Patents-Review.com
ClassID:

44775 ⎘

B24B37/107 - CPC Classification

Classification description:

Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping

Recent Application in this class:
#1
20260144004
2026-05-21

PROCESSING METHOD OF CHUCK TABLE, MANUFACTURING METHOD OF PROCESSED CHUCK TABLE, PROCESSING METHOD OF WORKPIECE, MANUFACTURING METHOD OF PROCESSED WAFER, AND PROCESSING APPARATUS

 #2
20260021551
2026-01-22

CHEMICAL MECHANICAL POLISHING USING FLEXURE MOUNTED PAD

 #3
20260014664
2026-01-15

A GRINDING AND/OR POLISHING MACHINE AND A SPECIMEN HOLDER

 #4
20260001188
2026-01-01

CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED-FORCE APPLIED TO A WORKPIECE

 #5
20250387870
2025-12-25

PROCESSING APPARATUS

 #6
20250269488
2025-08-28

ELECTRICAL CONNECTION FOR CHEMICAL MECHANICAL POLISHING CARRIER HEAD

 #7
20250235979
2025-07-24

FABRICATION OF A POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING

 #8
20250149358
2025-05-08

SUBSTRATE TREATING APPARATUS

 #9
20250108477
2025-04-03

CHEMICAL MECHANICAL POLISHING EDGE CONTROL WITH PAD RECESSES

 #10
20250108476
2025-04-03

TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING

 #11
20250018521
2025-01-16

MACHINE FOR FINISHING A WORK PIECE, AND HAVING A HIGHLY CONTROLLABLE TREATMENT TOOL

 #12
20240359286
2024-10-31

CHEMICAL MECHANICAL POLISHING APPARATUS AND A METHOD OF POLISHING A SUBSTRATE USING THE SAME

 #13
20240290629
2024-08-29

METHODS FOR CHEMICAL MECHANICAL POLISHING AND FORMING INTERCONNECT STRUCTURE

 #14
20240286242
2024-08-29

CHEMICAL-MECHANICAL POLISHING SYSTEM WITH A POTENTIOSTAT AND PULSED-FORCE APPLIED TO A WORKPIECE

 #15
20240238936
2024-07-18

CHEMICAL MECHANICAL POLISHING (CMP) APPARATUS AND METHOD OF CONTROLLING THEREOF

 #16
20240217054
2024-07-04

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD

 #17
20240213046
2024-06-27

Substrate processing apparatus and substrate processing method

 #18
20240181595
2024-06-06

POLISHING HEAD, POLISHING APPARATUS, AND ELASTIC BODY

 #19
20240157504
2024-05-16

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

 #20
20240051080
2024-02-15

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #21
20230373058
2023-11-23

SEMICONDUCTOR SUBSTRATE GRINDING APPARATUS AND SEMICONDUCTOR SUBSTRATE GRINDING METHOD USING THE SAME

 #22
20230347471
2023-11-02

Fabrication of a polishing pad for chemical mechanical polishing

 #23
20230321787
2023-10-12

PLANE POLISHING MACHINE

 #24
20230286108
2023-09-14

POLISHING APPARATUS FOR SUBSTRATE AND POLISHING METHOD FOR SUBSTRATE USING THE SAME

 #25
20230286106
2023-09-14

Chemical-mechanical polishing apparatus

 #26
20230211453
2023-07-06

Machine for finishing a work piece, and having a highly controllable treatment tool

 #27
20230150087
2023-05-18

POLISHING FIXING DEVICE AND POLISHING APPARATUS

 #28
20230082084
2023-03-16

Methods for chemical mechanical polishing and forming interconnect structure

 #29
20220379428
2022-12-01

Asymmetry correction via variable relative velocity of a wafer

 #30
20220371155
2022-11-24

POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME

 #31
20220362903
2022-11-17

MULTIPLE POLISHING HEADS WITH CROSS-ZONE PRESSURE ELEMENT DISTRIBUTIONS FOR CMP

 #32
20220324080
2022-10-13

Chemical-mechanical polishing system with a potentiostat and pulsed-force applied to a workpiece

 #33
20220305612
2022-09-29

Polishing apparatus

 #34
20220290009
2022-09-15

Polishing solution, polishing apparatus, and polishing method

 #35
20220169563
2022-06-02

Textured glass-based articles with multiple haze levels and processes of producing the same

