Patents-Review.com
ClassID:

44772 ⎘

B24B37/10 - CPC Classification

Classification description:

Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping

Sub-classes:
Recent Application in this class:
#1
20260131417
2026-05-14

METHOD OF POLISHING SUBSTRATES IN SYSTEM WITH MULTIPLE PLATENS AND LOADING STATIONS

 #2
20260102870
2026-04-16

COMPENSATION FOR SLURRY COMPOSITION IN IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING

 #3
20260097463
2026-04-09

SEMICONDUCTOR DEVICE FABRICATION METHODS AND DEVICES FOR FORMING THE SAME

 #4
20260048469
2026-02-19

SUBSTRATE POLISHING DEVICE

 #5
20260034637
2026-02-05

SEMICONDUCTOR MANUFACTURING DEVICE

 #6
20260021554
2026-01-22

FLEXURE MOUNTED PAD FOR CHEMICAL MECHANICAL POLISHING

 #7
20250332680
2025-10-30

DETERMINATION METHOD OF WAFER POLISHING CONDITIONS, METHOD OF MANUFACTURING WAFER, AND WAFER ONE SIDE POLISHING SYSTEM

 #8
20250326085
2025-10-23

Method and System for Conditioning a Polishing Pad

 #9
20250312888
2025-10-09

SUBSTRATE PROCESSING SYSTEM

 #10
20250312886
2025-10-09

DEVICE AND METHOD FOR IMPROVED CMP PROCESS WITH CMP HEAD

 #11
20250205846
2025-06-26

POLISHING APPARATUS AND POLISHING METHOD

 #12
20250153305
2025-05-15

CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING APPARATUS COMPRISING THE SAME

 #13
20250100107
2025-03-27

ELASTIC MEMBRANE, POLISHING HEAD, AND POLISHING METHOD

 #14
20250018523
2025-01-16

POLISHING DEVICE, SUBSTRATE TREATING APPARATUS, AND POLISHING METHOD

 #15
20250001542
2025-01-02

METHOD FOR POLISHING A SUBSTRATE

 #16
20240367286
2024-11-07

PLATEN ROTATION DEVICE

 #17
20240359288
2024-10-31

METHOD OF USING POLISHING PAD

 #18
20240359287
2024-10-31

SEMICONDUCTOR DEVICE FABRICATION METHODS AND DEVICES FOR FORMING THE SAME

 #19
20240351161
2024-10-24

POLISHING METHOD AND POLISHING APPARATUS

 #20
20240278380
2024-08-22

POLISHING METHOD AND POLISHING APPARATUS

 #21
20240261932
2024-08-08

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #22
20240208002
2024-06-27

POLISHING APPARATUS AND POLISHING METHOD

 #23
20240123565
2024-04-18

COMPENSATION FOR SLURRY COMPOSITION IN IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING

 #24
20240058922
2024-02-22

WORKPIECE PROCESSING METHOD

 #25
20230415299
2023-12-28

Surface height measurement method using dummy disk

 #26
20230373062
2023-11-23

CHEMICAL MECHANICAL POLISHING APPARATUS WITH INTEGRATED SLURRY MIXER-DISPENSER AND METHODS FOR OPERATING THE SAME

 #27
20230339068
2023-10-26

Method of using polishing pad

 #28
20230294238
2023-09-21

SEMICONDUCTOR MANUFACTURING DEVICE

 #29
20230290645
2023-09-14

Retaining ring having inner surfaces with facets

 #30
20230278160
2023-09-07

METHOD AND SYSTEM FOR PERFORMING CHEMICAL MECHANICAL POLISHING

 #31
20230274929
2023-08-31

Method and system for chemical mechanical polishing process

 #32
20230170222
2023-06-01

APPARATUS FOR POLISHING A WAFER AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME

 #33
20230158632
2023-05-25

POLISHING APPARATUS

 #34
20230150087
2023-05-18

POLISHING FIXING DEVICE AND POLISHING APPARATUS

 #35
20230070746
2023-03-09

Pivotable substrate retaining ring

 #36
20230060135
2023-03-02

Substrate processing apparatus and substrate processing method

 #37
20220402096
2022-12-22

Slurry distribution device for chemical mechanical polishing

 #38
20220379427
2022-12-01

Polishing system, polishing pad and method of manufacturing semiconductor device

 #39
20220339754
2022-10-27

POLISHING METHOD

 #40
20220281063
2022-09-08

Grinding apparatus

 #41
20220212313
2022-07-07

END FACE POLISHING DEVICE FOR OPTICAL FIBER FERRULE

 #42
20220184770
2022-06-16

Compensation for slurry composition in in-situ electromagnetic inductive monitoring

 #43
20220111485
2022-04-14

SUBSTRATE PROCESSING SYSTEM

 #44
20220093405
2022-03-24

Polishing apparatus including polishing pad conditioner, non-contact displacement sensor, and data processor

 #45
20220088742
2022-03-24

Grinding method for workpiece and grinding apparatus

 #46
20220088740
2022-03-24

SEMICONDUCTOR WAFER PHOTOELECTROCHEMICAL MECHANICAL POLISHING PROCESSING DEVICE AND PROCESSING METHOD

 #47
20220063051
2022-03-03

Grinding apparatus

 #48
20220016740
2022-01-20

POLISHING APPARATUS AND POLISHING METHOD

 #49
20210402547
2021-12-30

Polishing carrier head with piezoelectric pressure control

 #50
20210402546
2021-12-30

Polishing carrier head with piezoelectric pressure control

 #51
20210331288
2021-10-28

SLURRY DISTRIBUTION DEVICE FOR CHEMICAL MECHANICAL POLISHING

 #52
20210331286
2021-10-28

Platen rotation device

 #53
20210276151
2021-09-09

AUTOMATIC WET SANDING APPARATUS

 #54
20210249276
2021-08-12

Retaining ring having inner surfaces with facets

 #55
20210237224
2021-08-05

Polishing head system and polishing apparatus

 #56
20210229235
2021-07-29

SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING METHOD, AND APPARATUS FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD USED IN POLISHING APPARATUS

 #57
20210205953
2021-07-08

Slurry distribution device for chemical mechanical polishing

 #58
20210069859
2021-03-11

Processing apparatus

 #59
20210069855
2021-03-11

Method of using polishing pad

 #60
20210060726
2021-03-04

Pivotable substrate retaining ring

 #61
20210050241
2021-02-18

Substrate processing system, substrate processing method and computer-readable recording medium

 #62
20210023672
2021-01-28

POLISHING-AMOUNT SIMULATION METHOD FOR BUFFING, AND BUFFING APPARATUS

 #63
20200376700
2020-12-03

Polishing platens and polishing platen manufacturing methods

 #64
20200269381
2020-08-27

Polishing apparatus

 #65
20200238473
2020-07-30

Method and system for performing chemical mechanical polishing

 #66
20200219728
2020-07-09

Dressing device, polishing apparatus, holder, housing and dressing method

 #67
20200171621
2020-06-04

Polishing apparatus

 #68
20200156206
2020-05-21

Offset head-spindle for chemical mechanical polishing

 #69
20200152469
2020-05-14

Method of manufacture including polishing pad monitoring method and polishing apparatus including polishing pad monitoring device

 #70
20200147752
2020-05-14

Platen rotation method

 #71
20200051809
2020-02-13

Apparatus for chemical mechanical polishing process

 #72
20200047310
2020-02-13

Substrate rotation device, substrate cleaning device, substrate processing device, and control method for substrate rotation device

 #73
20200041247
2020-02-06

Indium phosphide substrate, method of inspecting indium phosphide substrate, and method of producing indium phosphide substrate

 #74
20190381628
2019-12-19

Lapping system that includes a lapping plate temperature control system, and related methods

