Patents-Review.com
ClassID:

103462 ⎘

C09G1/02 - page 3 - CPC Classification

Classification description:

Polishing compositions containing abrasives or grinding agents

Recent Application in this class:
#601
20210079262
2021-03-18

Polishing slurry composition for STI process

 #602
20210071037
2021-03-11

Polishing liquid, polishing liquid set and polishing method

 #603
20210071036
2021-03-11

Polishing composition

 #604
20210071035
2021-03-11

CARBON ABRASIVE AND POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #605
20210071034
2021-03-11

Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide films

 #606
20210066086
2021-03-04

CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND POLISHING PAD AND CHEMICAL MECHANICAL POLISHING DEVICE

 #607
20210062043
2021-03-04

Composition and method for polysilicon CMP

 #608
20210062042
2021-03-04

Composition and method for conducting a material removing operation

 #609
20210062041
2021-03-04

POLISHING LIQUID, POLISHING LIQUID SET, AND POLISHING METHOD

 #610
20210054233
2021-02-25

Polishing liquid, polishing liquid set, and polishing method

 #611
20210047541
2021-02-18

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

 #612
20210043661
2021-02-11

Polishing slurry, method for manufacturing a display device using the same and display device

 #613
20210035812
2021-02-04

CHEMICAL MECHANICAL POLISHING METHOD AND CHEMICAL MECHANICAL POLISHING DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #614
20210024781
2021-01-28

GALLIUM COMPOUND-BASED SEMICONDUCTOR SUBSTRATE POLISHING COMPOSITION

 #615
20210024780
2021-01-28

Polishing composition, manufacturing method of polishing composition, polishing method, and manufacturing method of semiconductor substrate

 #616
20210024779
2021-01-28

Polishing composition

 #617
20210017423
2021-01-21

POLISHING COMPOSITION

 #618
20210017422
2021-01-21

Polishing liquid, polishing liquid set, and polishing method

 #619
20210017421
2021-01-21

Method to increase barrier film removal rate in bulk tungsten slurry

 #620
20210013092
2021-01-14

Semiconductor substrate polishing methods

 #621
20210009859
2021-01-14

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION FOR POLISHING MULTIPLE FILMS AND POLISHING METHOD USING THE SAME

 #622
20210005473
2021-01-07

Treatment liquid

 #623
20210005462
2021-01-07

SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #624
20210002513
2021-01-07

Dispersion liquid of silica particles, polishing composition, and method for producing dispersion liquid of silica particles

 #625
20210002512
2021-01-07

CHEMICAL MECHANICAL POLISHING METHOD FOR TUNGSTEN

 #626
20210002511
2021-01-07

Polishing compositions for reduced defectivity and methods of using the same

 #627
20200407594
2020-12-31

CMP slurry solution for hardened fluid material

 #628
20200399505
2020-12-24

Polishing composition

 #629
20200399504
2020-12-24

Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate

 #630
20200392376
2020-12-17

POLISHING COMPOSITION AND POLISHING METHOD

 #631
20200392375
2020-12-17

Slurry composition and method of manufacturing integrated circuit device by using the same

