120139 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes; Coating on selected surface areas, e.g. using masks Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Engine component
#902Deposition method and deposition apparatus
#903Carbon deposition-etch-ash gap fill process
#904Method for depositing one or more polycrystalline silicon layers on substrate
#905Semiconductor constructions, methods of forming conductive structures and methods of forming DRAM cells
#906Enhanced etch and deposition profile control using plasma sheath engineering
#907Methods of improving tungsten contact resistance in small critical dimension features
#908Method for producing a three-dimensional structure and three-dimensional structure
#909Film deposition method and film deposition apparatus
#910Array of metallic nanotubes
#911ENHANCED MATERIALS AND INTERFACIAL PERFORMANCE VIA INFILTRATION
#912Method and apparatus for forming silicon film
#913Method for producing gas barrier plastic molded body
#914Gas-barrier plastic molded product and manufacturing process therefor
#915Methods for modulating step coverage during conformal film deposition
#916Tungsten feature fill
#917Integration of bottom-up metal film deposition
#918Methods of forming conductive structures and methods of forming DRAM cells
#919Method of fabricating semiconductor device
#920Controlled coating apparatus, systems, and methods
#921Charged particle beam apparatus, thin film forming method, defect correction method and device forming method
#922Method of plasma activated deposition of a conformal film on a substrate surface
#923Multiple vapor sources for vapor deposition
#924Semiconductor device manufacturing method
#925Method for plasma-treating workpieces
#926Syringe with integrated needle
#927Methods for forming a contact metal layer in semiconductor devices
#928Quality inspection of container coatings
#929Method for depositing phosphosilicate glass
#930Method for producing ultra-thin tungsten layers with improved step coverage
#931PCVD method and apparatus
#932HYBRID POROUS MATERIALS AND MANUFACTURING METHODS AND USES THEREOF
#933Method for the plasma-enhanced treatment of internal surfaces of a hollow body, fluid separator, and use thereof
#934Polymeric substrate having an etched-glass-like surface and a microfluidic chip made of said polymeric substrate
#935Oxygen diffusion barrier comprising Ru
#936Thin film forming method and film forming apparatus
#937Method of fabricating a ceramic component
#938Semiconductor device including a plug and method for manufacturing the same
#939Apparatuses and Methods for Large-Scale Production of Hybrid Fibers Containing Carbon Nanostructures and Related Materials
#940Methods of attaching a polycrystalline diamond compact to a substrate
#941METAL POWDER, METHOD FOR PREPARING THE SAME, AND MULTILAYERED CERAMIC CAPACITOR INCLUDING INNER ELECTRODE MADE OF METAL POWDER
#942PECVD coating methods for capped syringes, cartridges and other articles
#943Conformal doping via plasma activated atomic layer deposition and conformal film deposition
#944Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength
#945METHOD OF FORMING NOBLE METAL LAYER USING OZONE REACTION GAS
#946DEPOSITING MATERIAL WITH ANTIMICROBIAL PROPERTIES ON PERMEABLE SUBSTRATE USING ATOMIC LAYER DEPOSITION
#947Silicon Germanium Core Fiber
#948Film forming method and film forming apparatus
#949Downhole motor with diamond-like carbon coating on stator and/or rotor and method of making said downhole motor
#950Method and apparatus for forming silicon film
#951Systems and methods for controlling etch selectivity of various materials
#952Method and device for plasma-treating workpieces
#953Integrated process modulation for PSG gapfill
#954Plasma Processing Apparatus
#955Chemical vapor infiltration apparatus and process
#956Magnetically Enhanced Thin Film Coating Method and Apparatus
#957Methods and apparatus for controlled chemical vapor deposition
#958Ion-assisted direct growth of porous materials
#959Thin Film Filling Method
#960Composite materials for battery applications
#961Barrel
#962Write pole and shield with different taper angles
#963Film deposition apparatus and film deposition method
