B24B37/044 - page 2 - CPC Classification Index

#301

20180108536

2018-04-19

Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate

#302

20180079930

2018-03-22

Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate

#303

20180066161

2018-03-08

Polishing composition for silicon wafer and polishing method

#304

20180057711

2018-03-01

Polishing composition

#305

20180043497

2018-02-15

Polishing agent, stock solution for polishing agent, and polishing method

#306

20180030313

2018-02-01

METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITION

#307

20180022960

2018-01-25

POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING HARD BRITTLE MATERIAL SUBSTRATE

#308

20180022959

2018-01-25

POLISHING COMPOSITION

#309

20180016468

2018-01-18

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

#310

20180005840

2018-01-04

Surface treatment in a chemical mechanical process

#311

20180002571

2018-01-04

Additives for barrier chemical mechanical planarization

#312

20170372918

2017-12-28

Composition and Method Used for Chemical Mechanical Planarization of Metals

#313

20170369742

2017-12-28

Polishing composition comprising an amine-containing surfactant

#314

20170362466

2017-12-21

Chemical mechanical polishing (CMP) of cobalt-containing substrate

#315

20170362465

2017-12-21

Modified colloidal silica and method for producing the same, and polishing agent using the same

#316

20170348820

2017-12-07

Chemical-mechanical processing slurry and methods for processing a nickel substrate surface

#317

20170342304

2017-11-30

POLISHING COMPOSITION

#318

20170335489

2017-11-23

Silicon carbide substrate, method for producing same, and method for manufacturing silicon carbide semiconductor device

#319

20170335139

2017-11-23

CMP slurry composition for polishing copper and polishing method using the same

#320

20170330763

2017-11-16

Semiconductor treatment composition and treatment method

#321

20170321098

2017-11-09

Polishing composition

#322

20170320187

2017-11-09

Polishing method and polishing composition

#323

20170298253

2017-10-19

Polishing composition and polishing method

#324

20170297163

2017-10-19

Chemical mechanical polishing apparatus and methods

#325

20170292039

2017-10-12

POLISHING COMPOSITION, METHOD FOR MANUFACTURING SAME, AND POLISHING METHOD

#326

20170292038

2017-10-12

Polishing composition for silicon oxide film

#327

20170283673

2017-10-05

Composite particles, method of refining and use thereof

#328

20170260421

2017-09-14

Cobalt polishing accelerators

#329

20170253767

2017-09-07

Silicon wafer polishing composition

#330

20170243752

2017-08-24

POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHING COMPOSITION

#331

20170239781

2017-08-24

Concrete cutting, polishing, and coloring treatment solutions and methods

#332

20170239780

2017-08-24

Lubricated mechanical polishing

#333

20170226380

2017-08-10

POLISHING SOLUTIONS AND METHODS OF USING SAME

#334

20170210946

2017-07-27

Polishing composition comprising cationic polymer additive

#335

20170200617

2017-07-13

Polishing liquid for CMP, polishing liquid set for CMP, and polishing method

#336

20170154787

2017-06-01

CMP polishing liquid and polishing method

#337

20170136600

2017-05-18

Polishing composition and polishing method using the same

#338

20170133237

2017-05-11

POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLISHING LIQUID

#339

20170107404

2017-04-20

Slurry composition for chemical mechanical polishing, method of preparing the same, and polishing method using the same

#340

20170100815

2017-04-13

Method for polishing GaN single crystal material

#341

20170098560

2017-04-06

Slurry composition for chemical mechanical polishing of GE-based materials and devices

#342

20170081554

2017-03-23

Composition for polishing silicon wafers

#343

20170081553

2017-03-23

POLISHING COMPOSITION

#344

20170066102

2017-03-09

Selective nitride slurries with improved stability and improved polishing characteristics

#345

20170051181

2017-02-23

Polishing composition and method utilizing abrasive particles treated with an aminosilane

#346

20170044403

2017-02-16

Polishing composition containing ceria abrasive

#347

20170037290

2017-02-09

CMP polishing agent, method for manufacturing thereof, and method for polishing substrate

