120139 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes; Coating on selected surface areas, e.g. using masks Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
METHOD OF SELECTIVELY DEPOSITING MATERIAL ON NON-METALLIC SURFACE
#2GROWTH OF GATE OXIDE LAYER WITH SILICON NITRIDE AND CONVERSION
#3DEPOSITION OF METAL-CONTAINING FILMS
#4SUPERCONDUCTING CAVITY SMOOTHNESS
#5VARIABLE PRESSURE DOSING METHOD AND SYSTEM
#6MULTI-PHASE CERAMIC MATRIX COMPOSITE
#7Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features
#8METHOD AND APPARATUS FOR DEPOSITING A CARBON-CONTAINING MATERIAL
#9METHOD FOR RECYCLING AN EFFLUENT GAS FROM CHEMICAL VAPOR DEPOSITION OR INFILTRATION
#10LOW-K DIELECTRIC FILM REPAIR FOR BOTTOM-UP METAL GROWTH
#11PROCESS FOR PREPARING SILICON-CONTAINING COMPOSITE PARTICLES
#12METHOD OF DEPOSITING FILM
#13METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#14CONTROLLABLE CARBON PECVD FILM DEPOSITION
#15SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#16SEMICONDUCTOR PROCESSING APPARATUS AND RELATED METHODS
#17INHIBITED OXIDE DEPOSITION FOR REFILLING SHALLOW TRENCH ISOLATION
#18USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED CHROMATOGRAPHY OF METAL INTERACTING ANALYTES
#19METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#20CYCLICAL DEPOSITION METHOD INCLUDING TREATMENT STEP AND APPARATUS FOR SAME
#21DEPOSITION-ETCH SPECIES IADF AND IEDF CONTROL FOR CARBON GAPFILL PROCESSES
#22Toposelective Vapor Deposition Using an Inhibitor
#23STORAGE AND DELIVERY VESSELS AND RELATED METHODS
#24METHODS FOR FILLING RECESSED FEATURES ON A SUBSTRATE WITH A FLOWABLE LAYER STRUCTURE
#25PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
#26CHEMICAL PASSIVATION OF MOLYBDENUM PLUG OR TRENCH'S OUTER SURFACE TO PREVENT MO NITRIDATION OR OXIDATION AND MAINTAIN LOW CONTACT RESISTANCE
#27IN-SITU CYCLE ALE METHOD FOR DIELECTRIC DEPOSITION FULL-FILL ON NARROW TRENCH
#28METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#29METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#30RESISTIVE COATING FOR A CAPILLARY
#31SIN FILM EMBEDDING METHOD AND FILM FORMATION APPARATUS
#32MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION
#33FILM FORMING METHOD AND FILM FORMING APPARATUS
#34SELECTIVE MOLYBDENUM FILL
#35METHODS OF FILLING GAP ON SUBSTRATE SURFACE
#36FILM FORMATION METHOD AND FILM FORMATION APPARATUS
#37METHODS AND SYSTEMS FOR COATING, CLEANING, AND INSPECTING PHARMACEUTICAL CONTAINERS FOR PARTICLES AND DEFECTS
#38FILM FORMING METHOD AND FILM FORMING APPARATUS
#39METHOD FOR PRODUCING SILICON FILM AND SILICON FILM
#40PROCESS FOR PREPARING ELECTROACTIVE MATERIALS FOR METAL-ION BATTERIES
#41Metallic Structure, Method of Preparing Same, and Electronic Device Including Same
#42METHOD OF FILLING GAP AND PROCESSING SYSTEM FOR SAME
#43METHODS OF REPAIRING LOW-K MATERIALS AFTER INTEGRATION OPERATIONS
#44CVI MATRIX DENSIFICATION PROCESS
#45METHODS OF FORMING CONDUCTIVE LINES TO REDUCE TIER DEFLECTION
#46FILM FORMING METHOD AND FILM FORMING APPARATUS
#47FILM-FORMING METHOD AND FILM-FORMING APPARATUS
#48FILM-FORMING METHOD AND FILM-FORMING APPARATUS
#49LOW K INNER SPACER FORMATION BY SELECTIVE PECVD PROCESS IN GATE-ALL-AROUND (GAA) NANOSHEET DEVICE
#50A BARRIER DEPOSIT WITHIN A SUBSTRATE