#964Film deposition method and film deposition apparatus
#965Deposition method
#966Vessels, contact surfaces, and coating and inspection apparatus and methods
#967Method for adjusting the coolant consumption within actively cooled components, and component
#968DEVICE CONSTRUCTS AND METHODS OF COATING LUMINESCENT PHOSPHORS FOR DISPLAY AND LIGHTING APPLICATIONS
#969Method and apparatus for treating containers
#970Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode
#971Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner
#972METHOD OF SURFACE TREATING MICROFLUIDIC DEVICES
#973DEPOSITING THIN LAYER OF MATERIAL ON PERMEABLE SUBSTRATE
#974METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE
#975Method of manufacturing a gas barrier plastic container
#976Patterned dummy wafers loading in batch type CVD
#977METHODS OF CONTROLLING TUNGSTEN FILM PROPERTIES
#978Methods of forming copper wiring and copper film, and film forming system
#979Polysilicon films by HDP-CVD
#980RADICAL STEAM CVD
#981ARTICLES INCLUDING A POROUS SUBSTRATE HAVING A CONFORMAL LAYER THEREON
#982Method of applying atomic layer deposition coatings onto porous non-ceramic substrates
#983Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates
#984External Heating of Substrate Tubes in Plasma Chemical Vapor Deposition Processes
#985Novel Nanoporous Supported Lyotropic Liquid Crystal Polymer Membranes and Methods of Preparing and Using Same
#986Rapid and uniform gas switching for a plasma etch process
#987Method of Fabrication of Carbon Nanofibers on Nickel Foam
#988SEMICONDUCTOR DEVICE HAVING OXIDIZED METAL FILM AND MANUFACTURE METHOD OF THE SAME
#989BOTTOM UP FILL IN HIGH ASPECT RATIO TRENCHES
#990Method for fabricating semiconductor device
#991METHODS FOR FORMING BARRIER/SEED LAYERS FOR COPPER INTERCONNECT STRUCTURES
#992SUBSTRATE PROCESSING APPARATUS AND FILM FORMING SYSTEM
#993STAIN-RESISTANT CONTAINER AND METHOD
#994Film formation apparatus
#995Barrier layer, film forming method, and processing system
#996Starting material for use in forming silicon oxide film and method for forming silicon oxide film using same
#997Integration of bottom-up metal film deposition
#998Method of forming conformal film having si-N bonds on high-aspect ratio pattern
#999Methods of selectively forming a material using parylene coating
#1000Method for manufacturing gas barrier thin film-coated plastic container
#1001Process to deposit diamond like carbon as surface of a shaped object
#1002Apparatus and method for plasma treatment of containers
#1003Tantalum carbide-coated carbon material and production method thereof
#1004Fabricating method of semiconductor device
#1005METHOD FOR FORMING METAL NITRIDE FILM
#1006Soft error rate (SER) reduction in advanced silicon processes
#1007Plasma activated conformal dielectric film deposition
#1008APPARATUSES AND SYSTEMS FOR FABRICATING THREE DIMENSIONAL INTEGRATED CIRCUITS
#1009Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
#1010Plasma activated conformal dielectric film deposition
#1011Depositing tungsten into high aspect ratio features
#1012Inner electrode for barrier film formation and apparatus for film formation
#1013HDP-CVD SYSTEM
#1014Atomic layer deposition apparatus
#1015Apparatus and Method for Coating Internal Surfaces of a Turbine Engine Component
#1016Method and an arrangement for vapour phase coating of an internal surface of at least one hollow article
#1017SILICON FILM FORMATION METHOD AND SILICON FILM FORMATION APPARATUS
#1018Vapor deposition of silicon dioxide nanolaminates
#1019FILM-FORMING TREATMENT JIG, PLASMA CVD APPARATUS, METAL PLATE AND OSMIUM FILM FORMING METHOD
#1020SILICON NITRIDE FILMS AND METHODS
#1021Plasma activated conformal film deposition
#1022Process, apparatus, and material for making silicon germanuim core fiber
#1023Vessel inspection apparatus and methods
#1024Machine for plasma treatment of containers comprising an integrated vacuum circuit
#1025Method for fabricating semiconductor device with buried gates
#1026Method of processing multilayer film
#1027Film-forming method and film-forming apparatus
#1028Cobalt nitride layers for copper interconnects and methods for forming them
#1029Methods for growing low-resistivity tungsten for high aspect ratio and small features
