120139 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes; Coating on selected surface areas, e.g. using masks Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Atomic layer deposition apparatus
#1202High-throughput HDP-CVD processes for advanced gapfill applications
#1203Method for enlarging a nano-structure
#1204MULTILAYER CONTAINERS AND PREFORMS HAVING BARRIER PROPERTIES
#1205Method of forming a carbon layer on a substrate
#1206Machine for the treatment of bottles that are equipped with an interchangeable connection cartridge
#1207Selective sealing of porous dielectric materials
#1208System and method for treating surfaces of components
#1209Inner electrode for barrier film formation and apparatus for film formation
#1210Method of coating gas turbine components
#1211Device for depositing a coating on an internal surface of a container
#1212Method of forming silicon oxide layer
#1213Method for depositing an amorphous carbon film with improved density and step coverage
#1214Manufacturing method for semiconductor device
#1215METHOD OF DEPOSITING SILICON WITH HIGH STEP COVERAGE
#1216Metal (IV) tetra-amidinate compounds and their use in vapor deposition
#1217Apparatus for integration of barrier layer and seed layer
#1218Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes
#1219Controlled growth of gallium nitride nanostructures
#1220Deposition-plasma cure cycle process to enhance film quality of silicon dioxide
#1221Process for Plasma Coating
#1222Holder for holding a metal component part of a turbine
#1223Modified CVD cooling loop
#1224Method of gap-filling using amplitude modulation radio frequency power
#1225METHOD FOR PRODUCING COMPONENTS FOR ROCKET CONSTRUCTION
#1226METHOD AND APPARATUS FOR PHOTO-EXCITATION OF CHEMICALS FOR ATOMIC LAYER DEPOSITION OF DIELECTRIC FILM
#1227PROCESS FURNANCE OR THE LIKE
#1228Gas preheater for chemical vapor processing furnace
#1229Container-treatment method comprising vacuum pumping phases, and machine for implementing same
#1230Gap filling method and method for forming semiconductor memory device using the same
#1231Container-treatment machine comprising controlled gripping means for seizing containers by the neck
#1232Nanowire composite and preparation method thereof
#1233Method for measurement of weight during a CVI/CVD process
#1234Plasma processing apparatus
#1235GAP-FILL DEPOSITIONS IN THE FORMATION OF SILICON CONTAINING DIELECTRIC MATERIALS
#1236Production of elemental films using a boron-containing reducing agent
#1237Methods of using halogen-containing organic compounds to remove deposits from internal surfaces of turbine engine components
#1238Methods and apparatus to monitor a process of depositing a constituent of a multi-constituent gas during production of a composite brake disc
#1239Synthetic resin containers with high gas-barrier property
#1240GAS STORAGE CONTAINER LININGS FORMED WITH CHEMICAL VAPOR DEPOSITION
#1241Methods of forming a phosphorus doped silicon dioxide-comprising layer
#1242Device For Manufacturing DLC Film-Coated Plastic Container
#1243Method for fabricating STI gap fill oxide layer in semiconductor devices
#1244Apparatus for plasma treatment of dielectric bodies
#1245Methods for coating and filling high aspect ratio recessed features
#1246Method and apparatus for strengthening a porous substrate
#1247Microfluidic device having hydrophilic microchannels
#1248Increased stability low concentration gases, products comprising same, and methods of making same
#1249Methods for improving low k FSG film gap-fill characteristics
#1250Direct tailoring of the composition and density of ALD films
#1251Conformal lining layers for damascene metallization
#1252Device for a coating process, a retort, and a process for internal coating
#1253Low stress STI films and methods
#1254Method for coating a substrate
#1255ATOMIC LAYER DEPOSITION PROCESSES FOR RUTHENIUM MATERIALS
#1256Metal plating using seed film
#1257Method for controlling the step coverage of a ruthenium layer on a patterned substrate
#1258Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD
#1259Method of manufacturing semiconductor device includes the step of depositing the capacitor insulating film in a form of a hafnium silicate
#1260Metal plating using seed film
#1261Methods of making shape memory films by chemical vapor deposition and shape memory devices made thereby
#1262Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill
#1263Process for producing metal foams having uniform cell structure
#1264High aspect ratio gap fill application using high density plasma chemical vapor deposition
#1265Method of fabricating trench isolation of semiconductor device
#1266Method of forming non-conformal layers
#1267Support structure for radiative heat transfer
#1268Microwave plasma processing method
#1269Gapfill using deposition-etch sequence
#1270Method for chemical vapor deposition in high aspect ratio spaces
