Patents-Review.com
ClassID:

103463 ⎘

C09G1/04 - CPC Classification

Classification description:

Polishing compositions Aqueous dispersions

Recent Application in this class:
#1
20260139156
2026-05-21

CHEMICAL POLISHING BATH FOR TITANIUM AND TITANIUM ALLOYS, AND METHOD USING SUCH A BATH

 #2
20260107722
2026-04-16

TOOLS FOR CHEMICAL PLANARIZATION

 #3
20260055301
2026-02-26

Soluble Metal Oxide Anion CMP Slurry

 #4
20260015524
2026-01-15

SLURRY COMPOSITION FOR POLISHING METAL AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

 #5
20250270421
2025-08-28

SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

 #6
20250145861
2025-05-08

POLISHING COMPOSITION FOR A SEMICONDUCTOR PROCESS AND MANUFACTURING METHOD OF SUBSTRATE USING THE SAME

 #7
20250144609
2025-05-08

PHOTOELECTRIC FLUID FIELD CLUSTER CATALYTIC METHOD FOR ATOMIC-SCALE DETERMINISTIC PROCESSING

 #8
20250075105
2025-03-06

ANTIFOAMER FOR GRINDING OR POLISHING COMPOSITIONS AND METHODS FOR USING THE SAME

 #9
20250066641
2025-02-27

POLISHING SLURRY COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

 #10
20250026962
2025-01-23

COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

 #11
20240395562
2024-11-28

CHEMICAL MECHANICAL POLISH SLURRY AND METHOD OF MANUFACTURE

 #12
20240327677
2024-10-03

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER

 #13
20240318040
2024-09-26

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #14
20240318039
2024-09-26

CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

 #15
20240199917
2024-06-20

NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS

 #16
20240141205
2024-05-02

COMPOSITIONS AND METHODS OF USE THEREOF

 #17
20240076522
2024-03-07

POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

 #18
20240043721
2024-02-08

Ruthenium CMP chemistry based on halogenation

 #19
20240016154
2024-01-18

SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME

 #20
20230357601
2023-11-09

POLISHING LIQUID FOR POLISHING COMPOUND SEMICONDUCTOR SUBSTRATE

 #21
20230332015
2023-10-19

SLURRY COMPOSITION FOR POLISHING METAL AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

 #22
20230265313
2023-08-24

Polishing Compositions and Methods of Using Same

 #23
20230193476
2023-06-22

CHEMICAL POLISHING BATH FOR ALUMINUM AND ALUMINUM ALLOYS, AND METHOD USING SUCH A BATH

 #24
20230143013
2023-05-11

CHEMICAL PLANARIZATION

 #25
20230118455
2023-04-20

Ruthenium CMP chemistry based on halogenation

 #26
20230104949
2023-04-06

Slurry composition for chemical mechanical polishing

 #27
20230077988
2023-03-16

TOOLS FOR CHEMICAL PLANARIZATION

 #28
20230052829
2023-02-16

COMPOSITIONS AND METHODS OF USE THEREOF

 #29
20230026568
2023-01-26

CHEMICAL MECHANICAL POLISHING SOLUTION

 #30
20220406612
2022-12-22

Methods for polishing dielectric layer in forming semiconductor device

 #31
20220372332
2022-11-24

With-In Die Non-Uniformities (WID-NU) In Planarization

 #32
20220348792
2022-11-03

Polishing compositions for reduced defectivity and methods of using the same

 #33
20220315802
2022-10-06

SUSPENSION FOR CHEMICAL MECHANICAL PLANARIZATION (CMP) AND METHOD EMPLOYING THE SAME

 #34
20220298382
2022-09-22

CMP slurry composition for polishing tungsten pattern wafer and method of polishing tungsten pattern wafer using the same

 #35
20220298381
2022-09-22

CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN PATTERN WAFER AND METHOD OF POLISHING TUNGSTEN PATTERN WAFER USING THE SAME

 #36
20220267643
2022-08-25

COMPOSITIONS FOR TUNGSTEN ETCHING INHIBITION

 #37
20220243094
2022-08-04

SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD

 #38
20220235252
2022-07-28

Spherical inorganic particles having surface bumps formed thereon, and method of manufacturing same

