ClassID:

120139

C23C16/045 - page 4 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes; Coating on selected surface areas, e.g. using masks Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Recent Application in this class:
#901
20140102399
2014-04-17

Engine component

#902
20140099734
2014-04-10

Deposition method and deposition apparatus

#903
20140094035
2014-04-03

Carbon deposition-etch-ash gap fill process

#904
20140061867
2014-03-06

Method for depositing one or more polycrystalline silicon layers on substrate

#905
20140048943
2014-02-20

Semiconductor constructions, methods of forming conductive structures and methods of forming DRAM cells

#906
20140034611
2014-02-06

Enhanced etch and deposition profile control using plasma sheath engineering

#907
20140030889
2014-01-30

Methods of improving tungsten contact resistance in small critical dimension features

#908
20140023849
2014-01-23

Method for producing a three-dimensional structure and three-dimensional structure

#909
20140017909
2014-01-16

Film deposition method and film deposition apparatus

#910
20140015159
2014-01-16

Array of metallic nanotubes

#911
20140004381
2014-01-02

ENHANCED MATERIALS AND INTERFACIAL PERFORMANCE VIA INFILTRATION

#912
20130323915
2013-12-05

Method and apparatus for forming silicon film

#913
20130323423
2013-12-05

Method for producing gas barrier plastic molded body

#914
20130316108
2013-11-28

Gas-barrier plastic molded product and manufacturing process therefor

#915
20130309415
2013-11-21

Methods for modulating step coverage during conformal film deposition

#916
20130302980
2013-11-14

Tungsten feature fill

#917
20130270617
2013-10-17

Integration of bottom-up metal film deposition

#918
20130264713
2013-10-10

Methods of forming conductive structures and methods of forming DRAM cells

#919
20130244445
2013-09-19

Method of fabricating semiconductor device

#920
20130233449
2013-09-12

Controlled coating apparatus, systems, and methods

#921
20130224889
2013-08-29

Charged particle beam apparatus, thin film forming method, defect correction method and device forming method

#922
20130210241
2013-08-15

Method of plasma activated deposition of a conformal film on a substrate surface

#923
20130203267
2013-08-08

Multiple vapor sources for vapor deposition

#924
20130203250
2013-08-08

Semiconductor device manufacturing method

#925
20130202814
2013-08-08

Method for plasma-treating workpieces

#926
20130200549
2013-08-08

Syringe with integrated needle

#927
20130189840
2013-07-25

Methods for forming a contact metal layer in semiconductor devices

#928
20130186331
2013-07-25

Quality inspection of container coatings

#929
20130183458
2013-07-18

Method for depositing phosphosilicate glass

#930
20130168864
2013-07-04

Method for producing ultra-thin tungsten layers with improved step coverage

#931
20130167593
2013-07-04

PCVD method and apparatus

#932
20130143146
2013-06-06

HYBRID POROUS MATERIALS AND MANUFACTURING METHODS AND USES THEREOF

#933
20130129582
2013-05-23

Method for the plasma-enhanced treatment of internal surfaces of a hollow body, fluid separator, and use thereof

#934
20130121892
2013-05-16

Polymeric substrate having an etched-glass-like surface and a microfluidic chip made of said polymeric substrate

#935
20130102121
2013-04-25

Oxygen diffusion barrier comprising Ru

#936
20130084693
2013-04-04

Thin film forming method and film forming apparatus

#937
20130084389
2013-04-04

Method of fabricating a ceramic component

#938
20130075912
2013-03-28

Semiconductor device including a plug and method for manufacturing the same

#939
20130071565
2013-03-21

Apparatuses and Methods for Large-Scale Production of Hybrid Fibers Containing Carbon Nanostructures and Related Materials

#940
20130068539
2013-03-21

Methods of attaching a polycrystalline diamond compact to a substrate

#941
20130045385
2013-02-21

METAL POWDER, METHOD FOR PREPARING THE SAME, AND MULTILAYERED CERAMIC CAPACITOR INCLUDING INNER ELECTRODE MADE OF METAL POWDER

#942
20130041241
2013-02-14

PECVD coating methods for capped syringes, cartridges and other articles

#943
20130040447
2013-02-14

Conformal doping via plasma activated atomic layer deposition and conformal film deposition