#348

20170022392

2017-01-26

POLISHING COMPOSITION FOR HARD MATERIALS

#349

20170015868

2017-01-19

Polishing composition and method for polishing magnetic disk substrate

#350

20170015867

2017-01-19

Polishing composition and method for polishing magnetic disk substrate

#351

20170014969

2017-01-19

Methods and compositions for processing dielectric substrate

#352

20170009102

2017-01-12

Polishing agent and method for polishing substrate using the polishing agent

#353

20170009101

2017-01-12

Polishing composition

#354

20160379840

2016-12-29

Chemical mechanical polishing pad and method of making same

#355

20160375554

2016-12-29

Method of making composite polishing layer for chemical mechanical polishing pad

#356

20160375547

2016-12-29

Substrate processing method

#357

20160375545

2016-12-29

Chemical mechanical polishing pad composite polishing layer formulation

#358

20160375544

2016-12-29

Composite polishing layer chemical mechanical polishing pad

#359

20160325398

2016-11-10

Polishing abrasive particle, production method therefore, polishing method, polishing device, and slurry

#360

20160322231

2016-11-03

Manufacturing method of semiconductor device

#361

20160319160

2016-11-03

Metal oxide-polymer composite particles for chemical mechanical planarization

#362

20160319159

2016-11-03

Abrasive, abrasive set, and method for polishing substrate

#363

20160314989

2016-10-27

Low dishing copper chemical mechanical planarization

#364

20160288289

2016-10-06

POLISHING COMPOSITION

#365

20160280961

2016-09-29

Slurry, polishing solution set, polishing solution, and substrate polishing method

#366

20160272860

2016-09-22

Cerium oxide abrasive, method for producing cerium oxide abrasive, and polishing method

#367

20160263723

2016-09-15

CMP PAD DRESSER HAVING LEVELED TIPS AND ASSOCIATED METHODS

#368

20160257856

2016-09-08

Polishing composition containing ceria abrasive

#369

20160257855

2016-09-08

Polishing composition containing ceria particles and method of use

#370

20160244639

2016-08-25

Composition and method for polishing memory hard disks exhibiting reduced edge roll-off

#371

20160229023

2016-08-11

Multi-layered polishing pads

#372

20160221146

2016-08-04

Composite ceramic abrasive polishing solution

#373

20160215189

2016-07-28

Polishing composition and method for producing same

#374

20160215188

2016-07-28

Polishing composition and method for producing same

#375

20160177155

2016-06-23

Silica for CMP, aqueous dispersion, and process for producing silica for CMP

#376

20160168020

2016-06-16

METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE

#377

20160151876

2016-06-02

Kit for polishing sapphire surfaces

#378

20160137881

2016-05-19

Polishing liquid for CMP, and polishing method

#379

20160136770

2016-05-19

Concrete cutting, polishing and coloring treatment solutions and methods

#380

20160118073

2016-04-28

Method for manufacturing glass substrate, method for manufacturing magnetic disk, and polishing liquid composition for glass substrate

#381

20160115353

2016-04-28

Cobalt polishing accelerators

#382

20160108286

2016-04-21

Slurry for chemical mechanical polishing of cobalt

#383

20160108285

2016-04-21

Cobalt dishing control agents

#384

20160107286

2016-04-21

CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME

#385

20160096979

2016-04-07

Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material

#386

20160090513

2016-03-31

Chemical mechanical planarization slurry composition comprising composite particles, process for removing material using said composition, CMP polishing pad and process for preparing said composition

#387

20160089763

2016-03-31

Composition for tungsten CMP

#388

20160079084

2016-03-17

Composition and method used for chemical mechanical planarization of metals

#389

20160071737

2016-03-10

Slurry composition for chemical mechanical polishing of Ge-based materials and devices

#390

20160060488

2016-03-03

Polishing of hard substrates with soft-core composite particles

#391

20160040040

2016-02-11

Slurry for Selective Chemical Mechanical Polishing of Copper

#392

20160002500

2016-01-07

Polishing composition

#393

20160001416

2016-01-07

Polishing composition and method for producing polished article

#394

20150376460

2015-12-31

Methods for fabricating a chemical-mechanical polishing composition

#395

20150360340

2015-12-17

METHOD FOR POLISHING ALLOY MATERIAL AND METHOD FOR MANUFACTURING ALLOY MATERIAL

#396

20150357212

2015-12-10

Planarization method and planarization apparatus

#397

20150344738

2015-12-03

Polishing composition

#398

20150330919

2015-11-19

Group III nitride wafers and fabrication method and testing method

#399

20150329361

2015-11-19

Group III nitride wafers and fabrication method and testing method

#400

20150322294

2015-11-12

POLISHING COMPOSITION

#401

20150315441

2015-11-05

Polishing slurry including zirconia particles and a method of using the polishing slurry

#402

20150315417

2015-11-05

Polishing composition for edge roll-off improvement

#403

20150287609

2015-10-08

Polishing composition

#404

20150275048

2015-10-01

Polishing slurry preventing agglomeration of charged colloids without loss of surface activity

