Pre-conditioned chamber components

COBALT OXIDE- ANTIMONY TIN OXIDE (COO-ATO) ANTI-REFLECTING COATING

MOLYBDENUM CONTAINING TARGETS

SHIELDED SPUTTER DEPOSITION APPARATUS AND METHOD

SHIELDED SPUTTER DEPOSITION APPARATUS AND METHOD

Film forming apparatus and film forming method using the same

High performance solid lubricating titanium amorphous alloy

COBALT OXIDE- ANTIMONY TIN OXIDE (COO-ATO) ANTI-REFLECTING COATING

Deposition system with a multi-cathode

A UNIVERSALLY MOUNTABLE END-BLOCK

CYLINDRICAL SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

Film forming apparatus and film forming method

Method for machining sputtering target, apparatus for machining sputtering target, sputtering target, and method for producing sputtering target product

SHUTTER MECHANISM FOR TARGET, AND FILM-FORMING DEVICE PROVIDED WITH SAME

Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Film-forming apparatus, method for producing film-formed product using same, and cooling panel

VACUUM DEVICE AND METHOD FOR COATING COMPONENTS OF A VACUUM DEVICE

Process for producing sputtering target and sputtering target

Resistance-area (RA) control in layers deposited in physical vapor deposition chamber

Oxide sintered material and method of manufacturing the same, sputtering target, and method of manufacturing semiconductor device

APPARATUS AND METHODS FOR REDUCED-ARC SPUTTERING

Shield for a substrate processing chamber

Coated body and method for production of the body

Oxide sintered body and sputtering target

Multi-block sputtering target and associated methods and articles

CUTTING TOOL FOR SPUTTERING TARGET, PROCESSING METHOD OF SPUTTERING TARGET, AND MANUFACTURING METHOD OF SPUTTERING TARGET PRODUCT

Sputtering cathode, sputtering device, and method for producing film-formed body

Heterojunction photovoltaic device and fabrication method

Cathode unit for sputtering apparatus

Coating with solar control properties for a glass substrate

Multifocal magnetron design for physical vapor deposition processing on a single cathode

Substrate processing apparatus

Sliding element for internal combustion engines

Electromagnetic module for physical vapor deposition

SPUTTERING APPARATUS AND METHOD OF MANUFACTURING MAGNETIC MEMORY DEVICE USING THE SAME

Counter electrode material for electrochromic devices

Physical vapor deposition chamber with static magnet assembly and methods of sputtering

Sputtering target capable of stabilizing ignition

Oxide sintered body and transparent conductive oxide film

Sputtering targets and devices including Mo, Nb, and Ta, and methods

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Counter electrode for electrochromic devices

Process for making composite product by plating alloy film on carbon fiber core

THIN FILM OF METAL OXIDE, ORGANIC ELECTROLUMINESCENT DEVICE INCLUDING THIN FILM, PHOTOVOLTAIC CELL INCLUDING THIN FILM, AND MANUFACTURING METHOD OF THIN FILM

Physical vapor deposition processing systems target cooling

Physical vapor deposition chamber particle reduction apparatus and methods

Semiconductor memory device and semiconductor memory manufacturing apparatus

INVERTED MAGNETRON FOR PROCESSING OF THIN FILM MATERIALS

Cylindrical target production method and cylindrical target

SPUTTERING TARGET WITH MICRO CHANNELS

LITHIUM SPUTTER TARGETS

Cathode assembly having a dual position magnetron and centrally fed coolant

Apparatus and method for film formation by physical sputtering

Target structure of physical vapor deposition

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Film-forming apparatus and film-forming method

Process kit for multi-cathode processing chamber

Sputtering target with backside cooling grooves

Systems and methods for low resistivity physical vapor deposition of a tungsten film

Methods, Systems, and Apparatus for Fabricating a Physical Vapor Deposition Manrel-Target Assembly

Process for producing sputtering target and sputtering target

Substrate bearing assembly and magnetron sputtering device

Profiled sputtering target and method of making the same

Process for producing sputtering target and sputtering target

Plasma chamber target for reducing defects in workpiece during dielectric sputtering

Sputtering target

Sputtering target-backing plate assembly and production method thereof

Reactive sputter deposition of dielectric films

SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME

Sintered compact magnesium oxide target for sputtering, and method for producing same

Fabrication of low defectivity electrochromic devices

Processes for low pressure, cold bonding of solid lithium to metal substrates

ALUMINUM SPUTTERING TARGET

Powder coating apparatus

Physical vapor deposition processing systems target cooling

Sputtering target having RFID information

Sputtering apparatus and target changing device thereof

Fabrication of low defectivity electrochromic devices

COOLING AND UTILIZATION OPTIMIZATION OF HEAT SENSITIVE BONDED METAL TARGETS

Multi-block sputtering target and associated methods and articles

Functionally graded material by in-situ gradient alloy sputter deposition management

