120170 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material; Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides Nitrides
METHOD OF FORMING TITANIUM NITRADE (TiN) FILM, NONVOLATILE MEMORY DEVICE USING THE TiN FILM, AND METHOD OF MANUFACTURING THE NONVOLATILE MEMORY DEVICE
#902Methods of forming nanocomposites containing nanodiamond particles by vapor deposition
#903SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#904Corrosion-resistant article coated with aluminum nitride
#905Method for forming an aluminum nitride thin film
#906ALD method of forming thin film comprising a metal
#907METHOD FOR COATING A SLIDING ELEMENT AND SLIDING ELEMENT, IN PARTICULAR A PISTON RING
#908Semiconductor device including high-k/metal gate electrode
#909Semiconductor device manufacturing method and substrate processing apparatus
#910Deposition of Ta- or Nb-doped high-k films
#911Titanium nitride films
#912Method of manufacturing p-type nitride semiconductor and semiconductor device fabricated by the method
#913Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
#914Method of manufacturing semiconductor device and method of processing substrate
#915METHOD FOR FORMING METAL NITRIDE FILM
#916Gas exhaust system of film-forming apparatus, film-forming apparatus, and method for processing exhaust gas
#917Method of CVD-depositing a film having a substantially uniform film thickness
#918Selective deposition of noble metal thin films
#919Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#920Surface-coated cutting tool
#921Method for fabricating semiconductor thin film using substrate irradiated with focused light, apparatus for fabricating semiconductor thin film using substrate irradiated with focused light, method for selectively growing semiconductor thin film using substrate irradiated with focused light, and semiconductor element using substrate irradiated with focused light
#922Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
#923METHOD FOR FORMING TANTALUM NITRIDE FILM AND FILM-FORMING APPARATUS FOR FORMING THE SAME
#924Apparatus and methods for safely providing hazardous reactants
#925GAS INJECTORS FOR CVD SYSTEMS WITH THE SAME
#926Growth method of FeN material
#927High concentration nitrogen-containing germanium telluride based memory devices and processes of making
#928THIN FILMS
#929Atomic layer deposition methods
#930Method for fabricating semiconductor device with buried gates
#931Cobalt nitride layers for copper interconnects and methods for forming them
#932Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performance
#933Method of depositing a metal-containing dielectric film
#934IN-SITU ACCEPTOR ACTIVATION WITH NITROGEN AND/OR OXYGEN PLASMA TREATMENT
#935Titanium Nitride Film Deposition by Vapor Deposition Using Cyclopentadienyl Alkylamino Titanium Precursors
#936Enhanced work function layer supporting growth of rutile phase titanium oxide
#937Process for the internal coating of hollow bodies using a plasma beam at atmospheric pressure
#938Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces
#939Method of manufacturing semiconductor device and substrate processing apparatus
#940Phase change memory device
#941Hardmetal for use in oil and gas drilling applications
#942METHOD OF FORMING MIXED RARE EARTH OXIDE AND ALUMINATE FILMS BY ATOMIC LAYER DEPOSITION
#943SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING APPARATUS
#944Self-aligned barrier and capping layers for interconnects
#945FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM
#946Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
#947Method and system for binding halide-based contaminants
#948Wear resistant coatings for tool dies
#949Hardmask materials
#950Hardmask materials
#951Semiconductor device including carbon-containing electrode and method for fabricating the same
#952Coating process and corrosion protection coating for turbine components
#953Method of manufacturing P-type ZnO semiconductor layer using atomic layer deposition and thin film transistor including the P-type ZnO semiconductor layer
#954Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
#955SEQUENTIAL DEPOSITION OF TANTALUM NITRIDE USING A TANTALUM-CONTAINING PRECURSOR AND A NITROGEN-CONTAINING PRECURSOR