#1271Microwave plasma processing device and plasma processing gas supply member
#1272Non-pressure gradient single cycle CVI/CVD apparatus and method
#1273Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
#1274Chemical vapor deposited film based on a plasma CVD method and method of forming the film
#1275Controlling or modeling a chemical vapor infiltration process for densifying porous substrates with carbon
#1276Plasma processing apparatuses and methods
#1277Deposition methods
#1278Gas delivery device method for improved deposition of dielectric material
#1279Electroless deposition processes and compositions for forming interconnects
#1280In-situ silicidation metallization process
#1281Contact metallization scheme using a barrier layer over a silicide layer
#1282Methods of forming HSG layers and devices
#1283Process sequence for doped silicon fill of deep trenches
#1284Methods of filling openings with oxide, and methods of forming trenched isolation regions
#1285Leading edge components for high speed air and space craft
#1286USE OF ENHANCED TURBOMOLECULAR PUMP FOR GAPFILL DEPOSITION USING HIGH FLOWS OF LOW-MASS FLUENT GAS
#1287Method of forming an interconnect structure
#1288Method of forming a trench structure
#1289High-density plasma (HDP) chemical vapor deposition (CVD) methods and methods of fabricating semiconductor devices employing the same
#1290Low-temperature chemical vapor deposition of low-resistivity ruthenium layers
#1291Vapor aluminide coating gas manifold
#1292Semiconductor device having oxidized metal film and manufacture method of the same
#1293Structure and method for forming semiconductor wiring levels using atomic layer deposition
#1294Methods of forming silicon dioxide layers, and methods of forming trench isolation regions
#1295Apparatus for treating workpieces
#1296Nanoparticle compositions, coatings and articles made therefrom, methods of making and using said compositions, coatings and articles
#1297Method and system for coating internal surfaces using reverse-flow cycling
#1298Method and system for coating sections of internal surfaces
#1299Annular furnace spacers and method of using same
#1300One piece shim
#1301Methods of filling trenches using high-density plasma deposition (HDP)
#1302One piece shim
#1303Method of manufacturing gas barrier film coated plastic container
#1304Method and apparatus for chemical plasma processing of plastic container
#1305In-situ-etch-assisted HDP deposition
#1306Rhodium film and method of formation
#1307Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor
#1308High-throughput HDP-CVD processes for advanced gapfill applications
#1309Method for reducing argon diffusion from high density plasma films
#1310Multi-place coating apparatus and process for plasma coating
#1311Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
#1312Method of forming a metal oxide film and microwave power source device used for the above method
#1313Method of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
#1314Method for forming a metal wiring in a semiconductor device
#1315Process sequence for doped silicon fill of deep trenches
#1316Coating film for inhibiting coke formation in ethylene dichloride pyrolysis cracker and method of producing the same
#1317Internally coated hollow body, coating method and device
#1318Apparatus and method for the treating of workpieces
#1319Method and device for plasma treating workpieces
#1320Magnetic-field concentration in inductively coupled plasma reactors
#1321Gas delivery device for improved deposition of dielectric material
#1322Method and device for microwave plasma deposition of a coating on a thermoplastic container surface
#1323Method of making chemical vapor composites
#1324Methods of forming semiconductor devices having multilayer isolation structures
#1325DLC film coated plastic container, and device and method for manufacturing the plastic container
#1326Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters
#1327Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials
#1328Chemical vapor deposition method
#1329Plasma processing apparatuses and methods
#1330Methods for depositing tungsten layers employing atomic layer deposition techniques
#1331Continuous flow closed-loop rapid liquid-phase densification of a graphitizable carbon-carbon composite
#1332High throughput ILD fill process for high aspect ratio gap fill
#1333Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
#1334Plasma immersion ion implantation reactor having multiple ion shower grids
#1335Method and system for coating internal surfaces of prefabricated process piping in the field
#1336Method and apparatus for treating substrates in a rotary installation
#1337Interconnects forming method and interconnects forming apparatus
#1338Coating process for patterned substrate surfaces
#1339Environmentally friendly plastic container