 #39
20220227894
2022-07-21

CHITOSAN BASED COATING SYSTEM

 #40
20220226957
2022-07-21

Chemical mechanical polishing pad and polishing method

 #41
20220220637
2022-07-14

Silicon carbide substrate

 #42
20220211042
2022-07-07

SURFACE TREATMENT ARTICLES, DEVICES AND METHODS FOR MAKING THE SAME

 #43
20220199416
2022-06-23

Methods for polishing dielectric layer in forming semiconductor device

 #44
20220195246
2022-06-23

Chemical mechanical polishing slurry composition and method of polishing metal layer

 #45
20220177729
2022-06-09

Chemical mechanical polishing composition containing composite silica particles, method of making the silica composite particles and method of polishing a substrate

 #46
20220145133
2022-05-12

FREEZE-THAW STABLE WATER-IN-OIL EMULSION CLEANER AND/OR POLISH COMPOSITIONS

 #47
20220145130
2022-05-12

Polishing compositions and methods of using same

 #48
20220111489
2022-04-14

POLISHING AGENT REGENERATING METHOD AND POLISHING AGENT RECYCLE PROCESSING SYSTEM

 #49
20220089911
2022-03-24

Polishing composition

 #50
20220089910
2022-03-24

Calcium carbonate slurry

 #51
20220064490
2022-03-03

Polishing liquid and chemical mechanical polishing method

 #52
20220064489
2022-03-03

POLISHING SLURRY COMPOSITION

 #53
20220064488
2022-03-03

Polishing slurry composition

 #54
20220033684
2022-02-03

POLISHING LIQUID

 #55
20220010207
2022-01-13

Intermediate raw material, and polishing composition and composition for surface treatment using the same

 #56
20210343542
2021-11-04

Hydrophilization treatment liquid for semiconductor wafer surface

 #57
20210324238
2021-10-21

Hard abrasive particle-free polishing of hard materials

 #58
20210324236
2021-10-21

Chemical mechanical polishing composition containing composite silica particles, method of making the silica composite particles and method of polishing a substrate

 #59
20210313190
2021-10-07

Chemical Mechanical Polish Slurry and Method of Manufacture

 #60
20210269676
2021-09-02

Polishing slurry, method for polishing glass, and method for manufacturing glass

 #61
20210261825
2021-08-26

Chemical mechanical polishing composition, chemical mechanical polishing slurry and method for polishing substrate

 #62
20210261824
2021-08-26

Polishing agent, polishing method, and liquid additive for polishing

 #63
20210261822
2021-08-26

Barrier ruthenium chemical mechanical polishing slurry

 #64
20210210383
2021-07-08

Structure and formation method of semiconductor device with conductive feature

 #65
20210206920
2021-07-08

Derivatized polyamino acids

 #66
20210147715
2021-05-20

Polishing compositions for reduced defectivity and methods of using the same

 #67
20210130650
2021-05-06

Chemical mechanical polishing slurry composition and method of polishing metal layer

 #68
20210115335
2021-04-22

Etching composition for silicon nitride layer and method of etching silicon nitride layer using the same

 #69
20210108106
2021-04-15

Polishing compositions and methods of use thereof

 #70
20210102093
2021-04-08

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT COMPRISING SUBSTRATES

 #71
20210087409
2021-03-25

Water-based coating compositions that resist dirt pickup

 #72
20210079266
2021-03-18

Semiconductor element

 #73
20210079265
2021-03-18

Polishing slurry, method for polishing glass, and method for manufacturing glass

 #74
20210071037
2021-03-11

Polishing liquid, polishing liquid set and polishing method

 #75
20210071034
2021-03-11

Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films

 #76
20210062089
2021-03-04

Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices

 #77
20210062044
2021-03-04

Method for producing aluminum platter

 #78
20210062043
2021-03-04

Composition and method for polysilicon CMP

 #79
20210054238
2021-02-25

Composition for etching and manufacturing method of semiconductor device using the same

 #80
20210054237
2021-02-25

Composition for etching and manufacturing method of semiconductor device using the same

