93337 ⎘
Sulfonic acids; Halides, esters, or anhydrides thereof; Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing oxygen atoms bound to the carbon skeleton containing etherified hydroxy groups bound to the carbon skeleton with the oxygen atom of at least one of the etherified hydroxy groups further bound to an acyclic carbon atom
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
#2SULFATIZED ESTERAMINES
#3FUEL CELL WITH POLYMER ELECTROLYTE MEMBRANE
#4Cleavable surfactants
#5Negative resist composition and pattern forming process
#6NANOPARTICLE, CONTRAST AGENT FOR MAGNETIC RESONANCE IMAGING COMPRISING SAME AND ZWITTERIONIC LIGAND COMPOUND
#7Salt, acid generator, resist composition and method for producing resist pattern
#8Anionic-cationic-nonionic surfactant, production and use thereof
#9Vinylsulfonic anhydride, method for producing same, and method for producing vinylsulfonyl fluoride
#10Cyclic sulfonate compounds as photoacid generators in resist applications
#11Unsaturated fatty alcohol derivatives from natural oil metathesis
#12Cleavable surfactants
#13Sulfonic acid, carboxylic acid, and salts thereof
#14Cyclic sulfonate compounds as photoacid generators in resist applications
#15Patterning process
#16Anionic-cationic-nonionic surfactant, production and use thereof
#17ANIONIC SURFACTANT AND USE THEREOF
#18Salts and photoresists comprising same
#19Mixed dimers from alpha-olefin sulfonic acids
#20Cleavable surfactants
#21Beta-naphthol ether sulfonates, processes for preparing them and use thereof as brightness improvers
#22Salt and photoresist composition containing the same
#23Large hydrophobe surfactants
#24Anionic-cationic-nonionic surfactant, production and use thereof
#25Ultra-high salinity surfactant formulation
#26Acid Mist Mitigation Agents for Electrolyte Solutions
#27Fluorinated tensides
#28Resist composition and patterning process
#29Chemical compounds
#30Sulfonate-based compound and polymer electrolyte membrane using same
#31Acid mist mitigation agents for electrolyte solutions
#32SALTS CONTAINING TRIHYDROPERFLUOROALKOXYBUTANESULFONATE OR TRIHYDROPERFLUOROALKOXYPROPANESULFONATE ANION
#33Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same
#34CHEMICAL COMPOUNDS
#35Unsaturated fatty alcohol alkoxylates from natural oil metathesis
#36Unsaturated fatty alcohol derivatives from natural oil metathesis
#37Electrolyte salt for lithium-based energy stores
#38Sulfonium compounds, their preparation and use
#39Lithium-2-methoxy-1,1,2,2-tetrafluoro-ethanesulfonate and use thereof as conductive salt in lithium-based energy accumulators
#40Fluorinated oligomers having pendant functional groups
#41Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
#42Extended surfactant for emulsion polymerization
#43Anionic polyalkoxy group comprising surfactants on basis of guerbet-alcohols, method of manufacture and use in enhanced oil recovery (EOR) applications
#44Sulphonate based compound, polymer electrolyte membrane comprising same and fuel cell comprising same
#45FLUORINATED SURFACTANTS
#46Coating compositions
#47Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same
#48Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same
#49Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
#50Resist composition, method of forming resist pattern, polymeric compound, and compound
#51Modified carbon material and process of making and using the same
#52Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
#53Acid mist mitigation agents for electrolyte solutions
#54Salt, photoresist composition and method for producing photoresist pattern
#55Reactive surfactants for emulsion polymerization, pigment dispersion, and UV coatings
#56Salt, photoresist composition and method for producing photoresist pattern
#57Anionic acid-labile surfactants and methods of use
#58Anionic acid-labile surfactants and methods of use
#59Photoacid generator, method for producing the same, and resist composition comprising the same
#60Photoacid generator, method for producing the same, and resist composition comprising the same
#61METHOD FOR PRODUCING PERFLUOROSULFONIC ACID HAVING ETHER STRUCTURE AND DERIVATIVE THEREOF, AND SURFACTANT CONTAINING FLUORINE-CONTAINING ETHER SULFONIC ACID COMPOUND AND DERIVATIVE THEREOF
#62Process for reducing inorganics from and concentrating anionic surfactant solutions
#63Resist composition, method of forming resist pattern, compound and acid generator
#64Fluoroalkanesulfonic acid ammonium salts and method for producing same
#65Photoacid generators and photoresists comprising same
#66Anionic acid-labile surfactants and methods of use
#67Anionic polyalkoxy group comprising surfactants on basis of guerbet-alcohols, method of manufacture and use in enhanced oil recovery (EOR) applications
#68PHOTORESIST COMPOSITION
#69Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers
#70PERFLUORO SULFONYL HALIDES AND RELATED SPECIES AS POLYMER SUPPORT MODIFIERS
#71Sulfonate surfactants and methods of preparation and use
#72Photoacid generator compounds and compositions
#73Sulfonium compound
#74N-halogenated amino compounds and derivatives
#75Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith
#76Surfactants with a polyethersulfonate structure method for production thereof and use thereof for tertiary crude oil production
#77Fluoroalkyl ether sulfonate surfactants
#78Coating composition
#79Compound, acid generator, resist composition, and method of forming resist pattern
#80Resist composition, method of forming resist pattern, compound and acid generator including the same
#81Chemically modified catalyzed support particles for electrochemical cells
#82Resist composition, method of forming resist pattern, compound and acid generator
#83FLUOROSURFACTANTS
#84Anionic acid-labile surfactants and methods of use
#85Fluorinated surfactants
#86Photoacid generator compounds and compositions
#87Resist composition, method of forming resist pattern, novel compound, and acid generator
#88Cleavable surfactants
#89Compound, polymer, and radiation-sensitive composition
#90Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
#91Acid mist mitigation agents for electrolyte solutions
#92Resist composition, method of forming resist pattern, compound and acid generator
#93METHODS OF MAKING AN ANTISTATIC AGENT
#94ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES
#95Ether sulfonate surfactants and process for making same
#96Compositions and methods for the treatment of renal and cardiovascular disease
#97Photoactive compounds
#98Fluorosurfactants
#99Compositions and methods for the treatment of renal and cardiovascular disease
#100Monomers comprising superacidic groups, and polymers therefrom
#101METHODS OF MAKING AN ANTISTATIC AGENT
#102Functionalized carbon materials
#103Therapeutic cyclopentane derivatives
#104Photoactive compounds
#105Fluorinated surfactants
#106Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
#107Use of polyoxypropylene and polyoxyethylene terpene compounds in emulsion polymerization
#108Methods of making an antistatic agent
#109Vehicle and a vehicle door
#110Process for the production of water-soluble fluorine-containing vinyl ethers
#111Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS)
#112Fullerene compounds
#113Hydroxyeicosenoic acid anaglogs
#114Hydroxyfattysulfonic acid analogs
#115Cyclic process for the production of taurine from ethylene oxide