#944
20130023172
2013-01-24

Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength

#945
20130022744
2013-01-24

METHOD OF FORMING NOBLE METAL LAYER USING OZONE REACTION GAS

#946
20130022658
2013-01-24

DEPOSITING MATERIAL WITH ANTIMICROBIAL PROPERTIES ON PERMEABLE SUBSTRATE USING ATOMIC LAYER DEPOSITION

#947
20130022329
2013-01-24

Silicon Germanium Core Fiber

#948
20130017328
2013-01-17

Film forming method and film forming apparatus

#949
20130014995
2013-01-17

Downhole motor with diamond-like carbon coating on stator and/or rotor and method of making said downhole motor

#950
20130005142
2013-01-03

Method and apparatus for forming silicon film

#951
20130005140
2013-01-03

Systems and methods for controlling etch selectivity of various materials

#952
20130004682
2013-01-03

Method and device for plasma-treating workpieces

#953
20120325773
2012-12-27

Integrated process modulation for PSG gapfill

#954
20120325146
2012-12-27

Plasma Processing Apparatus

#955
20120321779
2012-12-20

Chemical vapor infiltration apparatus and process

#956
20120312233
2012-12-13

Magnetically Enhanced Thin Film Coating Method and Apparatus

#957
20120291705
2012-11-22

Methods and apparatus for controlled chemical vapor deposition

#958
20120289030
2012-11-15

Ion-assisted direct growth of porous materials

#959
20120282756
2012-11-08

Thin Film Filling Method

#960
20120282527
2012-11-08

Composite materials for battery applications

#961
20120272558
2012-11-01

Barrel

#962
20120268845
2012-10-25

Write pole and shield with different taper angles

#963
20120267341
2012-10-25

Film deposition apparatus and film deposition method

#964
20120267340
2012-10-25

Film deposition method and film deposition apparatus

#965
20120258604
2012-10-11

Deposition method

#966
20120252709
2012-10-04

Vessels, contact surfaces, and coating and inspection apparatus and methods

#967
20120251741
2012-10-04

Method for adjusting the coolant consumption within actively cooled components, and component

#968
20120237762
2012-09-20

DEVICE CONSTRUCTS AND METHODS OF COATING LUMINESCENT PHOSPHORS FOR DISPLAY AND LIGHTING APPLICATIONS

#969
20120231182
2012-09-13

Method and apparatus for treating containers

#970
20120231177
2012-09-13

Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode

#971
20120224975
2012-09-06

Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner

#972
20120219727
2012-08-30

METHOD OF SURFACE TREATING MICROFLUIDIC DEVICES

#973
20120213947
2012-08-23

DEPOSITING THIN LAYER OF MATERIAL ON PERMEABLE SUBSTRATE

#974
20120208373
2012-08-16

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE

#975
20120205279
2012-08-16

Method of manufacturing a gas barrier plastic container

#976
20120202355
2012-08-09

Patterned dummy wafers loading in batch type CVD

#977
20120199887
2012-08-09

METHODS OF CONTROLLING TUNGSTEN FILM PROPERTIES

#978
20120196437
2012-08-02

Methods of forming copper wiring and copper film, and film forming system

#979
20120190178
2012-07-26

Polysilicon films by HDP-CVD

#980
20120177846
2012-07-12

RADICAL STEAM CVD

#981
20120171403
2012-07-05

ARTICLES INCLUDING A POROUS SUBSTRATE HAVING A CONFORMAL LAYER THEREON

#982
20120171376
2012-07-05

Method of applying atomic layer deposition coatings onto porous non-ceramic substrates

#983
20120171375
2012-07-05

Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates

#984
20120160167
2012-06-28

External Heating of Substrate Tubes in Plasma Chemical Vapor Deposition Processes

#985
20120160095
2012-06-28

Novel Nanoporous Supported Lyotropic Liquid Crystal Polymer Membranes and Methods of Preparing and Using Same

