Poughkeepsie, New York
United States
13
2025-02-27
The entities that hold a legal rights for patent applications filed by inventor Klare Mark:
Mark Klare from Poughkeepsie, US has applied for patents for these inventions. The list has both pending applications and granted patents:
PRODUCTION SOLUTIONS FOR HIGH-THROUGHPUT/PRECISION XPS METROLOGY USING UNSUPERVISED MACHINE LEARNING
#2 | 2025-02-13METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS
#3 | 2024-03-14FEED-FORWARD OF MULTI-LAYER AND MULTI-PROCESS INFORMATION USING XPS AND XRF TECHNOLOGIES
#4 | 2023-12-21Method and system for non-destructive metrology of thin layers
#5 | 2022-03-10Method and system for non-destructive metrology of thin layers
#6 | 2021-12-02Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
#7 | 2020-11-26Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
#8 | 2020-06-18Method and system for non-destructive metrology of thin layers
#9 | 2019-11-28Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
#10 | 2019-01-31FEED-FORWARD OF MULTI-LAYER AND MULTI-PROCESS INFORMATION USING XPS AND XRF TECHNOLOGIES
#11 | 2018-11-15Method and system for non-destructive metrology of thin layers
#12 | 2018-06-21METHOD AND SYSTEM FOR NON-DESTRUCTIVE METROLOGY OF THIN LAYERS
#13 | 2017-06-08Feed-forward of multi-layer and multi-process information using XPS and XRF technologies
1896379 ⎘