103462 ⎘
Polishing compositions containing abrasives or grinding agents
Polishing slurry and polishing material
#902Polishing composition for magnetic disk substrate
#903POLISHING COMPOSITION
#904Hard abrasive particle-free polishing of hard materials
#905POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE
#906BUFFERED CMP POLISHING SOLUTION
#907METHOD FOR POLISHING A PHOSPHATE GLASS OR A FLUOROPHOSPHATE GLASS SUBSTRATE
#908Biased pulse CMP groove pattern
#909Controlled residence CMP polishing method
#910Uniform CMP polishing method
#911Organic film CMP slurry composition and polishing method using same
#912CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
#913Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
#914Chemical mechanical polishing apparatus, slurry, and method of using the same
#915Slurry compositions for polishing a metal layer and methods for fabricating semiconductor devices using the same
#916Polishing composition, method for producing same, and polishing method
#917Chemical mechanical polishing slurry for cobalt applications
#918Abrasive slurry regeneration method
#919Chemical mechanical polishing apparatus
#920Methods for processing semiconductor wafers having a polycrystalline finish
#921Method for post chemical mechanical polishing clean
#922Abrasive, abrasive set, and method for polishing substrate
#923METAL LAPPING COMPOUND FOR THE LAPPING OF GEARS
#924Polishing composition
#925Polishing composition
#926Chemical-mechanical processing slurry and methods for processing a nickel substrate surface
#927Chemical-mechanical processing slurry and methods
#928Methods of Polishing
#929Methods and compositions for processing dielectric substrate
#930Cerium-based abrasive material and process for producing same
#931System for chemical mechanical polishing of Ge-based materials and devices
#932Polishing composition
#933Slurry composition for chemical mechanical polishing
#934Polishing compositions and methods of use thereof
#935Slurry for polishing of integrated circuit packaging
#936Silicon carbide substrate
#937Polishing composition for magnetic disk substrate
#938POLISHING COMPOSITION USING AMINO ACIDS
#939Polishing composition
#940Polishing liquid, polishing liquid set, and substrate polishing method
#941Sintered vitrified superfinishing grindstone
#942Polishing method
#943Polishing slurry for cobalt-containing substrate
#944SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND SUBSTRATE
#945Slurry, polishing fluid set, polishing fluid, and substrate polishing method using same
#946Method for polishing cobalt-containing substrate
#947Polishing composition and polishing method using same
#948Self-stopping polishing composition and method for bulk oxide planarization
#949Chemical Mechanical Planarization of Films Comprising Elemental Silicon
#950Increased wetting of colloidal silica as a polishing slurry
#951Slurry and Slurry Delivery Technique for Chemical Mechanical Polishing of Copper
#952Slurry composition for CMP and polishing method using same
#953Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates
#954Alumina abrasive particles used for automotive finishing compositions
#955POLISHING COMPOSITION AND POLISHING METHOD
#956Chemical mechanical polishing method for tungsten using polyglycols and polyglycol derivatives
#957Chemical mechanical polishing method for tungsten
#958Polishing composition and method for polishing magnetic disk substrate
#959POLISHING COMPOSITION
#960Resistivity-based calibration of in-situ electromagnetic inductive monitoring
#961Resistivity-based adjustment of measurements from in-situ monitoring
#9623D magnetorheological polishing device and magnetorheological polishing fluid
#963Composition and method for polishing silicon carbide
#964REDUCTION IN LARGE PARTICLE COUNTS IN POLISHING SLURRIES
#965Polishing compositions
#966Polishing agent, storage solution for polishing agent and polishing method
#967Silica particle dispersion and production method of the same
#968Indium phosphide smoothing and chemical mechanical planarization processes
#969Silica-based polishing particle and abrasive
#970Chemical mechanical polishing device and chemical mechanical polishing method
#971POLISHING COMPOSITIONS WITH IMPROVED LOW TEMPERATURE PROPERTIES
#972SOFT POLYMER-BASED MATERIAL POLISHING MEDIA
#973Silica-based polishing particle and abrasive
#974Buffered slurry formulation for cobalt CMP
#975Slurry composition and additives and method for polishing organic polymer-based ophthalmic substrates
#976Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method
#977Display device and manufacturing method thereof
#978Slurry, polishing liquid set, polishing liquid, method for polishing substrate, and substrate
#979CMP compositions selective for oxide and nitride with improved dishing and pattern selectivity
#980Silica-based composite fine-particle dispersion, method for producing same, and polishing slurry including silica-based composite fine-particle dispersion