#986
20120156880
2012-06-21

Rapid and uniform gas switching for a plasma etch process

#987
20120154983
2012-06-21

Method of Fabrication of Carbon Nanofibers on Nickel Foam

#988
20120152168
2012-06-21

SEMICONDUCTOR DEVICE HAVING OXIDIZED METAL FILM AND MANUFACTURE METHOD OF THE SAME

#989
20120149213
2012-06-14

BOTTOM UP FILL IN HIGH ASPECT RATIO TRENCHES

#990
20120146196
2012-06-14

Method for fabricating semiconductor device

#991
20120141667
2012-06-07

METHODS FOR FORMING BARRIER/SEED LAYERS FOR COPPER INTERCONNECT STRUCTURES

#992
20120137973
2012-06-07

SUBSTRATE PROCESSING APPARATUS AND FILM FORMING SYSTEM

#993
20120128896
2012-05-24

STAIN-RESISTANT CONTAINER AND METHOD

#994
20120103518
2012-05-03

Film formation apparatus

#995
20120091588
2012-04-19

Barrier layer, film forming method, and processing system

#996
20120071006
2012-03-22

Starting material for use in forming silicon oxide film and method for forming silicon oxide film using same

#997
20120064715
2012-03-15

Integration of bottom-up metal film deposition

#998
20120058282
2012-03-08

Method of forming conformal film having si-N bonds on high-aspect ratio pattern

#999
20120052681
2012-03-01

Methods of selectively forming a material using parylene coating

#1000
20120052215
2012-03-01

Method for manufacturing gas barrier thin film-coated plastic container

#1001
20120045592
2012-02-23

Process to deposit diamond like carbon as surface of a shaped object

#1002
20120045590
2012-02-23

Apparatus and method for plasma treatment of containers

#1003
20120040172
2012-02-16

Tantalum carbide-coated carbon material and production method thereof

#1004
20120038052
2012-02-16

Fabricating method of semiconductor device

#1005
20120034793
2012-02-09

METHOD FOR FORMING METAL NITRIDE FILM

#1006
20120032334
2012-02-09

Soft error rate (SER) reduction in advanced silicon processes

#1007
20120028454
2012-02-02

Plasma activated conformal dielectric film deposition

#1008
20120024230
2012-02-02

APPARATUSES AND SYSTEMS FOR FABRICATING THREE DIMENSIONAL INTEGRATED CIRCUITS

#1009
20120015518
2012-01-19

Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics

#1010
20120009802
2012-01-12

Plasma activated conformal dielectric film deposition

#1011
20120009785
2012-01-12

Depositing tungsten into high aspect ratio features

#1012
20120000771
2012-01-05

Inner electrode for barrier film formation and apparatus for film formation

#1013
20120000423
2012-01-05

HDP-CVD SYSTEM

#1014
20110308460
2011-12-22

Atomic layer deposition apparatus

#1015
20110293826
2011-12-01

Apparatus and Method for Coating Internal Surfaces of a Turbine Engine Component

#1016
20110293825
2011-12-01

Method and an arrangement for vapour phase coating of an internal surface of at least one hollow article

#1017
20110287629
2011-11-24

SILICON FILM FORMATION METHOD AND SILICON FILM FORMATION APPARATUS

#1018
20110281417
2011-11-17

Vapor deposition of silicon dioxide nanolaminates

#1019
20110268983
2011-11-03

FILM-FORMING TREATMENT JIG, PLASMA CVD APPARATUS, METAL PLATE AND OSMIUM FILM FORMING METHOD

#1020
20110256734
2011-10-20

SILICON NITRIDE FILMS AND METHODS

#1021
20110256726
2011-10-20

Plasma activated conformal film deposition

#1022
20110256251
2011-10-20

Process, apparatus, and material for making silicon germanuim core fiber

#1023
20110252899
2011-10-20

Vessel inspection apparatus and methods

#1024
20110252861
2011-10-20

Machine for plasma treatment of containers comprising an integrated vacuum circuit

#1025
20110244673
2011-10-06

Method for fabricating semiconductor device with buried gates

#1026
20110244141
2011-10-06

Method of processing multilayer film

#1027
20110237076
2011-09-29

Film-forming method and film-forming apparatus

#1028
20110233780
2011-09-29

Cobalt nitride layers for copper interconnects and methods for forming them

#1029
20110223763
2011-09-15

Methods for growing low-resistivity tungsten for high aspect ratio and small features

#1030
20110220143
2011-09-15

Device for Treating an Inner Surface of a Work Piece

#1031
20110195570
2011-08-11

Integration of bottom-up metal film deposition

#1032
20110189407
2011-08-04

Process for the internal coating of hollow bodies using a plasma beam at atmospheric pressure

#1033
20110186537
2011-08-04

Systems, Apparatus and Methods for Coating the Interior of a Container Using a Photolysis and/or Thermal Chemical Vapor Deposition Process