#405

20150267081

2015-09-24

Composition for tungsten buffing

#406

20150261211

2015-09-17

Workpiece processing method

#407

20150210892

2015-07-30

Polishing composition and method for producing substrate

#408

20150194318

2015-07-09

Systems and methods for performing chemical mechanical planarization

#409

20150184029

2015-07-02

Polishing composition and method utilizing abrasive particles treated with an aminosilane

#410

20150183081

2015-07-02

Chemical mechanical planarization apparatus and methods

#411

20150175848

2015-06-25

Polishing agent, polishing method, and manufacturing method of semiconductor integrated circuit device

#412

20150175847

2015-06-25

MANUFACTURING METHOD OF POLISHING AGENT, POLISHING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#413

20150166838

2015-06-18

POLISHING COMPOSITION, MANUFACTURING PROCESS THEREFOR, UNDILUTED LIQUID, PROCESS FOR PRODUCING SILICON SUBSTRATE, AND SILICON SUBSTRATE

#414

20150166837

2015-06-18

Composition and method for chemical mechanical polishing

#415

20150158139

2015-06-11

MANUFACTURING METHOD OF GLASS SUBSTRATE FOR MAGNETIC DISK, MAGNETIC DISK, AND MAGNETIC DATA RECORDING/REPRODUCING DEVICE

#416

20150152290

2015-06-04

Polishing composition

#417

20150140904

2015-05-21

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

#418

20150140691

2015-05-21

Systems and methods for chemical mechanical planarization with fluorescence detection

#419

20150139885

2015-05-21

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

#420

20150132955

2015-05-14

Polishing composition, polishing method using same, and method for producing substrate

#421

20150123027

2015-05-07

Polishing liquid composition for wafers

#422

20150114929

2015-04-30

Polishing composition and method for nickel-phosphorous coated memory disks

#423

20150098887

2015-04-09

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

#424

20150079789

2015-03-19

Abrasive composition and method for producing semiconductor substrate

#425

20150056122

2015-02-26

Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate

#426

20150050862

2015-02-19

Polishing composition and method using said polishing composition to manufacture compound semiconductor substrate

#427

20150044947

2015-02-12

Method of polishing a new or a refurbished electrostatic chuck

#428

20150030650

2015-01-29

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

#429

20150014579

2015-01-15

POLISHING COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

#430

20140370707

2014-12-18

Polishing liquid for metal and polishing method

#431

20140346140

2014-11-27

CMP compositions selective for oxide and nitride with high removal rate and low defectivity

#432

20140342562

2014-11-20

Polishing composition

#433

20140342561

2014-11-20

Polishing composition

#434

20140335762

2014-11-13

Polishing composition, and polishing method and substrate production method using same

#435

20140322913

2014-10-30

Polishing composition

#436

20140308879

2014-10-16

ADDITIVE FOR POLISHING AGENT, AND POLISHING METHOD

#437

20140302753

2014-10-09

POLISHING COMPOSITION

#438

20140302752

2014-10-09

Composition for polishing purposes, polishing method using same, and method for producing substrate

#439

20140295738

2014-10-02

Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same

#440

20140263170

2014-09-18

Methods of polishing sapphire surfaces

#441

20140248823

2014-09-04

Composition and method for polishing glass

#442

20140242750

2014-08-28

Polishing slurry and polishing method

#443

20140220867

2014-08-07

Methods for grinding and polishing dried concrete using amorphous colloidal silica solution

#444

20140220778

2014-08-07

Planarization method and planarization apparatus

#445

20140206795

2014-07-24

Refurbished component, electronic device including the same, and method of refurbishing a component of an electronic device

#446

20140141612

2014-05-22

Polishing composition, polishing method using same, and method for producing semiconductor device

#447

20140073226

2014-03-13

Polypyrrolidone polishing composition and method

#448

20140057533

2014-02-27

Methods of polishing sapphire surfaces

#449

20140057532

2014-02-27

METHODS OF POLISHING SAPPHIRE SURFACES

#450

20140053982

2014-02-27

METHOD AND APPARATUS FOR PROCESSING WAFER-SHAPED ARTICLES

#451

20140051335

2014-02-20

ABRASIVE AND POLISHING COMPOSITION

#452

20140051250

2014-02-20

CMP polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base material

#453

20130344777

2013-12-26

Polishing composition, method for fabricating thereof and method of chemical mechanical polishing using the same