 #36
20220088744
2022-03-24

CMP MACHINE WITH IMPROVED THROUGHPUT AND PROCESS FLEXIBILITY

 #37
20220055178
2022-02-24

NOVEL AUTOMATED POLISHING SYSTEMS AND METHODS RELATING THERETO

 #38
20210402555
2021-12-30

Apparatus and method for CMP temperature control

 #39
20210398827
2021-12-23

Substrate processing apparatus and substrate processing method

 #40
20210391186
2021-12-16

Methods for chemical mechanical polishing and forming interconnect structure

 #41
20210370462
2021-12-02

Chemical-mechanical polishing apparatus

 #42
20210347010
2021-11-11

Apparatus for polishing and method of polishing

 #43
20210335650
2021-10-28

Elastic membrane, substrate holding device, and polishing apparatus

 #44
20210331285
2021-10-28

Polishing head, wafer polishing apparatus using the same, and wafer polishing method using the same

 #45
20210291313
2021-09-23

Chemical-mechanical polishing system with a potentiostat and pulsed-force applied to a workpiece

 #46
20210229240
2021-07-29

Polishing apparatus and polishing method

 #47
20210205950
2021-07-08

Chemical mechanical polishing apparatus and method

 #48
20210078130
2021-03-18

Chemical mechanical polishing apparatus and method

 #49
20210036129
2021-02-04

Semiconductor device, method, and tool of manufacture

 #50
20210023678
2021-01-28

System and Method of Chemical Mechanical Polishing

 #51
20200368874
2020-11-26

POLISHING APPARATUS AND POLISHING METHOD

 #52
20200215662
2020-07-09

Polyurethane polishing pad and composition for manufacturing the same

 #53
20200198089
2020-06-25

Machine for finishing a work piece, and having a highly controllable treatment tool

 #54
20200130132
2020-04-30

Chemical mechanical polishing apparatus having scraping fixture

 #55
20200101582
2020-04-02

System and method of chemical mechanical polishing

 #56
20200039031
2020-02-06

Apparatus for polishing and method for polishing

 #57
20200030934
2020-01-30

Fabrication of a polishing pad for chemical mechanical polishing

 #58
20190308296
2019-10-10

Polishing apparatus

 #59
20190287826
2019-09-19

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #60
20190181022
2019-06-13

Substrate processing apparatus and substrate processing method

 #61
20190143479
2019-05-16

Substrate holding device and substrate processing apparatus including the same

 #62
20190143476
2019-05-16

Temperature control of chemical mechanical polishing

 #63
20190118331
2019-04-25

Polishing apparatus

 #64
20190118330
2019-04-25

Non-transitory computer-readable storage medium storing a program of stretching operation of elastic membrane, method of stretching operation of elastic membrane, and polishing apparatus

 #65
20190099855
2019-04-04

POLISHING APPARATUS

 #66
20190054590
2019-02-21

Chemical-mechanical planarization system

 #67
20190039206
2019-02-07

Polishing device, polishing method, and record medium

 #68
20190030676
2019-01-31

Silicon wafer single-side polishing method

 #69
20190009385
2019-01-10

Substrate polishing apparatus and method

 #70
20180369985
2018-12-27

Wafer polishing method and apparatus

 #71
20180311784
2018-11-01

CMP MACHINE WITH IMPROVED THROUGHPUT AND PROCESS FLEXIBILITY

 #72
20180301367
2018-10-18

Elastic membrane, substrate holding device, and polishing apparatus

 #73
20180290263
2018-10-11

Polishing apparatus and polishing method

 #74
20180269307
2018-09-20

Semiconductor device, method, and tool of manufacture

 #75
20180264619
2018-09-20

Polishing method and polishing apparatus

 #76
20180264618
2018-09-20

Method for conditioning polishing pad and polishing apparatus

 #77
20180254196
2018-09-06

Polishing method, polishing apparatus, and substrate processing system

 #78
20180236631
2018-08-23

Heat exchanger for regulating surface temperature of a polishing pad, polishing apparatus, polishing method, and medium storing computer program

 #79
20180236630
2018-08-23

SUBSTRATE POLISHER AND POLISHING METHOD

 #80
20180229345
2018-08-16

Semiconductor manufacturing apparatus and manufacturing method of semiconductor device

 #81
20180226263
2018-08-09

Method and apparatus for within-wafer profile localized tuning

 #82
20180222008
2018-08-09

Polishing apparatus with a waste liquid receiver

 #83
20180207768
2018-07-26

Work polishing method and work polishing apparatus

 #84
20180130667
2018-05-10

Film thickness measuring method, film thickness measuring apparatus, polishing method, and polishing apparatus

 #85
20180111246
2018-04-26

Machine for finishing a work piece, and having a highly controllable treatment tool

 #86
20180079049
2018-03-22

Specimen mover and a method of placing specimens in a specimen mover

 #87
20180065228
2018-03-08

Polishing apparatus

 #88
20180036859
2018-02-08

Method of processing thin layer

 #89
20180016676
2018-01-18

Film thickness measuring device, polishing apparatus, film thickness measuring method and polishing method