#1034
20110186464
2011-08-04

Process for manufacturing glass containers and product obtained therewith

#1035
20110174220
2011-07-21

Device for Plasma-Assisted Coating of the Inner Side of Tubular Components

#1036
20110165347
2011-07-07

Dielectric film formation using inert gas excitation

#1037
20110163451
2011-07-07

Film forming method and processing system

#1038
20110151141
2011-06-23

Chemical vapor deposition for an interior of a hollow article with high aspect ratio

#1039
20110117288
2011-05-19

Substrate processing method

#1040
20110111202
2011-05-12

MULTILAYER FILM STRUCTURE, AND METHOD AND APPARATUS FOR TRANSFERRING NANO-CARBON MATERIAL

#1041
20110111132
2011-05-12

SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE

#1042
20110104890
2011-05-05

Method for forming Cu electrical interconnection film

#1043
20110104400
2011-05-05

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE

#1044
20110100088
2011-05-05

Articles of manufacture containing increased stability low concentration gases and methods of making and using the same

#1045
20110076421
2011-03-31

VAPOR DEPOSITION REACTOR FOR FORMING THIN FILM ON CURVED SURFACE

#1046
20110071014
2011-03-24

HYBRED POLYMER CVI COMPOSITES

#1047
20110070730
2011-03-24

SEQUENTIAL DEPOSITION OF TANTALUM NITRIDE USING A TANTALUM-CONTAINING PRECURSOR AND A NITROGEN-CONTAINING PRECURSOR

#1048
20110058780
2011-03-10

Single-mode fiber and production method thereof

#1049
20110045181
2011-02-24

Applying vapour phase aluminide coating on airfoil internal cavities using improved method

#1050
20110030617
2011-02-10

Plasma system

#1051
20110023781
2011-02-03

DEVICE FOR THE PLASMA TREATMENT OF WORKPIECES

#1052
20110006398
2011-01-13

Process, apparatus, and material for making silicon germanium core fiber

#1053
20100330773
2010-12-30

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

#1054
20100326355
2010-12-30

Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

#1055
20100319620
2010-12-23

VAPOR DEPOSITION APPARATUS

#1056
20100317189
2010-12-16

Method for manufacturing semiconductor device

#1057
20100298738
2010-11-25

Vessel, coating, inspection and processing apparatus

#1058
20100291290
2010-11-18

Method for forming copper distributing wires

#1059
20100275847
2010-11-04

DLC FILM COATED PLASTIC CONTAINER, AND DEVICE AND METHOD FOR MANUFACTURING THE PLASTIC CONTAINER

#1060
20100272527
2010-10-28

METHOD TO ATTACH OR IMPROVE THE ATTACHMENT OF ARTICLES

#1061
20100267235
2010-10-21

Methods for depositing ultra thin low resistivity tungsten film for small critical dimension contacts and interconnects

#1062
20100267230
2010-10-21

METHOD FOR FORMING TUNGSTEN CONTACTS AND INTERCONNECTS WITH SMALL CRITICAL DIMENSIONS

#1063
20100255342
2010-10-07

Metal plating using seed film

#1064
20100252531
2010-10-07

Enhanced etch and deposition profile control using plasma sheath engineering

#1065
20100236479
2010-09-23

PLASMA DEPOSITION APPARATUS

#1066
20100227119
2010-09-09

PROCESS FOR PLASMA COATING A POLYPROPYLENE OBJECT

#1067
20100221925
2010-09-02

Method of forming conformal dielectric film having Si-N bonds by PECVD

#1068
20100221427
2010-09-02

Methods and apparatus for controlled chemical vapor deposition

#1069
20100215845
2010-08-26

DLI-MOCVD process for making electrodes for electrochemical reactors

#1070
20100210116
2010-08-19

METHODS OF FORMING VAPOR THIN FILMS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES INCLUDING THE SAME

#1071
20100206232
2010-08-19

Machine for the plasma treatment of containers, comprising offset depressurization/pressurization circuits

#1072
20100200991
2010-08-12

Dopant Enhanced Interconnect

#1073
20100193461
2010-08-05

PLASMA-DEPOSITED BARRIER COATING INCLUDING AT LEAST THREE LAYERS, METHOD FOR OBTAINING ONE SUCH COATING AND CONTAINER COATED WITH SAME

#1074
20100190341
2010-07-29

APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME

#1075
20100189899
2010-07-29

Method and device for the infiltration of a structure of a porous material by chemical vapour deposition