 #81
20210054236
2021-02-25

Composition for etching and manufacturing method of semiconductor device using the same

 #82
20210054235
2021-02-25

Composition for etching and manufacturing method of semiconductor device using the same

 #83
20210054234
2021-02-25

Semiconductor element

 #84
20210054233
2021-02-25

Polishing liquid, polishing liquid set, and polishing method

 #85
20210028024
2021-01-28

Metal structure and method of manufacturing the same and metal wire and semiconductor device and electronic device

 #86
20210002511
2021-01-07

Polishing compositions for reduced defectivity and methods of using the same

 #87
20200407594
2020-12-31

CMP slurry solution for hardened fluid material

 #88
20200392375
2020-12-17

Slurry composition and method of manufacturing integrated circuit device by using the same

 #89
20200332150
2020-10-22

SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

 #90
20200239734
2020-07-30

Acid polishing composition and method of polishing a substrate having enhanced defect inhibition

 #91
20200194278
2020-06-18

Roughness reduction methods for materials using illuminated etch solutions

 #92
20200190339
2020-06-18

Water-based coating compositions that resist dirt pickup

 #93
20200181453
2020-06-11

Method of polishing substrate and polishing composition set

 #94
20200172763
2020-06-04

Polishing additive composition, polishing slurry composition and method for polishing insulating film of semiconductor element

 #95
20200172760
2020-06-04

Composition and method for metal CMP

 #96
20200165487
2020-05-28

Polishing composition and polishing method using the same

 #97
20200152471
2020-05-14

Polishing method

 #98
20200123414
2020-04-23

Polishing composition containing amphoteric surfactant

 #99
20200109313
2020-04-09

Polishing composition

 #100
20200102479
2020-04-02

HARD ABRASIVE PARTICLE-FREE POLISHING OF HARD MATERIALS METHOD

 #101
20200048551
2020-02-13

Chemical mechanical planarization composition for polishing oxide materials and method of use thereof

 #102
20200043786
2020-02-06

Structure and formation method of semiconductor device with conductive feature

 #103
20200043745
2020-02-06

Chemical mechanical polish slurry and method of manufacture

 #104
20200040221
2020-02-06

Compositions for use in chemical mechanical polishing

 #105
20200032108
2020-01-30

Chemical mechanical planarization of films comprising elemental silicon

 #106
20200024547
2020-01-23

Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate

 #107
20200002575
2020-01-02

Calcium carbonate slurry

 #108
20190367774
2019-12-05

Composition and method for polishing memory hard disks exhibiting reduced edge roll off

 #109
20190352537
2019-11-21

Polishing liquid and polishing method

 #110
20190300749
2019-10-03

Barrier ruthenium chemical mechanical polishing slurry

 #111
20190292406
2019-09-26

Polishing slurry and method of polishing substrate by using the polishing slurry

 #112
20190248668
2019-08-15

Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion

 #113
20190194493
2019-06-27

COMPOSITION FOR SEMICONDUCTOR TREATMENT AND TREATMENT METHOD

 #114
20190184518
2019-06-20

ABRASIVE GRAINS, MANUFACTURING METHOD THEREFOR, POLISHING SLURRY CONTAINING SAID ABRASIVE GRAINS, AND POLISHING METHOD USING SAID POLISHING SLURRY

 #115
20190161645
2019-05-30

Chemical mechanical polishing slurry composition for polishing polycrystalline silicon film

 #116
20190153279
2019-05-23

Silica-based composite fine particle dispersion and method for manufacturing same

 #117
20190144712
2019-05-16

Freeze-thaw stable water-in-oil emulsion cleaner and/or polish compositions

 #118
20190136090
2019-05-09

Composition for etching and manufacturing method of semiconductor device using the same

 #119
20190136089
2019-05-09

Polishing agent, polishing method, and liquid additive for polishing

 #120
20190119526
2019-04-25

POLISHING LIQUID FOR GLASS, AND POLISHING METHOD

 #121
20190119525
2019-04-25

Composition for conducting material removal operations and method for forming same

