44789 ⎘
Lapping machines or devices; Accessories; Work carriers for single side lapping of plane surfaces Retaining rings
SUBSTRATE POLISHING HEAD FOR OPTICAL ENHANCEMENT ANALYSIS
#2METHOD FOR CONDITIONING POLISHING PAD
#3METHOD AND SYSTEM FOR PERFORMING CHEMICAL MECHANICAL POLISHING
#4RETAINER RING AND WAFER POLISHING SYSTEM INCLUDING THE RETAINER RING
#5RETAINER RING AND WAFER POLISHING SYSTEM INCLUDING THE RETAINER RING
#6POLISHING APPARATUS AND POLISHING METHOD
#7RETAINING RING FOR CMP
#8WAFER POLISHING EQUIPMENT
#9INFORMATION PROCESSING DEVICE, INFERENCE DEVICE, MACHINE LEARNING DEVICE, INFORMATION PROCESSING METHOD, INFERENCE METHOD, AND MACHINE LEARNING METHOD
#10POLISHING HEAD ASSEMBLIES FOR POLISHING SEMICONDUCTOR WAFERS
#11RETAINER RING, POLISHING HEAD ASSEMBLY INCLUDING THE RETAINER RING, AND POLISHING DEVICE INCLUDING THE POLISHING HEAD ASSEMBLY
#12RETAINING RING HAVING INNER SURFACES WITH FEATURES
#13RETAINER RING FOR POLISHING HEAD
#14POLISHING HEAD AND POLISHING TREATMENT DEVICE
#15TEMPERATURE CONTROLLED SUBSTRATE CARRIER AND POLISHING COMPONENTS
#16CHEMICAL MECHANICAL POLISHING CORRECTION TOOL
#17DEVICE AND METHOD FOR IMPROVED CMP PROCESS WITH CMP HEAD
#18CHEMICAL MECHANICAL POLISHING APPARATUS
#19CARRIER HEAD AND SUBSTRATE POLISHING APPARATUS INCLUDING THE SAME
#20ELECTRICAL CONNECTION FOR CHEMICAL MECHANICAL POLISHING CARRIER HEAD
#21METHOD AND APPARATUS FOR SUBSTRATE NOTCH SENSING ON CMP HEAD FOR LOCAL PLANARIZATION
#22CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD
#23POLISHING HEAD WITH RETAINING RING WEAR SENSING
#24HIGH-PRECISION SUBSTRATE POLISHING SYSTEM
#25POLISHING DEVICE AND METHOD FOR DETECTING POLISHING END POINT IN POLISHING DEVICE
#26RETAINER RING FOR CHEMICAL MECHANICAL POLISHING APPARATUS AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME
#27RETAINING RING FOR EDGE COMPENSATION BY SLURRY FLOW CONTROL
#28POLISHING HEAD WITH FLEXURE EXTENDING THROUGH PRESSURE CHAMBER
#29RETAINER RING MODULE AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME
#30SUBSTRATE HOLDING DEVICE, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM
#31SUBSTRATE SUCTION MEMBER, ELASTIC SEAL ASSEMBLY, TOP RING, AND SUBSTRATE PROCESSING APPARATUS
#32RETAINING RING FOR CHEMICAL MECHANICAL POLISHING
#33POLISHING TOOL AND METHOD
#34CHEMICAL MECHANICAL POLISHING APPARATUS AND A METHOD OF POLISHING A SUBSTRATE USING THE SAME
#35POLISHING HEAD WITH MEMBRANE POSITION CONTROL
#36SUBSTRATE TRANSFER APPARATUS, AND APPARATUS FOR PROCESSING SUBSTRATE PROVIDED WITH SUBSTRATE TRANSFER APPARATUS
#37RETAINING RING HAVING INNER SURFACES WITH FEATURES
#38TOP RING OF POLISHING APPARATUS AND POLISHING APPARATUS
#39CHEMICAL MECHANICAL POLISHING METHOD
#40MANUFACTURING METHOD FOR MANUFACTURING SUBSTRATE OF NITRIDE CRYSTAL OF GROUP 13 ELEMENT IN PERIODIC TABLE
#41Wafer Polishing Locating Ring and Chemical Mechanical Polishing Device
#42Polishing head with local wafer pressure
#43CHEMICAL MECHANICAL POLISHING DEVICE AND POLISHING METHOD
#44CHEMICAL MECHANICAL POLISHING APPARATUS AND METHOD OF CONTROLLING THE SAME
#45CHEMICAL MECHANICAL POLISHING DEVICE AND POLISHING METHOD
#46RETAINER RING, CHEMICAL MECHANICAL POLISHING APPARATUS, AND SUBSTRATE POLISHING METHOD
#47Polishing head, and polishing treatment device
#48RETAINER FOR CHEMICAL MECHANICAL POLISHING CARRIER HEAD
#49POLISHING HEAD SYSTEM AND POLISHING METHOD
#50DUAL MEMBRANE CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING
#51Membrane for carrier head with segmented substrate chuck