#1076
20100184302
2010-07-22

Method of forming conformal dielectric film having Si-N bonds by PECVD

#1077
20100167527
2010-07-01

Method of depositing tungsten film with reduced resistivity and improved surface morphology

#1078
20100159694
2010-06-24

Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics

#1079
20100159627
2010-06-24

Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics

#1080
20100154479
2010-06-24

Method and device for manufacturing an optical preform

#1081
20100144140
2010-06-10

METHODS FOR DEPOSITING TUNGSTEN FILMS HAVING LOW RESISTIVITY FOR GAPFILL APPLICATIONS

#1082
20100143609
2010-06-10

Method for forming low-carbon CVD film for filling trenches

#1083
20100140802
2010-06-10

Film forming method and film forming apparatus

#1084
20100140205
2010-06-10

Biodegradable resin bottle and method of producing the same

#1085
20100119708
2010-05-13

Filling structures of high aspect ratio elements for growth amplification and device fabrication

#1086
20100119640
2010-05-13

Die for molding honeycomb structure and manufacturing method thereof

#1087
20100096393
2010-04-22

Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container

#1088
20100094430
2010-04-15

Device

#1089
20100075827
2010-03-25

Catalytic nanoporous membranes

#1090
20100075077
2010-03-25

Container having improved ease of discharge product residue, and method for the production thereof

#1091
20100041245
2010-02-18

HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system

#1092
20100041207
2010-02-18

High density plasma gapfill deposition-etch-deposition process etchant

#1093
20100034985
2010-02-11

Apparatus and method for the plasma treatment of hollow bodies

#1094
20100032285
2010-02-11

METHOD OF PLASMA TREATMENT OF A SURFACE

#1095
20100031887
2010-02-11

Supply device

#1096
20100031886
2010-02-11

Method of gap-filling using amplitude modulation radiofrequency power and apparatus for the same

#1097
20100022099
2010-01-28

Method of forming non-conformal layers

#1098
20100007100
2010-01-14

Double-sealing device for a machine for the plasma treatment of containers

#1099
20090324827
2009-12-31

CVD FILM FORMING METHOD AND CVD FILM FORMING APPARATUS

#1100
20090311483
2009-12-17

Articles with Two Crystalline Materials and Method of Making Same

#1101
20090311443
2009-12-17

Method of coating inner and outer surfaces of pipes for thermal solar and other applications

#1102
20090304920
2009-12-10

Spatially controlled atomic layer deposition in porous materials

#1103
20090297730
2009-12-03

RF antenna assembly for treatment of inner surfaces of tubes with inductively coupled plasma

#1104
20090286381
2009-11-19

Protective layer to enable damage free gap fill

#1105
20090286011
2009-11-19

Plasma processing device, plasma processing method, and plasma surface processing method

#1106
20090280276
2009-11-12

Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body

#1107
20090280268
2009-11-12

Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers

#1108
20090277864
2009-11-12

Synthetic resin bottle

#1109
20090275202
2009-11-05

SILICON STRUCTURE HAVING AN OPENING WHICH HAS A HIGH ASPECT RATIO, METHOD FOR MANUFACTURING THE SAME, SYSTEM FOR MANUFACTURING THE SAME, AND PROGRAM FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING ETCHING MASK FOR THE SILICON STRUCTURE

#1110
20090274865
2009-11-05

CELLULAR LATTICE STRUCTURES WITH MULTIPLICITY OF CELL SIZES AND RELATED METHOD OF USE

#1111
20090263967
2009-10-22

Method of forming noble metal layer using ozone reaction gas

#1112
20090261090
2009-10-22

Heat treatment oven with inductive heating

#1113
20090250444
2009-10-08

Microwave plasma processing device

#1114
20090239352
2009-09-24

METHOD FOR PRODUCING SILICON OXIDE FILM, CONTROL PROGRAM THEREOF, RECORDING MEDIUM AND PLASMA PROCESSING APPARATUS

#1115
20090229521
2009-09-17

METHOD AND DEVICE FOR MICROWAVE PLASMA DEPOSITION OF A COATING ON A THERMOPLASTIC CONTAINER SURFACE

#1116
20090223594
2009-09-10

Reactive gases with concentrations of increased stability and processes for manufacturing same