#956Semiconductor device manufacturing method and substrate processing apparatus
#957MASK PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#958Methods of Fabricating a Barrier Layer Over Interconnect Structures in Atomic Deposition Environments
#959Work piece with a hard film of AlCr-containing material, and process for its production
#960Method of manufacturing semiconductor device, substrate processing apparatus, and semiconductor device
#961Process for producing SiCAlNbase material, process for producing epitaxial wafer, SiCAlNbase material, and epitaxial wafer
#962PHOTOMASK ETCHING METHOD FOR CHEMICAL VAPOR DEPOSITION FILM
#963System for Depositing a Film by Modulated Ion-Induced Atomic Layer Deposition (MII-ALD)
#964THIN FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE THIN FILM
#965Methods of forming a semiconductor device including a metal silicon nitride layer
#966Body coated with hard material
#967Titanium dioxide particles coated via an atomic layer deposition process
#968INTERCONNECT STRUCTURES WITH A METAL NITRIDE DIFFUSION BARRIER CONTAINING RUTHENIUM
#969Substrate processing apparatus and manufacturing method of semiconductor device using plasma generation
#970Formation of a tantalum-nitride layer
#971Vapor deposition reactor and method for forming thin film
#972Method of manufacturing a semiconductor device
#973Film forming method and substrate processing apparatus
#974Method of manufacturing a semiconductor device and substrate processing apparatus
#975Method for forming copper distributing wires
#976SOLUTION BASED ZIRCONIUM PRECURSORS FOR ATOMIC LAYER DEPOSITION
#977Nanolayer deposition using bias power treatment
#978HVPE precursor source hardware
#979HVPE chamber hardware
#980Coated PCBN cutting insert, coated PCBN cutting tool using such coated PCBN cutting insert, and method for making the same
#981HEAT TREATMENT APPARATUS AND CONTROL METHOD THEREFOR
#982Gas delivery apparatus and method for atomic layer deposition
#983Metal compound, material for chemical vapor phase growth, and process for forming metal-containing thin film
#984Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta0thin films
#985METHOD OF FORMING MULTI METAL LAYERS THIN FILM ON WAFER
#986SEMICONDUCTOR DEVICE WITH GATE DIELECTRIC CONTAINING MIXED RARE EARTH ELEMENTS
#987Bodies coated with a hard material and method for the production thereof
#988METHOD FOR FORMING W-BASED FILM, METHOD FOR FORMING GATE ELECTRODE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#989Method of forming capacitors
#990Protection of conductors from oxidation in deposition chambers
#991METHOD FOR FORMING TI FILM AND TIN FILM, CONTACT STRUCTURE, COMPUTER READABLE STORAGE MEDIUM AND COMPUTER PROGRAM
#992Method for forming thin film using radicals generated by plasma
#993Tantalum amide complexes for depositing tantalum-containing films, and method of making same
#994Method for forming tantalum nitride film
#995METHOD FOR FORMING TRENCH ISOLATION USING GAS CLUSTER ION BEAM PROCESSING
#996Cutting tool, manufacturing method thereof and cutting method
#997Titanium silicon nitride deposition
#998DENSIFICATION PROCESS FOR TITANIUM NITRIDE LAYER FOR SUBMICRON APPLICATIONS
#999Selective deposition of noble metal thin films
#1000PROCESS FOR FORMING HIGH RESISTIVITY THIN METALLIC FILM
#1001Surface Coated Member and Manufacturing Method Thereof, and Cutting Tool
#1002Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#1003Multilayer CVD-coating and tool with such a coating
#1004DEPOSITION METHOD OF TERNARY FILMS
#1005VAPOR DEPOSITION METHOD FOR TERNARY COMPOUNDS
#1006Plasma treatment apparatus and plasma treatment method
#1007Integration of ALD tantalum nitride for copper metallization
#1008In-situ chamber treatment and deposition process
#1009Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition
#1010FILM FORMING METHOD
#1011BARRIER METAL FILM PRODUCTION APPARATUS, BARRIER METAL FILM PRODUCTION METHOD, METAL FILM PRODUCTION METHOD, AND METAL FILM PRODUCTION APPARATUS
#1012Process for deposition of non-oxide ceramic coatings
#1013METHOD OF CLEANING FILM FORMING APPARATUS AND FILM FORMING APPARATUS
#1014ALD METHOD AND APPARATUS