 #90
20180015508
2018-01-18

Apparatus and method for polishing a surface of a substrate

 #91
20180012780
2018-01-11

Substrate processing apparatus

 #92
20180009078
2018-01-11

Chemical mechanical polishing apparatus

 #93
20170252889
2017-09-07

POLISHING APPARATUS

 #94
20170226640
2017-08-10

SUBSTRATE WITH AMORPHOUS, COVALENTLY-BONDED LAYER AND METHOD OF MAKING THE SAME

 #95
20170040233
2017-02-09

Substrate Processing Apparatus and Substrate Processing System

 #96
20160361792
2016-12-15

Polishing head, polishing apparatus and polishing method

 #97
20160167191
2016-06-16

Single side polishing apparatus for wafer

 #98
20160133466
2016-05-12

Method of polishing SiC substrate

 #99
20160059377
2016-03-03

Configurable pressure design for multizone chemical mechanical planarization polishing head

 #100
20160008948
2016-01-14

Polishing apparatus

 #101
20150348797
2015-12-03

Apparatus and method for chemical mechanical polishing process control

 #102
20150343594
2015-12-03

Polishing apparatus having end point detecting apparatus detecting polishing end point on basis of current and sliding friction

 #103
20150343593
2015-12-03

Polishing apparatus

 #104
20150328743
2015-11-19

Polishing apparatus and retainer ring configuration

 #105
20150303049
2015-10-22

Method for processing semiconductor wafer

 #106
20150290769
2015-10-15

Rotary joint and polishing apparatus

 #107
20150202733
2015-07-23

Substrate holding apparatus and polishing apparatus

 #108
20150183082
2015-07-02

Retainer ring, polish apparatus, and polish method

 #109
20150133038
2015-05-14

Substrate holder, polishing apparatus, polishing method, and retaining ring

 #110
20150000055
2015-01-01

Substrate processing apparatus

 #111
20140209239
2014-07-31

Methods and apparatus for post-chemical mechanical planarization substrate cleaning

 #112
20140162532
2014-06-12

Method of polishing one side of wafer and single side polishing apparatus for wafer

 #113
20140073223
2014-03-13

Method and apparatus for wafer backgrinding and edge trimming on one machine

 #114
20130288578
2013-10-31

Methods and apparatus for pre-chemical mechanical planarization buffing module

 #115
20130237402
2013-09-12

SAPPHIRE MATERIAL AND PRODUCTION METHOD THEREOF

 #116
20130164937
2013-06-27

CHEMICAL MECHANICAL PLANARIZATION SITE ISOLATION REACTOR

 #117
20130090040
2013-04-11

Floating abrading platen configuration

 #118
20130045596
2013-02-21

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND POLISHING APPARATUS

 #119
20130044004
2013-02-21

Methods for real-time error detection in CMP processing

 #120
20120302064
2012-11-29

Fabrication method of semiconductor device and chemical mechanical polishing apparatus

 #121
20120289128
2012-11-15

Chemical mechanical polishing system

 #122
20120270478
2012-10-25

Wafer pads for fixed-spindle floating-platen lapping

 #123
20120255635
2012-10-11

METHOD AND APPARATUS FOR REFURBISHING GAS DISTRIBUTION PLATE SURFACES

 #124
20120129431
2012-05-24

Apparatus and method for target thickness and surface profile uniformity control of multi-head chemical mechanical polishing process

 #125
20120064801
2012-03-15

Feedback control of polishing using optical detection of clearance

 #126
20120064800
2012-03-15

Polishing apparatus

 #127
20120034846
2012-02-09

Semiconductor device manufacturing method

 #128
20120034845
2012-02-09

TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING

 #129
20120028545
2012-02-02

Pivot-balanced floating platen lapping machine

 #130
20110294405
2011-12-01

Workpiece spindles supported floating abrasive platen

 #131
20110249533
2011-10-13

GLASS SUBSTRATE POLISHING METHOD, PACKAGE MANUFACTURING METHOD, PIEZOELECTRIC VIBRATOR, OSCILLATOR, ELECTRONIC DEVICE AND RADIO TIMEPIECE

 #132
20110223838
2011-09-15

Fixed-spindle and floating-platen abrasive system using spherical mounts

 #133
20110223837
2011-09-15

Fixed-spindle floating-platen workpiece loader apparatus

 #134
20110223836
2011-09-15

Three-point fixed-spindle floating-platen abrasive system

 #135
20110223835
2011-09-15

Three-point spindle-supported floating abrasive platen

 #136
20110143636
2011-06-16

Optical disk restoration method and apparatus

 #137
20100285723
2010-11-11

Polishing apparatus

 #138
20090036028
2009-02-05

Chemical mechanical polishing apparatus and chemical mechanical polishing method thereof

 #139
20060030244
2006-02-09

Substrate polishing apparatus