 #632
20200392374
2020-12-17

Dispersion liquid of silica particles and production method therefor

 #633
20200388501
2020-12-10

Method of reducing semiconductor substrate surface unevenness

 #634
20200384605
2020-12-10

Cationic fluoropolymer composite polishing method

 #635
20200384603
2020-12-10

Low-debris fluopolymer composite CMP polishing pad

 #636
20200384602
2020-12-10

Fluopolymer composite CMP polishing method

 #637
20200384600
2020-12-10

Thin film fluoropolymer composite CMP polishing method

 #638
20200381258
2020-12-03

BIASED PULSE CMP GROOVE PATTERN

 #639
20200369919
2020-11-26

Polishing liquid composition for silicon oxide film

 #640
20200369918
2020-11-26

POLISHING SOLUTION AND POLISHING METHOD

 #641
20200369917
2020-11-26

Polishing solution and polishing method

 #642
20200365413
2020-11-19

Chemical mechanical planarization using nano-abrasive slurry

 #643
20200362199
2020-11-19

Polishing liquid and chemical mechanical polishing method

 #644
20200362198
2020-11-19

Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxide

 #645
20200357653
2020-11-12

Slurry

 #646
20200354610
2020-11-12

Polishing liquid and chemical mechanical polishing method

 #647
20200354609
2020-11-12

Polishing liquid and chemical mechanical polishing method

 #648
20200347268
2020-11-05

Polishing liquid and chemical mechanical polishing method

 #649
20200343444
2020-10-29

CMP stop layer and sacrifice layer for high yield small size MRAM devices

 #650
20200343098
2020-10-29

Polishing compositions and methods of using same

 #651
20200339837
2020-10-29

POLISHING COMPOSITIONS AND METHODS OF USING SAME

 #652
20200332163
2020-10-22

POLISHING LIQUID AND METHOD FOR PRODUCING POLISHED ARTICLE

 #653
20200332150
2020-10-22

SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

 #654
20200325360
2020-10-15

Slurry, polishing-liquid set, polishing liquid, and polishing method for base

 #655
20200317955
2020-10-08

COMPOSITION FOR POLISHING FOR USE IN ELIMINATING PROTRUSION IN PERIPHERY OF LASER MARK

 #656
20200308452
2020-10-01

Low Temperature Mechanical Polishing Or Planarization Slurry For Surfactant Solubility

 #657
20200308451
2020-10-01

ADDITIVES TO IMPROVE PARTICLE DISPERSION FOR CMP SLURRY

 #658
20200308450
2020-10-01

POLISHING COMPOSITION

 #659
20200308449
2020-10-01

Polishing composition

 #660
20200308448
2020-10-01

POLISHING COMPOSITION COMPRISING POLISHING PARTICLES HAVING HIGH WATER AFFINITY

 #661
20200308447
2020-10-01

COMPOSITIONS FOR POLISHING COBALT AND LOW-K MATERIAL SURFACES

 #662
20200308446
2020-10-01

Compositions for polishing cobalt and low-K material surfaces

 #663
20200308445
2020-10-01

Chemical mechanical polishing method for cobalt with high cobalt removal rates and reduced cobalt corrosion

 #664
20200303198
2020-09-24

POLISHING COMPOSITION AND POLISHING METHOD

 #665
20200299547
2020-09-24

Chemical mechanical polishing composition

 #666
20200299546
2020-09-24

Polishing composition

 #667
20200299545
2020-09-24

Slurry and polishing method

 #668
20200299544
2020-09-24

Polishing liquid, polishing liquid set and polishing method

 #669
20200299543
2020-09-24

POLISHING COMPOSITION

 #670
20200294813
2020-09-17

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

 #671
20200291268
2020-09-17

Polishing slurry and method of manufacturing semiconductor device

 #672
20200291267
2020-09-17

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / OR COBALT ALLOY COMPRISING SUBSTRATES

 #673
20200283659
2020-09-10

POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, ANDDEFECT SUPPRESSION METHOD

 #674
20200279751
2020-09-03

CMP slurry and CMP method

 #675
20200277514
2020-09-03

Chemical Mechanical Polishing For Copper And Through Silicon Via Applications

 #676
20200270763
2020-08-27

Use of HSOas an electrolyte in processes for smoothing and polishing metals by ion transport via free solids

 #677
20200270479
2020-08-27

Shallow Trench Isolation Chemical And Mechanical Polishing Slurry

 #678
20200263056
2020-08-20

POLISHING COMPOSITION AND POLISHING METHOD

 #679
20200255713
2020-08-13

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

 #680
20200255690
2020-08-13

Chemical mechanical polishing of tungsten using a method and composition containing quaternary phosphonium compounds

 #681
20200255689
2020-08-13

Polishing composition and method of fabricating semiconductor device using the same

 #682
20200251342
2020-08-06

Multi-modal diamond abrasive package or slurry for polishing hard substrates

 #683
20200239737
2020-07-30

Chemical mechanical polishing compositions having stabilized abrasive particles for polishing dielectric substrates

 #684
20200239736
2020-07-30

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates

 #685
20200239735
2020-07-30

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives

 #686
20200239734
2020-07-30

Acid polishing composition and method of polishing a substrate having enhanced defect inhibition

