Patents-Review.com
ClassID:

44785 ⎘

B24B37/26 - CPC Classification

Classification description:

Lapping machines or devices; Accessories; Lapping tools; Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved

Recent Application in this class:
#1
20260145295
2026-05-28

SUBSTRATE POLISHING HEAD FOR OPTICAL ENHANCEMENT ANALYSIS

 #2
20260145294
2026-05-28

MULTI-LAYER SUB PAD FOR CMP PROCESSES

 #3
20260138231
2026-05-21

CMP POLISHING PAD WITH PHASE CHANGING MATERIALS

 #4
20260124712
2026-05-07

CHEMICAL MECHANICAL POLISHING PADS, METHODS OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS, AND METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE

 #5
20260124711
2026-05-07

CHEMICAL MECHANICAL PLANARIZATION TOOL

 #6
20260097463
2026-04-09

SEMICONDUCTOR DEVICE FABRICATION METHODS AND DEVICES FOR FORMING THE SAME

 #7
20260097462
2026-04-09

POLISHING MEDIA ASSEMBLY FOR FIBER OPTIC POLISHING MACHINE

 #8
20260077448
2026-03-19

Two Component Chemical Mechanical Polishing

 #9
20260077447
2026-03-19

POLISHING PAD, PREPARATION METHOD THEREOF AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

 #10
20260070184
2026-03-12

CHEMICAL MECHANICAL POLISHING (CMP) PAD AND MANUFACTURING METHOD THEREOF

 #11
20260061549
2026-03-05

POLISHING PAD AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

 #12
20260061547
2026-03-05

RECYCLED POLISHING PAD AND PREPARATION METHOD THEREOF

 #13
20260048476
2026-02-19

CHEMICAL MECHANICAL PLANARIZATION (CMP) PADS WITH INTEGRATED WEAR INDICATOR

 #14
20260014666
2026-01-15

MULTI-LAYER SUB PAD FOR CMP PROCESSES

 #15
20250353138
2025-11-20

CHEMICAL-MECHANICAL PLANARIZATION PAD AND METHODS OF USE

 #16
20250353137
2025-11-20

POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING

 #17
20250326084
2025-10-23

EDDY CURRENT MONITORING TO DETECT VIBRATION IN POLISHING

 #18
20250312885
2025-10-09

RUBBER MEMBRANE HAVING FIRST AND SECOND HARDNESS FOR USE IN A POLISHING HEAD

 #19
20250282022
2025-09-11

Two Component Chemical Mechanical Polishing

 #20
20250196286
2025-06-19

POLISHING PAD AND CHEMICAL MECHANICAL POLISHING APPARATUS

 #21
20250178157
2025-06-05

METHOD AND SYSTEM FOR ONLINE INSPECTION OF SURFACE CONDITION OF POLISHING PAD

 #22
20250153305
2025-05-15

CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING APPARATUS COMPRISING THE SAME