#1030Device for Treating an Inner Surface of a Work Piece
#1031Integration of bottom-up metal film deposition
#1032Process for the internal coating of hollow bodies using a plasma beam at atmospheric pressure
#1033Systems, Apparatus and Methods for Coating the Interior of a Container Using a Photolysis and/or Thermal Chemical Vapor Deposition Process
#1034Process for manufacturing glass containers and product obtained therewith
#1035Device for Plasma-Assisted Coating of the Inner Side of Tubular Components
#1036Dielectric film formation using inert gas excitation
#1037Film forming method and processing system
#1038Chemical vapor deposition for an interior of a hollow article with high aspect ratio
#1039Substrate processing method
#1040MULTILAYER FILM STRUCTURE, AND METHOD AND APPARATUS FOR TRANSFERRING NANO-CARBON MATERIAL
#1041SYSTEM AND METHOD FOR DEPOSITING COATINGS ON INNER SURFACE OF TUBULAR STRUCTURE
#1042Method for forming Cu electrical interconnection film
#1043METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE
#1044Articles of manufacture containing increased stability low concentration gases and methods of making and using the same
#1045VAPOR DEPOSITION REACTOR FOR FORMING THIN FILM ON CURVED SURFACE
#1046HYBRED POLYMER CVI COMPOSITES
#1047SEQUENTIAL DEPOSITION OF TANTALUM NITRIDE USING A TANTALUM-CONTAINING PRECURSOR AND A NITROGEN-CONTAINING PRECURSOR
#1048Single-mode fiber and production method thereof
#1049Applying vapour phase aluminide coating on airfoil internal cavities using improved method
#1050Plasma system
#1051DEVICE FOR THE PLASMA TREATMENT OF WORKPIECES
#1052Process, apparatus, and material for making silicon germanium core fiber
#1053SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#1054Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
#1055VAPOR DEPOSITION APPARATUS
#1056Method for manufacturing semiconductor device
#1057Vessel, coating, inspection and processing apparatus
#1058Method for forming copper distributing wires
#1059DLC FILM COATED PLASTIC CONTAINER, AND DEVICE AND METHOD FOR MANUFACTURING THE PLASTIC CONTAINER
#1060METHOD TO ATTACH OR IMPROVE THE ATTACHMENT OF ARTICLES
#1061Methods for depositing ultra thin low resistivity tungsten film for small critical dimension contacts and interconnects
#1062METHOD FOR FORMING TUNGSTEN CONTACTS AND INTERCONNECTS WITH SMALL CRITICAL DIMENSIONS
#1063Metal plating using seed film
#1064Enhanced etch and deposition profile control using plasma sheath engineering
#1065PLASMA DEPOSITION APPARATUS
#1066PROCESS FOR PLASMA COATING A POLYPROPYLENE OBJECT
#1067Method of forming conformal dielectric film having Si-N bonds by PECVD
#1068Methods and apparatus for controlled chemical vapor deposition
#1069DLI-MOCVD process for making electrodes for electrochemical reactors
#1070METHODS OF FORMING VAPOR THIN FILMS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES INCLUDING THE SAME
#1071Machine for the plasma treatment of containers, comprising offset depressurization/pressurization circuits
#1072Dopant Enhanced Interconnect
#1073PLASMA-DEPOSITED BARRIER COATING INCLUDING AT LEAST THREE LAYERS, METHOD FOR OBTAINING ONE SUCH COATING AND CONTAINER COATED WITH SAME
#1074APPARATUS, METHOD FOR DEPOSITING THIN FILM ON WAFER AND METHOD FOR GAP-FILLING TRENCH USING THE SAME
#1075Method and device for the infiltration of a structure of a porous material by chemical vapour deposition
#1076Method of forming conformal dielectric film having Si-N bonds by PECVD
#1077Method of depositing tungsten film with reduced resistivity and improved surface morphology
#1078Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
#1079Crack and residue free conformal deposited silicon oxide with predictable and uniform etching characteristics
#1080Method and device for manufacturing an optical preform
#1081METHODS FOR DEPOSITING TUNGSTEN FILMS HAVING LOW RESISTIVITY FOR GAPFILL APPLICATIONS
#1082Method for forming low-carbon CVD film for filling trenches
#1083Film forming method and film forming apparatus
#1084Biodegradable resin bottle and method of producing the same
#1085Filling structures of high aspect ratio elements for growth amplification and device fabrication