 #75
20190355596
2019-11-21

Wafer grinding apparatus and wafer grinding method

 #76
20190308293
2019-10-10

METHOD OF REGULATING A SURFACE TEMPERATURE OF POLISHING PAD, AND POLISHING APPARATUS

 #77
20190270180
2019-09-05

Carrier head having abrasive structure on retainer ring

 #78
20190262968
2019-08-29

Chemical mechanical polishing apparatus for polishing workpiece

 #79
20190224808
2019-07-25

Polishing apparatus

 #80
20190224806
2019-07-25

One or more charging members used in the manufacture of a lapping plate, and related apparatuses and methods of making

 #81
20190193237
2019-06-27

PAD TEMPERATURE ADJUSTMENT APPARATUS FOR ADJUSTING TEMPERATURE OF POLISHING PAD, AND POLISHING APPARATUS

 #82
20190184517
2019-06-20

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING PROGRAM

 #83
20190168354
2019-06-06

SUBSTRATE POLISHING APPARATUS, SUBSTRATE POLISHING METHOD, AND APPARATUS FOR REGULATING TEMPERATURE OF POLISHING SURFACE OF POLISHING PAD USED IN POLISHING APPARATUS

 #84
20190157071
2019-05-23

Method and apparatus for chemical mechanical polishing process

 #85
20190134776
2019-05-09

Substrate polishing device and polishing method

 #86
20190118331
2019-04-25

Polishing apparatus

 #87
20190047110
2019-02-14

Polishing pad having arc-shaped configuration

 #88
20190030676
2019-01-31

Silicon wafer single-side polishing method

 #89
20180369985
2018-12-27

Wafer polishing method and apparatus

 #90
20180361535
2018-12-20

Platen rotation system and method

 #91
20180304434
2018-10-25

Leak checking method, and computer-readable storage medium for performing the leak checking method

 #92
20180289230
2018-10-11

Substrate cleaning apparatus and substrate processing apparatus

 #93
20180261493
2018-09-13

Substrate treatment device providing improved detachment mechanism between substrate and stage and substrate treatment method performed using the same

 #94
20180246016
2018-08-30

Metallographic grinder and components thereof

 #95
20180229346
2018-08-16

Polishing apparatus

 #96
20180222008
2018-08-09

Polishing apparatus with a waste liquid receiver

 #97
20180193975
2018-07-12

Work polishing head

 #98
20180161953
2018-06-14

Polishing pad and method of using

 #99
20180151343
2018-05-31

Substrate processing apparatus, substrate processing method and storage medium

 #100
20180147679
2018-05-31

Magnetic sample holder for abrasive operations and related methods

 #101
20180138052
2018-05-17

Backside polisher with dry frontside design and method using the same

 #102
20180099377
2018-04-12

Processing apparatus and processing method for workpiece

 #103
20180093360
2018-04-05

Polishing apparatus

 #104
20180085891
2018-03-29

APPARATUS FOR SHAPING THE SURFACE OF CHEMICAL MECHANICAL POLISHING PADS

 #105
20180056471
2018-03-01

Substrate grinding device

 #106
20180047572
2018-02-15

Dressing device, polishing apparatus, holder, housing and dressing method

 #107
20180043501
2018-02-15

Substrate polishing system and substrate polishing method

 #108
20180015508
2018-01-18

Apparatus and method for polishing a surface of a substrate

 #109
20180001440
2018-01-04

Substrate processing apparatus

 #110
20180001438
2018-01-04

Head height adjustment device and substrate processing apparatus provided with head height adjustment device

 #111
20170368664
2017-12-28

Slurry distribution device for chemical mechanical polishing

 #112
20170368663
2017-12-28

Slurry distribution device for chemical mechanical polishing

 #113
20170363406
2017-12-21

Indium phosphide substrate, method of inspecting indium phosphide substrate, and method of producing indium phosphide substrate

 #114
20170312880
2017-11-02

CHEMICAL MECHANICAL POLISHING APPARATUS FOR POLISHING WORKPIECE

 #115
20170304986
2017-10-26

Polishing apparatus

 #116
20170274498
2017-09-28

Textured small pad for chemical mechanical polishing

 #117
20170274495
2017-09-28

Polishing system with local area rate control and oscillation mode

 #118
20170252891
2017-09-07

Method for polishing silicon wafer

 #119
20170236726
2017-08-17

Etching apparatus and method, and flexible film etched by the etching method

 #120
20170229323
2017-08-10

Water discharge system, water discharge method, water discharge control apparatus, water discharge control method, substrate processing apparatus and non-transitory computer readable medium recording water discharge control