 #23
20250121472
2025-04-17

POLISHING ARTICLES FOR HYBRID BONDING APPLICATIONS

 #24
20250114901
2025-04-10

GROOVES FOR EDGE AND HOT SPOT COMPENSATION IN CHEMICAL MECHANICAL POLISHING

 #25
20250114897
2025-04-10

EDGE AND HOT SPOT COMPENSATION TECHNIQUES IN CHEMICAL MECHANICAL POLISHING

 #26
20250108477
2025-04-03

CHEMICAL MECHANICAL POLISHING EDGE CONTROL WITH PAD RECESSES

 #27
20250100101
2025-03-27

BUFFING TREATMENT MODULE INCLUDING BUFFING PAD

 #28
20250083278
2025-03-13

POLISHING PAD

 #29
20250058426
2025-02-20

LEVERAGED POROMERIC POLISHING PAD

 #30
20250033162
2025-01-30

MICROREPLICATED POLISHING PAD INCLUDING FLUORINATED POLYMER WINDOW

 #31
20240359288
2024-10-31

METHOD OF USING POLISHING PAD

 #32
20240359287
2024-10-31

SEMICONDUCTOR DEVICE FABRICATION METHODS AND DEVICES FOR FORMING THE SAME

 #33
20240304455
2024-09-12

CHEMICAL MECHANICAL POLISHING APPARATUS

 #34
20240293911
2024-09-05

POLISHING PAD AND WAFER NOTCH POLISHING METHOD

 #35
20240238937
2024-07-18

CHEMICAL MECHANICAL PLANARIZATION PADS WITH CONSTANT GROOVE VOLUME

 #36
20240227119
2024-07-11

POLISHING PAD AND POLISHING METHOD

 #37
20240217059
2024-07-04

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF CONTROLLING THE SAME

 #38
20240217058
2024-07-04

ABRASIVE ARTICLES AND METHODS OF FORMING SAME

 #39
20240217057
2024-07-04

CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF REPLACING POLISHING PAD USING THE SAME

 #40
20240207998
2024-06-27

CHEMICAL MECHANICAL POLISHING PAD WITH FLUORINATED POLYMER AND MULTIMODAL GROOVE PATTERN

 #41
20240181597
2024-06-06

DUAL-LAYER CMP POLISHING SUBPAD

 #42
20240181596
2024-06-06

MICRO-LAYER CMP POLISHING SUBPAD

 #43
20240157504
2024-05-16

APPARATUS AND METHOD FOR CMP TEMPERATURE CONTROL

 #44
20240131654
2024-04-25

POLISHING PAD AND POLISHING METHOD

 #45
20240123568
2024-04-18

METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING PADS BY USE OF AN ADDITIVE MANUFACTURING PROCESS

 #46
20240100646
2024-03-28

POLISHING SYSTEM WITH PLATEN FOR SUBSTRATE EDGE CONTROL

 #47
20240075583
2024-03-07

Wafer edge asymmetry correction using groove in polishing pad

 #48
20240066661
2024-02-29

METHOD FOR MANUFACTURING A POLISHING SHEET AND A POLISHING PAD

 #49
20240025010
2024-01-25

ADVANCED POLISHING PADS AND RELATED POLISHING PAD MANUFACTURING METHODS

 #50
20240017376
2024-01-18

MONITORING THICKNESS IN FACE-UP POLISHING WITH ROLLER

 #51
20230415300
2023-12-28

POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD

 #52
20230415299
2023-12-28

Surface height measurement method using dummy disk

 #53
20230383048
2023-11-30

Polyurethanes, Polishing Articles and Polishing Systems Therefrom and Method of Use Thereof

 #54
20230339068
2023-10-26

Method of using polishing pad

 #55
20230339067
2023-10-26

COMPOSITE PAD FOR CHEMICAL MECHANICAL POLISHING

 #56
20230330805
2023-10-19

POROUS CHEMICAL MECHANICAL POLISHING PADS

 #57
20230311269
2023-10-05

CMP POLISHING PAD WITH PROTRUDING STRUCTURES HAVING ENGINEERED OPEN VOID SPACE

 #58
20230286107
2023-09-14

EDDY CURRENT MONITORING TO DETECT VIBRATION IN POLISHING

 #59
20230286102
2023-09-14

Polishing apparatus for smoothing diamonds

 #60
20230278159
2023-09-07

Printing a chemical mechanical polishing pad

 #61
20230271298
2023-08-31

Chemical mechanical planarization tool

 #62
20230256563
2023-08-17

SLURRY RECYCLING FOR CHEMICAL MECHANICAL PLANARIZATION SYSTEM

 #63
20230219191
2023-07-13

POLISHING PAD, CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #64
20230211455
2023-07-06

POLISHING PADS AND SYSTEMS FOR AND METHODS OF USING SAME

 #65
20230201994
2023-06-29

POLISHING HEAD ASSEMBLY HAVING RECESS AND CAP

 #66
20230166381
2023-06-01

CMP POLISHING PAD WITH POLISHING ELEMENTS ON SUPPORTS

 #67
20230158633
2023-05-25

POLISHING PAD WITH WINDOW AND METHOD OF MANUFACTURING THE SAME

 #68
20230143013
2023-05-11

CHEMICAL PLANARIZATION

 #69
20230112228
2023-04-13

Chemical mechanical polishing pad and preparation thereof

 #70
20230111352
2023-04-13

POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

 #71
20230110921
2023-04-13

POLISHING PAD AND PREPARING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

 #72
20230080430
2023-03-16

Polishing pads for high temperature processing

 #73
20230065029
2023-03-02

ELASTIC MEMBRANE AND METHOD OF MANUFACTURING ELASTIC MEMBRANE

 #74
20230059394
2023-02-23

POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #75
20230052322
2023-02-16

