120137 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes Coating on selected surface areas, e.g. using masks
Sub-classes:PLASMA TREATMENT PROCESSES FOR SELECTIVE DEPOSITION
#2SELECTIVE DEPOSITION OF SILICON NITRIDE
#3FILM FORMATION METHOD AND FILM FORMATION APPARATUS
#4BOROPHENE-BASED TWO-DIMENSIONAL HETEROSTRUCTURES, FABRICATING METHODS AND APPLICATIONS OF SAME
#5Deposition of Organic Films
#6METHOD AND SYSTEM FOR SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL ON METAL SURFACE
#7FILM FORMING METHOD AND FILM FORMING APPARATUS
#8PHOTORESIST COMPOSITION, PATTERN FORMING METHOD USING NEAR-FIELD SURFACE LAYER IMAGING, AND DEPOSITION DEVICE
#9METHOD OF FORMING VANADIUM NITRIDE-CONTAINING LAYER AND STRUCTURE COMPRISING THE SAME
#10SELECTIVE SURFACE PASSIVATION AND INITIATED POLYMERIZATION FOR AREA SELECTIVE DEPOSITION
#11METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#12SELECTIVE DEPOSITION METHOD
#13METHOD AND APPARATUS FOR FORMING A PATTERNED STRUCTURE ON A SUBSTRATE
#14SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES
#15METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#16END EFFECTOR AND METHOD OF LASER REMOVAL OF COATING FOR APPLYING ELECTRICAL ENERGY
#17METHOD AND SYSTEM FOR DEPOSITING A METAL-CONTAINING LAYER
#18GAPFILL METHOD, SYSTEM AND APPARATUS
#19SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL
#20METHOD FOR SELECTIVE DEPOSITION OF METAL LAYER
#21FILM FORMING METHOD AND FILM FORMING APPARATUS
#22APPARATUS FOR MANUFACTURING DISPLAY DEVICE
#23AREA SELECTIVE DEPOSITION
#24METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#25INHERENTLY SELECTIVE THERMAL ATOMIC LAYER DEPOSITION OF COPPER METAL FILMS
#26Selective Thin Film Deposition Method Using Area-Selective Atomic Layer Deposition Method, and Substrates Having Thin Films Selectively Formed Thereon
#27HYBRID DUAL FREQUENCY PLASMA METHOD AND APPARATUS FOR DEPOSITION IN PATTERNED FEATURES ON A SUBSTRATE
#28METHOD AND SYSTEM FOR DEPOSITING A METAL-CONTAINING LAYER
#29FILM FORMING METHOD AND FILM FORMING APPARATUS
#30METHOD OF FORMING CARBON-BASED FILM AND FILM FORMING APPARATUS
#31FILM-FORMING METHOD AND SUBSTRATE-PROCESSING DEVICE
#32PROCESSING APPARATUS, PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
#33SELECTIVE FILM DEPOSITION
#34METHOD AND APPARATUS FOR SELECTIVE DEPOSITION OF DIELECTRIC FILMS
#35METHOD FOR MANUFACTURING MODIFIED SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#36SEMICONDUCTOR DEVICE PROCESSING COMPOSITION, COMPOUND, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
#37FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS
#38METHOD AND APPARATUS FOR AREA-SELECTIVE DEPOSITION
#39METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#40METHODS AND ASSEMBLIES FOR SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL
#41UNIFORM COATING OF A SURFACE
#42THIN FILM SHIELDING AGENT, METHOD OF FORMING THIN FILM USING THIN FILM SHIELDING AGENT, SEMICONDUCTOR SUBSTRATE INCLUDING THIN FILM, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE
#43THIN FILM MODIFICATION COMPOSITION, METHOD OF FORMING THIN FILM USING THIN FILM MODIFICATION COMPOSITION, SEMICONDUCTOR SUBSTRATE INCLUDING THIN FILM, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR
#44SELECTIVE NON-PLASMA DEPOSITION OF MASK PROTECTION MATERIAL
#45SHIELDING COMPOUND, METHOD OF FORMING THIN FILM USING SHIELDING COMPOUND, SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD, AND SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR SUBSTRATE
#46AREA SELECTIVE DEPOSITION OF METALS FOR ELECTRONIC DEVICES
#47TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
#48Area-Selective Hardmask Deposition: Methods and Tools for Advanced Patterning
#49POLYMERIC INHIBITOR FOR AREA SELECTIVE DEPOSITION
#50DIRECT ATOMIC LAYER DEPOSITION AND/OR ETCHING METHOD
#51METHOD FOR AREA-SELECTIVE GROWTH OF NOBLE METAL THIN FILMS USING ATOMIC LAYER DEPOSITION