 #121
20170216991
2017-08-03

Polishing-amount simulation method for buffing, and buffing apparatus

 #122
20170190016
2017-07-06

Apparatus and method for deterministic control of surface figure during full aperture pad polishing

 #123
20170179371
2017-06-22

Production method for composite substrate

 #124
20170157742
2017-06-08

Carrier head having abrasive structure on retainer ring

 #125
20170121850
2017-05-04

Method for manufacturing silicon carbide semiconductor device and silicon carbide semiconductor device

 #126
20170100814
2017-04-13

POLISHING APPARATUS HAVING OPTICAL MONITORING OF SUBSTRATES FOR UNIFORMITY CONTROL AND SEPARATE ENDPOINT SYSTEM

 #127
20170040202
2017-02-09

Chuck table and substrate processing system including the same

 #128
20160375547
2016-12-29

Substrate processing method

 #129
20160332280
2016-11-17

Method for producing substrates

 #130
20160325399
2016-11-10

POLISHING APPARATUS

 #131
20160279756
2016-09-29

Polishing system with front side pressure control

 #132
20160250735
2016-09-01

Polishing apparatus

 #133
20160176009
2016-06-23

POLISHING APPARATUS

 #134
20160151879
2016-06-02

Retaining ring having inner surfaces with facets

 #135
20160129549
2016-05-12

Chemical mechanical polishing machine and polishing head assembly

 #136
20160064230
2016-03-03

Wafer processing method

 #137
20160059376
2016-03-03

Buffing apparatus, and substrate processing apparatus

 #138
20160052104
2016-02-25

POLISHING APPARATUS

 #139
20160020133
2016-01-21

Carrier head

 #140
20160016282
2016-01-21

Polishing pad configuration and chemical mechanical polishing system

 #141
20160016281
2016-01-21

Polishing pad configuration and polishing pad support

 #142
20160016280
2016-01-21

Orbital polishing with small pad

 #143
20160005618
2016-01-07

Compliant polishing pad and polishing module

 #144
20150332943
2015-11-19

Polishing apparatus

 #145
20150311097
2015-10-29

Polishing apparatus and polishing method

 #146
20150290769
2015-10-15

Rotary joint and polishing apparatus

 #147
20150255118
2015-09-10

Vapor and heat removal systems in an optical disc restoration device

 #148
20150239089
2015-08-27

Surface grinding method for workpiece

 #149
20150217423
2015-08-06

Pressure-adjusting lapping element

 #150
20150185123
2015-07-02

Observation and photography apparatus

 #151
20150183082
2015-07-02

Retainer ring, polish apparatus, and polish method

 #152
20150111478
2015-04-23

POLISHING SYSTEM WITH LOCAL AREA RATE CONTROL

 #153
20150105005
2015-04-16

Chemical mechanical polisher with hub arms mounted

 #154
20150104999
2015-04-16

Substrate processing apparatus and substrate processing method

 #155
20150093971
2015-04-02

Polishing apparatus having substrate holding apparatus

 #156
20150093968
2015-04-02

Polishing apparatus having thermal energy measuring means

 #157
20150050866
2015-02-19

POLISHING PAD, POLISHING APPARATUS AND METHOD FOR MANUFACTURING POLISHING PAD

 #158
20150042028
2015-02-12

Wet treatment apparatus and substrate treatment apparatus provided with the same

 #159
20150024662
2015-01-22

Flexible diaphragm post-type floating and rigid abrading workholder

 #160
20150017890
2015-01-15

Polishing head and polishing apparatus

 #161
20150000055
2015-01-01

Substrate processing apparatus

 #162
20140357164
2014-12-04

Polishing apparatus

 #163
20140357161
2014-12-04

CENTER FLEX SINGLE SIDE POLISHING HEAD

 #164
20140335767
2014-11-13

APPARATUS AND METHOD FOR DETERMINISTIC CONTROL OF SURFACE FIGURE DURING FULL APERTURE PAD POLISHING

 #165
20140329446