#1086Die for molding honeycomb structure and manufacturing method thereof
#1087Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container
#1088Device
#1089Catalytic nanoporous membranes
#1090Container having improved ease of discharge product residue, and method for the production thereof
#1091HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system
#1092High density plasma gapfill deposition-etch-deposition process etchant
#1093Apparatus and method for the plasma treatment of hollow bodies
#1094METHOD OF PLASMA TREATMENT OF A SURFACE
#1095Supply device
#1096Method of gap-filling using amplitude modulation radiofrequency power and apparatus for the same
#1097Method of forming non-conformal layers
#1098Double-sealing device for a machine for the plasma treatment of containers
#1099CVD FILM FORMING METHOD AND CVD FILM FORMING APPARATUS
#1100Articles with Two Crystalline Materials and Method of Making Same
#1101Method of coating inner and outer surfaces of pipes for thermal solar and other applications
#1102Spatially controlled atomic layer deposition in porous materials
#1103RF antenna assembly for treatment of inner surfaces of tubes with inductively coupled plasma
#1104Protective layer to enable damage free gap fill
#1105Plasma processing device, plasma processing method, and plasma surface processing method
#1106Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body
#1107Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
#1108Synthetic resin bottle
#1109SILICON STRUCTURE HAVING AN OPENING WHICH HAS A HIGH ASPECT RATIO, METHOD FOR MANUFACTURING THE SAME, SYSTEM FOR MANUFACTURING THE SAME, AND PROGRAM FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING ETCHING MASK FOR THE SILICON STRUCTURE
#1110CELLULAR LATTICE STRUCTURES WITH MULTIPLICITY OF CELL SIZES AND RELATED METHOD OF USE
#1111Method of forming noble metal layer using ozone reaction gas
#1112Heat treatment oven with inductive heating
#1113Microwave plasma processing device
#1114METHOD FOR PRODUCING SILICON OXIDE FILM, CONTROL PROGRAM THEREOF, RECORDING MEDIUM AND PLASMA PROCESSING APPARATUS
#1115METHOD AND DEVICE FOR MICROWAVE PLASMA DEPOSITION OF A COATING ON A THERMOPLASTIC CONTAINER SURFACE
#1116Reactive gases with concentrations of increased stability and processes for manufacturing same
#1117HDP-CVD SiON films for gap-fill
#1118Apparatus and method for application of a thin barrier layer onto inner surfaces of wafer containers
#1119Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
#1120METHOD AND APPARATUS FOR SURFACE TREATMENT OF CONTAINERS OR OBJECTS
#1121Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component
#1122Thin diamond like coating for semiconductor processing equipment
#1123Method and Device for Producing Process Gases for Vapor Phase Deposition
#1124Method for forming Ta-Ru liner layer for Cu wiring
#1125Method and device for the internal plasma treatment of hollow bodies
#1126Vapor deposited film by plasma CVD method
#1127BARRIER LAYER
#1128Fine laminar barrier protective layer
#1129Inner coating of lamp vessels, such as discharge vessels of gas discharge lamps
#1130Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
#1131DIAMOND-DIAMOND COMPOSITES
#1132METHOD AND PLANT FOR SIMULTANEOUSLY COATING INTERNAL AND EXTERNAL SURFACES OF METAL ELEMENTS, IN PARTICULAR BLADES FOR TURBINES
#1133Gas Supply Pipe for Plasma Treatment
#1134Articles of manufacture containing increased stability low concentration gases and methods of making and using the same
#1135Methods for forming a silicon oxide layer over a substrate
#1136Method and system for improving dielectric film quality for void free gap fill
#1137Synthetic resin containers with high barrier property
#1138Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner
#1139Method and Device for Testing the Quality of a Metallic Coating
#1140Method of aluminization in the vapor phase on hollow metal parts of a turbomachine
#1141Plasma processing plant
#1142Reduction of etch-rate drift in HDP processes
#1143Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
#1144Method of forming titanium film by CVD
#1145APPARATUS FOR TREATING WORKPIECES
#1146Impurity control in HDP-CVD DEP/ETCH/DEP processes