#981Elevated temperature CMP compositions and methods for use thereof
#982CMP POLISHING COMPOSITION COMPRISING POSITIVE AND NEGATIVE SILICA PARTICLES
#983Chemical mechanical planarization slurry and method for forming same
#984TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND CLEANING METHOD
#985NANOSHEET COMPOSITIONS AND THEIR USE IN LUBRICANTS AND POLISHING SLURRIES
#986Reduction in large particle counts in polishing slurries
#987Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
#988Polishing agent, polishing method, and liquid additive for polishing
#989DIAMOND-BASED SLURRIES WITH IMPROVED SAPPHIRE REMOVAL RATE AND SURFACE ROUGHNESS
#990Polishing composition for silicon wafer and polishing method
#991Polishing composition for magnetic disc substrate
#992Polishing composition
#993POLISHING COMPOSITION AND POLISHING METHOD
#994Polishing agent, stock solution for polishing agent, and polishing method
#995METHOD FOR POLISHING SILICON WAFER AND SURFACE TREATMENT COMPOSITION
#996POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING HARD BRITTLE MATERIAL SUBSTRATE
#997POLISHING COMPOSITION
#998Alternative oxidizing agents for cobalt CMP
#999Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
#1000Composition for chemical mechanical polishing and method for reducing chemical mechanical polishing surface defects
#1001Additives for barrier chemical mechanical planarization
#1002Composition and Method Used for Chemical Mechanical Planarization of Metals
#1003Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium
#1004Polishing composition comprising an amine-containing surfactant
#1005Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
#1006Chemical mechanical polishing (CMP) of cobalt-containing substrate
#1007Modified colloidal silica and method for producing the same, and polishing agent using the same
#1008Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates
#1009Method for preparing an aluminum oxide polishing solution
#1010POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING CERAMIC COMPONENT
#1011Polishing composition, polishing method, and method for manufacturing ceramic component
#1012Abrasive composition
#1013POLYDISPERSE LARGE-PARTICLE-SIZE SILICA SOL AND METHOD OF PREPARING THE SAME
#1014Chemical-mechanical processing slurry and methods for processing a nickel substrate surface
#1015POLISHING COMPOSITION
#1016Chemical mechanical polishing slurry, method for chemical mechanical polishing and manufacturing method of semiconductor structure
#1017Silicon carbide substrate, method for producing same, and method for manufacturing silicon carbide semiconductor device
#1018CMP slurry composition for polishing copper and polishing method using the same
#1019Semiconductor treatment composition and treatment method
#1020Polishing composition
#1021Polishing composition for magnetic disc substrate
#1022Polishing method and polishing composition
#1023Polishing composition and polishing method
#1024NANOPARTICLE BASED CERIUM OXIDE SLURRIES
#1025POLISHING COMPOSITION, METHOD FOR MANUFACTURING SAME, AND POLISHING METHOD
#1026Polishing composition for silicon oxide film
#1027Composite particles, method of refining and use thereof
#1028CMP polishing agent, manufacturing method thereof, and method for polishing substrate
#1029POLISHING COMPOSITION
#1030CMP slurry composition for polishing copper line and polishing method using same
#1031POLISHING SLURRY FOR CMP AND POLISHING METHOD
#1032Abrasives, polishing composition, and polishing method
#1033Cobalt polishing accelerators
#1034Advanced fluid processing methods and systems
#1035Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures
#1036Silicon wafer polishing composition
#1037SLURRY COMPOSITION, USE THEREOF, AND POLISHING METHOD
#1038Polishing composition
#1039POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHING COMPOSITION
#1040Method of polishing group III-V materials
#1041Chemical-mechanical polishing composition comprising organic/inorganic composite particles
#1042POLISHING SOLUTIONS AND METHODS OF USING SAME
#1043Germanium smoothing and chemical mechanical planarization processes
#1044COMPOSITION FOR POLISHING TITANIUM ALLOY MATERIAL
#1045METHOD FOR POLISHING GERMANIUM WAFER
#1046Method and device for dispensing solid compound pastes for surface processing, and related surface processing method and system
#1047Final polishing method of silicon wafer and silicon wafer
#1048CMP POLISHING LIQUID, AND POLISHING METHOD
#1049Polishing composition comprising cationic polymer additive
#1050Method of fabricating integrated circuit device by using slurry composition
#1051Slurry composition and method of use
#1052Polishing liquid for CMP, polishing liquid set for CMP, and polishing method
#1053METHOD OF POLISHING A LOW-K SUBSTRATE
#1054Tungsten processing slurry with catalyst
#1055CMP processing composition comprising alkylamine and cyclodextrin
#1056Abrasive particle-dispersion layer composite and polishing slurry composition including the same
#1057Additive composition and positive polishing slurry composition including the same