#1015Method of manufacturing semiconductor device and substrate processing apparatus
#1016Superhard dielectric compounds and methods of preparation
#1017Metal heterocyclic compounds for deposition of thin films
#1018Method of forming high-k dielectric films based on novel titanium, zirconium, and hafnium precursors and their use for semiconductor manufacturing
#1019Chemical vapor deposition apparatus, film forming method, and method of manufacturing semiconductor device
#1020FILM FORMING METHOD AND APPARATUS
#1021Atomic layer deposition methods
#1022SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#1023METHOD OF FORMING A COBALT METAL NITRIDE BARRIER FILM
#1024Method for forming tantalum nitride film
#1025Tantalum lanthanide oxynitride films
#1026Apparatus and Method of Film Formation
#1027COATED ARTICLE AND METHOD OF MAKING THE SAME
#1028Cutting tool, process for producing the same, and method of cutting
#1029Atomic layer deposition systems and methods including silicon-containing tantalum precursor compounds
#1030A PROCESSING METHOD FOR PROCESSING A SUBSTRATE PLACED ON A PLACEMENT STAGE IN A PROCESS CHAMBER
#1031Coated Cutting Tool Insert
#1032Ruthenium alloy film for copper interconnects
#1033Article having nano-scaled structures and a process for making such article
#1034Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
#1035METHOD OF FORMING TASIN FILM
#1036Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
#1037GROUP-III NITRIDE COMPOUND SEMICONDUCTOR DEVICE AND PRODUCTION METHOD THEREOF, GROUP-III NITRIDE COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE AND PRODUCTION METHOD THEREOF, AND LAMP
#1038EXHAUST STRUCTURE OF FILM-FORMING APPARATUS, FILM-FORMING APPARATUS, AND METHOD FOR PROCESSING EXHAUST GAS
#1039Method for Forming Tantalum Nitride Film
#1040Method for forming tantalum nitride film
#1041Method for forming tantalum nitride film
#1042Method for depositing tungsten-containing layers by vapor deposition techniques
#1043Method and apparatus for generating a precursor for a semiconductor processing system
#1044METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#1045Method of Film Deposition and Film Deposition System
#1046Method of film deposition
#1047METHODS FOR MODIFICATION OF POLYMERS, FIBERS AND TEXTILE MEDIA
#1048Electronic device having a hafnium nitride and hafnium oxide film
#1049Method of Forming Thin Film and Method of Manufacturing Semiconductor Device
#1050METAL COMPOUND DOTS DIELECTRIC PIECE
#1051Hard-material-coated bodies and method for their production
#1052Method of manufacturing p-type nitride semiconductor and semiconductor device fabricated by the method
#1053METHOD FOR TREATING SUBSTRATE AND RECORDING MEDIUM
#1054Plasma-enhanced cyclic layer deposition process for barrier layers
#1055Methods for forming a dielectric layer within trenches
#1056Method for forming tantalum nitride film
#1057Method of film formation and computer-readable storage medium
#1058Film forming apparatus and method, gas supply device and storage medium
#1059METHOD FOR FORMING ULTRA-THIN BORON-CONTAINING NITRIDE FILMS AND RELATED APPARATUS
#1060MULTI-GAS SPIRAL CHANNEL SHOWERHEAD
#1061MULTI-GAS CONCENTRIC INJECTION SHOWERHEAD
#1062Thin films
#1063Titanium complexes, their production methods, titanium-containing thin films, and their formation methods
#1064METHODS AND APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE IN A PROCESSING CHAMBER
#1065Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films
#1066Cobalt precursors for semiconductor applications
#1067NITRIDE SEMICONDUCTOR MATERIAL AND PRODUCTION PROCESS OF NITRIDE SEMICONDUCTOR CRYSTAL
#1068Method of forming a layer on a semiconductor substrate
#1069Method and apparatus for providing precursor gas to a processing chamber
#1070Tantalum amide complexes for depositing tantalum-containing films, and method of making same
#1071Plasma enhanced cyclic deposition method of metal silicon nitride film
#1072Method for depositing thin films by mixed pulsed CVD and ALD
#1073Manufacturing method of semiconductor device including filling a connecting hole with metal film
#1074Method of forming a phase change memory device
#1075Method for forming inorganic silazane-based dielectric film
#1076Tungsten nitride atomic layer deposition processes
#1077Atomic layer deposition systems and methods including silicon-containing tantalum precursor compounds
#1078Deposition of Ta- or Nb-doped high-k films
#1079In situ silicon and titanium nitride deposition
#1080METHOD OF FABRICATING AN INTEGRATED CIRCUIT
#1081Method for depositing titanium nitride films for semiconductor manufacturing
#1082Plasma processing, deposition and ALD methods
#1083Periodic plasma annealing in an ALD-type process
#1084Method for depositing titanium nitride films for semiconductor manufacturing
#1085Cobalt nitride layers for copper interconnects and methods for forming them
#1086Strained metal silicon nitride films and method of forming
#1087Strained metal nitride films and method of forming
#1088Strained metal silicon nitride films and method of forming
#1089Method of Forming Thin Film, Thin Film Forming Apparatus, Program and Computer-Readable Information Recording Medium
#1090Strained metal nitride films and method of forming
#1091Cutting insert having ceramic coating
#1092Method of forming crystallographically stabilized doped hafnium zirconium based films
#1093Film-forming method
#1094Precoat film forming method, idling method of film forming device, loading table structure, film forming device and film forming method
#1095Chemical precursor ampoule for vapor deposition processes
#1096Apparatus and method for fabricating semiconductor devices and substrates
#1097PROCESS FOR TUNGSTEN NITRIDE DEPOSITION BY A TEMPERATURE CONTROLLED LID ASSEMBLY
#1098Interconnect structures with a metal nitride diffusion barrier containing ruthenium and method of forming
#1099Temperature controlled lid assembly for tungsten nitride deposition
#1100Vacuum film-forming apparatus
#1101Selective Deposition of Noble Metal Thin Films
#1102Method for Forming Tantalum Nitride Film
#1103METHOD OF FORMING A TITANIUM ALUMINUM NITRIDE LAYER AND METHOD OF MANUFACTURING A PHASE-CHANGE MEMORY DEVICE USING THE SAME
#1104Plasma-enhanced ALD of tantalum nitride films
#1105Passivated stoichiometric metal nitride films
#1106Method of manufacturing P-type ZnO semiconductor layer using atomic layer deposition and thin film transistor including the P-type ZnO semiconductor layer
#1107METHOD AND APPARATUS FOR LOW TEMPERATURE AND LOW K SiBN DEPOSITION
#1108Cyclic chemical vapor deposition of metal-silicon containing films
#1109Radical Processing of a Sub-Nanometer Insulation Film
#1110Organometallic precursor compounds
#1111Work piece with a hard film of ALCR-containing material, and process for its production
#1112In-Situ Formation of Metal Insulator Metal Capacitors
#1113Vortex chamber lids for atomic layer deposition
#1114Methods of fabricating a barrier layer with varying composition for copper metallization
#1115ALD of metal-containing films using cyclopentadienyl compounds
#1116VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION
#1117Method of fabricating metal compound dots dielectric piece
#1118Silicon lanthanide oxynitride films
#1119PROCESSING SYSTEM CONTAINING A HOT FILAMENT HYDROGEN RADICAL SOURCE FOR INTEGRATED SUBSTRATE PROCESSING
#1120Systems and methods of forming refractory metal nitride layers using organic amines
#1121Systems and methods for forming metal-containing layers using vapor deposition processes
#1122Silicon-alloy based barrier layers for integrated circuit metal interconnects
#1123PRECURSORS AND HARDWARE FOR CVD AND ALD
#1124Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device using the same
#1125Hafnium aluminium oxynitride high-K dielectric and metal gates
#1126Formation of Titanium Nitride Film
#1127Tantalum lanthanide oxynitride films
#1128Method for producing a doped nitride film, doped oxide film and other doped films
#1129METHOD OF FORMING A MATERIAL LAYER
#1130Gas delivery apparatus for atomic layer deposition
#1131ATOMIC LAYER DEPOSITION PROCESS
#1132Organometallic compounds
#1133ARTICLE HAVING NANO-SCALED STRUCTURES AND A PROCESS FOR MAKING SUCH ARTICLE
#1134Process For Producing Glass Plate With Thin Film
#1135Deposition processes for tungsten-containing barrier layers
#1136Method of producing dies for extrusion molding of honeycomb structure bodies