#1147Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container
#1148Expedited manufacture of carbon-carbon composite brake discs
#1149Method of densifying porous articles
#1150Protective coating applied to metallic reactor components to reduce corrosion products into the nuclear reactor environment
#1151Chemical vapor deposition of titanium
#1152RUTHENIUM FILM FORMATION METHOD AND COMPUTER READABLE STORAGE MEDIUM
#1153Corrosion-resistant internal coating method using a germanium-containing precursor and hollow cathode techniques
#1154Plasma enhanced bonding for improving adhesion and corrosion resistance of deposited films
#1155Apparatus and method for coating internal surfaces of a turbine engine component
#1156METHOD FOR FABRICATING AN INTERLAYER DIELECTRIC IN A SEMICONDUCTOR DEVICE
#1157Process sequence for doped silicon fill of deep trenches
#1158GAPFILL EXTENSION OF HDP-CVD INTEGRATED PROCESS MODULATION SIO2 PROCESS
#1159Film forming apparatus and film forming method
#1160Plasma immersion ion processing for coating of hollow substrates
#1161Method for Monitoring a Plasma, Device for Carrying Out this Method, Use of this Method for Depositing a Film Onto a Pet Hollow Body
#1162Seed-Assisted MOCVD Growth of Threshold Switching and Phase-Change Materials
#1163Method and system for forming thin films
#1164Cooled device for plasma depositing a barrier layer onto a container
#1165Process for Plasma Coating a Nanocomposite Object
#1166Semiconductor device having oxidized metal film and manufacture method of the same
#1167Methods for growing low-resistivity tungsten for high aspect ratio and small features
#1168Cobalt nitride layers for copper interconnects and methods for forming them
#1169METHOD FOR PRODUCING HYDROGEN GAS SEPARATION MATERIAL
#1170Method for pre-conditioning a precursor vaporization system for a vapor deposition process
#1171Method for heating a substrate prior to a vapor deposition process
#1172Hearth plate including side walls defining a processing volume
#1173Rotating Machines for Treating Containers
#1174Plasma enhanced ALD process for copper alloy seed layers
#1175Method For The Manufacture Of A Reactor To Separate Gases
#1176Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve
#1177METHODS AND DEVICES FOR COATING AN INTERIOR SURFACE OF A PLASTIC CONTAINER
#1178Zirconium-doped zinc oxide structures and methods
#1179Fabrication of composite materials using atomic layer deposition
#1180Process for producing shaped bodies of carbon fiber reinforced carbon and shaped body produced by the process
#1181Process For Plasma Coating a Polypropylene Object
#1182Method for chemical infiltration in the gas phase for the densification of porous substrates with pyrolytic carbon
#1183METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE
#1184Method of densifying thin porous substrates by chemical vapor infiltration, and a loading device for such substrates
#1185Methods, apparatuses, and systems for fabricating three dimensional integrated circuits
#1186Method for Manufacturing a Pecvd Carbon Coated Polymer Article and Article Obtained by Such Method
#1187MULTI-STEP DEP-ETCH-DEP HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION PROCESSES FOR DIELECTRIC GAPFILLS
#1188Fabrication of semiconductor metamaterials
#1189Non-wetting coating on a fluid ejector
#1190Deposition process for graded cobalt barrier layers
#1191Plasma Processing Apparatus with Scanning Injector and Plasma Processing Method
#1192Pressure swing CVI/CVD
#1193Semiconductor device having oxidized metal film and manufacture method of the same
#1194PLASMA DEPOSITION PROCESS WITH VARIABLE PROCESS PARAMETERS
#1195INSTALLATION FOR DEPOSITING, BY MEANS OF A MICROWAVE PLASMA, AN INTERNAL BARRIER COATING ON THERMOPLASTIC CONTAINERS
#1196GAP-FILL DEPOSITIONS INTRODUCING HYDROXYL-CONTAINING PRECURSORS IN THE FORMATION OF SILICON CONTAINING DIELECTRIC MATERIALS
#1197Method and an apparatus for the coating of a base body
#1198Semiconductor device having oxidized metal film and manufacture method of the same
#1199Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers
#1200Raw Material Solution for Metal Organic Chemical Vapor Deposition and Composite Oxide-Based Dielectric Thin Film Produced by Using the Raw Material