#52HEAD FOR HOLDING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
#53RETAINER, TOP RING, AND SUBSTRATE PROCESSING APPARATUS
#54POLISHING CARRIER HEAD WITH MULTIPLE ZONES
#55ACOUSTIC MONITORING OF CMP RETAINING RING
#56CLAMPING RETAINER FOR CHEMICAL MECHANICAL POLISHING
#57POLISHING HEAD WITH LOCAL INNER RING DOWNFORCE CONTROL
#58COMPLIANT INNER RING FOR A CHEMICAL MECHANICAL POLISHING SYSTEM
#59Carrier head membrane with regions of different roughness
#60SUBSTRATE POLISH EDGE UNIFORMITY CONTROL WITH SECONDARY FLUID DISPENSE
#61Retaining ring having inner surfaces with facets
#62METHOD AND SYSTEM FOR PERFORMING CHEMICAL MECHANICAL POLISHING
#63Chemical mechanical polishing apparatus and method
#64Top ring for holding a substrate and substrate processing apparatus
#65LARGE AREA QUARTZ CRYSTAL WAFER LAPPING DEVICE AND A LAPPING METHOD THEREOF
#66Polishing head with membrane position control
#67Mega-sonic vibration assisted chemical mechanical planarization
#68METHOD OF RAISING POLISHING HEAD AFTER POLISHING OF WORKPIECE, POLISHING APPARATUS FOR WORKPIECE, AND COMPUTER-READABLE STORAGE MEDIUM STORING PROGRAM
#69SUBSTRATE CLEANING DEVICE AND SUBSTRATE POLISHING DEVICE
#70Method of forming retaining ring with shaped surface
#71CMP POLISHER HEAD OVER-ROTATION RESTRICTOR
#72POLISHING APPARATUS
#73Retaining Ring for Wafer Polishing
#74CMP polishing head design for improving removal rate uniformity
#75Pivotable substrate retaining ring
#76APPARATUS FOR POLISHING A WAFER
#77Method of transferring semiconductor wafer to polishing apparatus and method of producing semiconductor wafer
#78INTERLOCKED STEPPED RETAINING RING
#79Retaining ring having inner surfaces with features
#80POLISHING APPARATUS AND POLISHING METHOD
#81METHOD FOR CONDITIONING POLISHING PAD
#82RETAINING RING DESIGN
#83CHEMICAL MECHANICAL POLISHING CORRECTION TOOL
#84MACHINE LEARNING FOR CLASSIFYING RETAINING RINGS
#85Carrier head with segmented substrate chuck
#86Dual loading retaining ring
#87COMPONENTS FOR A CHEMICAL MECHANICAL POLISHING TOOL
#88Chemical mechanical polishing method
#89Chemical mechanical planarization membrane
#90Polishing head, polishing apparatus, and method of manufacturing semiconductor wafer
#91Retaining ring with shaped surface and method of forming
#92Fixing device and detection system
#93Polishing head with local wafer pressure
#94Substrate carrier head and processing system
#95Polishing head retaining ring tilting moment control
#96Polishing head retaining ring tilting moment control
#97Edge load ring
#98Substrate polish edge uniformity control with secondary fluid dispense
#99CMP MACHINE WITH IMPROVED THROUGHPUT AND PROCESS FLEXIBILITY
#100Polishing jig assembly for a new or refurbished electrostatic chuck
#101RETAINING RING DESIGN
#102Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane
#103Multi-toothed, magnetically controlled retaining ring
#104Retaining ring
#105Polishing carrier head with multiple angular pressurizable zones
#106POLISHING CARRIER HEAD WITH MULTIPLE ANGULAR PRESSURIZABLE ZONES
#107Polishing carrier head with piezoelectric pressure control
#108Polishing carrier head with piezoelectric pressure control
#109Apparatus for polishing and method of polishing
#110Polishing head, wafer polishing apparatus using the same, and wafer polishing method using the same
#111FOCUS RING AND SUBSTRATE PROCESSING APPARATUS
#112Polishing head system and polishing apparatus
#113Retaining ring having inner surfaces with facets
#114Method of making carrier head membrane with regions of different roughness