#52DEPOSITION OF ORGANIC FILMS
#53SUBSTRATE TREATMENT METHOD
#54METHOD FOR GROWING DIAMOND ON SILICON SUBSTRATE AND METHOD FOR SELECTIVELY GROWING DIAMOND ON SILICON SUBSTRATE
#55SELECTIVE DEPOSITION OF ORGANIC POLYMER MATERIAL AND DEPOSITION ASSEMBLIES
#563D PRINTING-ASSISTED MULTI-SCALE METAL THREE-DIMENSIONAL SURFACE STRUCTURE PREPARATION METHOD AND PRODUCT
#57ELECTRODE PRODUCTION PROCESS
#58DEPOSITION OF ORGANIC MATERIAL
#59METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#60SELECTIVE DEPOSITION OF OXIDE MATERIAL AND A DEPOSITION ASSEMBLY
#61HIGH PRESSURE PLASMA INHIBITION
#62SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
#63DEPOSITION OF OXIDE THIN FILMS
#64SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
#65DEPOSITION METHOD
#66SELECTIVE RUTHENIUM DEPOSITION AND RELATED SYSTEMS AND METHODS
#67METHOD FOR FORMATION OF DIFFICULT-TO-MACHINE MATERIALS AND MATERIALS RESULTING THEREFROM
#68METHOD OF FORMING A RUTHENIUM-CONTAINING LAYER AND LAMINATE
#69METHODS FOR SELECTIVE DEPOSITION USING SELF-ASSEMBLED MONOLAYERS
#70CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, MANUFACTURING METHOD OF LAMINATE, AND CHEMICAL LIQUID CONTAINER
#71PECVD DEPOSITION SYSTEM FOR DEPOSITION ON SELECTIVE SIDE OF THE SUBSTRATE
#72CONFORMAL AND SELECTIVE SIN DEPOSITION
#73SELECTIVE DEPOSITION OF METAL OXIDE
#74SEMICONDUCTOR DEVICE PATTERNING METHODS
#75DEVICES AND METHODS FOR CONVEYING NEURON SIGNALS TO A PROCESSING DEVICE
#76FILM FORMATION METHOD AND FILM FORMATION DEVICE
#77VOID FREE LOW STRESS FILL
#78AREA SELECTIVE CARBON-BASED FILM DEPOSITION
#79METHOD OF FORMING MOLYBDENUM SILICIDE
#80METHODS AND ASSEMBLIES FOR SELECTIVELY DEPOSITING MOLYBDENUM
#81METHODS FOR SELECTIVELY FORMING AND UTILIZING A PASSIVATION LAYER ON A SUBSTRATE AND RELATED STRUCTURES INCLUDING A PASSIVATION LAYER
#82GRAPHENE-CAPPED COPPER IN DUAL DAMASCENE INTERCONNECT
#83FILM FORMING METHOD AND FILM FORMING APPARATUS
#84BACKSIDE DEPOSITION PREVENTION ON SUBSTRATES
#85THIN FILM DEPOSITION APPARATUS
#86METHOD OF FORMING VANADIUM NITRIDE-CONTAINING LAYER AND STRUCTURE COMPRISING THE SAME
#87TITANIUM DIBORIDE COATED REFRACTORY METAL COMPONENT
#88Fixtures for Chemical Vapor Deposition Gradient Coatings
#89CHEMICAL VAPOR DEPOSITION DURING ADDITIVE MANUFACTURING
#90SELECTIVE DEPOSITION OF SILICON OXIDE ON METAL SURFACES
#91Method of processing substrate and method of manufacturing semiconductor device by forming film
#92Area-selective method for forming thin film by using nuclear growth retardation
#93Method for manufacturing anode for lithium secondary battery
#94METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#95Methods for Selective Molybdenum Deposition
#96Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
#97SELECTIVE THERMAL ATOMIC LAYER DEPOSITION
#98Selective processing with etch residue-based inhibitors
#99ANCHORAGE AND PRESTRESSED CONCRETE (PC) STRUCTURE
#100PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM
#101METHOD OF FORMING FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
#102SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION
#103SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FILM ON DIELECTRICS
#104A METHOD AND A SYSTEM FOR GENERATING A HIGH-RESOLUTION PATTERN ON A SUBSTRATE
#105METHOD AND SYSTEM FOR FORMING PATTERNED STRUCTURES USING MULTIPLE PATTERNING PROCESS
#106SELECTIVE DEPOSITION OF METAL OXIDES USING SILANES AS AN INHIBITOR
#107METHOD FOR FORMING REGION-SELECTIVE THIN FILM USING SELECTIVATING AGENT
#108Deposition of organic films
#109AREA SELECTIVE ATOMIC LAYER DEPOSITION OF METAL OXIDE OR DIELECTRIC LAYER ON PATTERNED SUBSTRATE
#110Area selective carbon-based film deposition
#111Low refractive index surface layers and related methods
#112Methods for depositing blocking layers on conductive surfaces
