Assignee profile:

NuFlare Technology, Inc.

City:

Numazu-shi

Country:

Japan

Published Applications:

213

Last publication date:

2017-03-09

Patent Grants:

195

Last grant date:

2021-01-05

Quarterly NuFlare Technology, Inc. Patent Applications

Top Inventors for applications by NuFlare Technology, Inc.

These are the the leading inventors for applications assigned to NuFlare Technology, Inc.:

Recent patent applications by NuFlare Technology, Inc.

NuFlare Technology, Inc. based in Numazu-shi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2017-03-09 ✅ Patent 10,884,336 granted on 2021-01-05
US20170068172A1
Physics

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

#2 | 2016-06-09 ✅ Patent 10,120,284 granted on 2018-11-06
US20160161849A1
Physics

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#3 | 2015-12-31
US20150377800A1
Physics

PATTERN TEST APPARATUS

#4 | 2015-10-29 ✅ Patent 9,535,327 granted on 2017-01-03
US20150309412A1
Physics

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

#5 | 2015-08-20 ✅ Patent 9,543,119 granted on 2017-01-10
US20150235807A1
Electricity

Multi charged particle beam writing apparatus and method for correcting a current distribution of groups of charged particle beams

#6 | 2015-08-13 ✅ Patent 9,552,983 granted on 2017-01-24
US20150228477A1
Electricity

Manufacturing method for semiconductor device

#7 | 2015-07-09 ✅ Patent 9,406,117 granted on 2016-08-02
US20150193918A1
Physics

Inspection system and method for inspecting line width and/or positional errors of a pattern

#8 | 2015-05-14 ✅ Patent 9,177,372 granted on 2015-11-03
US20150131892A1
Physics

Defect estimation device and method and inspection system and method

#9 | 2014-08-14 ✅ Patent 9,076,564 granted on 2015-07-07
US20140225008A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#10 | 2014-03-20 ✅ Patent 9,018,602 granted on 2015-04-28
US20140077103A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#11 | 2014-03-13 ✅ Patent 9,086,388 granted on 2015-07-21
US20140072202A1
Physics

Pattern evaluation method and apparatus

#12 | 2014-03-06 ✅ Patent 9,343,266 granted on 2016-05-17
US20140061499A1
Electricity

Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table

#13 | 2014-02-27 ✅ Patent 9,157,870 granted on 2015-10-13
US20140055780A1
Physics

Pattern test apparatus

#14 | 2014-02-27 ✅ Patent 9,194,817 granted on 2015-11-24
US20140055774A1
Physics

Defect detection method

#15 | 2014-02-27 ✅ Patent 8,803,108 granted on 2014-08-12
US20140054469A1
Electricity

Method for acquiring settling time

#16 | 2014-01-16 ✅ Patent 9,141,750 granted on 2015-09-22
US20140017349A1
Physics

Charged particle beam writing apparatus and irradiation time apportionment method of charged particle beams for multiple writing

#17 | 2014-01-02 ✅ Patent 8,742,376 granted on 2014-06-03
US20140001380A1
Electricity

Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask

#18 | 2013-12-19 ✅ Patent 8,835,881 granted on 2014-09-16
US20130334442A1
Electricity

Drift correction method and pattern writing data generation method

#19 | 2013-12-05 ✅ Patent 8,729,507 granted on 2014-05-20
US20130320230A1
Electricity

Multi charged particle beam writing method and multi charged particle beam writing apparatus

#20 | 2013-11-28 ✅ Patent 9,268,234 granted on 2016-02-23
US20130316288A1
Physics

Charged particle beam lithography apparatus and charged particle beam pattern writing method

#21 | 2013-10-10 ✅ Patent 8,779,379 granted on 2014-07-15
US20130264499A1
Electricity

Acquisition method of charged particle beam deflection shape error and charged particle beam writing method

#22 | 2013-10-10 ✅ Patent 9,164,044 granted on 2015-10-20
US20130264478A1
Physics

Charged particle beam lithography apparatus, inspection apparatus and inspection method of pattern writing data