Molybdenum containing targets

Sputter trap having multimodal particle size distribution

SPUTTERING CATHODE, SPUTTERING DEVICE, AND METHOD FOR PRODUCING FILM-FORMED BODY

Magnetron Sputtering Apparatus

Sputtering target

Connector piece for a tubular target

Electromagnet device, electromagnet controller, electromagnet control method, and electromagnet system

High strength aluminum alloy backing plate and methods of making

Sputtering showerhead

METHOD OF PRODUCING HIGH-PURITY ERBIUM

FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES

Molybdenum containing targets

Cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact

PERISHABLE ELEMENT FOR PARTICLE BOMBARDMENT, SET OF DEVICES FOR PARTICLE BOMBARDMENT AND PERISHABLE ELEMENT AND METHOD FOR DETERMINING THE ETCHING PATTERN VIA PARTICLE BOMBARDMENT OF A TARGET

Oxide sintered compact and sputtering target formed from said oxide sintered compact

Apparatus for processing long base material by roll-to-roll method and film forming apparatus using the same

Chalcogenide sputtering target and method of making the same

Contact type power feeding apparatus

Fe-Pt-BASED SPUTTERING TARGET WITH DISPERSED C GRAINS

SPUTTERING TARGET HAVING REVERSE BOWNG TARGET GEOMETRY

FABRICATION METHOD OF STRONTIUM NIOBIUM OXYNITRIDE FILM HAVING SMALL CARRIER DENSITY AND ITS USE

Rotary cathode unit for magnetron sputtering apparatus

Thin film plasmonic solar cell

Sputtering target with backside cooling grooves

MAGNETRON PLASMA APPARATUS

DEPOSITION RING AND ELECTROSTATIC CHUCK FOR PHYSICAL VAPOR DEPOSITION CHAMBER

Film forming apparatus

Counter electrode for electrochromic devices

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

Laterally adjustable return path magnet assembly and methods

Sputtering apparatus, sputtering target, and method for forming semiconductor film with the sputtering apparatus

Sputtering target for PVD chamber

Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target

Sputter target and sputtering methods

Upright target structure and sputtering equipment

Lithium sputter targets

Coating liquid for forming planarization film and metal foil coil with planarization film

IMPLANT FOR USE IN THE CARDIOVASCULAR SYSTEM

Method for manufacturing a resistive device for a memory or logic circuit

Deposition method and method for manufacturing semiconductor device

Fabrication of low defectivity electrochromic devices

Composite high index layers for anti reflective stacks

TARGET SPUTTERING DEVICE AND METHOD FOR SPUTTERING TARGET

DC magnetron sputtering

Sputtering target for forming magnetic recording film and method for producing same

Piezoelectric ceramic sputtering target, lead-free piezoelectric thin film and piezoelectric thin film element using the same

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Cathode assembly

POLYGON DEPOSITION SOURCES WITH HIGH MATERIALS UTILIZATION AND INCREASED TIME BETWEEN CHAMBER CLEANINGS

Durable 3D geometry conformal anti-reflection coating

Quantum dot color film substrate, manufacturing method thereof and LCD apparatus

Target assembly

Magnetic Spattering Coating Device and Target Device Thereof

Target assembly

Backing plate obtained by diffusion-bonding anticorrosive metal and Mo or Mo alloy, and sputtering target-backing plate assembly provided with said backing plate

Sputter device with moving target

Method of sputtering and sputter system

Target and process for producing a target

THIN FILM OF METAL OXIDE, ORGANIC ELECTROLUMINESCENT DEVICE INCLUDING THIN FILM, PHOTOVOLTAIC CELL INCLUDING THIN FILM, AND MANUFACTURING METHOD OF THIN FILM

CONTOURED TARGET FOR SPUTTERING

Methods and apparatus for processing a substrate

Half mirror, method for manufacturing the same and lighting unit using the same

Surrounding field sputtering source

SPUTTERING SOURCE ARRANGEMENT, SPUTTERING SYSTEM AND METHOD OF MANUFACTURING METAL-COATED PLATE-SHAPED SUBSTRATES

Method for producing a pH half-cell, and a pH half-cell

Roll-to-roll sputtering process with hybrid target and product thereof

Cooling water jet pack for high power rotary cathodes

Sputtering apparatus

OXIDE SINTERED BODY, SPUTTERING TARGET, AND OXIDE SEMICONDUCTOR THIN FILM OBTAINED USING SPUTTERING TARGET

Target material for sputtering and method for manufacturing same

Systems and methods for low resistivity physical vapor deposition of a tungsten film