#113METHOD OF SELECTIVELY FORMING COBALT METAL LAYER BY USING COBALT COMPOUND, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING COBALT COMPOUND
#114GAS SENSOR WITH SUPERLATTICE STRUCTURE
#115METHOD AND APPARATUS FOR FORMING A PATTERNED STRUCTURE ON A SUBSTRATE
#116Electrode production process
#117METHOD OF INSULATING LITHIUM ION ELECTROCHEMICAL CELL COMPONENTS WITH METAL OXIDE COATINGS
#118SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES
#119Thin film deposition apparatus
#120SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS
#121SELECTIVE DEPOSITION ON METALS USING POROUS LOW-K MATERIALS
#122Semiconductor device patterning methods
#123Methods Of Selectively Forming Metal-Containing Films
#124Atomic Layer Deposition (ALD) for Multi-Layer Ceramic Capacitors (MLCCs)
#125Laser Activated Luminescence System
#126METHOD FOR DEPOSITING A FILM
#127Methods for preparing self-assembled monolayers
#128TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
#129GRAPHENE BIOSCAFFOLDS AND THEIR USE IN CELLULAR THERAPY
#130FILM FORMATION METHOD AND FILM FORMATION APPARATUS
#131Electronic device having an oxygen free platinum group metal film
#132Deposition of organic films
#133AREA SELECTIVE ATOMIC LAYER DEPOSITION METHOD AND TOOL
#134MULTIPLE SURFACE AND FLUORINATED BLOCKING COMPOUNDS
#135Low temperature growth of transition metal chalcogenides
#136Cyclic plasma processing
#137Sequential infiltration synthesis apparatus and a method of forming a patterned structure
#138SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#139Deposition of oxide thin films
#140TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
#141METHODS FOR PATTERNING A SILICON OXIDE-SILICON NITRIDE-SILICON OXIDE STACK AND STRUCTURES FORMED BY THE SAME
#142FILM-FORMING METHOD
#143Catalyst enhanced seamless ruthenium gap fill
#144Deposition method
#145Atomic layer process printer
#146METHOD OF CONTROLLING AN AMOUNT OF SOLUBLE BASE CONTENT OF MATERIAL COMPRISING LITHIUM CARBONATE AND STRUCTURE, CATHODE, AND BATTERY FORMED USING THE METHOD
#147Coating method and film layer thereof, and coating fixture and application thereof
#148SURFACE TREATMENT FOR SELECTIVE DEPOSITION
#149Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
#150SEMICONDUCTOR FILM
#151Borophene-based two-dimensional heterostructures, fabricating methods and applications of same
#152Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask
#153DEPOSITION OF BORON FILMS
#154Film formation method and film formation device
#155Three-dimensional nano-patterns
#156PECVD deposition system for deposition on selective side of the substrate
#157PECVD deposition system for deposition on selective side of the substrate
#158PECVD deposition system for deposition on selective side of the substrate
#159Selective termination of superhydrophobic surfaces
#160Method for adjusting resistance value of thin film resistance layer in semiconductor structure
#161Selective Deposition Of A Heterocyclic Passivation Film On A Metal Surface
#162Methods of making a self-assembled slow-wave structures
#163SELECTIVE DEPOSITION ON METAL OR METALLIC SURFACES RELATIVE TO DIELECTRIC SURFACES
#164Void free low stress fill
#165SURFACE TREATMENT AGENT, SURFACE TREATMENT METHOD, AND REGION SELECTIVE FILM FORMATION METHOD FOR SURFACE OF SUBSTRATE
#166FLUID REACTORS
#167Fluorine-free tungsten ALD for dielectric selectivity improvement
#168Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium
#169Systems And Methods For Continuous Deposition
#170Method of forming vanadium nitride-containing layer
#171Selective deposition of titanium films
#172Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces
#173Simultaneous selective deposition of two different materials on two different surfaces
#174Method for selectively depositing a metallic film on a substrate
#175Dual selective deposition
#176Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based Selective Deposition
