ClassID:

84117

B81C2201/0177 - CPC Classification

Classification description:

Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing; Chemical vapour Deposition Epitaxy, i.e. homo-epitaxy, hetero-epitaxy, GaAs-epitaxy

Recent Application in this class:
#1
20260109595
2026-04-23

ENGINEERED SUBSTRATES, FREE-STANDING SEMICONDUCTOR MICROSTRUCTURES, AND RELATED SYSTEMS AND METHODS

#2
20260015225
2026-01-15

METHOD FOR PRODUCING MICROELECTROMECHANICAL STRUCTURES

#3
20250236507
2025-07-24

ALL-SILICON CARBIDE (SiC) ACCELERATION-PRESSURE INTEGRATED SENSOR CHIP AND PREPARATION METHOD THEREOF

#4
20250033951
2025-01-30

ANCHOR STRUCTURE

#5
20250030998
2025-01-23

FOUNDRY-COMPATIBLE PROCESS FOR INTEGRATED MICRO-SPEAKER AND MICROPHONE

#6
20250019230
2025-01-16

MONOCRYSTALLINE NICKEL-TITANIUM FILMS ON SINGLE CRYSTAL SILICON SUBSTRATES USING SEED LAYERS

#7
20240425360
2024-12-26

MEMS RESONATOR AND METHOD FOR PRODUCING THE SAME

#8
20240208805
2024-06-27

ENGINEERED SUBSTRATES, FREE-STANDING SEMICONDUCTOR MICROSTRUCTURES, AND RELATED SYSTEMS AND METHODS

#9
20240190702
2024-06-13

SEMICONDUCTOR COMPONENT AND METHOD FOR MANUFACTURING A SEMICONDUCTOR COMPONENT

#10
20240017989
2024-01-18

MEMS DEVICE AND METHOD OF MANUFACTURING MEMS DEVICE

#11
20230348258
2023-11-02

MEMS STRUCTURE INCLUDING A BURIED CAVITY WITH ANTISTICTION PROTUBERANCES, AND MANUFACTURING METHODS THEREOF

#12
20230052052
2023-02-16

Method of forming monocrystalline nickel-titanium films on single crystal silicon substrates using seed layers

#13
20220396476
2022-12-15

Engineered substrates, free-standing semiconductor microstructures, and related systems and methods

#14
20200363629
2020-11-19

Process for manufacturing a MEMS micromirror device, and associated device

#15
20200216307
2020-07-09

METHOD FOR MANUFACTURING DUAL-CAVITY STRUCTURE, AND DUAL-CAVITY STRUCTURE

#16
20190016590
2019-01-17

Method for producing a multilayer MEMS component, and corresponding multilayer MEMS component

#17
20180143352
2018-05-24

Manufacturing method of micro-nano structure antireflective coating layer and display apparatus thereof

#18
20180031822
2018-02-01

Process for manufacturing a MEMS micromirror device, and associated device

#19
20170297896
2017-10-19

Epi-poly etch stop for out of plane spacer defined electrode

#20
20160353210
2016-12-01

Micromechanical structure comprising carbon material and method for fabricating the same

#21
20160304340
2016-10-20

Method for fabricating suspended MEMS structures

#22
20160137485
2016-05-19

Epi-poly etch stop for out of plane spacer defined electrode

#23
20160023895
2016-01-28

Method for producing a micromechanical component, and corresponding micromechanical component

#24
20130106875
2013-05-02

METHOD OF IMPROVING THIN-FILM ENCAPSULATION FOR AN ELECTROMECHANICAL SYSTEMS ASSEMBLY

#25
20120319219
2012-12-20

Epitaxial silicon CMOS-MEMS microphones and method for manufacturing

#26
20120286903
2012-11-15

Micromechanical device including N-type doping for providing temperature compensation and method of designing thereof

#27
20110209970
2011-09-01

SWITCH AND METHOD FOR MANUFACTURING THE SAME, AND RELAY

#28
20100297781
2010-11-25

METHOD FOR MANUFACTURING MEMS STRUCTURES

#29
20100029031
2010-02-04

Method of fabricating a MEMS/NEMS electromechanical component

#30
20050142688
2005-06-30

Episeal pressure sensor