ClassID:

83789

B81B7/0025 - CPC Classification

Classification description:

Microstructural systems; Auxiliary parts of microstructural devices or systems; Structural features, others than packages, for protecting a device against environmental influences Protection against chemical alteration

Recent Application in this class:
#1
20250373966
2025-12-04

MEMS DEVICE AND METHOD FOR FABRICATING A MEMS DEVICE

#2
20250320113
2025-10-16

PLASMA SHIELDING FOR AN ELECTROSTATIC MEMS DEVICE

#3
20250236514
2025-07-24

CHEMICAL STOP STRUCTURES FOR MEMS DEVICES

#4
20250157998
2025-05-15

MICROMECHANICAL COMPONENT AND CORRESPONDING PRODUCTION METHOD

#5
20240425366
2024-12-26

MICRO-ELECTROMECHANICAL SYSTEM AND METHOD FOR FABRICATING MEMS HAVING PROTECTION WALL

#6
20240406640
2024-12-05

OVER-THE-SINK DRYING ELEMENT

#7
20240118141
2024-04-11

WEARABLE DEVICE WITH COMBINED SENSING CAPABILITIES

#8
20230415482
2023-12-28

CORROSION TOLERANT MICRO-ELECTROMECHANICAL FLUID EJECTION DEVICE

#9
20230404777
2023-12-21

A MICROFLUIDIC SENSOR

#10
20230241889
2023-08-03

Microfluidic passage with protective layer

#11
20220396477
2022-12-15

Micromechanical component for a sensor device or microphone device

#12
20220380209
2022-12-01

Actuator layer patterning with polysilicon and etch stop layer

#13
20220212919
2022-07-07

BARRIER STRUCTURE WITHIN A MICROELECTRONIC ENCLOSURE

#14
20220150645
2022-05-12

Microphone device with ingress protection

#15
20220128498
2022-04-28

Gas sensor and manufacturing method thereof

#16
20220119248
2022-04-21

Micro-electromechanical system and method for fabricating MEMS having protection wall

#17
20220040977
2022-02-10

Corrosion tolerant micro-electromechanical fluid ejection device

#18
20220040691
2022-02-10

Substrate assembly and method of bonding substrates

#19
20220033256
2022-02-03

Method for producing a microelectromechanical sensor and microelectromechanical sensor

#20
20210188625
2021-06-24

SEMICONDUCTOR CHIP

#21
20210041298
2021-02-11

Wearable device with combined sensing capabilities

#22
20200282394
2020-09-10

Planarization layers over silicon dies

#23
20200245078
2020-07-30

Microphone package

#24
20200239303
2020-07-30

Microelectromechanical component and method for producing same

#25
20200092657
2020-03-19

High performance sealed-gap capacitive microphone

#26
20200039815
2020-02-06

Sensor package

#27
20190311961
2019-10-10

Environmentally protected sensing device

#28
20190300362
2019-10-03

Deposition of protective material at wafer level in front end for early stage particle and moisture protection

#29
20190285564
2019-09-19

Insulated sensors

#30
20190282110
2019-09-19

Hybrid diamond-polymer thin film sensors and fabrication method

#31
20190148566
2019-05-16

Semiconductor sensor device and method for fabricating the same

#32
20190146212
2019-05-16

Reflective device

#33
20190126272
2019-05-02

Substrate assembly and method of bonding substrates

#34
20190119101
2019-04-25

AMORPHOUS THIN METAL FILM

#35
20190113390
2019-04-18

Wearable device with combined sensing capabilities

#36
20190014421
2019-01-10

Microphone package

#37
20180346323
2018-12-06

Release chemical protection for integrated complementary metal-oxide-semiconductor (CMOS) and micro-electro-mechanical (MEMS) devices

#38
20180302726
2018-10-18

High performance sealed-gap capacitive microphone

#39
20180086664
2018-03-29

GLASS-SENSOR STRUCTURES

#40
20180044177
2018-02-15

Wafer-level package with enhanced performance

#41
20170253478
2017-09-07

Structure for device with integrated microelectromechanical systems

#42
20170197826
2017-07-13

Electromechanical device including connector formed of dielectric material

#43
20170081183
2017-03-23

MICROMECHANICAL LAYER SYSTEM

#44
20170066648
2017-03-09

CMOS-MEMS integrated device with selective bond pad protection

#45
20170015547
2017-01-19

Release chemical protection for integrated complementary metal-oxide-semiconductor (CMOS) and micro-electro-mechanical (MEMS) devices

#46
20160273967
2016-09-22

Wearable device with combined sensing capabilities

#47
20160103033
2016-04-14

Sensor with protective layer

#48
20160101976
2016-04-14

Method of improving getter efficiency by increasing superficial area

#49
20160068388
2016-03-10

Release chemical protection for integrated complementary metal-oxide-semiconductor (CMOS) and micro-electro-mechanical (MEMS) devices

#50
20150364363
2015-12-17

VHF etch barrier for semiconductor integrated microsystem

#51
20150102432
2015-04-16

Method of improving getter efficiency by increasing superficial area

#52
20150076627
2015-03-19

MEMS-microphone with reduced parasitic capacitance

#53
20140197503
2014-07-17

Sensor package

#54
20140016169
2014-01-16

Reflective device to scan light to project an image on a display surface

#55
20130113055
2013-05-09

Sensor device manufacturing method and sensor device

#56
20120292770
2012-11-22

METHOD AND DEVICE FOR PREVENTING CORROSION ON SENSORS

#57
20120024074
2012-02-02

Sensor element for capacitively measuring differential pressure

#58
20110193052
2011-08-11

Three-dimensional nanodevices including nanostructures

#59
20090026560
2009-01-29

Sensor package

#60
20050199975
2005-09-15

Circuit device