 #122
20190092972
2019-03-28

Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them

 #123
20190092971
2019-03-28

Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them

 #124
20190085210
2019-03-21

Production method of polishing composition

 #125
20190085209
2019-03-21

COMPOSITION FOR TUNGSTEN CMP

 #126
20190062598
2019-02-28

Stop-On Silicon Containing Layer Additive

 #127
20190010359
2019-01-10

Polishing slurry and polishing material

 #128
20190010356
2019-01-10

Hard abrasive particle-free polishing of hard materials

 #129
20180362807
2018-12-20

Organic film CMP slurry composition and polishing method using same

 #130
20180340095
2018-11-29

Oxidizing fluid for the chemical-mechanical polishing of ceramic materials

 #131
20180339399
2018-11-29

Abrasive slurry regeneration method

 #132
20180298257
2018-10-18

Chemical-mechanical processing slurry and methods for processing a nickel substrate surface

 #133
20180291234
2018-10-11

System for chemical mechanical polishing of Ge-based materials and devices

 #134
20180277384
2018-09-27

Slurry for polishing of integrated circuit packaging

 #135
20180258319
2018-09-13

Polishing liquid, polishing liquid set, and substrate polishing method

 #136
20180254193
2018-09-06

Polishing slurry for cobalt-containing substrate

 #137
20180251658
2018-09-06

Method for polishing cobalt-containing substrate

 #138
20180230333
2018-08-16

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates

 #139
20180204736
2018-07-19

Compositions and methods for removing ceria particles from a surface

 #140
20180194968
2018-07-12

Method for producing zeta negative nanodiamond dispersion and zeta negative nanodiamond dispersion

 #141
20180148607
2018-05-31

POLISHING COMPOSITIONS WITH IMPROVED LOW TEMPERATURE PROPERTIES

 #142
20180111248
2018-04-26

Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method

 #143
20180086944
2018-03-29

Chemical mechanical planarization slurry and method for forming same

 #144
20180086943
2018-03-29

TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND CLEANING METHOD

 #145
20180079932
2018-03-22

Floor coating compositions and related methods

 #146
20180072916
2018-03-15

DIAMOND-BASED SLURRIES WITH IMPROVED SAPPHIRE REMOVAL RATE AND SURFACE ROUGHNESS

 #147
20180016468
2018-01-18

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

 #148
20170369743
2017-12-28

Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium

 #149
20170369741
2017-12-28

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

 #150
20170342298
2017-11-30

Single crystal silicon-carbide substrate and polishing solution

 #151
20170338123
2017-11-23

Chemical mechanical polishing slurry, method for chemical mechanical polishing and manufacturing method of semiconductor structure

 #152
20170330763
2017-11-16

Semiconductor treatment composition and treatment method

 #153
20170283987
2017-10-05

Single-crystal silicon-carbide substrate and polishing solution

 #154
20170278718
2017-09-28

CMP polishing agent, manufacturing method thereof, and method for polishing substrate

 #155
20170275713
2017-09-28

COMPOSITIONS AND METHODS FOR TREATING LEATHER

 #156
20170271172
2017-09-21

CMP slurry composition for polishing copper line and polishing method using same

 #157
20170226368
2017-08-10

Protective coating compositions

 #158
20170190936
2017-07-06

Tungsten processing slurry with catalyst

 #159
20170183539
2017-06-29

Abrasive particle-dispersion layer composite and polishing slurry composition including the same

 #160
20170183538
2017-06-29

Additive composition and positive polishing slurry composition including the same

 #161
20170174904
2017-06-22

Water-based coating compositions that resist dirt pickup

 #162
20170158914
2017-06-08

CMP slurry solution for hardened fluid material

 #163
20170158913
2017-06-08

Chemical mechanical polishing (CMP) composition

 #164
20170158911
2017-06-08

Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC wafer

 #165
20170152402
2017-06-01

pH-adjuster free chemical mechanical planarization slurry

 #166
20170098560
2017-04-06

Slurry composition for chemical mechanical polishing of GE-based materials and devices

 #167
20170088748
2017-03-30

Stop-on silicon containing layer additive

 #168
20170081553
2017-03-23

POLISHING COMPOSITION

 #169
20170081552
2017-03-23

Polishing composition, polishing method, and method for producing substrate

 #170
20170072530
2017-03-16

Method of chemical mechanical polishing of alumina

 #171
20170044403
2017-02-16

Polishing composition containing ceria abrasive

 #172
20170037290
2017-02-09

CMP polishing agent, method for manufacturing thereof, and method for polishing substrate

 #173
20170015869
2017-01-19

Epoxy-fortified floor polishes

 #174
20160329215
2016-11-10

Chemical mechanical polishing method using slurry composition containing N-oxide compound

 #175
20160314990
2016-10-27

Ni:NiGe:Ge selective etch formulations and method of using same

 #176
20160300730
2016-10-13

Cu-low K cleaning and protection compositions

 #177
20160288290
2016-10-06

CMP composition and method for polishing rigid disks

 #178
20160257856
2016-09-08

Polishing composition containing ceria abrasive

 #179
20160244639
2016-08-25

Composition and method for polishing memory hard disks exhibiting reduced edge roll-off

 #180
20160237315
2016-08-18

Dishing reducing in tungsten chemical mechanical polishing

 #181
20160222254
2016-08-04

CMP composition for silicon nitride removal

 #182
20160215189
2016-07-28

Polishing composition and method for producing same

 #183
20160215188
2016-07-28

Polishing composition and method for producing same

 #184
20160203994
2016-07-14

POLISHING COMPOSITION

 #185
20160153095
2016-06-02

Polishing composition

 #186
20160151876
2016-06-02

Kit for polishing sapphire surfaces

 #187
20160130475
2016-05-12

Polishing liquid and method of polishing SiC substrate

 #188
20160071737
2016-03-10

Slurry composition for chemical mechanical polishing of Ge-based materials and devices

 #189
20160068713
2016-03-10

Slurry composition and method of substrate polishing

 #190
20160068398
2016-03-10

Method for producing zeta negative nanodiamond dispersion and zeta negative nanodiamond dispersion

 #191
20160060488
2016-03-03

Polishing of hard substrates with soft-core composite particles

 #192
20160042993
2016-02-11

Etching liquid, etching method, and method of manufacturing solder bump

 #193
20160032461
2016-02-04

Chemical mechanical polishing of alumina

 #194
20160027663
2016-01-28

Method for chemical mechanical polishing substrates containing ruthenium and copper

 #195
20160024351
2016-01-28

Polishing agent, polishing method and additive liquid for polishing

 #196
20150376461
2015-12-31

Colloidal silica chemical-mechanical polishing concentrate

 #197
20150376460
2015-12-31

Methods for fabricating a chemical-mechanical polishing composition

 #198
20150376459
2015-12-31

Colloidal silica chemical-mechanical polishing composition

 #199
20150376458
2015-12-31

Colloidal silica chemical-mechanical polishing composition

 #200
20150315417
2015-11-05

Polishing composition for edge roll-off improvement

 #201
20150275048
2015-10-01

Polishing slurry preventing agglomeration of charged colloids without loss of surface activity

 #202
20150267307
2015-09-24

Brightening and passivation of stainless steel surfaces

 #203
20150267084
2015-09-24

Slurry for chemical-mechanical polishing of metals and use thereof

 #204
20150267083
2015-09-24

Mixed abrasive tungsten CMP composition

 #205
20150197669
2015-07-16

Composition and method for polishing memory hard disks

 #206
20150166840
2015-06-18

GLOSS ENHANCING AND STAINLESS STEEL POLISH COMPOSITIONS

 #207
20150159050
2015-06-11

Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives

 #208
20150157996
2015-06-11

Emulsion compositions and applications therefor

 #209
20150132958
2015-05-14

Contact release capsule useful for chemical mechanical planarization slurry

 #210
20150132956
2015-05-14

Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications

 #211
20150129795
2015-05-14

Chemical mechanical polishing method using slurry composition containing N-oxide compound

 #212
20150118845
2015-04-30

Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors

 #213
20150083962
2015-03-26

Polishing composition and polishing method using the same

 #214
20150083689
2015-03-26

Chemical-mechanical planarization of polymer films

 #215
20150079789
2015-03-19

Abrasive composition and method for producing semiconductor substrate

 #216
20150072522
2015-03-12

Abrasive particle, polishing slurry, and method of manufacturing semiconductor device using the same