POLISHING PAD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME

 #76
20230052048
2023-02-16

Integrated abrasive polishing pads and manufacturing methods

 #77
20230021149
2023-01-19

CHEMICAL-MECHANICAL PLANARIZATION PAD AND METHODS OF USE

 #78
20220410340
2022-12-29

POLISHING HEAD ASSEMBLY HAVING RECESS AND CAP

 #79
20220410339
2022-12-29

POLISHING PAD WITH PROTRUDED POLISHING STRUCTURES, SYSTEM FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING THE SAME

 #80
20220410338
2022-12-29

CHEMICAL MECHANICAL POLISHING APPARATUS WITH POLISHING PAD INCLUDING DEBRIS DISCHARGE TUNNELS AND METHODS OF OPERATING THE SAME

 #81
20220395958
2022-12-15

Polishing pads with interconnected pores

 #82
20220388114
2022-12-08

Abrasive composition and method of manufacturing same

 #83
20220371155
2022-11-24

POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME

 #84
20220355441
2022-11-10

SLURRY RECYCLING FOR CHEMICAL MECHANICAL POLISHING SYSTEM

 #85
20220355437
2022-11-10

Polishing head, chemical-mechanical polishing system and method for polishing substrate

 #86
20220355436
2022-11-10

POLISHING PAD, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #87
20220347816
2022-11-03

Polishing Article, Polishing System and Method of Polishing

 #88
20220347815
2022-11-03

POLISHING PAD AND METHOD FOR MANUFACTURING SAME

 #89
20220305613
2022-09-29

CONTROLLED PROFILE POLISHING PLATEN

 #90
20220234163
2022-07-28

Chemical mechanical polishing using time share control

 #91
20220226963
2022-07-21

CHEMICAL MECHANICAL PLANARIZATION TOOLS, AND RELATED PADS FOR CHEMICAL MECHANICAL PLANARIZATION TOOLS

 #92
20220226962
2022-07-21

Polishing pad, method for manufacturing polishing pad, and polishing method

 #93
20220226958
2022-07-21

Formulations for chemical mechanical polishing pads with high planarization efficiency and CMP pads made therewith

 #94
20220212314
2022-07-07

PITCH LAYER PAD FOR SMOOTHING OPTICAL SURFACES

 #95
20220203496
2022-06-30

POLISHING PAD, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME

 #96
20220203495
2022-06-30

CMP polishing pad with window having transparency at low wavelengths and material useful in such window

 #97
20220193855
2022-06-23

GRINDING WHEEL

 #98
20220152776
2022-05-19

Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same

 #99
20220143778
2022-05-12

Polishing pad, method for producing the same and method of fabricating semiconductor device using the same

 #100
20220134507
2022-05-05

CHEMICAL MECHANICAL POLISHING PAD HAVING PATTERN SUBSTRATE

 #101
20220105602
2022-04-07

Printing a chemical mechanical polishing pad

 #102
20220080550
2022-03-17

POLISHING PAD HAVING PATTERN STRUCTURE FORMED ON POLISHING SURFACE, POLISHING DEVICE INCLUDING SAME, AND METHOD FOR MANUFACTURING POLISHING PAD

 #103
20220072678
2022-03-10

Polishing pad and method of fabricating semiconductor device using the same

 #104
20220023998
2022-01-27

POLISHING PAD AND POLISHING METHOD

 #105
20220009051
2022-01-13

Polishing pad, polishing apparatus and a method for polishing silicon wafer

 #106
20220005716
2022-01-06

Substrate transporter and substrate processing apparatus including substrate transporter