#1117
20090215281
2009-08-27

HDP-CVD SiON films for gap-fill

#1118
20090208669
2009-08-20

Apparatus and method for application of a thin barrier layer onto inner surfaces of wafer containers

#1119
20090197406
2009-08-06

Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor

#1120
20090181185
2009-07-16

METHOD AND APPARATUS FOR SURFACE TREATMENT OF CONTAINERS OR OBJECTS

#1121
20090176035
2009-07-09

Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component

#1122
20090162997
2009-06-25

Thin diamond like coating for semiconductor processing equipment

#1123
20090162571
2009-06-25

Method and Device for Producing Process Gases for Vapor Phase Deposition

#1124
20090155997
2009-06-18

Method for forming Ta-Ru liner layer for Cu wiring

#1125
20090155490
2009-06-18

Method and device for the internal plasma treatment of hollow bodies

#1126
20090148633
2009-06-11

Vapor deposited film by plasma CVD method

#1127
20090142525
2009-06-04

BARRIER LAYER

#1128
20090142524
2009-06-04

Fine laminar barrier protective layer

#1129
20090140628
2009-06-04

Inner coating of lamp vessels, such as discharge vessels of gas discharge lamps

#1130
20090133626
2009-05-28

Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device

#1131
20090123648
2009-05-14

DIAMOND-DIAMOND COMPOSITES

#1132
20090123646
2009-05-14

METHOD AND PLANT FOR SIMULTANEOUSLY COATING INTERNAL AND EXTERNAL SURFACES OF METAL ELEMENTS, IN PARTICULAR BLADES FOR TURBINES

#1133
20090120363
2009-05-14

Gas Supply Pipe for Plasma Treatment

#1134
20090120158
2009-05-14

Articles of manufacture containing increased stability low concentration gases and methods of making and using the same

#1135
20090104791
2009-04-23

Methods for forming a silicon oxide layer over a substrate

#1136
20090104789
2009-04-23

Method and system for improving dielectric film quality for void free gap fill

#1137
20090104392
2009-04-23

Synthetic resin containers with high barrier property

#1138
20090092826
2009-04-09

Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner

#1139
20090092763
2009-04-09

Method and Device for Testing the Quality of a Metallic Coating

#1140
20090092753
2009-04-09

Method of aluminization in the vapor phase on hollow metal parts of a turbomachine

#1141
20090081382
2009-03-26

Plasma processing plant

#1142
20090075489
2009-03-19

Reduction of etch-rate drift in HDP processes

#1143
20090071407
2009-03-19

Semiconductor processing parts having apertures with deposited coatings and methods for forming the same

#1144
20090071404
2009-03-19

Method of forming titanium film by CVD

#1145
20090071399
2009-03-19

APPARATUS FOR TREATING WORKPIECES

#1146
20090068853
2009-03-12

Impurity control in HDP-CVD DEP/ETCH/DEP processes

#1147
20090061111
2009-03-05

Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container

#1148
20090061085
2009-03-05

Expedited manufacture of carbon-carbon composite brake discs

#1149
20090053413
2009-02-26

Method of densifying porous articles

#1150
20090046825
2009-02-19

Protective coating applied to metallic reactor components to reduce corrosion products into the nuclear reactor environment

#1151
20090039517
2009-02-12

Chemical vapor deposition of titanium

#1152
20090035466
2009-02-05

RUTHENIUM FILM FORMATION METHOD AND COMPUTER READABLE STORAGE MEDIUM

#1153
20090017230
2009-01-15

Corrosion-resistant internal coating method using a germanium-containing precursor and hollow cathode techniques

#1154
20090017222
2009-01-15

Plasma enhanced bonding for improving adhesion and corrosion resistance of deposited films

#1155
20090017205
2009-01-15

Apparatus and method for coating internal surfaces of a turbine engine component

#1156
20090004839
2009-01-01

METHOD FOR FABRICATING AN INTERLAYER DIELECTRIC IN A SEMICONDUCTOR DEVICE

#1157
20080318441
2008-12-25

Process sequence for doped silicon fill of deep trenches

#1158
20080299775
2008-12-04

GAPFILL EXTENSION OF HDP-CVD INTEGRATED PROCESS MODULATION SIO2 PROCESS

#1159
20080299313
2008-12-04

Film forming apparatus and film forming method

#1160
20080292806
2008-11-27

Plasma immersion ion processing for coating of hollow substrates

#1161
20080292781
2008-11-27

Method for Monitoring a Plasma, Device for Carrying Out this Method, Use of this Method for Depositing a Film Onto a Pet Hollow Body

