Patents-Review.com
ClassID:

44774 ⎘

B24B37/105 - CPC Classification

Classification description:

Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement

Sub-classes:
Recent Application in this class:
#1
20260131418
2026-05-14

MEMBRANE DESIGN FOR RECTANGULAR SUBSTRATE POLISHING BY CHEMICAL MECHANICAL POLISHING

 #2
20260115855
2026-04-30

SYSTEM AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING

 #3
20260042184
2026-02-12

CONTROL OF PLATEN EDGE-SHAPE IN CHEMICAL MECHANICAL POLISHING

 #4
20260001192
2026-01-01

POLISHING HEAD AND POLISHING TREATMENT DEVICE

 #5
20250375851
2025-12-11

PAD CONDITIONER AND CHEMICAL MECHANICAL PLANARIZATION APPARATUS

 #6
20250235983
2025-07-24

GRINDING APPARATUS, METHOD OF GRINDING WORKPIECE, AND METHOD OF MANUFACTURING SUBSTRATE

 #7
20250187138
2025-06-12

MODULAR CHEMICAL MECHANICAL POLISHER WITH SIMULTANEOUS POLISHING AND PAD TREATMENT

 #8
20250114906
2025-04-10

METHOD OF PROCESSING WORKPIECE

 #9
20250114899
2025-04-10

CMP WITH INDIVIDUALLY ROTATABLE PLATENS

 #10
20250114898
2025-04-10

RETAINING RING FOR EDGE COMPENSATION BY SLURRY FLOW CONTROL

 #11
20250114896
2025-04-10

INDIVIDUALLY ROTATABLE PLATENS AND CONTROL OF CARRIER HEAD SWEEP

 #12
20240367202
2024-11-07

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

 #13
20240282619
2024-08-22

SUBSTRATE HOLDING APPARATUS, SUBSTRATE PROCESSING APPARATUS HAVING SUBSTRATE HOLDING APPARATUS, AND SUBSTRATE PROCESSING METHOD

 #14
20240091899
2024-03-21

POLISHING APPARATUS

 #15
20240075582
2024-03-07

Modular chemical mechanical polisher with simultaneous polishing and pad treatment

