Miyagi
Japan
11
2014-03-13
11
2015-09-01
These are the the leading inventors for applications assigned to Advanced Interconnect Materials, LLC:
Advanced Interconnect Materials, LLC based in Miyagi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Electrode for oxide semiconductor, method of forming the same, and oxide semiconductor device provided with the electrode
#2 | 2013-07-04 ✅ Patent 8,895,978 granted on 2014-11-25Semiconductor device
#3 | 2013-05-09 ✅ Patent 8,866,140 granted on 2014-10-21Thin-film transistor
#4 | 2012-11-22 ✅ Patent 8,420,535 granted on 2013-04-16Copper interconnection, method for forming copper interconnection structure, and semiconductor device
#5 | 2012-01-26 ✅ Patent 9,082,821 granted on 2015-07-14Method for forming copper interconnection structures
#6 | 2011-03-10 ✅ Patent 8,531,033 granted on 2013-09-10Contact plug structure, semiconductor device, and method for forming contact plug
#7 | 2010-10-21 ✅ Patent 8,163,649 granted on 2012-04-24Copper interconnection structure, semiconductor device, and method for forming copper interconnection structure
#8 | 2010-06-24 ✅ Patent 8,169,079 granted on 2012-05-01Copper interconnection structures and semiconductor devices
#9 | 2010-03-18 ✅ Patent 8,258,626 granted on 2012-09-04Copper interconnection, method for forming copper interconnection structure, and semiconductor device
#10 | 2009-10-08 ✅ Patent 8,372,745 granted on 2013-02-12Semiconductor device, its manufacturing method, and sputtering target material for use in the method
#11 | 2009-08-27 ✅ Patent 8,188,599 granted on 2012-05-29Semiconductor device, its manufacturing method, and sputtering target material for use in the method
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