SPUTTERING APPARATUS

Manufacturing apparatus

Integrated process kit for a substrate processing chamber

RADIO FREQUENCY IDENTIFICATION IN-METAL INSTALLATION AND ISOLATION FOR SPUTTERING TARGET

Coating with solar control properties for a glass substrate

DIFFUSION-BONDED SPUTTER TARGET ASSEMBLY AND METHOD OF MANUFACTURING

SINTERED OXIDE, SPUTTERING TARGET, AND OXIDE SEMICONDUCTOR THIN FILM OBTAINED USING SPUTTERING TARGET

OXIDE SINTERED BODY, SPUTTERING TARGET, AND OXIDE SEMICONDUCTOR THIN FILM OBTAINED USING SPUTTERING TARGET

Silicon sputtering target with special surface treatment and good particle performance and methods of making the same

FILM FORMATION DEVICE AND FILM FORMATION METHOD

Heterojunction photovoltaic device and fabrication method

MAGNETRON PLASMA APPARATUS

Electromagnetic wave shielding thin film, electronic device provided with electromagnetic wave shielding thin film and shielding structure, and method for manufacturing electromagnetic wave shielding thin film

Method and system for producing coated steel components

Film Forming Apparatus and Film Forming Method

Counter electrode for electrochromic devices

Process kit having tall deposition ring and deposition ring clamp

Method for monitoring usage of a physical vapor deposition (PVD) target with an ultrasonic transducer

Silver nanoparticles on conducting electrode as plasmonic scattering nanomaterial and related photovoltaic cells

Sputtering target

End block assembly, bearing assembly, and method for manufacturing a bearing assembly

Deposition ring and electrostatic chuck for physical vapor deposition chamber

AC power connector, sputtering apparatus and method therefor

Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions

Fabrication of low defectivity electrochromic devices

Functionally graded material by in-situ gradient alloy sputter deposition management

Remote Arc Discharge Plasma Assisted Processes

Functionally graded material by in-situ gradient alloy sputter deposition management

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact

Method of manufacturing tunnel magnetoresistive effect element and sputtering apparatus

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

Sputtering apparatus

Physical vapor deposition system and physical vapor depositing method using the same

Sputtering device and maintenance method for sputtering device

SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS

Sputtering target for forming protective film and multilayer wiring film

Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms

Multi-block sputtering target with interface portions and associated methods and articles

Multi-block sputtering target and associated methods and articles

Manufacturing method of cylindrical sputtering target material

Magnetron-sputtering coating system and method, and display substrate

Target preparation

TiSiN layers and their production

Target, adapted to an indirect cooling device, having a cooling plate

Interchangeable magnet pack

Methods of manufacturing large-area sputtering targets using interlocking joints

FORMING MEMORY USING HIGH POWER IMPULSE MAGNETRON SPUTTERING

Deposition mask and method of fabricating the same

Cylindrical sputtering target and process for producing the same

METHOD OF MANUFACTURING MAGNETORESISTIVE MEMORY DEVICE AND MANUFACTURING APPARATUS OF THE SAME

Seamless mold manufacturing method

End block arrangement and socket arrangement

SPUTTERING TARGET AND METHOD OF PRODUCING THIN FILM BY USING SPUTTERING TARGET

METHOD FOR FILLING VIAS AND SUBSTRATE-VIA FILLING VACUUM PROCESSING SYSTEM

Fabrication of low defectivity electrochromic devices

ARC EVAPORATION COATING SOURCE HAVING A PERMANENT MAGNET

Piezoelectric composition, piezoelectric element and sputtering target

DURABLE 3D GEOMETRY CONFORMAL ANTI-REFLECTION COATING

Sputtering target-backing plate assembly

Centering of a plate in a holder both at room temperatures and at higher temperatures

Backing plate-integrated metal sputtering target and method of producing same

Deposition device having cooler with lifting mechanism

Sputtering target having increased power compatibility

Li-containing oxide target assembly

Surface-enhanced raman scattering substrate and manufacturing method thereof

Touch panel, preparing method thereof, and Ag—Pd—Nd alloy for touch panel

ENCAPSULATED COMPOSITE BACKING PLATE

Deposition device and deposition method

Magnet plate assembly, deposition apparatus including the magnet plate assembly, and deposition method using the magnet plate assembly

Production method for transparent conductive film

Cathode assembly, physical vapor deposition system, and method for physical vapor deposition