#177Film forming method
#178Atomic Layer Deposition Apparatus
#179Connector and connector pair
#180Deposition method
#181Method of manufacturing semiconductor device
#182Catalyst enhanced seamless ruthenium gap fill
#183Method of growing graphene selectively
#184Methods of processing substrate and manufacturing semiconductor device by forming film, substrate processing apparatus, and recording medium
#185Method of insulating lithium ion electrochemical cell components with metal oxide coatings
#186Area selective deposition of metal containing films
#187Method for growing a transition metal dichalcogenide layer, transition metal dichalcogenide growth device, and method for forming a semiconductor device
#188Methods for patterning a silicon oxide-silicon nitride-silicon oxide stack and structures formed by the same
#189Deposition of organic films
#190Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#191High throughput vacuum deposition sources and system
#192Deposition of organic films
#193Methods for depositing blocking layers on conductive surfaces
#194Apparatus for forming self-assembled monolayers
#195PROTECTION OF SURFACES BY EVAPORATED SALT COATINGS
#196Non-metal member with colored surface and method of coloring non-metal surface
#197Methods for Depositing a Film on a Backside of a Substrate
#198Method for manufacturing anode for lithium secondary battery
#199METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#200Selective processing with etch residue-based inhibitors
#201Sequential infiltration synthesis apparatus and a method of forming a patterned structure
#202Method for manufacturing laminated structure and method for manufacturing liquid ejection head substrate
#203Method and Apparatus for Selective Deposition of Dielectric Films
#204Differential capacitive sensors for in-situ film thickness and dielectric constant measurement
#205LOCALIZED SURFACE COATING DEFECT PATCHING PROCESS
#206Surface treatment agent, surface treatment method, and area selective deposition method
#207DEPOSITION OF RHENIUM-CONTAINING THIN FILMS
#208Methods for depositing anti-coking protective coatings on aerospace components
#209Surface-coated cutting tool and method of manufacturing the same
#210METHODS OF AREA-SELECTIVE ATOMIC LAYER DEPOSITION
#211Selective deposition on non-metallic surfaces
#212Reverse Selective Deposition
#213SELECTIVE DEPOSITION OF TUNGSTEN
#214Selective deposition of metal oxides on metal surfaces
#215Thin film deposition apparatus
#216Methods and precursors for selective deposition of metal films
#217Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#218Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
#219Method for direct patterned growth of atomic layer metal dichalcogenides with pre-defined width
#220Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
#221Selective deposition of aluminum and nitrogen containing material
#222Selective deposition of silicon nitride
#223Organic reactants for atomic layer deposition
#224Substrate processing method and substrate processing apparatus
#225Selective deposition of silicon oxide
#226Methods for selective deposition of dielectric on silicon oxide
#227Feature fill with multi-stage nucleation inhibition
#228Dual selective deposition
#229Interconnect structure for semiconductor device and methods of fabrication thereof
#230Systems and methods for inhibiting detectivity, metal particle contamination, and film growth on wafers
#231Electronically abrupt borophene/organic lateral heterostructures and preparation thereof
#232Selective step coverage for micro-fabricated structures
#233Systems and methods for coating surfaces
#234Method for selective deposition using a base-catalyzed inhibitor
#235Production method of capacitor structure, capacitor structure, and sensor
#236Selective aluminum oxide film deposition