 #687
20200239727
2020-07-30

Surface protectant for semiconductor wafer

 #688
20200231451
2020-07-23

Production method for dispersion liquid of silica particle

 #689
20200224058
2020-07-16

Polishing compositions and methods of use thereof

 #690
20200224057
2020-07-16

Dual additive composition for polishing memory hard disks exhibiting edge roll off

 #691
20200208015
2020-07-02

Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk

 #692
20200208014
2020-07-02

Composition for tungsten CMP

 #693
20200203172
2020-06-25

Polishing compositions and methods of using same

 #694
20200199409
2020-06-25

Polishing compositions and methods of using same

 #695
20200198982
2020-06-25

Cerium based particles

 #696
20200198092
2020-06-25

POLISHING PAD AND COMPOSITION FOR MANUFACTURING THE SAME

 #697
20200198090
2020-06-25

CMP APPARATUS AND METHOD OF PERFORMING CERIA-BASED CMP PROCESS

 #698
20200198084
2020-06-25

Wafer grinding wheel

 #699
20200194278
2020-06-18

Roughness reduction methods for materials using illuminated etch solutions

 #700
20200190361
2020-06-18

Self-stopping polishing composition and method for bulk oxide planarization

 #701
20200181454
2020-06-11

OXIDIZER FREE SLURRY FOR RUTHENIUM CMP

 #702
20200181453
2020-06-11

Method of polishing substrate and polishing composition set

 #703
20200176264
2020-06-04

Wafer polishing with separated chemical reaction and mechanical polishing

 #704
20200172763
2020-06-04

Polishing additive composition, polishing slurry composition and method for polishing insulating film of semiconductor element

 #705
20200172762
2020-06-04

Composition and method for copper barrier CMP

 #706
20200172761
2020-06-04

Composition and method for silicon nitride CMP

 #707
20200172760
2020-06-04

Composition and method for metal CMP

 #708
20200172759
2020-06-04

COMPOSITION AND METHOD FOR COBALT CMP

 #709
20200164482
2020-05-28

Multi-layered windows for use in chemical-mechanical planarization systems

 #710
20200161141
2020-05-21

Polishing slurry and method of manufacturing semiconductor device

 #711
20200157382
2020-05-21

SLURRY COMPOSITION FOR POLISHING TUNGSTEN BARRIER LAYER

 #712
20200157381
2020-05-21

Polishing additive composition, polishing slurry composition and method for polishing insulating film of semiconductor element

 #713
20200152471
2020-05-14

Polishing method

 #714
20200135486
2020-04-30

Slurry and manufacturing semiconductor using the slurry

 #715
20200131415
2020-04-30

Method for manufacturing polishing particles and method for polishing synthetic quartz glass substrate

 #716
20200131404
2020-04-30

Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process

 #717
20200123414
2020-04-23

Polishing composition containing amphoteric surfactant

 #718
20200123413
2020-04-23

Polishing composition and polishing method

 #719
20200123412
2020-04-23

Chemical mechanical polishing composition and method for tungsten

 #720
20200115590
2020-04-16

Composite abrasive particles for chemical mechanical planarization composition and method of use thereof

 #721
20200114488
2020-04-16

Method for polishing silicon wafer

 #722
20200109312
2020-04-09

Nanobubble-containing inorganic oxide fine particle and abrasive containing same

 #723
20200105580
2020-04-02

Methods of forming an abrasive slurry and methods for chemical-mechanical polishing

 #724
20200102479
2020-04-02

HARD ABRASIVE PARTICLE-FREE POLISHING OF HARD MATERIALS METHOD

 #725
20200102478
2020-04-02

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF POLISHING SILCON DIOXIDE OVER SILICON NITIRIDE

 #726
20200102477
2020-04-02

Polishing composition, polishing method, and method of producing substrate

 #727
20200102476
2020-04-02

Barrier Slurry Removal Rate Improvement

 #728
20200102475
2020-04-02

CHEMICAL MECAHNICAL POLISHING COMPOSITION AND METHOD OF POLISHING SILCON DIOXIDE OVER SILICON NITIRIDE

 #729
20200098591
2020-03-26

Metal heterojunction structure with capping metal layer

 #730
20200098590
2020-03-26

CMP slurry and CMP method

 #731
20200095502
2020-03-26

High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dishing In Shallow Trench Isolation(STI) Chemical Mechanical Planarization Polishing(CMP)