#1162
20080286446
2008-11-20

Seed-Assisted MOCVD Growth of Threshold Switching and Phase-Change Materials

#1163
20080282981
2008-11-20

Method and system for forming thin films

#1164
20080282980
2008-11-20

Cooled device for plasma depositing a barrier layer onto a container

#1165
20080268252
2008-10-30

Process for Plasma Coating a Nanocomposite Object

#1166
20080261398
2008-10-23

Semiconductor device having oxidized metal film and manufacture method of the same

#1167
20080254623
2008-10-16

Methods for growing low-resistivity tungsten for high aspect ratio and small features

#1168
20080254232
2008-10-16

Cobalt nitride layers for copper interconnects and methods for forming them

#1169
20080241383
2008-10-02

METHOD FOR PRODUCING HYDROGEN GAS SEPARATION MATERIAL

#1170
20080241381
2008-10-02

Method for pre-conditioning a precursor vaporization system for a vapor deposition process

#1171
20080241357
2008-10-02

Method for heating a substrate prior to a vapor deposition process

#1172
20080232424
2008-09-25

Hearth plate including side walls defining a processing volume

#1173
20080226431
2008-09-18

Rotating Machines for Treating Containers

#1174
20080223287
2008-09-18

Plasma enhanced ALD process for copper alloy seed layers

#1175
20080213156
2008-09-04

Method For The Manufacture Of A Reactor To Separate Gases

#1176
20080206477
2008-08-28

Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve

#1177
20080202414
2008-08-28

METHODS AND DEVICES FOR COATING AN INTERIOR SURFACE OF A PLASTIC CONTAINER

#1178
20080193791
2008-08-14

Zirconium-doped zinc oxide structures and methods

#1179
20080193739
2008-08-14

Fabrication of composite materials using atomic layer deposition

#1180
20080176067
2008-07-24

Process for producing shaped bodies of carbon fiber reinforced carbon and shaped body produced by the process

#1181
20080171162
2008-07-17

Process For Plasma Coating a Polypropylene Object

#1182
20080160192
2008-07-03

Method for chemical infiltration in the gas phase for the densification of porous substrates with pyrolytic carbon

#1183
20080153311
2008-06-26

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE

#1184
20080152803
2008-06-26

Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates

#1185
20080152464
2008-06-26

Methods, apparatuses, and systems for fabricating three dimensional integrated circuits

#1186
20080145651
2008-06-19

Method for Manufacturing a Pecvd Carbon Coated Polymer Article and Article Obtained by Such Method

#1187
20080142483
2008-06-19

MULTI-STEP DEP-ETCH-DEP HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION PROCESSES FOR DIELECTRIC GAPFILLS

#1188
20080138571
2008-06-12

Fabrication of semiconductor metamaterials

#1189
20080136866
2008-06-12

Non-wetting coating on a fluid ejector

#1190
20080132050
2008-06-05

Deposition process for graded cobalt barrier layers

#1191
20080127892
2008-06-05

Plasma Processing Apparatus with Scanning Injector and Plasma Processing Method

#1192
20080124462
2008-05-29

Pressure swing CVI/CVD

#1193
20080122102
2008-05-29

Semiconductor device having oxidized metal film and manufacture method of the same

#1194
20080121518
2008-05-29

PLASMA DEPOSITION PROCESS WITH VARIABLE PROCESS PARAMETERS

#1195
20080121176
2008-05-29

INSTALLATION FOR DEPOSITING, BY MEANS OF A MICROWAVE PLASMA, AN INTERNAL BARRIER COATING ON THERMOPLASTIC CONTAINERS

#1196
20080115726
2008-05-22

GAP-FILL DEPOSITIONS INTRODUCING HYDROXYL-CONTAINING PRECURSORS IN THE FORMATION OF SILICON CONTAINING DIELECTRIC MATERIALS

#1197
20080107808
2008-05-08

Method and an apparatus for the coating of a base body

#1198
20080090410
2008-04-17

Semiconductor device having oxidized metal film and manufacture method of the same

#1199
20080087221
2008-04-17

Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers

#1200
20080072792
2008-03-27

Raw Material Solution for Metal Organic Chemical Vapor Deposition and Composite Oxide-Based Dielectric Thin Film Produced by Using the Raw Material