 #107
20220001507
2022-01-06

Correction of fabricated shapes in additive manufacturing

 #108
20210402555
2021-12-30

Apparatus and method for CMP temperature control

 #109
20210394333
2021-12-23

Advanced polishing pads and related polishing pad manufacturing methods

 #110
20210362285
2021-11-25

Substrate processing apparatus, polishing head, and substrate processing method

 #111
20210347007
2021-11-11

POLISHING PAD AND POLISHING METHOD USING SAME

 #112
20210347005
2021-11-11

POLISHING PAD WITH WINDOW AND MANUFACTURING METHODS THEREOF

 #113
20210323116
2021-10-21

OFFSET PORE POROMERIC POLISHING PAD

 #114
20210299817
2021-09-30

CMP polishing pad with polishing elements on supports

 #115
20210299816
2021-09-30

CMP POLISHING PAD WITH PROTRUDING STRUCTURES HAVING ENGINEERED OPEN VOID SPACE

 #116
20210283744
2021-09-16

Chemical mechanical polishing pad and chemical mechanical polishing apparatus including the same

 #117
20210260719
2021-08-26

Polishing pad, semiconductor fabricating device and fabricating method of semiconductor device

 #118
20210252664
2021-08-19

METHOD AND POLISHING APPARATUS FOR MACHINING A PLATE-SHAPED COMPONENT, AND PLATE-SHAPED COMPONENT, IN PARTICULAR ELECTROSTATIC HOLDING APPARATUS OR IMMERSION WAFER PANEL

 #119
20210205951
2021-07-08

Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process

 #120
20210154797
2021-05-27

POLISHING PAD, PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE USING SAME

 #121
20210154796
2021-05-27

Wafer edge asymmetry correction using groove in polishing pad

 #122
20210154795
2021-05-27

Polishing head for use in chemical mechanical polishing and CMP apparatus having the same

 #123
20210138605
2021-05-13

POLISHING PAD, PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF SEMICONDUCTOR DEVICE USING SAME

 #124
20210122007
2021-04-29

Composition for polishing pad and polishing pad

 #125
20210122006
2021-04-29

Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same

 #126
20210107116
2021-04-15

Polishing pads produced by an additive manufacturing process

 #127
20210086324
2021-03-25

Retaining ring for use in chemical mechanical polishing and CMP apparatus having the same

 #128
20210069856
2021-03-11

Printing a chemical mechanical polishing pad

 #129
20210069855
2021-03-11

Method of using polishing pad

 #130
20210053181
2021-02-25

POLISHING PAD

 #131
20210053180
2021-02-25

Chemical mechanical planarization tool

 #132
20200384606
2020-12-10

CMP polishing pad with lobed protruding structures

 #133
20200381258
2020-12-03

BIASED PULSE CMP GROOVE PATTERN

 #134
20200353588
2020-11-12

Chemical mechanical planarization pads with constant groove volume

 #135
20200353587
2020-11-12

Polishing pad for wafer polishing apparatus and manufacturing method therefor

 #136
20200353586
2020-11-12

Chemical mechanical planarization pads via vat-based production

 #137
20200306923
2020-10-01

Polishing pad, manufacturing method of polishing pad and polishing method

 #138
20200298370
2020-09-24

Abrasive articles with precisely shaped features and method of making thereof

 #139
20200276685
2020-09-03

Controlling chemical mechanical polishing pad stiffness by adjusting wetting in the backing layer

 #140
20200246937
2020-08-06

Pads for chemical mechanical planarization tools, chemical mechanical planarization tools, and related methods

 #141
20200238471
2020-07-30

Polishing system, polishing pad, and related methods

 #142
20200230911
2020-07-23

POLYMERIC FOAM LAYER AND METHODS OF MAKING THE SAME

 #143
20200230781
2020-07-23

POLISHING PADS FORMED USING AN ADDITIVE MANUFACTURING PROCESS AND METHODS RELATED THERETO

 #144
20200230780
2020-07-23

Polishing pad and method for manufacturing same

 #145
20200207981
2020-07-02

Composition for polishing pad, polishing pad and preparation method thereof

 #146
20200207904
2020-07-02

Composition for a polishing pad, polishing pad, and process for preparing the same