#1137Deposition of complex nitride films
#1138Metal (IV) tetra-amidinate compounds and their use in vapor deposition
#1139Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#1140Apparatus for integration of barrier layer and seed layer
#1141Barrier metal film production method
#1142METHOD AND APPARATUS FOR PHOTO-EXCITATION OF CHEMICALS FOR ATOMIC LAYER DEPOSITION OF DIELECTRIC FILM
#1143Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer program
#1144UV activation of NH3 for III-N deposition
#1145Nanolayer Thick Film Processing System
#1146Method for depositing a barrier layer on a low dielectric constant material
#1147ALD method and apparatus
#1148Method of forming mixed rare earth nitride and aluminum nitride films by atomic layer deposition
#1149METHOD OF FORMING MIXED RARE EARTH OXIDE AND ALUMINATE FILMS BY ATOMIC LAYER DEPOSITION
#1150Semiconductor device with gate dielectric containing mixed rare earth elements
#1151Transistor of semiconductor device and method for manufacturing the same
#1152Method for depositing tungsten-containing layers by vapor deposition techniques
#1153Titanium nitride films
#1154Method for forming dielectric or metallic films
#1155Production of elemental films using a boron-containing reducing agent
#1156Controlling the temperature of a substrate in a film deposition apparatus
#1157METHODS OF FORMING METAL LAYERS USING METAL-ORGANIC CHEMICAL VAPOR DEPOSITION
#1158Method of manufacturing film
#1159Systems and methods of forming refractory metal nitride layers using disilazanes
#1160Method for forming metal line in a semiconductor device
#1161Chemical vapor deposition chamber for depositing titanium silicon nitride films for forming phase change memory devices
#1162Semiconductor device and method of forming the same
#1163Surface coated cutting tool
#1164Automatic layer deposition process
#1165Coated inserts
#1166Method for producing silicon nitride films and silicon oxynitride films by chemical vapor deposition
#1167Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)
#1168Processing method
#1169Coated cutting tool insert
#1170Systems and methods of forming refractory metal nitride layers using disilazanes
#1171Methods of fabricating interconnects for semiconductor components
#1172Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#1173ALD film forming method
#1174Large aluminum nitride crystals with reduced defects and methods of making them
#1175Coated cutting tool insert
#1176Method of producing thin films
#1177Tantalum amide complexes for depositing tantalum-containing films, and method of making same
#1178Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#1179Apparatus for thermal and plasma enhanced vapor deposition and method of operating
#1180Method and apparatus for providing precursor gas to a processing chamber
#1181INTEGRATION PROCESS OF TUNGSTEN ATOMIC LAYER DEPOSITION FOR METALLIZATION APPLICATION
#1182Conformal lining layers for damascene metallization
#1183Fuel cell component having a durable conductive and hydrophilic coating
#1184Method for providing gas to a processing chamber
#1185Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#1186Atomic layer deposition methods
#1187Chemical vapor deposition of TiN films in a batch reactor
#1188Method and apparatus for generating a precursor for a semiconductor processing system
#1189Semiconductor devices and fabrication methods thereof
#1190System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
#1191Method of forming a tantalum-containing layer from a metalorganic precursor
#1192Method of forming a tantalum-containing layer from a metalorganic precursor
#1193Atomic layer deposition systems and methods including silicon-containing tantalum precursor compounds
#1194Thin film forming method
#1195Manufacturing method of semiconductor device and substrate processing apparatus
#1196Process for producing thin hafnium or zirconium nitride coatings
#1197Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)
#1198Method of forming plasma and method of forming a layer using the same
#1199Semiconductor device including diffusion barrier and method for manufacturing the same
#1200Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes