Assignee profile:

GlobalWafers Co., Ltd.

City:

Country:

Taiwan

Published Applications:

9

Last publication date:

2019-07-11

Patent Grants:

9

Last grant date:

2020-03-03

Top Inventors for applications by GlobalWafers Co., Ltd.

These are the the leading inventors for applications assigned to GlobalWafers Co., Ltd.:

Recent patent applications by GlobalWafers Co., Ltd.

GlobalWafers Co., Ltd. based in , TW has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2019-07-11 ✅ Patent 10,577,717 granted on 2020-03-03
US20190211469A1
Chemistry; metallurgy

Systems for selectively feeding chunk polysilicon or granular polysilicon in a crystal growth chamber

#2 | 2018-08-23 ✅ Patent 10,273,596 granted on 2019-04-30
US20180237948A1
Chemistry; metallurgy

Systems for selectively feeding chunk polysilicon or granular polysilicon in a crystal growth chamber

#3 | 2018-08-16 ✅ Patent 10,490,464 granted on 2019-11-26
US20180233420A1
Electricity

Methods for assessing semiconductor structures

#4 | 2018-07-19 ✅ Patent 10,557,213 granted on 2020-02-11
US20180202065A1
Chemistry; metallurgy

Crystal growing systems and methods including a transparent crucible

#5 | 2018-06-07 ✅ Patent 10,468,295 granted on 2019-11-05
US20180158721A1
Electricity

High resistivity silicon-on-insulator structure and method of manufacture thereof

#6 | 2017-09-07 ✅ Patent 10,128,146 granted on 2018-11-13
US20170256439A9
Electricity

Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures

#7 | 2017-02-23 ✅ Patent 10,128,146 granted on 2018-11-13
US20170053826A1
Electricity

Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures

#8 | 2016-11-24 ✅ Patent 10,184,193 granted on 2019-01-22
US20160340799A1
Chemistry; metallurgy

Epitaxy reactor and susceptor system for improved epitaxial wafer flatness

#9 | 2014-07-03 ✅ Patent 10,361,097 granted on 2019-07-23
US20140182788A1
Electricity

Apparatus for stressing semiconductor substrates

AssigneeID:

546878 ⎘