Holding assembly for substrate processing chamber

Zinc oxide sputtering target

Fixing unit of plate-shaped member, PVD processing apparatus and fixing method of plate-shaped member

Electronic device manufacturing method and sputtering method

Molybdenum containing targets for touch screen device

Physical vapor deposition methods and systems to form semiconductor films using counterbalance magnetic field generators

Methods of manufacturing large-area sputtering targets using interlocking joints

Drum sputtering device

High purity refractory metal powders and their use in sputtering targets which may have random texture

Method for increased target utilization in ion beam deposition tools

Heterojunction photovoltaic device and fabrication method

Electrode, ferroelectric ceramics and manufacturing method thereof

Deposition method and method for manufacturing semiconductor device

Touch screen device comprising Mo-based film layer and methods thereof

Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device

Composite oxide sintered body and oxide transparent conductive film

METHOD OF COATING BY PULSED BIPOLAR SPUTTERING

CHALCOGENIDE-BASED PHOTOVOLTAIC DEVICES AND METHODS OF MANUFACTURING THE SAME

Interchangeable sputter gun head

Diffusion bonded high purity copper sputtering target assemblies

Physical vapor deposition (PVD) target having low friction pads

Apparatus and method for improved darkspace gap design in RF sputtering chamber

Recording layer, information recording medium, and target

Physical vapor deposition tile arrangement and physical vapor deposition arrangement

Sputtering apparatus and recording medium for recording control program thereof

Sputtering apparatus and sputtering method

Fabrication of low defectivity electrochromic devices

Target adapted to an indirect cooling device

Sputtering target with backside cooling grooves

Thin film deposition apparatus, deposition method using the same, and method of manufacturing organic light-emitting display apparatus by using the apparatus

In-vacuum rotational device

SUBSTRATE WITH TRANSPARENT ELECTRODE AND METHOD FOR MANUFACTURING SAME

Gas barrier film

Sputtering target assembly

Oxide sputtering target, thin film transistor using the same, and method for manufacturing thin film transistor

Sputtering target and manufacturing method therefor

Silicon target for sputtering film formation and method for forming silicon-containing thin film

Sputter target and sputtering methods

Silicon sputtering target with special surface treatment and good particle performance and methods of making the same

Magnetron sputtering target and process for producing the same

Sintered compact magnesium oxide target for sputtering, and method for producing same

High purity copper—manganese alloy sputtering target

Sputtering apparatus, target and shield

Processing apparatus and shield

Plating stack to condition a bonding surface

Sputter source for semiconductor process chambers

Processing apparatus and shield

PVD target for self-centering process shield

Sputter source for use in a semiconductor process chamber

Target for PVD sputtering system

Sputtering apparatus

Tantalum Sputtering Target and Method for Manufacturing Same

Cylindrical evaporation source

TUBULAR TARGET AND METHOD OF PRODUCING A TUBULAR TARGET

METHODS AND APPARATUS FOR CONTROLLING DOPANT CONCENTRATION IN THIN FILMS FORMED VIA SPUTTERING DEPOSITION

Forming a memory device using sputtering to deposit silver-selenide film

HIGH-PURITY LANTHANUM, METHOD FOR PRODUCING SAME, SPUTTERING TARGET COMPRISING HIGH-PURITY LANTHANUM, AND METAL GATE FILM COMPRISING HIGH-PURITY LANTHANUM AS MAIN COMPONENT

Hot tile sputtering system

Method for supplying sequential power impulses

Radio-frequency sputtering system with rotary target for fabricating solar cells

Evaporation source

SPUTTERING APPARATUS

SPUTTERING APPARATUS

MgO target for sputtering

Sputtering apparatus and method

Lithium sputter targets

HIGH-PURITY ERBIUM, SPUTTERING TARGET COMPRISING HIGH-PURITY ERBIUM, METAL GATE FILM HAVING HIGH-PURITY ERBIUM AS MAIN COMPONENT THEREOF, AND PRODUCTION METHOD FOR HIGH-PURITY ERBIUM

Copper-Titanium Alloy Sputtering Target, Semiconductor Wiring Line Formed Using the Sputtering Target, and Semiconductor Element and Device Each Equipped with the Semiconductor Wiring Line

Backing plate for a sputter target, sputter target, and sputter device

SPUTTERING TARGET, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR

METHODS FOR DEPOSITING A HOMOGENEOUS FILM VIA SPUTTERING FROM AN INHOMOGENEOUS TARGET

NON-BONDED ROTATABLE TARGETS AND THEIR METHODS OF SPUTTERING

InO—SnO—ZnO sputtering target

SPUTTERING APPARATUS