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Inventor profile of:

Jun Yashima

City:

Kanagawa

Country:

Japan

Published Applications:

25

Last publication date:

2015-03-05

Top Assignees for applications by Jun Yashima

The entities that hold a legal rights for patent applications filed by inventor Yashima Jun:

NuFlare Technology, Inc. 22 Numazu-shi, Japan
NuFlare Technology, Inc. 3 Yokohama, Japan
Nuflare Technology, Inc. 2 Yokohama-shi, Japan
NuFlare Technolgy, Inc. 1 Numazu-shi, Japan
NuFlare Technology, Inc. 1 Shizuoka, Japan

Recent patent applications by Yashima Jun

Jun Yashima from Kanagawa, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-03-05

US20150060690A1

Charged particle beam writing apparatus, and charged particle beam writing method

#2 | 2015-01-15

US20150014549A1

Charged particle beam writing apparatus and charged particle beam writing method

#3 | 2014-08-21

US20140237196A1

Charged particle beam writing apparatus, and buffer memory data storage method

#4 | 2014-01-16

US20140017349A1

Charged particle beam writing apparatus and irradiation time apportionment method of charged particle beams for multiple writing

#5 | 2013-10-03

US20130256519A1

Charged particle beam writing apparatus and charged particle beam writing method

#6 | 2013-04-25

US20130099139A1

Charged particle beam writing apparatus and charged particle beam writing method

#7 | 2012-11-22

US20120292537A1

Charged particle beam writing apparatus

#8 | 2012-11-22

US20120292536A1

Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block

#9 | 2012-05-24

US20120126145A1

Charged particle beam writing apparatus and charged particle beam writing method

#10 | 2012-05-03

US20120108063A1

Beam dose computing method and writing method and record carrier body and writing apparatus

#11 | 2012-05-03

US20120104286A1

Method for resizing pattern to be written by lithography technique, and charged particle beam writing method

#12 | 2012-03-22

US20120068089A1

Charged particle beam writing apparatus and charged particle beam writing method

#13 | 2012-02-09

US20120036486A1

Method for resizing pattern to be written by lithography technique, and charged particle beam writing method

#14 | 2012-01-05

US20120001097A1

Charged particle beam drawing apparatus and control method thereof

#15 | 2011-12-01

US20110291029A1

Charged particle beam drawing apparatus and control method thereof

#16 | 2011-02-24

US20110046762A1

Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing

#17 | 2011-01-20

US20110012031A1

Charged particle beam drawing method and apparatus

#18 | 2010-09-23

US20100237253A1

Charged particle beam drawing method and apparatus

#19 | 2010-07-08

US20100173235A1

Method and apparatus for writing

#20 | 2010-03-25

US20100072390A1

Charged particle beam writing apparatus and method

#21 | 2010-01-21

US20100015537A1

Beam dose computing method and writing method and record carrier body and writing apparatus

#22 | 2009-08-13

US20090200488A1

Charged particle beam writing apparatus, and apparatus and method for correcting dimension error of pattern

#23 | 2008-07-31

US20080184190A1

Method for resizing pattern to be written by lithography technique, and charged particle beam writing method

#24 | 2007-06-21

US20070138413A1

Charged particle beam writing method and apparatus

#25 | 2007-05-24

US20070114453A1

Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam

InventorID:

204867 ⎘