#1340Method for forming thin film, apparatus for forming thin film, and method for monitoring thin film forming process
#1341High aspect ratio performance coatings for biological microfluidics
#1342Articles of manufacture containing increased stability low concentration gases and methods of making and using the same
#1343Method of depositing low k films
#1344Reactive gases with concentrations of increased stability and processes for manufacturing same
#1345Memory device with chemical vapor deposition of titanium for titanium silicide contacts
#1346Method and device for plasma treating workpieces
#1347Plasma cvd film forming apparatus and method for manufacturing cvd film coated plastic container
#1348Rotary machine for cvd coatings
#1349Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus
#1350Method and device for the plasma treatment of workpieces
#1351Coating device comprising a conveying device
#1352Reactive sputter deposition plasma reactor and process using plural ion shower grids
#1353Reactive sputter deposition plasma process using an ion shower grid
#1354Chemical vapor deposition plasma reactor having an ion shower grid
#1355Chemical vapor deposition plasma reactor having plural ion shower grids
#1356Method of forming silicon nitride film and method of manufacturing semiconductor device
#1357Methods of filling gaps using high density plasma chemical vapor deposition
#1358Method and apparatus for forming silicon oxide film
#1359Gas delivery device for improved deposition of dielectric material
#1360Plasma treatment of porous materials
#1361Pressure gradient CVI/CVD apparatus and method
#1362Controlled growth of gallium nitride nanostructures
#1363Metal plating using seed film
#1364In-situ-etch-assisted HDP deposition using SiF
#1365Process for vertically patterning substrates in semiconductor process technology by means of inconformal deposition
#1366Method for monitoring the course of a process using a reactive gas containing one or several hydrocarbons
#1367Metal plating using seed film
#1368Method for manufacturing carbon composites
#1369Rotary type CVD film forming apparatus for mass production
#1370Integration of barrier layer and seed layer
#1371Gap-fill techniques
#1372Method of forming titanium film by CVD
#1373Catalytic CVD equipment, method for catalytic CVD, and method for manufacturing semiconductor device
#1374Method of forming trench isolation in the fabrication of integrated circuitry
#1375In situ application of etch back for improved deposition into high-aspect-ratio features
#1376Rapid process for the production of multilayer barrier layers
#1377Plastic containers coated on the inner surface and process for production thereof
#1378Vapor deposition of silicon dioxide nanolaminates
#1379Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics
#1380Method for improved deposition of dielectric material
#1381Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
#1382Plasma enhanced chemical vapor deposition methods and semiconductor processing methods of forming layers and shallow trench isolation regions
#1383Method for high aspect ratio HDP CVD gapfill
#1384Method of forming a metal layer using an intermittent precursor gas flow process
#1385Catalytic nanoporous membranes
#1386Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
#1387Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
#1388Metallization of substrate(s) by a liquid/vapor deposition process
#1389Production of elemental films using a boron-containing reducing agent
#1390Multilayer containers and preforms having barrier properties utilizing recycled material
#1391Apparatus for treating workpieces
#1392In-situ-etch-assisted HDP deposition using SiF4 and hydrogen
#1393Methods of filling trenches using high-density plasma deposition (HDP)
#1394Staggered in-situ deposition and etching of a dielectric layer for HDP CVD
#1395Die for molding honeycomb structure and manufacturing method thereof
#1396Method of depositing coating by plasma; device for implementing the method and coating obtained by said method
#1397Method of depositing coating by plasma; device for implementing the method and coating obtained by said method
#1398Method of depositing coating by plasma; device for implementing the method and coating obtained by said method
#1399Methods of forming a phosphorous doped silicon dioxide comprising layer
#1400Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology
#1401Aluminide coating of turbine engine component
#1402Barrier coating
#1403NiPd nano-alloy film as a electrocatalyst and methods of preparation thereof
#1404Boron aluminum oxide compound deposited by atomic layer deposition on product used for radiation shielding
#1405Process for preparing electroactive materials for metal-ion batteries
#1406Preform and method of making a preform
#1407Process and apparatus for making composite structures
#1408System having a cooling element for densifying a substrate