#1058POLISHING SLURRY COMPOSITION
#1059Polishing composition and polishing method
#1060Polishing composition
#1061Polishing composition
#1062Abrasive particle-dispersion layer composite and polishing slurry composition including the same
#1063CMP slurry composition for metal wiring and polishing method using the same
#1064CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A POLY(AMINOACID)
#1065CMP slurry solution for hardened fluid material
#1066Method of controlling selectivity using composition for polishing silicon nitride
#1067Halite salts as silicon carbide etchants for enhancing CMP material removal rate for SiC wafer
#1068CMP polishing liquid and polishing method
#1069Metal doped cerium oxide compositions
#1070Polishing slurry for silicon, method of polishing polysilicon and method of manufacturing a thin film transistor substrate
#1071Slurry for polishing phase-change materials and method for producing a phase-change device using same
#1072Polishing composition and polishing method using the same
#1073MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SLURRY FOR CHEMICAL MECHANICAL POLISHING
#1074POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE POLISHING LIQUID
#1075Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
#1076Abrasive material
#1077Tungsten-processing slurry with cationic surfactant
#1078Tungsten-processing slurry with cationic surfactant and cyclodextrin
#1079Germanium smoothing and chemical mechanical planarization processes
#1080Group III arsenide material smoothing and chemical mechanical planarization processes
#1081Indium phosphide smoothing and chemical mechanical planarization processes
#1082Slurry compounds and methods of fabricating semiconductor devices using the same
#1083Slurry composition for chemical mechanical polishing, method of preparing the same, and polishing method using the same
#1084Processing of alumina
#1085Method for polishing GaN single crystal material
#1086Slurry composition for chemical mechanical polishing of GE-based materials and devices
#1087Polishing composition, polishing method, and method for producing polishing composition
#1088Stop-on silicon containing layer additive
#1089Composition for polishing silicon wafers
#1090POLISHING COMPOSITION
#1091Polishing composition, polishing method, and method for producing substrate
#1092Method of chemical mechanical polishing of alumina
#1093METHODS AND COMPOSITIONS FOR PROCESSING DIELECTRIC SUBSTRATE
#1094Selective nitride slurries with improved stability and improved polishing characteristics
#1095Semiconductor substrate polishing methods and slurries and methods for manufacturing silicon on insulator structures
#1096Polishing composition and method utilizing abrasive particles treated with an aminosilane
#1097Method for preparing slurry composition and slurry composition prepared thereby
#1098Polishing composition containing ceria abrasive
#1099Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid
#1100CMP polishing agent, method for manufacturing thereof, and method for polishing substrate
#1101Slurry composition and method for polishing substrate
#1102Polishing compositions and methods of manufacturing semiconductor devices using the same
#1103POLISHING COMPOSITION FOR HARD MATERIALS
#1104Polishing slurry composition
#1105Polishing composition and method for polishing magnetic disk substrate
#1106Polishing composition and method for polishing magnetic disk substrate
#1107Methods and compositions for processing dielectric substrate
#1108Slurry composition for polishing tungsten
#1109Polishing agent and method for polishing substrate using the polishing agent
#1110Polishing composition
#1111Abrasive particles, polishing slurry and method of fabricating abrasive particles
#1112Method for preparing recycled abrasive slurry
#1113Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives
#1114Chemical mechanical polishing slurry
#1115Chemical mechanical polishing method using slurry composition containing N-oxide compound
#1116Polishing abrasive particle, production method therefore, polishing method, polishing device, and slurry
#1117Metal oxide-polymer composite particles for chemical mechanical planarization
#1118Abrasive, abrasive set, and method for polishing substrate
#1119Low dishing copper chemical mechanical planarization
#1120Liquid suspension of cerium oxide particles
#1121In Situ Formation of Stable Aqueous, Semi-Aqueous or Non-Aqueous Slurry Suspensions of Gelatinous Particles for Separating and Suspending Inert and Abrasive Particles in a Carrier Medium
#1122CHEMICAL MACHNICAL POLISHING SLURRY
#1123Polishing composition
#1124Compositions comprising silane modified metal oxides
#1125CMP composition and method for polishing rigid disks
#1126POLISHING COMPOSITION
#1127Method of preparing a monocrystalline diamond abrasive grain
#1128RASPBERRY-TYPE METAL OXIDE NANOSTRUCTURES COATED WITH CEO2 NANOPARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION (CMP)