 #147
20200206866
2020-07-02

Polishing system with platen for substrate edge control

 #148
20200198086
2020-06-25

Method for machining a workpiece in the production of an optical element

 #149
20200171619
2020-06-04

Surface projection polishing pad

 #150
20200164486
2020-05-28

Substrate processing apparatus

 #151
20200164484
2020-05-28

Microreplicated polishing surface with enhanced co-planarity

 #152
20200147750
2020-05-14

CMP pad construction with composite material properties using additive manufacturing processes

 #153
20200139507
2020-05-07

Correction of fabricated shapes in additive manufacturing

 #154
20200135517
2020-04-30

Techniques for combining CMP process tracking data with 3D printed CMP consumables

 #155
20200101657
2020-04-02

Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

 #156
20200086454
2020-03-19

POLISHING HEAD AND POLISHING CARRIER APPARATUS HAVING THE SAME

 #157
20200086453
2020-03-19

NON-CONTACT ROTARY UNION

 #158
20200070308
2020-03-05

Slurry recycling for chemical mechanical polishing system

 #159
20200061773
2020-02-27

Polishing pad

 #160
20200055161
2020-02-20

Apparatus and method of forming a polishing article that has a desired zeta potential

 #161
20200047307
2020-02-13

Polishing layer and polishing method

 #162
20200043746
2020-02-06

Chemical mechanical polishing apparatus

 #163
20200039023
2020-02-06

ABRASIVE PAD

 #164
20200030933
2020-01-30

Apparatus and methods for chemical mechanical polishing

 #165
20200023489
2020-01-23

Polishing-pad laminated structure, polishing-pad positioning instrument, and method of attaching a polishing pad to a polishing table

 #166
20190389033
2019-12-26

Polishing pad with improved fluidity of slurry and process for preparing same

 #167
20190381630
2019-12-19

Polishing pad, polishing apparatus and method of manufacturing semiconductor package using the same

 #168
20190381575
2019-12-19

GELLING REDUCTION TOOL FOR GROOVING CHEMICAL MECHANICAL PLANARIZATION POLISHING PADS

 #169
20190337119
2019-11-07

PAD CONDITIONER WITH SPACER AND WAFER PLANARIZATION SYSTEM

 #170
20190337117
2019-11-07

Hydrophilic and zeta potential tunable chemical mechanical polishing pads

 #171
20190308295
2019-10-10

Polishing head, chemical-mechanical polishing system and method for polishing substrate

 #172
20190299357
2019-10-03

PRINTED CHEMICAL MECHANICAL POLISHING PAD

 #173
20190283215
2019-09-19

Gimbal for CMP tool conditioning disk having flexible metal diaphragm

 #174
20190283206
2019-09-19

POLISHING PAD, SEMICONDUCTOR FABRICATING DEVICE AND FABRICATING METHOD OF SEMICONDUCTOR DEVICE

 #175
20190247975
2019-08-15

Polishing body and manufacturing method therefor

 #176
20190240802
2019-08-08

Piezo-electric end-pointing for 3D printed CMP pads

 #177
20190224811
2019-07-25

Polishing pad with pad wear indicator

 #178
20190224810
2019-07-25

Polishing pad for chemical mechanical planarization

 #179
20190224809
2019-07-25

POROUS CHEMICAL MECHANICAL POLISHING PADS

 #180
20190224807
2019-07-25

Dual-surface polishing device and dual-surface polishing method

 #181
20190210187
2019-07-11

Polishing head for face-up type polishing apparatus, polishing apparatus including the polishing head, and polishing method using the polishing apparatus

 #182
20190210184
2019-07-11

Split-window CMP polishing pad and preparation method thereof

 #183
20190193238
2019-06-27

WAFER POLISHING PAD AND METHOD OF WAFER POLISHING USING THE SAME

 #184
20190160625
2019-05-30

System, control method and apparatus for chemical mechanical polishing

 #185
20190105753
2019-04-11

CMP composite groove polishing pad

 #186
20190099856
2019-04-04

Polishing pad, method for manufacturing polishing pad, and polishing method

 #187
20190091828
2019-03-28

Method of controlling a temperature of a chemical mechanical polishing process, temperature control, and CMP apparatus including the temperature control