#115TOP RING FOR HOLDING A SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
#116SUBSTRATE HOLDING APPARATUS AND METHOD OF MANUFACTURING A DRIVE RING
#117Chemical mechanical polishing (CMP) polishing head with improved vacuum sealing
#118Retaining ring for use in chemical mechanical polishing and CMP apparatus having the same
#119Pivotable substrate retaining ring
#120Dual membrane carrier head for chemical mechanical polishing
#121Carrier head with segmented substrate chuck
#122Polishing head with membrane position control
#123POLISHING APPARATUS AND RETAINER RING
#124Mega-sonic vibration assisted chemical mechanical planarization
#125Temperature controlled substrate carrier and polishing components
#126Retaining ring with shaped surface
#127POLISHING APPARATUS AND POLISHING METHOD
#128Polishing apparatus
#129Laminated membrane, substrate holder including laminated membrane, and substrate processing apparatus
#130Polishing head for holding substrate and substrate processing apparatus
#131POLISHING APPARATUS AND POLISHING METHOD
#132Retainer for chemical mechanical polishing carrier head
#133Polishing apparatus
#134Method and system for performing chemical mechanical polishing
#135Polyurethane polishing pad and composition for manufacturing the same
#136Polishing apparatus and polishing method
#137Carrier head of polishing apparatus and membrane used therein
#138Chemical mechanical polishing apparatus and method
#139Chemical mechanical polishing apparatus having scraping fixture
#140Wafer carrier assembly
#141Retaining ring having inner surfaces with features
#142Components for a chemical mechanical polishing tool
#143Chemical mechanical polishing method
#144Substrate holding device, substrate polishing apparatus, and method of manufacturing the substrate holding device
#145Jig for a polishing apparatus
#146Top ring for holding a substrate and substrate processing apparatus
#147SUBSTRATE HOLDING APPARATUS, SUBSTRATE POLISHING APPARATUS, ELASTIC MEMBER, AND MANUFACTURING METHOD OF SUBSTRATE HOLDING APPARATUS
#148CARRIER HEAD FOR CHEMICAL MECHANICAL POLISHING DEVICE, INCLUDING CONTACT FLAP
#149Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system
#150Retaining ring for CMP
#151Carrier head having abrasive structure on retainer ring
#152METHOD FOR POLISHING WAFER
#153Method and apparatus for polishing a substrate
#154Flattening method and flattening apparatus
#155Polishing apparatus
#156Method for conditioning polishing pad
#157Substrate processing apparatus
#158Chemical mechanical polishing apparatus and method
#159APPARATUS AND METHOD FOR PLANARIZING SUBSTRATE
#160Polishing method and polishing apparatus
#161Method for selecting template assembly, method for polishing workpiece, and template assembly
#162SUBSTRATE TREATMENT APPARATUS
#163CMP polishing head design for improving removal rate uniformity
#164Carrier head membrane with regions of different roughness
#165Non-transitory computer-readable storage medium storing a program of stretching operation of elastic membrane, method of stretching operation of elastic membrane, and polishing apparatus
#166Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes
#167Retaining ring design
#168SEMICONDUCTOR FABRICATION USING PROCESS CONTROL PARAMETER MATRIX
#169SEMICONDUCTOR FABRICATION USING MACHINE LEARNING APPROACH TO GENERATING PROCESS CONTROL PARAMETERS
#170Chemical mechanical planarization membrane
#171Carrier ring, grinding device, and grinding method
#172SUBSTRATE POLISHING APPARATUS AND METHOD