#51BOTTOM-UP GAP FILL USING NON-CONFORMAL POISONING
#52ELECTROCHEMICAL WATER SPLITTING WITH A NIVOX CATALYST
#53SUBSTRATE COMPRISING CONFORMAL METAL CARBIDE COATING
#54METAL FOAM THERMAL INTERFACE MATERIALS
#55FILM FORMING METHOD AND FILM FORMING APPARATUS
#56FILM FORMING METHOD AND FILM FORMING APPARATUS
#57NONCONFORMAL OXIDE FILM DEPOSITION USING CARBON-CONTAINING INHIBITOR
#58FILM FORMING METHOD
#59THIN FILM, METHOD OF FORMING THE SAME AND SEMICONDUCTOR DEVICE
#60METHODS OF FILLING A RECESSED FEATURE ON A SUBSTRATE EMPLOYING METAL SEQUENTIAL INFILTRATION SYNTHESIS PROCESSES
#61MOLYBDENUM DEPOSITION
#62METHOD FOR MANUFACTURING COATED TUBULAR MEMBER HAVING AMORPHOUS CARBON DEPOSITION FILM FORMED ON INNER SURF ACE OF TUBULAR MEMBER
#63HIGH-DENSITY PLASMA (HDP) TOPOGRAPHY IMPROVEMENT WITH PARTIAL GAPFILL CARBON
#64METHODS OF FORMING DIELECTRIC LAYERS THROUGH DEPOSITION AND ANNEAL PROCESSES
#65APPARATUS FOR CONTROLLING VAPOR PRESSURE OF A SUBJECT MATERIAL CONTAINED THEREIN, AND RELATED METHODS AND SYSTEMS
#66SELF-PLANARIZING SELECTIVE CARBON GAPFILL DEPOSITION
#67METHOD OF DEPOSITING SILICON NITRIDE THIN FILM IN TRENCH OF SUBSTRATE
#68CHEMICAL VAPOR DEPOSITION (CVD) AFTER HEAT TREATMENT FOR IMPROVED SILICON MELT INFILTRATION PROCESSING
#69MOLYBDENUM FILL
#70METHODS OF DEPOSITING IRIDIUM-CONTAINING FILMS FOR SEMICONDUCTOR DEVICES
#71FILM FORMING METHOD AND FILM FORMING APPARATUS
#72COMPONENT HAVING AT LEAST ONE FEATURE THAT HAS A VARYING CROSS-SECTIONAL SHAPE, SIZE, OR POSITION
#73Methods for Depositing Gap-Filling Fluids and Related Systems and Devices
#74LOCAL PART MASKING FOR IMPROVED UNIFORMITY IN CERAMIC MATRIX COMPOSITES
#75TOOLING FOR FORCED-FLOW CHEMICAL VAPOR INFILTRATION PROCESS
#76FLOWABLE CHEMICAL VAPOR DEPOSITION (FCVD) AND SACRIFICIAL ETCH PROTECTION PROCESSES
#77SUBSTRATE PROCESSING METHOD
#78COETANEOUS DEPOSITION-ETCHING FOR BOTTOM-UP CARBON GAPFILL
#79LIQUID CHROMATOGRAPHY SYSTEM AND COMPONENT
#80PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM
#81LATERAL GAP FILL
#82GROWTH SUPPRESSION DEPOSITION FOR CVD TUNGSTEN GAP FILL WITH THERMAL TREATMENT
#83METAL SILICIDE CONTACT FORMATION
#84ATOMIC LAYER DEPOSITION DEVICE FOR UNIFORM COATING ON INNER SURFACE OF DOME SHAPED SURFACE
#85METHOD OF FILLING A GAP
#86Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF) Plasma
#87SEAM PERFORMANCE IMPROVEMENT FOR LARGE AREA GAPFILL
#88METHODS AND APPARATUSES FOR FILLING A GAP
#89METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#90METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#91SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING SYSTEM
#92METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY CHEMICAL VAPOR POLYMERIZATION
#93REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES
#94ANTI-OXIDIZED METAL PIPE AND METHOD OF FABRICATING THE SAME
#95PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY
#96UNIFORM GAPFILL DEPOSITION ON SEMICONDUCTOR SUBSTRATES WITH VARYING GEOMETRIES
#97SIDEWALL PASSIVATION USING ALDEHYDE OR ISOCYANATE CHEMISTRY FOR HIGH ASPECT RATIO ETCH
#98METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#99ROBUST ONO FILMS AND METHODS OF MAKING THEREOF
#100LOW RESISTIVITY CONTACTS AND INTERCONNECTS
#101SELECTIVE BOTTOM-UP FILL