 #188
20190084120
2019-03-21

Flanged optical endpoint detection windows and CMP polishing pads containing them

 #189
20190076982
2019-03-14

Method and system for monitoring polishing pad

 #190
20190070707
2019-03-07

Polishing method and polishing pad

 #191
20190070706
2019-03-07

Wafer polishing pad and using method thereof

 #192
20190047112
2019-02-14

Polishing pad with window and manufacturing methods thereof

 #193
20190047110
2019-02-14

Polishing pad having arc-shaped configuration

 #194
20190039204
2019-02-07

Abrasive delivery polishing pads and manufacturing methods thereof

 #195
20190030678
2019-01-31

Integrated abrasive polishing pads and manufacturing methods

 #196
20190001464
2019-01-03

Abrasive article having a non-uniform distribution of openings

 #197
20180366333
2018-12-20

Biased pulse CMP groove pattern

 #198
20180366332
2018-12-20

Controlled residence CMP polishing method

 #199
20180366331
2018-12-20

Uniform CMP polishing method

 #200
20180361533
2018-12-20

Trapezoidal CMP groove pattern

 #201
20180361532
2018-12-20

High-rate CMP polishing method

 #202
20180354094
2018-12-13

Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity

 #203
20180319205
2018-11-08

Electrostatic chuck optimized for refurbishment

 #204
20180304534
2018-10-25

Printing a chemical mechanical polishing pad

 #205
20180281150
2018-10-04

Polishing pad having grooves on bottom surface of top layer

 #206
20180281148
2018-10-04

Polishing pads and systems and methods of making and using the same

 #207
20180281076
2018-10-04

GELLING REDUCTION TOOL FOR GROOVING CHEMICAL MECHANICAL PLANARIZATION POLISHING PADS

 #208
20180229346
2018-08-16

Polishing apparatus

 #209
20180207770
2018-07-26

Thin plastic polishing article for CMP applications

 #210
20180200861
2018-07-19

Polishing pad and polishing method

 #211
20180161959
2018-06-14

Polishing pad and polishing method

 #212
20180161954
2018-06-14

CMP pad construction with composite material properties using additive manufacturing processes

 #213
20180161953
2018-06-14

Polishing pad and method of using

 #214
20180154497
2018-06-07

Polishing pads and systems for and methods of using same

 #215
20180154496
2018-06-07

Method for deterministic finishing of a chuck surface

 #216
20180085888
2018-03-29

CHEMICAL MECHANICAL POLISHING PADS HAVING A CONSISTENT PAD SURFACE MICROTEXTURE

 #217
20180079152
2018-03-22

Tiltable platform for additive manufacturing of a polishing pad

 #218
20180079147
2018-03-22

Two step curing of polishing pad material in additive manufacturing

 #219
20180071887
2018-03-15

Lapping device

 #220
20180043613
2018-02-15

Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

 #221
20180043500
2018-02-15

Method for manufacturing polishing head, polishing head, and polishing apparatus

 #222
20180043499
2018-02-15

Chemical mechanical polishing pad and method for manufacturing the same

 #223
20180043498
2018-02-15

Lapping pads and systems and methods of making and using the same

 #224
20180043495
2018-02-15

Advanced polishing system

 #225
20180036863
2018-02-08

Low-defect-porous polishing pad

 #226
20180036862
2018-02-08

Tapered poromeric polishing pad

 #227
20180036860
2018-02-08

Tapering method for poromeric polishing pad

 #228
20180009080
2018-01-11

Manufacturing method of polishing layer, and polishing method

 #229
20170355140
2017-12-14

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Cylindrical-component grinding device, and workpiece advancing apparatus and grinding method thereof

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Polishing layer analyzer and method

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Grooved CMP pads

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Polishing pad configuration and polishing pad support

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Method to provide an abrasive product surface and abrasive products thereof

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Method to provide an abrasive product surface and abrasive products thereof

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Method to provide an abrasive product and abrasive products thereof

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