 #732
20200095468
2020-03-26

TUNGSTEN DISSOLUTION INHIBITOR, AND POLISHING COMPOSITION AND COMPOSITION FOR SURFACE TREATMENT USING THE SAME

 #733
20200095467
2020-03-26

INTERMEDIATE RAW MATERIAL, AND POLISHING COMPOSITION AND COMPOSITION FOR SURFACE TREATMENT USING THE SAME

 #734
20200095466
2020-03-26

Polishing composition

 #735
20200090997
2020-03-19

Method for reducing metal plug corrosion and device

 #736
20200087539
2020-03-19

Liquid suspension of cerium oxide particles

 #737
20200087538
2020-03-19

COMPOSITION FOR SELECTIVE POLISHING OF WORK FUNCTION METALS

 #738
20200079976
2020-03-12

Chemical mechanical planarization for tungsten-containing substrates

 #739
20200079975
2020-03-12

Slurry composition and method of selective silica polishing

 #740
20200071568
2020-03-05

Polishing composition and polishing system

 #741
20200071567
2020-03-05

POLISHING COMPOSITION AND POLISHING SYSTEM

 #742
20200071566
2020-03-05

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING

 #743
20200062997
2020-02-27

Polishing composition

 #744
20200058482
2020-02-20

METHOD FOR POLISHING SILICON CARBIDE SUBSTATE

 #745
20200056069
2020-02-20

Polishing composition and method utilizing abrasive particles treated with an aminosilane

 #746
20200048551
2020-02-13

Chemical mechanical planarization composition for polishing oxide materials and method of use thereof

 #747
20200048550
2020-02-13

Plasma etching method

 #748
20200048516
2020-02-13

Composition including a plurality of abrasive particles and method of using same

 #749
20200048498
2020-02-13

CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION

 #750
20200048497
2020-02-13

Polishing composition and method for manufacturing same, polishing method, and method for manufacturing substrate

 #751
20200048496
2020-02-13

Oxide chemical mechanical planarization (CMP) polishing compositions

 #752
20200043748
2020-02-06

Slurry recycling for chemical mechanical polishing system

 #753
20200043745
2020-02-06

Chemical mechanical polish slurry and method of manufacture

 #754
20200040256
2020-02-06

Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topography

 #755
20200040221
2020-02-06

Compositions for use in chemical mechanical polishing

 #756
20200032108
2020-01-30

Chemical mechanical planarization of films comprising elemental silicon

 #757
20200032107
2020-01-30

Metal chemical mechanical planarization (CMP) composition and methods therefore

 #758
20200032106
2020-01-30

Polishing liquid, polishing liquid set, and polishing method

 #759
20200032105
2020-01-30

Materials and methods for chemical mechanical polishing of ruthenium-containing materials

 #760
20200032104
2020-01-30

Method for polishing glass substrate, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, method for manufacturing magnetic disk, polishing liquid, and method for reducing cerium oxide

 #761
20200030934
2020-01-30

Fabrication of a polishing pad for chemical mechanical polishing

 #762
20200024515
2020-01-23

Tungsten chemical mechanical polishing for reduced oxide erosion

 #763
20200024484
2020-01-23

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE, METHOD FOR MANUFACTURING THE POLISHING AGENT, AND METHOD FOR POLISHING SYNTHETIC QUARTZ GLASS SUBSTRATE

 #764
20200024483
2020-01-23

AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF PRODUCING THE SAME

 #765
20200024482
2020-01-23

Polishing slurry, method of manufacturing the same, and method of manufacturing semiconductor device

 #766
20200024481
2020-01-23

POLISHING LIQUID COMPOSITION

 #767
20200017719
2020-01-16

COMPOSITION FOR SURFACE TREATMENT, METHOD FOR PRODUCING THE SAME, SURFACE TREATMENT METHOD USING COMPOSITION FOR SURFACE TREATMENT, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