#102LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS
#103SURFACE INHIBITION ATOMIC LAYER DEPOSITION
#104APPARATUSES AND METHODS FOR FILLING A GAP
#105METHOD OF FILLING GAPS ON SUBSTRATE SURFACE USING PLASMA
#106EMBEDDING METHOD AND SUBSTRATE PROCESSING APPARATUS
#107METHODS FOR FORMING MOLYBDENUM SURFACES WITH INCREASED DIFFUSION BARRIER
#108METHOD AND APPARATUS OF EMBEDDING RUTHENIUM INTO RECESS
#109COATING TECHNOLOGY FOR PLASTIC CONTAINERS
#110ANTI-OXIDIZED METAL PIPE AND METHOD OF FABRICATING THE SAME
#111HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPROVE FILM SEAM QUALITY AND WER
#112TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
#113METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTIVE PASSIVATION
#114REMOTE PLASMA BASED DEPOSITION OF SILICON CARBIDE FILMS USING SILICON-CONTAINING AND CARBON-CONTAINING PRECURSORS
#115METHOD OF MANUFACTURE OF GRAPHENE COATED SURFACES BY ATOMIC OR MOLECULAR LAYER DEPOSITION
#116DEPOSITION OF CARBON GAPFILL MATERIALS
#117METHOD FOR PROCESSING SUBSTRATE
#118Method and system for filling a gap
#119CHEMICAL VAPOR INFILTRATION DENSIFICATION METHOD USING SINGLE-PILE PLATES FOR A SEMI-FORCED FLOW
#120SPONGE-LIKE POROUS BODY, POLISHING PAD, LIQUID ABSORBING PAD, CLEANING SPONGE, CULTIVATION SPONGE AND METHOD FOR PRODUCING SPONGE-LIKE POROUS BODY
#121Methods for Depositing Film Layers
#122GAPFILL METHOD, SYSTEM AND APPARATUS
#123CERAMIC MATRIX COMPOSITE SURFACE ROUGHNESS
#124GROWTH OF THIN OXIDE LAYER WITH SILICON NITRIDE AND CONVERSION
#125FORMING FILMS WITH IMPROVED STEP COVERAGE
#126DETERMINATION METHOD AND SUBSTRATE PROCESSING APPARATUS
#127METHODS AND SYSTEMS FOR FILLING A GAP
#128SINGLE-CYCLE RAPID DENSIFICATION OF CARBON/CARBON COMPONENTS FOR AIR AND SPACE APPLICATIONS
#129METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTURES DURING DIELECTRIC GAP FILL
#130LARGE GRAIN TUNGSTEN GROWTH IN FEATURES
#131FEATURE FILL WITH NUCLEATION INHIBITION
#132Quantum Printing Nanostructures Within Carbon Nanopores
#133SUBSTRATE PROCESSING METHOD
#134PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
#135PATTERNING OF COMPLEX METAL OXIDE STRUCTURES
#136FORMATION OF MEMORY DEVICE CHANNEL HOLES USING DOPED FILM LAYER
#137BONDING FOR HIGH-TEMPERATURE COMPOSITE APPLICATIONS
#138COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM
#139Process for preparing electroactive materials for metal-ion batteries
#140BOTTOM-UP METAL NITRIDE FORMATION
#141PROCESS GAS RAMP DURING SEMICONDUCTOR PROCESSING
#142METHOD AND APPARATUS FOR EMBEDDING RUTHENIUM IN RECESS FORMED ON SUBSTRATE SURFACE
#143METHODS AND SYSTEMS FOR FILLING A GAP
#144ELECTRONIC DEVICES COMPRISING SILICON CARBIDE MATERIALS
#145Liquid chromatography system and component
#146PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
#147PULSE-MANAGED PLASMA METHOD FOR COATING ON INTERNAL SURFACES OF WORKPIECES
#148ELECTRONIC DEVICE BASED ON MULTILAYER THIN FILM AND METHOD FOR MANUFACTURING THE SAME USING A THREE-DIMENSIONAL STRUCTURE
#149CHEMICAL VAPOR INFILTRATION TOOLING HOLE MODIFICATION FOR OPTIMIZING INFILTRATION IN CERAMIC MATRIX COMPOSITES
#150METHOD AND APPARATUS FOR EMBEDDING TUNGSTEN INTO RECESS FORMED ON SUBSTRATE