#237Control of surface properties by deposition of particle monolayers
#238Oxygen free deposition of platinum group metal films
#239Plasma treatment method
#240Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask
#241Deposition of organic films
#242Coloured thermocompensated spiral and a method for the production thereof
#243Methods for selective deposition using self-assembled monolayers
#244Method of site-specific deposition onto a free-standing carbon article
#245Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity
#246Method for selectively depositing a metallic film on a substrate
#247Selective deposition on metal or metallic surfaces relative to dielectric surfaces
#248Alcohol Assisted ALD Film Deposition
#249Deposition of organic films
#250Tungsten feature fill with nucleation inhibition
#251ELECTRICAL CONTACT, CONNECTOR, AND METHOD FOR PRODUCING ELECTRICAL CONTACT
#252Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition
#253Tungsten feature fill with nucleation inhibition
#254Surface treatment method, surface treatment agent, and method for forming film region-selectively on substrate
#255Methods for depositing blocking layers on conductive surfaces
#256Selective atomic layer deposition of ruthenium
#257Selective formation of metallic films on metallic surfaces
#258Phosphor screen for MEMS image intensifiers
#259Shadow ring for modifying wafer edge and bevel deposition
#260APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
#261Selective deposition of silicon oxide
#262Selective deposition of metal silicides
#263Dual selective deposition
#264Feature fill with multi-stage nucleation inhibition
#265Control of surface properties by deposition of particle monolayers
#266Interconnect structure for semiconductor device and methods of fabrication thereof
#267Interconnect structure for semiconductor device and methods of fabrication thereof
#268PECVD deposition system for deposition on selective side of the substrate
#269Methods for preparing self-assembled monolayers
#270Low refractive index surface layers and related methods
#271Chemical vapor deposition during additive manufacturing
#272Encapsulation method for OLED Panel
#273Apparatus and method for planarizing multiple shadow masks on a common carrier frame
#274Method of synthesizing thickness-controlled graphene through chemical vapor deposition using Cu—Ni thin film laminate
#275Double-layer mask component and evaporation device
#276Multi-layer plasma erosion protection for chamber components
#277Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
#278Film forming method
#279Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide
#280Surface-selective atomic layer deposition using hydrosilylation passivation
#281Mask frame, mask and method for manufacturing the same
#282High throughput vacuum deposition sources and system
#283ELECTROLESS PLATING METHOD AND PRODUCT OBTAINED
#284Selective termination of superhydrophobic surfaces
#285Self-aligned nanodots for 3D NAND flash memory
#286Selective deposition of silicon oxide
#287Inherently selective precursors for deposition of second or third row transition metal thin films
#288Electronically abrupt borophene/organic lateral heterostructures and preparation thereof
#289Method of manufacturing lithography template
#290Protective film forming method
#291Selective deposition of thin film dielectrics using surface blocking chemistry
#292Control of surface properties by deposition of particle monolayers
#293Plasma treatment apparatus
#294Alcohol assisted ALD film deposition
#295Film-forming method
#296Deposition of oxide thin films
#297Selective inhibition in atomic layer deposition of silicon-containing films
#298Cobalt deposition selectivity on copper and dielectrics
#299Method of manufacturing semiconductor device
#300Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity