120276 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
Compositions and methods using same for deposition of silicon-containing film
#902Fabrication and application of nanofiber ribbons and sheets and twisted and non-twisted nanofiber yarns
#903Methods and apparatuses for increasing reactor processing batch size
#904Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber
#905Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate
#906Method of fabricating substrate for culturing stem cell
#907Method of making aluminum-free neopentasilane
#908Chemical vapor deposition during additive manufacturing
#909Neural interface probe employing amorphous silicon carbide
#910Vacuum-coating system for coating lenses
#911Intermediate layer formed between base material and DLC layer and film-forming method thereof
#912Method for producing a graphene film
#913Organosilane precursors for ALD/CVD silicon-containing film applications and methods of using the same
#914BORON FILM REMOVING METHOD, AND PATTERN FORMING METHOD AND APPARATUS USING BORON FILM
#915Deposition radial and edge profile tunability through independent control of TEOS flow
#916Remote plasma oxidation chamber
#917Transfer-free method for producing graphene thin film
#918Monopole antenna array source with gas supply or grid filter for semiconductor process equipment
#919Monopole antenna array source for semiconductor process equipment
#920Monopole antenna array source with phase shifted zones for semiconductor process equipment
#921Chemical vapor deposition system including ground strap bar
#922DIFFUSER FOR UNIFORMITY IMPROVEMENT IN DISPLAY PECVD APPLICATIONS
#923Epitaxial growing device and method for making epitaxial structure using the same
#924Wafer Edge Contact Hardware and Methods to Eliminate Deposition at Wafer Backside Edge and Notch
#925Polymeric surface having reduced biomolecule adhesion to thermoplastic articles of such substrate
#926Plasma source for rotating susceptor
#927High registration particles-transferring system
#928Device and method for vacuum coating
#929Wafer positioning pedestal for semiconductor processing
#930Laminated film
#931Support ring with masked edge
#932METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS ON INSULATOR SURFACES
#933ACTIVE SWITCH ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL USING THE SAME
#934Electrode assembly
#935Method for depositing high deposition rate, thick tetraethyl orthosilicate film with low compressive stress, high film stability and low shrinkage
#936Coating method of separator for fuel cell and separator for fuel cell
#937Plasma-resistant member
#938FILM FORMATION APPARATUS AND FILM FORMATION METHOD
#939Fully Dense, Fluid Tight and Low Friction Coating Systems for Dynamically Engaging Load Bearing Surfaces for High Pressure High Temperature Applications
#940Ultra-high temperature precipitation process for manufacturing polysilicon
#941Repaired Airfoil with Improved Coating System and Methods of Forming the Same
#942Treatment approach to improve film roughness by improving nucleation/adhesion of silicon oxide
#943Fabrication method for two-dimensional materials
#944METHOD FOR MANUFACTURING COATED SUBSTRATES, COATED SUBSTRATES, USE THEREOF, AND SYSTEMS FOR MANUFACTURING COATED SUBSTRATES
#945SHEET AND LAMINATE
#946Feature fill with nucleation inhibition
#947SUBSTRATE PROCESSING APPARATUS
#948FULLY DENSE, FLUID TIGHT AND LOW FRICTION COATING SYSTEMS FOR DYNAMICALLY ENGAGING LOAD BEARING SURFACES FOR HIGH PRESSURE HIGH TEMPERATURE APPLICATIONS
#949Packaging for high purity solvents
#950Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)
#951Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)
#952Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors
#953Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials
#954BIOSENSOR USING DNA-BASED CONDUCTIVE NANOWIRE AND METHOD FOR MANUFACTURING THE SAME
#955Plasma resistant coating of porous body by atomic layer deposition
#956Plasma resistant coating of porous body by atomic layer deposition
#957Polymer substrate with hardcoat layer, and manufacturing method for same
#958Application of bottom purge to increase clean efficiency
#959APPARATUS FOR PROCESSING A SURFACE OF SUBSTRATE AND METHOD OPERATING THE APPARATUS
#960PECVD process
#961Modulating the microstructure of metallic interconnect structures
#962Reactors for plasma-assisted processes and associated methods
#963High throughput vacuum deposition sources and system
#964REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON CARBIDE FILM
#965Systems and methods for internal surface conditioning assessment in plasma processing equipment
#966Multi-layer plasma resistant coating by atomic layer deposition
#967Piston ring and method for manufacturing same
#968Gas distribution apparatus for processing chambers
#969Self-aligned nanodots for 3D NAND flash memory
#970Method of manufacturing semiconductor device
#971Apparatus with concentric pumping for multiple pressure regimes
#972Item Having Optimized Adhesive Properties and Comprising a Silicon Organic Layer
#973Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same
#974Plasma erosion resistant thin film coating for high temperature application
#975Method for PECVD overlay improvement
#976Substrate processing apparatus
#977Meta-optical device and method of manufacturing the same
#978Radical gas generation system
#979Techniques for filling a structure using selective surface modification
#980Boron doped tungsten carbide for hardmask applications
#981Structure for electric energy storage using carbon nanotubes
#982METHOD FOR PECVD DEPOSITION OF A GRAPHENE-BASED LAYER ON A SUBSTRATE
#983Apparatus and methods for wafer chucking on a susceptor for ALD
#984Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing
#985Wafer chuck and processing arrangement
#986Method and apparatus for semiconductor processing chamber isolation for reduced particles and improved uniformity
#987Multi-layer plasma resistant coating by atomic layer deposition
#988Method and device for the surface treatment of substrates
#989Substrate treating apparatus and substrate treating method
#990Selective deposition of thin film dielectrics using surface blocking chemistry
#991Encapsulating film stacks for OLED applications with desired profile control
#992Plasma treatment apparatus
#993Method and apparatus for depositing a monolayer on a three dimensional structure
#994Method of manufacturing semiconductor device
#995Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#996LAMINATED FILM AND METHOD FOR MANUFACTURING LAMINATED FILM
#997Plasma distribution control
#998Substrate processing apparatus and method of manufacturing semiconductor device
#999Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#1000Plasma polymerization coating apparatus
#1001Plasma device
#1002Display device having integrated metamaterial lens
#1003Conical wafer centering and holding device for semiconductor processing
#1004Shower plate structure for exhausting deposition inhibiting gas
#1005QUARTZ CRYSTAL MICROBALANCE UTILIZATION FOR FORELINE SOLIDS FORMATION QUANTIFICATION
#1006Substrate processing apparatus
#1007Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
#1008DEVICE FOR PRODUCING CONTINUOUS-GROWTH TYPE LARGE-AREA TRANSPARENT AND CONDUCTIVE GRAPHENE FILM
#1009Pad raising mechanism in wafer positioning pedestal for semiconductor processing
#1010Substrate treatment apparatus
#1011Deposition Of Metal Films
#1012Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source
#1013Ruthenium precursors for ALD and CVD thin film deposition and uses thereof
#1014CEM switching device
#1015Reducing EUV-induced material property changes
#1016Apparatus for plasma atomic layer deposition
#1017SHOWER HEAD AND ROLL-TO-ROLL PLASMA-PROCESSING APPARATUS INCLUDING THE SAME
#1018LAMINATED FILM
#1019Deposition apparatus and method for manufacturing semiconductor device using the same
#1020Methods for processing substrates using small plasma chambers
#1021SYSTEM INTEGRATING ATOMIC LAYER DEPOSITION AND REACTIVE ION ETCHING
#1022Coated metal mold and method for manufacturing same
#1023Selective inhibition in atomic layer deposition of silicon-containing films
#1024GRAPHITE BOAT TRANSMISSION MECHANISM USED IN PECVD DEVICE
#1025FILM FORMING APPARATUS
#1026Low Temperature Atmospheric Pressure Atomic Layer Deposition (ALD) of Graphene on Stainless Steel Substrates as BPP Coating
#1027Wafer positioning pedestal for semiconductor processing
#1028PROCESSING SYSTEM
#1029APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
#1030Methods and systems to modulate film stress
#1031PLASMA TREATMENT WITH NON-POLYMERIZING COMPOUNDS THAT LEADS TO REDUCED DILUTE BIOMOLECULE ADHESION TO THERMOPLASTIC ARTICLES
#1032COATING DEVICE OF COMPONENT FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND COATING METHOD THEREOF
#1033Method and system for in situ formation of gas-phase compounds
#1034Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity
#1035Carrier plate for use in plasma processing systems
#1036Use of silyl bridged alkyl compounds for dense OSG films
#1037Precursors and flowable CVD methods for making low-k films to fill surface features
#1038High Hardness Soft Film Structure
#1039PECVD BOAT
#1040Controlling the uniformity of PECVD deposition
#1041Deposition apparatus including UV annealing unit and method for fabricating non-volatile memory device by using the deposition apparatus
#1042Technique to prevent aluminum fluoride build up on the heater
#1043Fuel cell separator and coating method of seperator for fuel cell separator
#1044Film forming apparatus, cleaning method for film forming apparatus and recording medium
#1045PARALLEL PAIR CABLE
#1046Charge transfer roller for use in an additive deposition system and process
#1047LOADING WORKPIECES IN A COATING SYSTEM
#1048Carbon bridged aminosilane compounds for high growth rate silicon-containing films
#1049Support ring with masked edge
#1050SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#1051Method for depositing ALD films using halide-based precursors
#1052Cobalt etch back
#1053COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF
#1054Oxygen compatible plasma source