#151SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#152METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#153METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#154MULTI-LAYER FEATURE FILL
#155METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
#156METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#157METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#158METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#159METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#160METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#161METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#162METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#163SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#164COATINGS FOR TOOLING
#165NON-LINE-OF-SIGHT DEPOSITION OF COATING ON INTERNAL COMPONENTS OF ASSEMBLED DEVICE
#166FILM FORMING METHOD AND FILM FORMING DEVICE
#167CHAMFER-LESS VIA INTEGRATION SCHEME
#168SUBSTRATE PROCESSING METHOD
#169METHOD FOR FABRICATING A BLAZED GRATING
#170INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE
#171ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#172FLOATING TOOLING ASSEMBLY FOR CHEMICAL VAPOR INFILTRATION
#173Electrolyte and Method for Cobalt Electrodeposition
#174SELECTIVE METAL SELECTIVITY IMPROVEMENT WITH RF PULSING
#175ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#176PROCESSING SYSTEM AND METHODS FOR FORMING VOID-FREE AND SEAM-FREE TUNGSTEN FEATURES
#177METHOD OF FORMING PATTERN STRUCTURE INCLUDING SILICON NITRIDE
#178ATOMIC LAYER DEPOSITION COATED PHARMACEUTICAL PACKAGING AND IMPROVED SYRINGES AND VIALS, E.G. FOR LYOPHILIZED/COLD-CHAIN DRUGS/VACCINES
#179AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION
#180SUBSTRATE TREATMENT APPARATUS USING SUPERCRITICAL FLUID
#181FILM FORMING METHOD, PROCESSING APPARATUS, AND PROCESSING SYSTEM
#182LOW RESISTIVITY GAPFILL
#183DEPOSITION METHOD AND DEPOSITION APPARATUS
#184Methods for increasing the density of high-index nanoimprint lithography films
#185PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY
#186METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM OVER A DIELECTRIC SURFACE OF A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
#187SUBSTRATE PROCESSING METHOD
#188SUBSTRATE PROCESSING METHOD
#189Conformal deposition of silicon carbide films
#190ACOUSTIC WAVE ASSISTED CHEMICAL VAPOR IINFILTRATION
#191FLOATING TOOLING ASSEMBLY FOR CHEMICAL VAPOR INFILTRATION
#192Electrolyte and Method for Cobalt Electrodeposition
#193Nanoporous GaN on p-type GaN: A Mg out-diffusion compensation layer for heavily Mg-doped p-type GaN
#194FILM FORMING METHOD AND FILM FORMING APPARATUS
#195Method of coating onto fabric substrates by means of plasma
#196Selective Deposition of Thin Films with Improved Stability
#197STACKING TOOL FIXTURE FOR FORCED FLOW CHEMICAL VAPOR INFILTRATION
#198Methods for Forming Low Resistivity Contacts
#199METHOD FOR FORMING CARBONACEOUS STRUCTURE AND SUBSTRATE HAVING THE CARBONACEOUS STRUCTURE
#200METHODS FOR PROVIDING A PRECURSOR MIXTURE TO A REACTION CHAMBER
#201Semiconductor Device, Method and Machine of Manufacture
#202METHOD OF FORMING SILICON NITRIDE FILM AND FILM FORMING APPARATUS
#203PECVD coated pharmaceutical packaging
#204SUBSTRATE PROCESSING METHOD
#205SUBSTRATE PROCESSING METHOD
#206SUBSTRATE PROCESSING METHOD
#207METHOD OF FORMING MATERIAL WITHIN A RECESS
