84182 ⎘
Forming microstructural systems; Integrating an electronic processing unit with a micromechanical structure; Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure; Topology for facilitating the monolithic integration Stacking the electronic processing unit and the micromechanical structure
MEMS MIRROR MODULE WITH STRESS-DECOUPLED VIBRATIONAL MODES
#2DECOUPLING METHOD FOR SEMICONDUCTOR DEVICE
#3DECOUPLING METHOD FOR SEMICONDUCTOR DEVICE
#4CMOS ULTRASONIC TRANSDUCERS AND RELATED APPARATUS AND METHODS
#5STACKED DIE PACKAGE AND METHODS OF FORMING THE SAME
#6WAFER LEVEL PROCESSING FOR MICROELECTRONIC DEVICE PACKAGE WITH CAVITY
#7Heterogenous integration of complementary metal-oxide-semiconductor and MEMS sensors
#8Method for producing monolithic integration of piezoelectric micromachined ultrasonic transducers and CMOS
#9Semiconductor device including a microelectromechanical structure and an associated integrated electronic circuit
#10Optical electronics device
#11CMOS ultrasonic transducers and related apparatus and methods
#12MEMS device and manufacturing method thereof
#13Method for integrating complementary metal-oxide-semiconductor (CMOS) devices with microelectromechanical systems (MEMS) devices using a flat surface above a sacrificial layer
#14Nano-electromechanical system (NEMS) device structure and method for forming the same
#15Multi-layer sealing film for high seal yield
#16Fence structure to prevent stiction in a MEMS motion sensor
#17Integration scheme for microelectromechanical systems (MEMS) devices and complementary metal-oxide-semiconductor (CMOS) devices
#18Electrically controllable integrated switch
#19Method for integrating complementary metal-oxide-semiconductor (CMOS) devices with microelectromechanical systems (MEMS) devices using a flat surface above a sacrificial layer
#20CMOS ultrasonic transducers and related apparatus and methods
#21Method for fabricating MEMS device integrated with a semiconductor integrated circuit
#22CMOS ultrasonic transducers and related apparatus and methods
#23Micro-structured organic sensor device and method for manufacturing same
#24Complementary metal oxide semiconductor (CMOS) ultrasonic transducers and methods for forming the same
#25Monolithic integration of piezoelectric micromachined ultrasonic transducers and CMOS and method for producing the same
#26Ultrasonic transducers in complementary metal oxide semiconductor (CMOS) wafers and related apparatus and methods
#27Semiconductor device including a microelectromechanical structure and an associated integrated electronic circuit
#28Multi-layer sealing film for high seal yield
#29Fence structure to prevent stiction in a MEMS motion sensor
#30Method for integrating complementary metal-oxide-semiconductor (CMOS) devices with microelectromechanical systems (MEMS) devices using a flat surface above a sacrificial layer
#31Microfabricated ultrasonic transducers and related apparatus and methods
#32Manufacturing method for semiconductor structure
#33Nano-electromechanical system (NEMS) device structure and method for forming the same
#34Optical electronics device
#35Semiconductor structure and manufacturing method for the same
#36Complementary metal oxide semiconductor (CMOS) ultrasonic transducers and methods for forming the same
#37MEMS device integrated with a semiconductor integrated circuit and manufacturing method thereof
#38Method for integrating complementary metal-oxide-semiconductor (CMOS) devices with microelectromechanical systems (MEMS) devices using a flat surface above a sacrificial layer
#39CMOS ultrasonic transducers and related apparatus and methods
#40Ultrasonic transducers in complementary metal oxide semiconductor (CMOS) wafers and related apparatus and methods
#41Integrating MEMS structures with interconnects and vias
#42Process for manufacturing a semiconductor device including a microelectromechanical structure and an associated integrated electronic circuit and corresponding semiconductor device
#43Integration scheme for microelectromechanical systems (MEMS) devices and complementary metal-oxide-semiconductor (CMOS) devices
#44Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphone
#45Complementary metal oxide semiconductor (CMOS) ultrasonic transducers and methods for forming the same
#46CMOS ultrasonic transducers and related apparatus and methods
#47Nano-electromechanical system (NEMS) device structure and method for forming the same
#48Micro feedback-chamber sensor and method of manufacturing such sensor
#49Pressure sensor and method for producing the pressure sensor