 #16
20240066660
2024-02-29

LOW-TEMPERATURE METAL CMP FOR MINIMIZING DISHING AND CORROSION, AND IMPROVING PAD ASPERITY

 #17
20240050995
2024-02-15

Electrical cleaning tool for wafer polishing tool system

 #18
20230405758
2023-12-21

POLISHING CARRIER HEAD WITH MULTIPLE ZONES

 #19
20230356351
2023-11-09

CHEMICAL MECHANICAL POLISHING TEMPERATURE SCANNING APPARATUS FOR TEMPERATURE CONTROL

 #20
20230352326
2023-11-02

SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD

 #21
20230339066
2023-10-26

SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE

 #22
20230286102
2023-09-14

Polishing apparatus for smoothing diamonds

 #23
20230249312
2023-08-10

LARGE AREA QUARTZ CRYSTAL WAFER LAPPING DEVICE AND A LAPPING METHOD THEREOF

 #24
20230219188
2023-07-13

Mega-sonic vibration assisted chemical mechanical planarization

 #25
20230191555
2023-06-22

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD USING THE SAME

 #26
20230182257
2023-06-15

SYSTEM AND METHOD FOR MONITORING CHEMICAL MECHANICAL POLISHING

 #27
20230150087
2023-05-18

POLISHING FIXING DEVICE AND POLISHING APPARATUS

 #28
20220297258
2022-09-22

SUBSTRATE POLISHING SIMULTANEOUSLY OVER MULTIPLE MINI PLATENS

 #29
20220274228
2022-09-01

SUBSTRATE POLISHING SYSTEM

 #30
20220250974
2022-08-11

Process for making anti-reflective optical glass and product thereof

 #31
20220193859
2022-06-23

Chemical mechanical polishing with applied magnetic field

 #32
20220134505
2022-05-05

HORIZONTAL BUFFING MODULE

 #33
20220097198
2022-03-31

Substrate polish edge uniformity control with secondary fluid dispense

 #34
20220072682
2022-03-10

SUBSTRATE HANDLING SYSTEMS AND METHODS FOR CMP PROCESSING

 #35
20220048155
2022-02-17

POLISHING APPARATUS AND POLISHING METHOD

 #36
20210402558
2021-12-30

Polishing carrier head with multiple angular pressurizable zones

 #37
20210308828
2021-10-07

DRESSING APPARATUS AND DRESSING METHOD FOR SUBSTRATE REAR SURFACE POLISHING MEMBER

 #38
20210308823
2021-10-07

Polishing head system and polishing apparatus

 #39
20210094146
2021-04-01

Chemical mechanical polishing (CMP) polishing head with improved vacuum sealing

 #40
20210086324
2021-03-25

Retaining ring for use in chemical mechanical polishing and CMP apparatus having the same

 #41
20210069851
2021-03-11

Manufacturing method for phosphor glass thin plate and piece thereof, and phosphor glass thin plate and piece thereof

 #42
20210046602
2021-02-18

Low-temperature metal CMP for minimizing dishing and corrosion, and improving pad asperity

 #43
20210016415
2021-01-21

Mega-sonic vibration assisted chemical mechanical planarization

 #44
20210013071
2021-01-14

SUBSTRATE PROCESSING APPARATUS AND PROCESSING METHOD

 #45
20210008685
2021-01-14

CHEMICAL MECHANICAL POLISHING APPARATUS, CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME

 #46
20200331117
2020-10-22

Temperature-based assymetry correction during CMP and nozzle for media dispensing

 #47
20200331114
2020-10-22

Temperature-based in-situ edge assymetry correction during CMP

 #48
20200331113
2020-10-22

Chemical mechanical polishing temperature scanning apparatus for temperature control

 #49
20200284700
2020-09-10

Planar grinder

 #50
20200262023
2020-08-20

Polishing system, learning device, and learning method of learning device

 #51
20200206870
2020-07-02

Polishing pad conditioning apparatus

 #52
20200171619
2020-06-04

Surface projection polishing pad

 #53
20200156206
2020-05-21

Offset head-spindle for chemical mechanical polishing

 #54
20200094371
2020-03-26

Polishing head and polishing apparatus

 #55
20200041247
2020-02-06

Indium phosphide substrate, method of inspecting indium phosphide substrate, and method of producing indium phosphide substrate

 #56
20190358767
2019-11-28

Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system

 #57
20190232458
2019-08-01

CMP groove processing positioning method and positioning device

 #58
20190232457
2019-08-01

Polishing apparatuses and polishing methods

 #59
20190224808
2019-07-25

Polishing apparatus

 #60
20190214319
2019-07-11

IN-SITU CALIBRATION STRUCTURES AND METHODS OF USE IN SEMICONDUCTOR PROCESSING

 #61
20190210182
2019-07-11

Wafer polishing apparatus

 #62
20190168355
2019-06-06

POLISHING APPARATUS AND POLISHING METHOD

 #63
20190148125
2019-05-16

Apparatus and method for processing a surface of a substrate

 #64
20190143474
2019-05-16

System and method for monitoring chemical mechanical polishing

 #65
20190131166
2019-05-02

Substrate holding apparatus, substrate processing apparatus having substrate holding apparatus, and substrate processing method

 #66
20190131150
2019-05-02

Polishing apparatus and polishing method

 #67
20190126427
2019-05-02

SUBSTRATE PROCESSING APPARATUS

 #68
20190118335
2019-04-25

Polishing apparatus

 #69
20190118332
2019-04-25

Polishing apparatus and polishing method

 #70
20190111541
2019-04-18

Polishing of electrostatic substrate support geometries

 #71
20190105754
2019-04-11

Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes

 #72
20190061094
2019-02-28

Platen stopper

 #73
20190047118
2019-02-14

Dressing apparatus and dressing method for substrate rear surface polishing member