#173Stepped retaining ring
#174Substrate polishing apparatus and method
#175WORKPIECE POLISHING APPARATUS
#176CMP MACHINE WITH IMPROVED THROUGHPUT AND PROCESS FLEXIBILITY
#177Inner retaining ring and outer retaining ring for carrier head
#178Leak checking method, and computer-readable storage medium for performing the leak checking method
#179ADHESIVE-LESS CARRIERS FOR CHEMICAL MECHANICAL POLISHING
#180RETAINER RING FOR CARRIER HEAD FOR CHEMICAL POLISHING APPARATUS AND CARRIER HEAD COMPRISING SAME
#181Polishing method and polishing apparatus
#182Double disc surface grinding machine and grinding method
#183Metallographic grinder and components thereof
#184Work polishing head
#185Retaining ring with shaped surface
#186Chemical mechanical polishing retaining ring with integrated sensor
#187Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane
#188Polishing apparatus
#189Chemical mechanical polishing smart ring
#190Polishing apparatus
#191Retaining ring for CMP
#192Method for processing one semiconductor wafer or a plurality of semiconductor wafers and protective cover for covering the semiconductor wafer
#193RETAINER RING FOR SEMICONDUCTOR MANUFACTURING PROCESSES
#194Stepped retaining ring
#195Wafer carrier assembly
#196GRINDING RING SET FOR SEMICONDUCTOR WAFER IN CHEMICAL AND MECHANICAL GRINDING PROCESS
#197Substrate polishing method, top ring, and substrate polishing apparatus
#198Polishing method and polishing apparatus
#199Apparatus and method for deterministic control of surface figure during full aperture pad polishing
#200Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system
#201Carrier head having abrasive structure on retainer ring
#202Polishing method
#203CMP polishing head design for improving removal rate uniformity
#204Chemical mechanical polishing system
#205Substrate holding device, and substrate polishing apparatus
#206External clamp ring for a chemical mechanical polishing carrier head
#207Corrosion resistant retaining rings
#208FOCUS RING AND SUBSTRATE PROCESSING APPARATUS
#209Polishing apparatus and semiconductor manufacturing method
#210Polishing apparatus, polishing head, and retainer ring
#211Retaining ring having inner surfaces with features
#212Polishing system with front side pressure control
#213Retaining ring for lower wafer defects
#214Polishing apparatus
#215RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS, AND RETAINER RING MAINTENANCE METHOD
#216Polishing head and polishing carrier apparatus having the same
#217RETAINER RING, POLISHING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#218Components for a chemical mechanical polishing tool
#219Method and apparatus for polishing a substrate
#220Retainer ring for chemical-mechanical polishing device
#221CHEMICAL MECHANICAL POLISHING FASTENING DEVICE
#222Retaining ring having inner surfaces with facets
#223CMP head structure with retaining ring
#224Using A Carrier Head With Shims
#225CMP head structure with retaining ring
#226Chemical mechanical polishing machine and polishing head assembly
#227Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes
#228Inner retaining ring and outer retaining ring for carrier head
#229RETAINER AND WAFER CARRIER INCLUDING THE SAME
#230Retaining ring with Shaped Surface
#231CARRIER HEAD AND CHEMICAL MECHANICAL POLISHING APPARATUS
#232Carrier head
#233Chemical mechanical polishing retaining ring with integrated sensor
#234Polishing apparatus and retainer ring configuration
#235Retaining ring having inner surfaces with facets