#454

20130327985

2013-12-12

Ceramic composite for light conversion and method for manufacture thereof

#455

20130324015

2013-12-05

Polishing composition

#456

20130309946

2013-11-21

METHOD FOR MANUFACTURING MAGNETIC DISC SUBSTRATE

#457

20130288573

2013-10-31

Polishing composition and polishing method using the same

#458

20130260558

2013-10-03

Polishing liquid and method for polishing substrate using the polishing liquid

#459

20130252426

2013-09-26

Polishing agent and method for polishing substrate using the polishing agent

#460

20130203324

2013-08-08

Manufacture of synthetic quartz glass substrate

#461

20130203254

2013-08-08

Polishing composition and polishing method

#462

20130183889

2013-07-18

PROCESS FOR PRODUCING POLISHING LIQUID COMPOSITION

#463

20130183826

2013-07-18

Composition for polishing and composition for rinsing

#464

20130137265

2013-05-30

Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate

#465

20130130595

2013-05-23

POLISHING AGENT AND POLISHING METHOD

#466

20130122785

2013-05-16

Method of preparing substrate

#467

20130119013

2013-05-16

Method for chemical planarization and chemical planarization apparatus

#468

20130115859

2013-05-09

SURFACE TREATMENT METHOD OF POLISHING PAD AND POLISHING METHOD OF WAFER USING THE SAME

#469

20130115855

2013-05-09

Polishing method and polishing apparatus

#470

20130109194

2013-05-02

Polishing liquid composition

#471

20130102229

2013-04-25

Process for producing glass substrate for information recording medium

#472

20130083425

2013-04-04

Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic recording / reproducing device

#473

20130040461

2013-02-14

Polishing composition and polishing method

#474

20130032573

2013-02-07

Method for polishing silicon wafer and polishing liquid therefor

#475

20130029489

2013-01-31

POLISHING SLURRY, POLISHING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#476

20130020283

2013-01-24

Polishing solution for copper polishing, and polishing method using same

#477

20130012102

2013-01-10

POLISHING SLURRY AND POLISHING METHOD THEREFOR

#478

20130005219

2013-01-03

CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME

#479

20130004793

2013-01-03

COPPER ALLOY FOR ELECTRONIC MATERIAL AND METHOD OF MANUFACTURE FOR SAME

#480

20120329371

2012-12-27

Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate

#481

20120329370

2012-12-27

Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate

#482

20120322346

2012-12-20

Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same

#483

20120315826

2012-12-13

Device and Method for Measuring Physical Parameters of Slurry and Chemical Mechanical Polishing Apparatus Comprising the Device

#484

20120315763

2012-12-13

Polishing liquid for CMP and polishing method using the same

#485

20120295443

2012-11-22

METHOD FOR RECLAIMING SEMICONDUCTOR WAFER AND POLISHING COMPOSITION

#486

20120280170

2012-11-08

Compositions for polishing silicon-containing substrates

#487

20120258597

2012-10-11

Method of manufacturing semiconductor device

#488

20120251711

2012-10-04

Method of manufacturing a glass substrate for a magnetic disk and method of manufacturing a magnetic disk

#489

20120240479

2012-09-27

POLISHING SLURRY FOR SILICON CARBIDE AND POLISHING METHOD THEREFOR

#490

20120240478

2012-09-27

ABRASIVE MATERIAL

#491

20120238094

2012-09-20

CMP polishing solution and polishing method

#492

20120214307

2012-08-23

CHEMICAL-MECHANICAL POLISHING LIQUID, AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND POLISHING METHOD USING SAID POLISHING LIQUID

#493

20120171936

2012-07-05

Polishing slurry including zirconia particles and a method of using the polishing slurry

#494

20120160804

2012-06-28

Polishing agent for copper polishing and polishing method using same

#495

20120156968

2012-06-21

Polishing liquid composition for magnetic disk substrate

#496

20120138851

2012-06-07

POLISHING COMPOSITION AND POLISHING METHOD

#497

20120129346

2012-05-24

Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate

#498

20120108064

2012-05-03

Polishing composition for silicon wafers

#499

20120094487

2012-04-19

COMPOSITIONS AND METHODS FOR MODIFYING A SURFACE SUITED FOR SEMICONDUCTOR FABRICATION

#500

20120080775

2012-04-05

Method of polishing a silicon wafer

#501

20120077422

2012-03-29

Polishing liquid composition

#502

20120028466

2012-02-02

Method for chemical mechanical planarization of a tungsten-containing substrate

#503

20120024818

2012-02-02

Polishing agent for copper polishing and polishing method using same

#504

20120021675

2012-01-26

SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING SLURRY AND MANUFACTURE OF SYNTHETIC QUARTZ GLASS SUBSTRATE USING THE SAME

