Santa Clara, California
United States
18
2023-01-19
18
2023-06-20
These are the the leading inventors for applications assigned to NOVA MEASURING INSTRUMENTS INC.:
NOVA MEASURING INSTRUMENTS INC. based in Santa Clara, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
XPS metrology for process control in selective deposition
#2 | 2022-12-08 ✅ Patent 11,996,259 granted on 2024-05-28Patterned x-ray emitting target
#3 | 2021-12-02 ✅ Patent 11,733,035 granted on 2023-08-22Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
#4 | 2021-09-30 ✅ Patent 11,430,647 granted on 2022-08-30Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry
#5 | 2020-11-26 ✅ Patent 11,029,148 granted on 2021-06-08Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
#6 | 2020-08-13 ✅ Patent 10,910,208 granted on 2021-02-02Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
#7 | 2020-03-19 ✅ Patent 10,859,519 granted on 2020-12-08Methods and systems for measuring periodic structures using multi-angle x-ray reflectance scatterometry (XRS)
#8 | 2020-02-27 ✅ Patent 11,183,377 granted on 2021-11-23Mass spectrometer detector and system and method using the same
#9 | 2019-12-19 ✅ Patent 10,636,644 granted on 2020-04-28Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
#10 | 2019-11-28 ✅ Patent 10,648,802 granted on 2020-05-12Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
#11 | 2019-09-12 ✅ Patent 10,801,978 granted on 2020-10-13XPS metrology for process control in selective deposition
#12 | 2019-03-21 ✅ Patent 10,481,112 granted on 2019-11-19Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
#13 | 2018-11-15 ✅ Patent 10,403,489 granted on 2019-09-03Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
#14 | 2018-11-15 ✅ Patent 10,533,961 granted on 2020-01-14Method and system for non-destructive metrology of thin layers
#15 | 2018-01-25 ✅ Patent 10,056,242 granted on 2018-08-21Systems and approaches for semiconductor metrology and surface analysis using secondary ion mass spectrometry
#16 | 2017-06-22 ✅ Patent 9,952,166 granted on 2018-04-24Silicon germanium thickness and composition determination using combined XPS and XRF technologies
#17 | 2017-06-22 ✅ Patent 10,119,925 granted on 2018-11-06Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS)
#18 | 2017-06-08 ✅ Patent 10,082,390 granted on 2018-09-25Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
Also check out NOVA MEASURING INSTRUMENTS, INC.'s (Santa Clara, United States) applicant profile with 19 patent applications submitted.
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