#50CMOS ultrasonic transducers and related apparatus and methods
#51Optical electronic device and method of fabrication
#52Complementary metal oxide semiconductor (CMOS) ultrasonic transducers and methods for forming the same
#53Ultrasonic transducers in complementary metal oxide semiconductor (CMOS) wafers and related apparatus and methods
#54Integrated circuit with a pressure sensor
#55Integration of active devices with passive components and MEMS devices
#56MEMS device and fabrication method
#57CMOS ultrasonic transducers and related apparatus and methods
#58MEMS PRESSURE SENSOR AND METHOD FOR FORMING THE SAME
#59Device and method for protecting FEOL element and BEOL element
#60Method of manufacturing an integrated circuit comprising a pressure sensor
#61Electronic device with stacked chips
#62Method of making a semiconductor device package with dummy gate
#63CMOS integrated moving-gate transducer with silicon as a functional layer
#64Electrically controllable integrated switch
#65Backside bulk silicon MEMS
#66Semiconductor device with through molding vias and method of making the same
#67Cavity structures for MEMS devices
#68Ultrasonic transducers in complementary metal oxide semiconductor (CMOS) wafers and related apparatus and methods
#69Complementary metal oxide semiconductor (CMOS) ultrasonic transducers and methods for forming the same
#70Mechanisms for forming micro-electro mechanical device
#71Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphone
#72Integrated circuit provided with a device for detecting its spatial orientation and/or a modification of this orientation
#73MEMS device and fabrication method
#74Method of making a semiconductor device package
#75Complementary metal oxide semiconductor (CMOS) ultrasonic transducers and methods for forming the same
#76Cavity structures for MEMS devices
#77CMOS ultrasonic transducers and related apparatus and methods
#78CMOS integrated moving-gate transducer with silicon as a functional layer
#79Multi-axis integrated MEMS devices with CMOS circuits and method therefor
#80Method of forming a suspended structure and a transistor co-integrated on a same substrate
#81Hermetic wafer level packaging
#82Hybrid integrated component
#83Backside bulk silicon MEMS
#84Substrate with multiple encapsulated devices
#85Micromechanical structure, in particular sensor arrangement, and corresponding operating method
#86Hybrid integrated component and method for the manufacture thereof
#87Integrated circuit with pressure sensor having a pair of electrodes
#88Hybrid integrated component and method for the manufacture thereof
#89Method for manufacturing a hybrid integrated component
#90Electronic device
#91Strain and pressure sensing device, microphone, method for manufacturing strain and pressure sensing device, and method for manufacturing microphone
#92INTEGRATED MEMS DEVICE
#93Analysis device including a MEMS and/or NEMS network
#94Semiconductor device and method for manufacturing same
#95HERMETICALLY SEALED MEMS DEVICE WITH A PORTION EXPOSED TO THE ENVIRONMENT WITH VERTICALLY INTEGRATED ELECTRONICS
#96Electrical bypass structure for MEMS device
#97CAVITY STRUCTURES FOR MEMS DEVICES
#98METHODS AND SYSTEMS FOR FABRICATION OF MEMS CMOS DEVICES IN LOWER NODE DESIGNS
#99Wafer level packaging of micro-electro-mechanical systems (MEMS) and complementary metal-oxide-semiconductor (CMOS) substrates
#100Hermetic wafer level packaging
#101SEMICONDUCTOR DEVICE
#102Integrated circuit and fabricating method thereof
#103Method for Manufacturing Microelectronic Devices and Devices According to Such Methods
#104MICROELECTROMECHANICAL SENSOR DEVICE PACKAGE AND METHOD FOR MAKING THE SAME
#105Planar microshells for vacuum encapsulated devices and damascene method of manufacture
#106Planar microshells for vacuum encapsulated devices and damascene method of manufacture
#107Microshells with integrated getter layer
#108Integrated (multilayer) circuits and process of producing the same
#109METHODS AND SYSTEMS FOR FABRICATION OF MEMS CMOS DEVICES
#110Vertical system integration
#111Method and structures for fabricating MEMS devices on compliant layers
#112Devices for fabricating tri-layer beams
#113Semiconductor apparatus and method for manufacturing the same
#114Vertical system integration
#115Vertical system integration
#116Vertical system integration
#117Vertical system integration
#118MEMS devices with an etch stop layer
#119SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING THE SAME
#120Vertical system integration