#505

20120009441

2012-01-12

Method of manufacturing perpendicular magnetic recording medium substrate and perpendicular magnetic recording medium substrate manufactured by the same

#506

20110294293

2011-12-01

Chemical planarization of copper wafer polishing

#507

20110275216

2011-11-10

TWO STEP CHEMICAL-MECHANICAL POLISHING PROCESS

#508

20110244762

2011-10-06

Method for the double-side polishing of a semiconductor wafer

#509

20110225897

2011-09-22

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

#510

20110204027

2011-08-25

SLURRY MANUFACTURING METHOD, SLURRY AND POLISHING METHOD AND APPARATUS USING SLURRY

#511

20110203186

2011-08-25

POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE

#512

20110183581

2011-07-28

Polishing composition and polishing method using the same

#513

20110177690

2011-07-21

Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMP

#514

20110175018

2011-07-21

Polishing liquid and polishing method

#515

20110162873

2011-07-07

Forming conductive features of electronic devices

#516

20110123831

2011-05-26

METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISK

#517

20110045654

2011-02-24

Germanium layer polishing

#518

20110039475

2011-02-17

Polishing agent and method for polishing substrate using the polishing agent

#519

20110027997

2011-02-03

POLISHING LIQUID FOR CMP AND POLISHING METHOD

#520

20110008965

2011-01-13

POLISHING COMPOSITION AND POLISHING METHOD

#521

20110005143

2011-01-13

POLISHING OIL SLURRY FOR POLISHING HARD CRYSTAL SUBSTRATE

#522

20100323586

2010-12-23

Methods for producing and processing semiconductor wafers

#523

20100323522

2010-12-23

Polishing composition and polishing method

#524

20100279507

2010-11-04

Method for chemical mechanical polishing a substrate

#525

20100243471

2010-09-30

COMPOSITION, METHOD AND PROCESS FOR POLISHING A WAFER

#526

20100236288

2010-09-23

GLASS POWDERS, METHODS FOR PRODUCING GLASS POWDERS AND DEVICES FABRICATED FROM SAME

#527

20100230841

2010-09-16

AEROSOL METHOD AND APPARATUS, PARTICULATE PRODUCTS, AND ELECTRONIC DEVICES MADE THEREFROM

#528

20100216309

2010-08-26

CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME

#529

20100190413

2010-07-29

POLISHING COMPOSITION

#530

20100190339

2010-07-29

COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE CHANGE MATERIALS

#531

20100184359

2010-07-22

Method for fabricating semiconductor device

#532

20100180513

2010-07-22

Polymer particles having improved mechanical properties and applications of same

#533

20100099259

2010-04-22

POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#534

20100092366

2010-04-15

WATER-BASED POLISHING SLURRY FOR POLISHING SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, AND POLISHING METHOD FOR THE SAME

#535

20100075500

2010-03-25

Metal polishing slurry and chemical mechanical polishing method

#536

20100056026

2010-03-04

Polishing liquid composition

#537

20100029181

2010-02-04

Methods and compositions for polishing silicon-containing substrates

#538

20100015806

2010-01-21

CMP POLISHING SLURRY, ADDITIVE LIQUID FOR CMP POLISHING SLURRY, AND SUBSTRATE-POLISHING PROCESSES USING THE SAME

#539

20100009539

2010-01-14

Cerium oxide powder, method for preparing the same, and CMP slurry comprising the same

#540

20100003897

2010-01-07

METHODS OF POLISHING AN OBJECT USING SLURRY COMPOSITIONS

#541

20090325323

2009-12-31

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, PRODUCTION METHOD THEREOF, AND CHEMICAL MECHANICAL POLISHING METHOD

#542

20090302266

2009-12-10

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING

#543

20090289033

2009-11-26

Polishing composition containing polyether amine

#544

20090258493

2009-10-15

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#545

20090239450

2009-09-24

PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISKS

#546

20090236559

2009-09-24

Compositions for polishing aluminum/copper and titanium in damascene structures

#547

20090197415

2009-08-06

Polishing fluid composition

#548

20090197414

2009-08-06

Polishing Composition and Polishing Method Using The Same

#549

20090181539

2009-07-16

POLISHING AGENT FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

#550

20090176373

2009-07-09

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Method for polishing a substrate surface

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