#208AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITION METHOD AND NiVOx MATERIAL FOR ELECTROCHEMICAL WATER OXIDATION
#209METHOD FOR FORMING LAYER ON DIFFERENT-DENSITY PATTERN REGIONS
#210METHODS OF SELECTIVE DEPOSITION OF MOLYBDENUM
#211Depositing coatings on and within housings, apparatus, or tools utilizing counter current flow of reactants
#212BOTTOM UP MOLYBDENUM GAPFILL
#213CONFORMAL MOLYBDENUM DEPOSITION
#214POROUS INORGANIC FILMS VIA POLYMER SWELLING INFILTRATION
#215METHOD OF DEPOSITING SILICON BASED DIELECTRIC FILM
#216METHOD FOR FORMING CARBON FILM AND FILM FORMING APPARATUS
#217LOW RESISTANCE PULSED CVD TUNGSTEN
#218Composites and methods of forming composites having friction and wear plugs
#219METHOD FOR FORMATION OF CONFORMAL ALD SIO2 FILMS
#220PROCESS FOR MANUFACTURING SILICON-CONTAINING MATERIALS
#221NANOMATERIAL MANUFACTURING METHODS
#222SEAL PLATES FOR CHEMICAL VAPOR INFILTRATION & DEPOSITION CHAMBERS
#223Infiltrated carbon nanotubes
#224FILM FORMING METHOD AND FILM FORMING APPARATUS
#225PROCESS FOR PREPARING SILICON-CONTAINING COMPOSITE PARTICLES
#226USE OF VAPOR DEPOSITION COATED FLOW PATHS FOR IMPROVED CHROMATOGRAPHY OF METAL INTERACTING ANALYTES
#227INORGANIC POROUS COATINGS AND METHODS OF MAKING THE SAME
#228SYRINGE WITH PECVD LUBRICATION
#229FILLING METHOD AND FILM FORMING APPARATUS
#230Quantum printing nanostructures within carbon nanopores
#231Method of Filling Gaps with Carbon and Nitrogen Doped Film
#232LOW TEMPERATURE FLOWABLE VANADIUM OXIDE GAP FILL
#233SIN FILM EMBEDDING METHOD AND FILM FORMATION APPARATUS
#234METHOD OF FORMING STRUCTURE INCLUDING A DOPED ADHESION FILM
#235CVI matrix densification process
#236Gapfill Process Using Pulsed High-Frequency Radio-Frequency (HFRF) Plasma
#237Method and apparatus for filling a gap
#238DEVICE FOR DIFFUSING A PRECURSOR WITH A CONTAINER HAVING AT LEAST ONE POROUS ELEMENT ALLOWING THE GENERATION OF AN AEROSOL TOWARDS A GROWTH SURFACE
#239Low refractive index surface layers and related methods
#240METHOD AND DEVICE FOR THE OUTER-WALL AND/OR INNER-WALL COATING OF HOLLOW BODIES
#241RESISTIVE COATING FOR A CAPILLARY
#242VIBRO-THERMALLY ASSISTED CHEMICAL VAPOR INFILTRATION
#243METHOD AND PACKAGE FOR REDUCING THE DEGRADATION OF A DRUG AND/OR EXCIPIENT, E.G. POLYSORBATE STABILIZER, IN A PHARMACEUTICAL PRODUCT
#244COMBINED SELF-FORMING BARRIER AND SEED LAYER BY ATOMIC LAYER DEPOSITION
#245METHODS AND SYSTEMS FOR FILLING GAP FEATURES ON SUBSTRATE SURFACES
#246LOW RESISTANCE GATE OXIDE METALLIZATION LINER
#247Quantum printing methods
#248Bifurcated fabric architecture for airfoils, methods of manufacture thereof and airfoils comprising the same
#249High Performance Bifunctional Porous Non-Noble Metal Phosphide Catalyst for Overall Water Splitting
#250DEVICES HAVING A RARE EARTH (OXY) FLUORIDE COATING FOR IMPROVED RESISTANCE TO CORROSIVE CHEMICAL ENVIRONMENTS AND METHODS FOR MAKING AND USING THESE DEVICES
#251METHOD FOR FUNCTIONALIZING A POLYMER-BASED SUBSTRATE BY CHEMICAL DEPOSITION OF A THIN LAYER
#252Methods of manufacturing semiconductor devices
#253COATED ITEMS AND MANUFACTURING THEREOF
#254Ceramic matrix composite component having low density core and method of making
#255CONFORMAL THERMAL CVD WITH CONTROLLED FILM PROPERTIES AND HIGH DEPOSITION RATE