#236RETAINING RING ASSEMBLY WITH INSERTS
#237Polishing device and polishing method
#238Retaining ring with selected stiffness and thickness
#239Substrate holding apparatus and polishing apparatus
#240Retainer ring, polish apparatus, and polish method
#241Retainer ring structure for chemical-mechanical polishing apparatus and method for manufacturing the same
#242Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system
#243Carrier head having abrasive structure on retainer ring
#244Polishing apparatus
#245Substrate holder, polishing apparatus, polishing method, and retaining ring
#246CMP head structure
#247CMP head structure
#248Coated retaining ring
#249RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING MACHINE
#250RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING MACHINE AND METHOD FOR MANUFACTURING THE SAME
#251Method of polishing a new or a refurbished electrostatic chuck
#252CHEMICAL MECHANICAL POLISHING RETAINING RING METHODS AND APPARATUS
#253Polishing head and polishing apparatus
#254POLISHING APPARATUS
#255Polishing apparatus
#256Polishing apparatus
#257Chemical mechanical polishing fixture having lateral perforation structures
#258Polishing apparatus
#259Retaining ring with attachable segments
#260CMP retaining ring with soft retaining ring insert
#261Polishing System with Front Side Pressure Control
#262Polishing system with front side pressure control
#263SUBSTRATE PRECESSION MECHANISM FOR CMP POLISHING HEAD
#264Polishing head in chemical mechanical polishing apparatus and chemical mechanical polishing apparatus including the same
#265Chemical mechanical polishing machine and polishing head assembly
#266Flattening method and flattening apparatus
#267Polishing apparatus and polishing method
#268Retainer ring
#269Substrate holding apparatus and polishing apparatus
#270Method of manufacturing retainer ring for polishing wafer
#271Spider arm driven flexible chamber abrading workholder
#272Bellows driven floatation-type abrading workholder
#273Retaining ring with selected stiffness and thickness
#274POLISHING HEAD AND POLISHING APPARATUS
#275Retaining ring with shaped surface
#276Substrate holding apparatus and polishing apparatus
#277Two-part retaining ring with interlock features
#278Polishing apparatus and polishing method
#279WAFER CARRIER FOR BATCH WAFER POLISHING IN WAFER POLISHING MACHINES
#280Retainer ring
#281METHODS AND APPARATUS FOR ACTIVE SUBSTRATE PRECESSION DURING CHEMICAL MECHANICAL POLISHING
#282Stepped retaining ring
#283Retaining ring monitoring and control of pressure
#284Methods and apparatus for an improved polishing head retaining ring
#285Substrate holder, polishing apparatus, and polishing method
#286Retaining ring for chemical mechanical polishing
#287Retaining ring and articles for carrier head
#288Method for holding and polishing a substrate
#289SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#290Wafer Carrier with Flexible Pressure Plate
#291Method and apparatus for performing a polishing process in semiconductor fabrication
#292Two-Part Plastic Retaining Ring
#293Method of assembly of retaining ring for CMP
#294Method for manufacturing retainer ring of chemical mechanical polishing device
#295Substrate holding apparatus, polishing apparatus, and polishing method
#296Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same
#297Polishing head and polishing apparatus
#298Carrier head with shims
#299Semiconductor manufacturing apparatus
#300Systems providing an air zone for a chucking stage