 #217
20150056122
2015-02-26

Polishing composition, manufacturing process therefor, process for production of silicon substrate, and silicon substrate

 #218
20150038597
2015-02-05

Wet sanding compositions

 #219
20150031205
2015-01-29

Polishing method

 #220
20150030650
2015-01-29

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

 #221
20150025177
2015-01-22

Coating compositions having chelant functionality

 #222
20150024595
2015-01-22

Compositions and methods for CMP of silicon oxide, silicon nitride, and polysilicon materials

 #223
20150021292
2015-01-22

Polishing agent for synthetic quartz glass substrate

 #224
20140342560
2014-11-20

POLISHING COMPOSITION

 #225
20140308814
2014-10-16

CHEMICAL MECHANICAL POLISHING METHODS AND SYSTEMS INCLUDING PRE-TREATMENT PHASE AND PRE-TREATMENT COMPOSITIONS

 #226
20140263170
2014-09-18

Methods of polishing sapphire surfaces

 #227
20140220299
2014-08-07

SINGLE-CRYSTAL SILICON-CARBIDE SUBSTRATE AND POLISHING SOLUTION

 #228
20140141612
2014-05-22

Polishing composition, polishing method using same, and method for producing semiconductor device

 #229
20140073226
2014-03-13

Polypyrrolidone polishing composition and method

 #230
20140057438
2014-02-27

Polishing method of non-oxide single-crystal substrate

 #231
20140054266
2014-02-27

COMPOSITIONS AND METHODS FOR SELECTIVE POLISHING OF PLATINUM AND RUTHENIUM MATERIALS

 #232
20140030897
2014-01-30

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

 #233
20130302984
2013-11-14

POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND SUBSTRATE PRODUCTION METHOD

 #234
20130273739
2013-10-17

Aqueous polishing composition and process for chemically mechanically polishing substrates having patterned or unpatterned low-k dielectric layers

 #235
20130245190
2013-09-19

Aqueous floor polishing composition

 #236
20130109794
2013-05-02

Polish composition

 #237
20130109181
2013-05-02

Method of polishing a substrate

 #238
20130078811
2013-03-28

Slurry for chemical-mechanical polishing of metals and use thereof

 #239
20130072620
2013-03-21

Low gloss aqueous coating compositions containing poly(ethylene oxide)

 #240
20120270343
2012-10-25

Polishing method and method for forming a gate

 #241
20120220199
2012-08-30

Wet sanding compositions

 #242
20120219705
2012-08-30

Leather-surface repair-composition and the method for surface repair of leather surfaces

 #243
20120190200
2012-07-26

Abrasive Free Silicon Chemical Mechanical Planarization

 #244
20120164833
2012-06-28

Polishing agent, compound semiconductor manufacturing method, and semiconductor device manufacturing method

 #245
20120157595
2012-06-21

Protective coating compositions

 #246
20120152148
2012-06-21

NON-BUFFING WAX EMULSION COMPOSITION

 #247
20110294293
2011-12-01

Chemical planarization of copper wafer polishing

 #248
20110225897
2011-09-22

Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof

 #249
20110180511
2011-07-28

Polishing composition and polishing method using the same

 #250
20110118409
2011-05-19

Aqueous coating composition

 #251
20110073800
2011-03-31

Abrasive-free chemical mechanical polishing compositions

 #252
20110070736
2011-03-24

Method for polishing through-silicon via (TSV) wafers and a polishing composition used in the method