2014-11-06

POLISHING APPARATUS

 #166
20140302754
2014-10-09

Polishing apparatus

 #167
20140273766
2014-09-18

Polishing System with Front Side Pressure Control

 #168
20140273765
2014-09-18

Polishing system with front side pressure control

 #169
20140248782
2014-09-04

Substrate processing method

 #170
20140235144
2014-08-21

Chemical mechanical polishing machine and polishing head assembly

 #171
20140220864
2014-08-07

Polishing apparatus

 #172
20140170938
2014-06-19

Flexible diaphragm combination floating and rigid abrading workholder

 #173
20140127976
2014-05-08

Pin driven flexible chamber abrading workholder

 #174
20140127974
2014-05-08

Combinatorial tool for mechanically-assisted surface polishing and cleaning

 #175
20140106647
2014-04-17

Multifunctional substrate polishing and burnishing device and polishing and burnishing method thereof

 #176
20140011432
2014-01-09

Method and device for the injection of CMP slurry

 #177
20140004772
2014-01-02

Polishing pad and chemical mechanical polishing apparatus for polishing a workpiece, and method of polishing a workpiece using the chemical mechanical polishing apparatus

 #178
20130316620
2013-11-28

Retainer ring

 #179
20130225050
2013-08-29

LOCALIZED SPOT LAPPING ON A LARGER WORK SURFACE AREA

 #180
20130130601
2013-05-23

Chemical mechanical polishing machine and chemical mechanical polishing apparatus comprising the same

 #181
20120244649
2012-09-27

Polishing method, polishing apparatus and polishing tool

 #182
20120190273
2012-07-26

POLISHING METHOD AND POLISHING APPARATUS

 #183
20120164917
2012-06-28

Polishing apparatus and polishing method

 #184
20120149286
2012-06-14

Wafer polishing apparatus and method

 #185
20120071065
2012-03-22

Polishing apparatus

 #186
20120058709
2012-03-08

Polishing apparatus having thermal energy measuring means

 #187
20110281137
2011-11-17

Zr-rich bulk amorphous alloy article and method of surface grinding thereof

 #188
20110269377
2011-11-03

Automatic generation of reference spectra for optical monitoring of substrates

 #189
20110256803
2011-10-20

FLUIDIZED WEB POLISHING APPARATUS AND METHOD USING CONTACT PRESSURE FEEDBACK

 #190
20110244763
2011-10-06

Side pad design for edge pedestal

 #191
20110233562
2011-09-29

Substrate composed of silicon carbide with thin film, semiconductor device, and method of manufacturing a semiconductor device

 #192
20110201254
2011-08-18

Methods and Systems for Process Control During Backgrinding of Through-Via Substrates

 #193
20110171882
2011-07-14

Chemical-mechanical polishing apparatus for manufacturing semiconductor devices

 #194
20110159782
2011-06-30

Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus

 #195
20110124273
2011-05-26

WAFER POLISHING APPARATUS FOR ADJUSTING HEIGHT OF WHEEL TIP

 #196
20110104997
2011-05-05

APPARATUSES AND METHODS FOR POLISHING AND CLEANING SEMICONDUCTOR WAFERS

 #197
20110081832
2011-04-07

POLISHING DEVICE AND POLISHING METHOD

 #198
20100311308
2010-12-09

Apparatus and method for deterministic control of surface figure during full aperture polishing

 #199
20090191797
2009-07-30

Polishing apparatus

 #200
20080070479
2008-03-20

Polishing apparatus

 #201
20070026769
2007-02-01

Chemical mechanical polishing apparatus and a method for planarizing/polishing a surface

 #202
20050272348
2005-12-08

Polishing pad assembly, apparatus for polishing a wafer including the polishing pad assembly and method for polishing a wafer using the polishing pad assembly

 #203
20050227596
2005-10-13

Polishing apparatus