 #74
20190047110
2019-02-14

Polishing pad having arc-shaped configuration

 #75
20190030676
2019-01-31

Silicon wafer single-side polishing method

 #76
20190027382
2019-01-24

Substrate polishing apparatus and method

 #77
20180345447
2018-12-06

Polishing table and polishing apparatus having ihe same

 #78
20180345446
2018-12-06

Apparatus for chemical-mechanical polishing

 #79
20180281152
2018-10-04

Apparatus and method for timed dispensing various slurry components

 #80
20180246016
2018-08-30

Metallographic grinder and components thereof

 #81
20180229342
2018-08-16

High throughput polishing system for workpieces

 #82
20180154497
2018-06-07

Polishing pads and systems for and methods of using same

 #83
20180079052
2018-03-22

Endpoint detection with compensation for filtering

 #84
20180079048
2018-03-22

Overpolishing based on electromagnetic inductive monitoring of trench depth

 #85
20180071885
2018-03-15

Coupling mechanism, substrate polishing apparatus, method of determining position of rotational center of coupling mechanism, program of determining position of rotational center of coupling mechanism, method of determining maximum pressing load of rotating body, and program of determining maximum pressing load of rotating body

 #86
20180056471
2018-03-01

Substrate grinding device

 #87
20170363406
2017-12-21

Indium phosphide substrate, method of inspecting indium phosphide substrate, and method of producing indium phosphide substrate

 #88
20170352460
2017-12-07

MAGNETIC FIELD GENERATION APPARATUS OF MAGNETORHEOLOGICAL POLISHING DEVICE

 #89
20170271217
2017-09-21

In-situ calibration structures and methods of use in semiconductor processing

 #90
20170194159
2017-07-06

Chemical-mechanical polish (CMP) devices, tools, and methods

 #91
20170190020
2017-07-06

Polishing method and polishing apparatus

 #92
20170182628
2017-06-29

Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system

 #93
20170148655
2017-05-25

Polishing method

 #94
20170037290
2017-02-09

CMP polishing agent, method for manufacturing thereof, and method for polishing substrate

 #95
20170008146
2017-01-12

CHEMICAL MECHANICAL PLANARIZATION CONDITIONER

 #96
20170005001
2017-01-05

Semiconductor wafer, semiconductor device diced from semiconductor wafer, and method for manufacturing semiconductor device

 #97
20160250735
2016-09-01

Polishing apparatus

 #98
20160189972
2016-06-30

Wafer polishing apparatus and method

 #99
20150352686
2015-12-10

Chemical mechanical polishing (CMP) platform for local profile control

 #100
20150321312
2015-11-12

Modifying substrate thickness profiles

 #101
20150318179
2015-11-05

Planarization device and planarization method using the same

 #102
20150133033
2015-05-14

Platen assembly, chemical-mechanical polisher, and method for polishing substrate

 #103
20150126095
2015-05-07

Chemical mechanical polishing apparatus and polishing method using the same

 #104
20150024662
2015-01-22

Flexible diaphragm post-type floating and rigid abrading workholder

 #105
20150024659
2015-01-22

Computer program product and method of controlling polishing of a substrate

 #106
20140370787
2014-12-18

Vacuum-grooved membrane abrasive polishing wafer workholder

 #107
20140357164
2014-12-04

Polishing apparatus

 #108
20140302754
2014-10-09

Polishing apparatus

 #109
20140220864
2014-08-07

Polishing apparatus

 #110
20140213158
2014-07-31

Polishing apparatus with polishing head cover

 #111
20140154958
2014-06-05

Wafer polishing apparatus

 #112
20140153000
2014-06-05

Apparatus for detecting the flatness of wafer and the method thereof

 #113
20140030957
2014-01-30

Method for adjusting height position of polishing head and method for polishing workpiece

 #114
20140024299
2014-01-23

Polishing Pad and Multi-Head Polishing System

 #115
20140024292
2014-01-23

Polishing control using weighting with default sequence

 #116
20140024291
2014-01-23

Endpoint detection during polishing using integrated differential intensity

 #117
20140020830
2014-01-23

Carrier Head Sweep Motor Current for In-Situ Monitoring

 #118
20140011429
2014-01-09

Gathering spectra from multiple optical heads

 #119
20130316623
2013-11-28

MULTI-SPINDLE CHEMICAL MECHANICAL PLANARIZATION TOOL

 #120
20130072092
2013-03-21

Multi-spindle chemical mechanical planarization tool

 #121
20130072089
2013-03-21

Multi-spindle chemical mechanical planarization tool

 #122
20120276816
2012-11-01

Polishing method

 #123
20120274932
2012-11-01

Method of controlling polishing

 #124
20120244785
2012-09-27

Polishing method and polishing system

 #125
20120208439
2012-08-16

Method for polishing semiconductor wafer

 #126
20120196512
2012-08-02

POLISHING PAD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE

 #127
20120196511
2012-08-02

Gathering spectra from multiple optical heads

 #128
20120171933
2012-07-05

PRESSURE CONTROLLED POLISHING PLATEN

 #129
20120122373
2012-05-17

PRECISE REAL TIME AND POSITION LOW PRESSURE CONTROL OF CHEMICAL MECHANICAL POLISH (CMP) HEAD

 #130
20120071065
2012-03-22

Polishing apparatus

 #131
20110312182
2011-12-22

METHOD AND APPARATUS FOR CHEMICAL-MECHANICAL PLANARIZATION

 #132
20100311308
2010-12-09

Apparatus and method for deterministic control of surface figure during full aperture polishing

 #133
20100258173
2010-10-14

POLISHING A THIN METALLIC SUBSTRATE FOR A SOLAR CELL

 #134
20100173567
2010-07-08

Methods and Devices for Enhancing Chemical Mechanical Polishing Processes

 #135
20090298388
2009-12-03

METHOD AND APPARATUS FOR CHEMICAL MECHANICAL POLISHING OF LARGE SIZE WAFER WITH CAPABILITY OF POLISHING INDIVIDUAL DIE

 #136
20090191797
2009-07-30

Polishing apparatus

 #137
20090029634
2009-01-29

Semiconductor wafer polishing machine

 #138
20080233843
2008-09-25

Two-sided surface grinding method

 #139
20080070479
2008-03-20

Polishing apparatus

 #140
20070218807
2007-09-20

Method and apparatus for producing micro-texture on a slider substrate using chemical and mechanical polishing techniques

 #141
20070167115
2007-07-19

Chemical mechanical polishing system and process

 #142
20070145011
2007-06-28

Chemical mechanical polishing system and process

 #143
20070021263
2007-01-25

Systems for planarizing workpieces, e.g., microelectronic workpieces

 #144
20070010168
2007-01-11

Methods for planarizing workpieces, e.g., microelectronic workpieces

 #145
20060252350
2006-11-09

Chemical mechanical polishing system and process

 #146
20060030240
2006-02-09

Methods for planarizing microelectronic workpieces

 #147
20050277376
2005-12-15

Single component pad backer for polishing head of an orbital chemical mechanical polishing machine and method therefor

 #148
20050202756
2005-09-15

Methods and systems for planarizing workpieces, e.g., microelectronic workpieces

 #149
20050159090
2005-07-21

Polishing apparatus

 #150
20050090188
2005-04-28

Method and apparatus for polishing workpiece

 #151
20050020191
2005-01-27

Apparatus for planarizing microelectronic workpieces

 #152
20050014373
2005-01-20

Method for managing polishing apparatus

 #153
20050009452
2005-01-13

Orbiting indexable belt polishing station for chemical mechanical polishing