 #253
20100330882
2010-12-30

Polishing pad and method for polishing a semiconductor wafer

 #254
20100327219
2010-12-30

Solution for forming polishing slurry, polishing slurry and related methods

 #255
20100243950
2010-09-30

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE

 #256
20100240920
2010-09-23

Phosphate surfactants

 #257
20100176336
2010-07-15

Systems, methods and solutions for chemical polishing of GaAs wafers

 #258
20100168300
2010-07-01

Aqueous compositions of fluorinated surfactants and methods of using the same

 #259
20100078589
2010-04-01

Method for purifying chemical added with chelating agent

 #260
20100051474
2010-03-04

METHOD AND COMPOSITION FOR ELECTRO-CHEMICAL-MECHANICAL POLISHING

 #261
20100029079
2010-02-04

Chemical mechanical polishing composition and methods relating thereto

 #262
20090302003
2009-12-10

Aqueous Solution for Chemical Polishing and Deburring and Process for Polishing and Deburring A Part made of Pure Nickel or Nickel-200 Therein

 #263
20090294749
2009-12-03

Chemical mechanical polishing slurry composition for polishing phase-change memory device and method for polishing phase-change memory device using the same

 #264
20090263573
2009-10-22

Leather-surface repair-composition and the method for surface repair of leather surfaces

 #265
20090215266
2009-08-27

Polishing Copper-Containing patterned wafers

 #266
20090215265
2009-08-27

Low-stain polishing composition

 #267
20090130454
2009-05-21

Strippable floor coating and method of forming the coating

 #268
20090114117
2009-05-07

Leveling agent and water-based floor-polishing composition comprising the leveling agent

 #269
20090088519
2009-04-02

Furniture polish compositions substantially free of organic solvents

 #270
20090001340
2009-01-01

Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same

 #271
20090001339
2009-01-01

Chemical Mechanical Polishing Slurry Composition for Polishing Phase-Change Memory Device and Method for Polishing Phase-Change Memory Device Using the Same

 #272
20080315154
2008-12-25

Polishing fluids and methods for CMP

 #273
20080315153
2008-12-25

Polishing fluids and methods for CMP

 #274
20080248727
2008-10-09

Polishing Slurry

 #275
20080182413
2008-07-31

SELECTIVE CHEMISTRY FOR FIXED ABRASIVE CMP

 #276
20080171440
2008-07-17

Pre-polishing treatment solution for interconnect substrate, polishing method, and method and apparatus for manufacturing interconnect substrate

 #277
20080153392
2008-06-26

Chemical mechanical planarization composition, system, and method of use

 #278
20080153253
2008-06-26

Chemical mechanical polishing process and method of fabricating semiconductor device using the same

 #279
20080121840
2008-05-29

Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same

 #280
20080067149
2008-03-20

STABILIZER FOR ACIDIC, METAL-CONTAINING POLISHING BATHS

 #281
20080053002
2008-03-06

Solution for forming polishing slurry, polishing slurry and related methods

 #282
20080042099
2008-02-21

Solution for forming polishing slurry, polishing slurry and related methods

 #283
20080035882
2008-02-14

COMPOSITION FOR POLISHING A SUBSTRATE

 #284
20080003924
2008-01-03

Polishing slurry and polishing method

 #285
20070295934
2007-12-27

Polishing slurry and polishing method

 #286
20070289481
2007-12-20

Leveling agent for floor polish and aqueous floor polish composition

 #287
20070190906
2007-08-16

POLISHING MEDIUM FOR CHEMICAL-MECHANICAL POLISHING, AND POLISHING METHOD

 #288
20070181851
2007-08-09

Polishing composition and polishing method

 #289
20070167017
2007-07-19

Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same

 #290
20070147551
2007-06-28

Abrasive-free polishing slurry and CMP process

 #291
20070093182
2007-04-26

Polishing fluids and methods for CMP

 #292
20070051274
2007-03-08

Hydrophilic treatment composition, and hydrophilic protective film-forming method

 #293
20070039926
2007-02-22

Abrasive-free polishing system

 #294
20070000873
2007-01-04

Substrate processing method and semiconductor device manufacturing method

 #295
20060264052
2006-11-23

Method of forming a platinum pattern

 #296
20060241009
2006-10-26

Compatibilization of esters with latices

 #297
20060236892
2006-10-26

Floor coating composition and floor coating composition additive

 #298
20060223320
2006-10-05

Polishing technique to minimize abrasive removal of material and composition therefor

 #299
20060216939
2006-09-28

Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same

 #300
20060205865
2006-09-14

High solids latex for dry-bright floor polish compositions