 #768
20200017718
2020-01-16

Polishing agent, stock solution for polishing agent, and polishing method

 #769
20200017717
2020-01-16

CERIUM OXIDE ABRASIVE GRAINS

 #770
20200017716
2020-01-16

Chemical-mechanical polishing solution having high silicon nitride selectivity

 #771
20200017715
2020-01-16

Chemical mechanical polishing method for tungsten

 #772
20200016721
2020-01-16

SLURRY AND POLISHING METHOD

 #773
20200010727
2020-01-09

INTERMEDIATE POLISHING COMPOSITION FOR SILICON SUBSTRATE AND POLISHING COMPOSITION SET FOR SILICON SUBSTRATE

 #774
20200010726
2020-01-09

Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten

 #775
20200002575
2020-01-02

Calcium carbonate slurry

 #776
20200002574
2020-01-02

Low oxide trench dishing chemical mechanical polishing

 #777
20200002573
2020-01-02

Polishing slurry composition

 #778
20190382619
2019-12-19

Tungsten Chemical Mechanical Polishing Compositions

 #779
20190382618
2019-12-19

HYDROXYL FULLERENE DISPERSION, METHOD OF PREPARING THE SAME, POLISHING SLURRY INCLUDING THE SAME, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

 #780
20190367777
2019-12-05

Polishing composition

 #781
20190367776
2019-12-05

Polishing liquid and polishing method

 #782
20190367775
2019-12-05

POLISHING SLURRY COMPOSITION

 #783
20190367774
2019-12-05

Composition and method for polishing memory hard disks exhibiting reduced edge roll off

 #784
20190359868
2019-11-28

Composite particles, method of refining and use thereof

 #785
20190359858
2019-11-28

Polishing compositions containing charged abrasive

 #786
20190359857
2019-11-28

Polishing compositions containing charged abrasive

 #787
20190359856
2019-11-28

Polishing composition

 #788
20190359855
2019-11-28

Altering shear thickening in fumed silica suspensions using nanoparticles

 #789
20190352537
2019-11-21

Polishing liquid and polishing method

 #790
20190352536
2019-11-21

Polishing composition

 #791
20190352535
2019-11-21

Chemical Mechanical Polishing Tungsten Buffing Slurries

 #792
20190345364
2019-11-14

Chemical mechanical polishing method for tungsten

 #793
20190345363
2019-11-14

Chemical mechanical polishing method for tungsten

 #794
20190344395
2019-11-14

Optical surface polishing

 #795
20190338174
2019-11-07

Fluid synthesis system

 #796
20190338163
2019-11-07

Chemical mechanical polishing method for tungsten

 #797
20190322899
2019-10-24

CERIUM OXIDE ABRASIVE GRAINS

 #798
20190322898
2019-10-24

Finishing Mediums And Finishing Suspensions

 #799
20190318962
2019-10-17

Modulating metal interconnect surface topography

 #800
20190316003
2019-10-17

SLURRY COMPOSITION FOR POLISHING HIGH STEPPED REGION

 #801
20190309191
2019-10-10

MODIFIED COLLOIDAL SILICA AND METHOD FOR PRODUCING THE SAME, AND POLISHING AGENT USING THE SAME

 #802
20190309190
2019-10-10

Modified colloidal silica and method for producing the same, and polishing agent using the same

 #803
20190308301
2019-10-10

Method for surface treatment, use of an additive and surface treatment agent

 #804
20190301028
2019-10-03

COMPOSITION FOR SURFACE TREATMENT, AND METHOD FOR SURFACE TREATMENT AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE USING THE SAME

 #805
20190300751
2019-10-03

Method for producing polishing composition and polishing method

 #806
20190300750
2019-10-03

Bulk ruthenium chemical mechanical polishing composition

 #807
20190300749
2019-10-03

Barrier ruthenium chemical mechanical polishing slurry

 #808
20190292409
2019-09-26

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT BOARD

 #809
20190292408
2019-09-26

CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT BOARD

 #810
20190292407
2019-09-26

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND POLISHING METHOD

 #811
20190292406
2019-09-26

Polishing slurry and method of polishing substrate by using the polishing slurry

 #812
20190292405
2019-09-26

SLURRIES FOR CHEMICAL MECHANICAL POLISHING OF COBALT CONTAINING SUBSTRATES

 #813
20190284435
2019-09-19

Polishing composition and method of polishing a substrate having enhanced defect inhibition

 #814
20190284434
2019-09-19

CMP compositions containing polymer complexes and agents for STI applications

 #815
20190276706
2019-09-12

Polishing composition

 #816
20190270914
2019-09-05

FUMED SILICA AND METHOD FOR PRODUCING THE SAME

 #817
20190270913
2019-09-05

POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING

 #818
20190256742
2019-08-22

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND POLISHING METHOD

 #819
20190256741
2019-08-22

CMP POLISHING SOLUTION AND POLISHING METHOD

 #820
20190249122
2019-08-15

RINSING AGENT COMPOSITION FOR SILICON WAFERS

 #821
20190248668
2019-08-15

Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion

 #822
20190245141
2019-08-08

CMP stop layer and sacrifice layer for high yield small size MRAM devices

 #823
20190241783
2019-08-08

COMPOSITION AND METHOD FOR POLISHING SILICON CARBIDE

 #824
20190241766
2019-08-08

POLISHING LIQUID COMPOSITION

 #825
20190240802
2019-08-08

Piezo-electric end-pointing for 3D printed CMP pads

 #826
20190233678
2019-08-01

Method for producing cationically modified silica, cationically modified silica dispersion, method for producing polishing composition using cationically modified silica, and polishing composition using cationically modified silica

 #827
20190225836
2019-07-25

Polishing composition, method for producing polishing composition, and polishing method

 #828
20190211245
2019-07-11

SURFACE-MODIFIED COLLOIDAL CERIA ABRASIVE PARTICLES, PREPARATION METHOD THEREFOR, AND POLISHING SLURRY COMPOSITION CONTAINING SAME

 #829
20190211228
2019-07-11

TUNGSTEN BULK POLISHING METHOD WITH IMPROVED TOPOGRAPHY

 #830
20190211227
2019-07-11

Tungsten buff polishing compositions with improved topography

 #831
20190203073
2019-07-04

Method of selectively removing tungsten over silicon oxide

 #832
20190189460
2019-06-20

Method for polishing silicon wafer and surface treatment composition

 #833
20190185716
2019-06-20

Self-stopping polishing composition and method for bulk oxide planarization

 #834
20190185715
2019-06-20

POLISHING LIQUID FOR CMP AND PREPARATION METHOD AND USE THEREOF

 #835
20190185714
2019-06-20

Aqueous compositions of low dishing silica particles for polysilicon polishing

 #836
20190185713
2019-06-20

CMP SLURRY COMPOSITIONS CONTAINING SILICA WITH TRIMETHYLSULFOXONIUM CATIONS

 #837
20190172720
2019-06-06

Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate

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20190164778
2019-05-30

Chemical mechanical polishing slurry composition and method for manufacturing semiconductor using the same

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20190161645
2019-05-30

Chemical mechanical polishing slurry composition for polishing polycrystalline silicon film

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20190161644
2019-05-30

Slurry composition for polishing and method for polishing semiconductor thin film with steps of a high aspect ratio

 #841
20190153279
2019-05-23

Silica-based composite fine particle dispersion and method for manufacturing same

 #842
20190153278
2019-05-23

Polishing method and polishing composition

 #843
20190153264
2019-05-23

Composition for conducting material removal operations and method for forming same

 #844
20190153263
2019-05-23

Abrasive, polishing composition, and polishing method

 #845
20190153262
2019-05-23

COMPOSITION AND METHOD FOR POLISHING MEMORY HARD DISKS EXHIBITING REDUCED SURFACE SCRATCHING

 #846
20190148414
2019-05-16

Display device

 #847
20190145010
2019-05-16

Chemical processing of additive manufactured workpieces

 #848
20190144728
2019-05-16

Polishing composition

 #849
20190136089
2019-05-09

Polishing agent, polishing method, and liquid additive for polishing

 #850
20190127607
2019-05-02

Composite Particles, Method of Refining and Use Thereof

 #851
20190127230
2019-05-02

Method for producing cationically modified silica and cationically modified silica dispersion

 #852
20190119525
2019-04-25

Composition for conducting material removal operations and method for forming same

 #853
20190119524
2019-04-25

Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate

 #854
20190119523
2019-04-25

POLISHING COMPOSITION, METHOD FOR PRODUCING SAME, AND MAGNETIC POLISHING METHOD

 #855
20190112506
2019-04-18

Polishing composition

 #856
20190112505
2019-04-18

Polishing composition

 #857
20190112504
2019-04-18

Anti-corrosion polishing composition

 #858
20190112196
2019-04-18

CATION-MODIFIED SILICA RAW MATERIAL DISPERSION

 #859
20190106596
2019-04-11

Polishing compositions containing charged abrasive

 #860
20190105620
2019-04-11

Fluid processing systems including a plurality of material tanks, at least one mixing tank, at least one holding tank, and recirculation loops

 #861
20190100678
2019-04-04

Metal compound chemically anchored colloidal particles and methods of production and use thereof

 #862
20190100677
2019-04-04

Surface treated abrasive particles for tungsten buff applications

 #863
20190099853
2019-04-04

Chemical mechanical polishing composition and method

 #864
20190096761
2019-03-28

Method for reducing metal plug corrosion and device

 #865
20190092975
2019-03-28

POLISHING COMPOSITION, PRODUCTION METHOD OF POLISHING COMPOSITION, POLISHING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR SUBSTRATE

 #866
20190092974
2019-03-28

Polishing composition, method for producing polishing composition, polishing method, and method for producing semiconductor substrate

 #867
20190092973
2019-03-28

Aqueous silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of using them

 #868
20190092972
2019-03-28

Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using them

 #869
20190092971
2019-03-28

Aqueous anionic functional silica slurry and amine carboxylic acid compositions for selective nitride removal in polishing and methods of using them

 #870
20190092970
2019-03-28

Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them

 #871
20190085210
2019-03-21

Production method of polishing composition

 #872
20190085209
2019-03-21

COMPOSITION FOR TUNGSTEN CMP

 #873
20190085208
2019-03-21

POLISHING COMPOSITION, METHOD FOR PRODUCING SAME, POLISHING METHOD, AND METHOD FOR PRODUCING SUBSTRATE

 #874
20190085207
2019-03-21

POLISHING COMPOSITION FOR OBJECT TO BE POLISHED HAVING METAL-CONTAINING LAYER

 #875
20190085206
2019-03-21

Chemical mechanical polishing method for cobalt

 #876
20190085205
2019-03-21

NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS

 #877
20190080927
2019-03-14

Polishing method, and polishing composition and method for producing the same

 #878
20190077994
2019-03-14

Polishing slurry composition

 #879
20190077993
2019-03-14

POLISHING SLURRY COMPOSITION

 #880
20190077992
2019-03-14

Polishing composition, method for producing polishing composition and polishing composition preparation kit

 #881
20190077991
2019-03-14

POLISHING COMPOSITION AND POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING POLISHING-COMPLETED OBJECT TO BE POLISHED USING SAME

 #882
20190071588
2019-03-07

Polishing composition, polishing method, and method for manufacturing semiconductor substrate

 #883
20190067092
2019-02-28

Modulating metal interconnect surface topography

 #884
20190062598
2019-02-28

Stop-On Silicon Containing Layer Additive

 #885
20190062597
2019-02-28

Metal chemical mechanical planarization (CMP) composition and methods therefore

 #886
20190062596
2019-02-28

Chemical mechanical polishing method

 #887
20190062595
2019-02-28

Polishing composition and polishing method using same

 #888
20190062594
2019-02-28

CHEMICAL MECHANICAL POLISHING SLURRY AND APPLICATION THEREOF

 #889
20190062593
2019-02-28

Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them

 #890
20190061095
2019-02-28

Method for polishing silicon substrate and polishing composition set

 #891
20190057877
2019-02-21

Method of chemical mechanical polishing a semiconductor substrate

 #892
20190055431
2019-02-21

Polishing compositions and methods of use thereof

 #893
20190055430
2019-02-21

Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications

 #894
20190051537
2019-02-14

Chemical mechanical polishing method for tungsten

 #895
20190035675
2019-01-31

Polishing slurries for polishing semiconductor wafers

 #896
20190031919
2019-01-31

POLISHING COMPOSITION

 #897
20190023944
2019-01-24

Method of chemical mechanical polishing a substrate

 #898
20190022821
2019-01-24

Method for polishing silicon substrate and polishing composition set

 #899
20190016999
2019-01-17

Cleaning composition

 #900
20190015947
2019-01-17

POLISHING COMPOSITION AND METHOD FOR POLISHING SILICON SUBSTRATE