#23 | 2013-10-03
US20130256555A1
Electricity

SHAPING OFFSET ADJUSTMENT METHOD AND CHARGED PARTICLE BEAM DRAWING APPARATUS

#24 | 2013-10-03 ✅ Patent 8,872,141 granted on 2014-10-28
US20130256519A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#25 | 2013-10-03 ✅ Patent 9,735,003 granted on 2017-08-15
US20130255569A1
Electricity

Film-forming apparatus and film-forming method

#26 | 2013-09-26 ✅ Patent 9,159,555 granted on 2015-10-13
US20130253688A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#27 | 2013-09-26 ✅ Patent 9,082,588 granted on 2015-07-14
US20130252172A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#28 | 2013-09-26 ✅ Patent 9,299,533 granted on 2016-03-29
US20130252145A1
Electricity

Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers

#29 | 2013-09-26 ✅ Patent 9,235,883 granted on 2016-01-12
US20130250095A1
Physics

Inspection system and method

#30 | 2013-09-19 ✅ Patent 8,927,941 granted on 2015-01-06
US20130240750A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens

#31 | 2013-08-22 ✅ Patent 9,373,424 granted on 2016-06-21
US20130216953A1
Physics

Electron beam writing apparatus and electron beam writing method

#32 | 2013-08-22 ✅ Patent 8,861,832 granted on 2014-10-14
US20130216120A1
Physics

Inspection system and method

#33 | 2013-08-22 ✅ Patent 8,816,276 granted on 2014-08-26
US20130214172A1
Electricity

Electron beam writing apparatus and electron beam writing method

#34 | 2013-07-11 ✅ Patent 8,767,200 granted on 2014-07-01
US20130176559A1
Physics

Luminous flux branching element and mask defect inspection apparatus

#35 | 2013-06-20 ✅ Patent 8,741,547 granted on 2014-06-03
US20130157198A1
Physics

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#36 | 2013-06-20
US20130156950A1
Chemistry; metallurgy

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

#37 | 2013-06-20
US20130152853A1
Chemistry; metallurgy

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

#38 | 2013-05-30 ✅ Patent 8,759,799 granted on 2014-06-24
US20130134329A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#39 | 2013-05-02
US20130104800A1
Chemistry; metallurgy

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

#40 | 2013-04-25 ✅ Patent 8,552,405 granted on 2013-10-08
US20130099139A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#41 | 2013-04-18 ✅ Patent 8,781,212 granted on 2014-07-15
US20130094752A1
Physics

Defect estimation device and method and inspection system and method

#42 | 2013-04-18 ✅ Patent 8,983,113 granted on 2015-03-17
US20130093878A1
Physics

Defect estimation device and method and inspection system and method

#43 | 2013-04-04 ✅ Patent 8,797,525 granted on 2014-08-05
US20130083318A1
Physics

Pattern inspection apparatus and pattern inspection method

#44 | 2013-04-04 ✅ Patent 8,847,178 granted on 2014-09-30
US20130082193A1
Physics

Charged particle beam writing apparatus and charged particle beam writing method

#45 | 2013-04-04 ✅ Patent 8,492,732 granted on 2013-07-23
US20130082187A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#46 | 2013-03-14 ✅ Patent 8,748,064 granted on 2014-06-10
US20130065184A1
Physics

Charged particle beam drawing method and charged particle beam drawing apparatus

#47 | 2013-03-07 ✅ Patent 8,710,467 granted on 2014-04-29
US20130056647A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#48 | 2013-03-07 ✅ Patent 8,586,951 granted on 2013-11-19
US20130056645A1
Electricity

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#49 | 2013-02-21 ✅ Patent 9,542,586 granted on 2017-01-10
US20130044205A1
Physics

Pattern inspection apparatus and pattern inspection method

#50 | 2013-02-14 ✅ Patent 8,748,843 granted on 2014-06-10
US20130037724A1
Electricity

Charged particle beam drawing apparatus and charged particle beam drawing method

#51 | 2013-01-10 ✅ Patent 8,452,074 granted on 2013-05-28
US20130010291A1
Physics

Apparatus and method for pattern inspection

#52 | 2012-12-27 ✅ Patent 9,273,412 granted on 2016-03-01
US20120325138A1
Chemistry; metallurgy

Film-forming apparatus and film-forming method

#53 | 2012-12-06 ✅ Patent 10,578,560 granted on 2020-03-03
US20120307043A1
Physics

Inspection apparatus and method for detecting false defects

#54 | 2012-11-22 ✅ Patent 8,563,952 granted on 2013-10-22
US20120292537A1
Electricity

Charged particle beam writing apparatus

#55 | 2012-11-22 ✅ Patent 9,006,691 granted on 2015-04-14
US20120292536A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block

#56 | 2012-11-15
US20120286174A1
Electricity

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD

#57 | 2012-10-04 ✅ Patent 9,122,176 granted on 2015-09-01
US20120252215A1
Physics

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

#58 | 2012-10-04 ✅ Patent 8,779,394 granted on 2014-07-15
US20120248340A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#59 | 2012-08-23 ✅ Patent 8,859,997 granted on 2014-10-14
US20120211676A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#60 | 2012-08-23 ✅ Patent 9,063,440 granted on 2015-06-23
US20120211674A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#61 | 2012-08-02 ✅ Patent 8,610,096 granted on 2013-12-17
US20120193553A1
Electricity

Charged particle beam writing apparatus and method

#62 | 2012-07-26 ✅ Patent 8,755,040 granted on 2014-06-17
US20120189032A1
Physics

Illuminating apparatus, pattern inspection apparatus, and method of forming illuminating light

#63 | 2012-07-26 ✅ Patent 8,431,908 granted on 2013-04-30
US20120187307A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#64 | 2012-06-07 ✅ Patent 9,057,711 granted on 2015-06-16
US20120140060A1
Physics

Inspection apparatus and method

#65 | 2012-05-24 ✅ Patent 8,878,149 granted on 2014-11-04
US20120126145A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#66 | 2012-05-03 ✅ Patent 8,352,889 granted on 2013-01-08
US20120108063A1
Electricity

Beam dose computing method and writing method and record carrier body and writing apparatus

#67 | 2012-05-03 ✅ Patent 8,527,913 granted on 2013-09-03
US20120104286A1
Electricity

Method for resizing pattern to be written by lithography technique, and charged particle beam writing method

#68 | 2012-04-12 ✅ Patent 9,218,942 granted on 2015-12-22
US20120085940A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#69 | 2012-04-05
US20120081538A1
Physics

PATTERN INSPECTION APPARATUS

#70 | 2012-03-22 ✅ Patent 8,563,953 granted on 2013-10-22
US20120068089A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#71 | 2012-02-09 ✅ Patent 8,429,575 granted on 2013-04-23
US20120036486A1
Electricity

Method for resizing pattern to be written by lithography technique, and charged particle beam writing method

#72 | 2012-01-12 ✅ Patent 8,502,175 granted on 2013-08-06
US20120007002A1
Electricity

Charged particle beam pattern forming apparatus and charged particle beam pattern forming method

#73 | 2012-01-05 ✅ Patent 8,466,440 granted on 2013-06-18
US20120001097A1
Electricity

Charged particle beam drawing apparatus and control method thereof

#74 | 2011-12-01 ✅ Patent 9,188,853 granted on 2015-11-17
US20110291029A1
Physics

Charged particle beam drawing apparatus and control method thereof

#75 | 2011-11-24 ✅ Patent 8,301,291 granted on 2012-10-30
US20110286319A1
Electricity

Charged particle beam writing apparatus, write data creation method and charged particle beam writing method

#76 | 2011-10-20 ✅ Patent 9,036,896 granted on 2015-05-19
US20110255770A1
Physics

Inspection system and method for inspecting line width and/or positional errors of a pattern