#256Ceramic matrix composite surface roughness
#257Method for depositing a coating on a yarn in a microwave field
#258PACKAGES COMPRISING ANTI-MICROBIAL COATINGS FOR PREVENTING CONTAMINATION, E.G. AFTER FIRST USE OF THE PRODUCT
#259METHOD FOR PROCESSING NEGATIVE ELECTRODE PLATE, SODIUM-METAL NEGATIVE ELECTRODE PLATE AND RELATED DEVICE
#260TRANSPARENT MESOPOROUS MATERIALS AND DEVICES COMPRISING SAME
#261Air data probe corrosion protection
#262THIN FILM DEPOSITION METHOD AND METHOD OF FABRICATING ELECTRONIC DEVICE USING THE SAME
#263Method for coating fibers in a fluidized bed
#264METAL COMPONENTS WITH INERT VAPOR PHASE COATING ON INTERNAL SURFACES
#265METHOD FOR FABRICATING CERAMIC MATRIX COMPOSITE COMPONENTS
#266SEALING SURFACES OF COMPONENTS USED IN PLASMA ETCHING TOOLS USING ATOMIC LAYER DEPOSITION
#267SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#268METHOD AND APPARATUS FOR FILLING A GAP
#269CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS PRECURSOR INTERACTION
#270PARTICLE ENHANCEMENT OF CERAMIC MATRIX COMPOSITES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME
#271Sequential infiltration synthesis apparatus
#272Methods of forming low resistivity titanium nitride thin film in horizontal vias and related devices
#273SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL
#274Method for coating short fibres
#275entitled METHOD FOR PREPARING A CATALYST FOR ENVIRONMENTAL DECONTAMINATION BY MEANS OF NON-SELECTIVE REDUCTIVE HETEROGENEOUS ELECTROCATALYSIS
#276Method and system for forming a conformal silicon carbon nitride layer and structure formed using same
#277SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#278Method for densifying composite matertals
#279LOSS PREVENTION DURING ATOMIC LAYER DEPOSITION
#280Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus
#281METHOD FOR PRODUCING POROUS BASE MATERIAL HAVING PORE WITH SURFACE MODIFIED AND POROUS BASE MATERIAL HAVING PORE WITH SURFACE MODIFIED
#282REACTANT GAS PULSE DELIVERY
#283ATMOSPHERIC PRESSURE REMOTE PLASMA CVD DEVICE, FILM FORMATION METHOD, AND PLASTIC BOTTLE MANUFACTURING METHOD
#284MICROFLUIDIC MEMS DEVICE COMPRISING A BURIED CHAMBER AND MANUFACTURING PROCESS THEREOF
#285Atomic Layer Deposition (ALD) for Multi-Layer Ceramic Capacitors (MLCCs)
#286Methods and systems for filling a gap
#287Percolation doping of inorganic-organic frameworks for multiple device applications
#288SUBSTRATE PROCESSING METHOD
#289FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING SYSTEM
#290VESSELS, CONTAINERS, AND SURFACES COATED WITH WATER BARRIER COATINGS
#291STORAGE AND DELIVERY VESSELS AND RELATED METHODS
#292BIOPHARMACEUTICAL MANUFACTURING PROCESS AND PRODUCT
#293Quantum printing apparatus and method of using same
#294DEVICE AND METHOD FOR COATING CHANNELS OF A SAMPLE BY MEANS OF VAPOR DEPOSITION
#295TOPOLOGY-SELECTIVE DEPOSITION METHOD AND STRUCTURE FORMED USING SAME
#296Method for depositing a gap-fill layer by plasma-assisted deposition
#297METHOD OF FORMING A STRUCTURE INCLUDING A SILICON CARBIDE LAYER
#298TUNGSTEN FEATURE FILL WITH NUCLEATION INHIBITION
#299DIELECTRIC FILLED NANOSTRUCTURED SILICA SUBSTRATE FOR FLAT OPTICAL DEVICES
#300Mask and deposition apparatus including the same