ClassID:

84128

B81C2201/0192 - CPC Classification

Classification description:

Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing; Transfer of a layer from a carrier wafer to a device wafer by cleaving the carrier wafer

Recent Application in this class:
#1
20260034315
2026-02-05

MICROFLUIDIC DEVICES AND METHODS OF PRODUCING

#2
20260022010
2026-01-22

MEMBRANE TRANSFER METHOD

#3
20250304434
2025-10-02

ACTUATOR LAYER DEPOSITION AND TRANSFER

#4
20230406696
2023-12-21

MEMBRANE TRANSFER METHOD

#5
20230073003
2023-03-09

METHOD FOR PREPARING THE REMAINDER OF A DONOR SUBSTRATE, SUBSTRATE PRODUCED BY SAID METHOD, AND USE OF SUCH A SUBSTRATE

#6
20210039279
2021-02-11

Method of treating a solid layer bonded to a carrier substrate

#7
20200385265
2020-12-10

Method for preparing the remainder of a donor substrate, substrate produced by said method, and use of such a substrate

#8
20200331750
2020-10-22

METHODS OF FABRICATING SEMICONDUCTOR STRUCTURES INCLUDING CAVITIES FILLED WITH A SACRIFICIAL MATERIAL

#9
20200198963
2020-06-25

Method for processing a monocrystalline substrate and micromechanical structure

#10
20190233280
2019-08-01

METHOD FOR PROCESSING SILICON WAFER WITH THROUGH CAVITY STRUCTURE

#11
20180243944
2018-08-30

Method for the material-saving production of wafers and processing of wafers

#12
20180086630
2018-03-29

Method for processing a monocrystalline substrate and micromechanical structure

#13
20170210617
2017-07-27

Methods of fabricating semiconductor structures including cavities filled with a sacrificial material

#14
20160336233
2016-11-17

Systems and methods for laser splitting and device layer transfer

#15
20110294306
2011-12-01

CONTROLLED PROCESS AND RESULTING DEVICE

#16
20100282323
2010-11-11

Controlled process and resulting device

#17
20100267183
2010-10-21

Method for manufacturing capped MEMS components

#18
20100171153
2010-07-08

Method and structure of monolithically integrated pressure sensor using IC foundry-compatible processes

#19
20090093103
2009-04-09

Method and device for controlled cleaving process

#20
20080286945
2008-11-20

Controlled process and resulting device

#21
20080182386
2008-07-31

Controlled cleaving process

#22
20080057675
2008-03-06

Method and device for controlled cleaving process

#23
20070123013
2007-05-31

Controlled process and resulting device

#24
20070122995
2007-05-31

Controlled process and resulting device

#25
20060191627
2006-08-31

Process for cutting out a block of material and formation of a thin film

#26
20060141747
2006-06-29

Controlled cleaving process

#27
20050186758
2005-08-25

Controlled cleaving process

#28
20050070071
2005-03-31

Method and device for controlled cleaving process