#77 | 2011-10-20 ✅ Patent 8,427,919 granted on 2013-04-23
US20110255388A1
Electricity

Pattern writing system and method and abnormality diagnosing method

#78 | 2011-10-20 ✅ Patent 8,791,432 granted on 2014-07-29
US20110253912A1
Electricity

Charged particle beam writing apparatus and charged particle beam writing method

#79 | 2011-10-20 ✅ Patent 8,610,091 granted on 2013-12-17
US20110253911A1
Physics

Charged particle beam writing apparatus and charged particle beam writing method

#80 | 2011-09-22 ✅ Patent 9,552,963 granted on 2017-01-24
US20110231134A1
Electricity

Charged particle beam writing apparatus and method therefor

#81 | 2011-08-04 ✅ Patent 8,737,676 granted on 2014-05-27
US20110188734A1
Physics

Defect estimation device and method and inspection system and method

#82 | 2011-08-04
US20110186744A1
Electricity

CHARGED PARTICLE BEAM APPARATUS AND METHOD

#83 | 2011-07-21 ✅ Patent 8,548,223 granted on 2013-10-01
US20110176719A1
Physics

Inspection system and method

#84 | 2011-06-30 ✅ Patent 8,779,397 granted on 2014-07-15
US20110155930A1
Electricity

Substrate cover and charged particle beam writing method using same

#85 | 2011-05-26
US20110121208A1
Electricity

CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF

#86 | 2011-05-19 ✅ Patent 8,653,488 granted on 2014-02-18
US20110114853A1
Physics

Electron beam apparatus

#87 | 2011-04-21 ✅ Patent 8,755,599 granted on 2014-06-17
US20110091099A1
Physics

Review apparatus and inspection system

#88 | 2011-04-21
US20110089346A1
Performing operations; transporting

METHOD AND SYSTEM FOR PATTERN WRITING WITH CHARGED-PARTICLE BEAM

#89 | 2011-03-24 ✅ Patent 8,207,514 granted on 2012-06-26
US20110068281A1
Electricity

Charged particle beam drawing apparatus and proximity effect correction method thereof

#90 | 2011-03-17 ✅ Patent 8,755,924 granted on 2014-06-17
US20110066272A1
Electricity

Charged particle beam writing method and apparatus therefor

#91 | 2011-03-17 ✅ Patent 8,471,225 granted on 2013-06-25
US20110066271A1
Electricity

Charged particle beam writing method and apparatus therefor

#92 | 2011-02-24 ✅ Patent 8,183,545 granted on 2012-05-22
US20110046762A1
Electricity

Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing

#93 | 2011-02-24 ✅ Patent 8,903,158 granted on 2014-12-02
US20110044529A1
Physics

Inspection system and inspection method

#94 | 2011-02-24 ✅ Patent 9,031,313 granted on 2015-05-12
US20110044528A1
Physics

Inspection system

#95 | 2011-02-10 ✅ Patent 8,481,964 granted on 2013-07-09
US20110033788A1
Electricity

Charged particle beam drawing apparatus and method

#96 | 2011-02-10 ✅ Patent 8,178,856 granted on 2012-05-15
US20110031387A1
Electricity

Charged particle beam writing apparatus and method thereof

#97 | 2011-01-20 ✅ Patent 8,188,449 granted on 2012-05-29
US20110012031A1
Electricity

Charged particle beam drawing method and apparatus

#98 | 2010-12-02 ✅ Patent 8,307,314 granted on 2012-11-06
US20100306721A1
Electricity

Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus

#99 | 2010-11-18 ✅ Patent 8,237,139 granted on 2012-08-07
US20100290023A1
Physics

Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus

#100 | 2010-11-18 ✅ Patent 8,247,783 granted on 2012-08-21
US20100288939A1
Electricity

Method of determining main deflection settling time for charged particle beam writing, method of writing with charged particle beam, and apparatus for writing with charged particle beam

Also check out NuFlare Technology, Inc.'s (Numazu-shi, Japan) applicant profile with 18 patent applications submitted.

AssigneeID:

3105 ⎘