#1129Metal compound chemically anchored colloidal particles and methods of production and use thereof
#1130Slurry, polishing solution set, polishing solution, and substrate polishing method
#1131Polishing slurry and substrate polishing method using the same
#1132Polishing composition, method for producing polishing composition and polishing composition preparation kit
#1133Polishing composition containing ceria abrasive
#1134Polishing composition containing ceria particles and method of use
#1135POLISHING COMPOSITION AND POLISHING PROCESSING METHOD USING SAME
#1136Polishing composition containing cationic polymer additive
#1137Polishing slurry and method of polishing substrate using the same
#1138Metal film polishing slurry composition, and method for reducing scratches generated when polishing metal film by using same
#1139Composition and method for polishing memory hard disks exhibiting reduced edge roll-off
#1140Polishing agent, polishing method and method for manufacturing semiconductor integrated circuit device
#1141Dishing reducing in tungsten chemical mechanical polishing
#1142Multi-layered polishing pads
#1143CMP composition for silicon nitride removal
#1144Polishing agent, polishing method, and liquid additive for polishing
#1145Slurry, polishing-liquid set, polishing liquid, method for polishing substrate, and substrate
#1146Composite ceramic abrasive polishing solution
#1147Method for manufacturing glass substrate and method for manufacturing magnetic disk
#1148Polishing composition and method for producing same
#1149POLISHING COMPOSITION
#1150Polishing composition
#1151Composite abrasive particles for chemical mechanical planarization composition and method of use thereof
#1152Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors
#1153Polishing Material, Polishing Material Slurry
#1154Polishing material particles, method for producing polishing material, and polishing processing method
#1155Polishing compositions and methods for polishing cobalt films
#1156Method for producing polished object and polishing composition kit
#1157Polishing composition
#1158Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
#1159CMP compositions exhibiting reduced dishing in STI wafer polishing
#1160CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA
#1161Removal of defects by in-situ etching during chemical-mechanical polishing processing
#1162Kit for polishing sapphire surfaces
#1163SLURRY COMPOSITIONS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES USING THE SAME
#1164Polishing liquid for CMP, and polishing method
#1165SLURRY COMPOUNDS AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES USING THE SAME
#1166Polishing Composition and Polishing Method
#1167SILICON WAFER POLISHING COMPOSITION
#1168Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor
#1169Cobalt polishing accelerators
#1170Slurry for chemical mechanical polishing of cobalt
#1171Cobalt dishing control agents
#1172Corrosion inhibitors and related compositions and methods
#1173CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME
#1174Nickel phosphorous CMP compositions and methods
#1175Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material
#1176Chemical mechanical planarization slurry composition comprising composite particles, process for removing material using said composition, CMP polishing pad and process for preparing said composition
#1177Composition for tungsten CMP
#1178CMP POLISHING SOLUTION AND POLISHING METHOD USING SAME
#1179Composition and method used for chemical mechanical planarization of metals
#1180Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films
#1181Slurry composition for chemical mechanical polishing of Ge-based materials and devices
#1182Chemical-mechanical polishing compositions comprising polyethylene imine
#1183Organic Film CMP Slurry Composition and Polishing Method Using Same
#1184Polishing compositions and methods for polishing cobalt films
#1185Polishing of hard substrates with soft-core composite particles
#1186COMPOSITION AND METHOD FOR POLISHING A SAPPHIRE SURFACE
#1187Methods of forming earth-boring tools
#1188Reduction in large particle counts in polishing slurries
#1189Etching liquid, etching method, and method of manufacturing solder bump
#1190Abrasive, abrasive set, and method for abrading substrate
#1191Slurry for Selective Chemical Mechanical Polishing of Copper
#1192Chemical mechanical polishing of alumina
#1193Method for chemical mechanical polishing substrates containing ruthenium and copper
#1194Chemical mechanical polishing (CMP) of cobalt-containing substrate
#1195Methods of manufacturing abrasive particle and polishing slurry
#1196CMP slurry composition for polishing copper, and polishing method using same
#1197CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
#1198CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING N,N,N',N'-TETRAKIS-(2-HYDROXYPROPYL)-ETHYLENEDIAMINE OR METHANESULFONIC ACID
#1199Polishing composition
#1200Nano-diamond dispersion solution and method for preparing same