#1055Remote plasma based deposition of graded or multi-layered silicon carbide film
#1056Dual-channel showerhead with improved profile
#1057Dual-channel showerhead with improved profile
#1058Method of Preparing Corrosion Resistant Coatings
#1059Film forming apparatus
#1060HARD MASK AND MANUFACTURING METHOD THEREOF
#1061Method of manufacturing semiconductor device
#1062Film forming apparatus
#1063Sputtering showerhead
#1064Method of forming a silicon nitride film using Si—N containing precursors
#1065Plasma processing method
#1066Methods and apparatus for processing chamber cleaning end point detection
#1067Systems and methods for detection of plasma instability by electrical measurement
#1068Substrate processing apparatus
#1069MASK ETCH FOR PATTERNING
#1070Thick tungsten hardmask films deposition on high compressive/tensile bow wafers
#1071Pentachlorodisilane
#1072DISCHARGE ELECTRODE
#1073Control system for plasma chamber having controllable valve and method of using the same
#1074PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#1075Systems and methods for reducing effluent build-up in a pumping exhaust system
#1076PECVD process
#1077THIN FILM MANUFACTURING DEVICE AND THIN FILM MANUFACTURING METHOD
#1078METHOD OF DEPOSITING THIN FILM
#10792,2,4,4-tetrasilylpentasilane and its compositions, methods and uses
#1080Silicon-based deposition for semiconductor processing
#1081Precursors and flowable CVD methods for making low-K films to fill surface features
#1082APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF MANUFACTURING AND USE THEREOF
#1083Method for manufacturing diamond-like carbon film
#1084MANUFACTURING METHOD OF TRANSPARENT ELECTRODE
#1085Substrate processing apparatus
#1086Suppressing interfacial reactions by varying the wafer temperature throughout deposition
#1087Polycrystalline ceramic substrate and method of manufacture
#1088Film forming apparatus and gas injection member used therefor
#1089MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE COATING WITH INTERMITTENT RESTORATION PLASMA
#1090Rare-earth oxide based chamber material
#1091Rare-earth oxide based chamber material
#1092Method for manufacturing packaging comprising a container printed on directly and treated by plasma
#1093Aluminum fluoride mitigation by plasma treatment
#1094Method and apparatus for filling a gap
#1095Film forming method and method of manufacturing thin film transistor
#1096Method and apparatus for filling a gap
#1097Method and apparatus for filling a gap
#1098Fixture comprising magnetic means for holding rotary symmetric workpieces
#1099Hollow cathode plasma source
#1100Plasma Process and Reactor for the Thermochemical Treatment of the Surface of Metallic Pieces
#1101Amorphous hydrocarbon based film, and sliding member and sliding system with said film
#1102INDEX MATCHING LAYER IN OPTICAL APPLICATIONS
#1103Metal component and manufacturing method thereof and process chamber having the metal component
#1104DNA sequencing with stacked nanopores
#1105Method of manufacturing polymer-free everolimus-eluting coronary stent fabricated by electrospinning technique
#1106PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING LITHIUM-BASED FILM BY USING THE SAME
#1107Apparatus and method for deposition and etch in gap fill
#1108FLEXIBLE SENSOR
#1109Growth method of graphene
#1110SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD
#1111Display apparatus and method of manufacturing the same
#1112Methods of filling a flowable material in a gap of an assembly module
#1113Remote plasma based deposition of oxygen doped silicon carbide films
#1114Coil filament for plasma enhanced chemical vapor deposition source
#1115PLASMA GENERATOR APPARATUS
#1116Showerhead curtain gas method and system for film profile modulation
#1117Substrate temperature monitoring
#1118Low-friction coating production method and sliding method
#1119METHODS FOR PLASMA DEPOSITING POLYMERS COMPRISING CYCLIC SILOXANES AND RELATED COMPOSITIONS AND ARTICLES
#1120RESIN CONTAINER AND RESIN-CONTAINER COATING APPARATUS
#1121Method for Preparing Transparent Sheet Materials
#1122Si—O—N—P related fabrication methods, surface treatments and uses thereof
#1123Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
#1124Compositions and methods using same for deposition of silicon-containing films
#1125Substrate processing method and substrate processing apparatus
#1126Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching
#1127Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
#1128Diffusion resistant electrostatic clamp
#1129NON-SHADOW FRAME PLASMA PROCESSING CHAMBER
#1130Film deposition apparatus
#1131Compositions and methods using same for deposition of silicon-containing film
#1132Filling a cavity in a substrate using sputtering and deposition
#1133COMPOSITE SUBSTRATE MANUFACTURING METHOD AND COMPOSITE SUBSTRATE
#1134Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication
#1135Substrate processing device and substrate processing method
#1136Adjustable side gas plenum for edge rate control in a downstream reactor
#1137Fabrication and application of nanofiber ribbons and sheets and twisted and non-twisted nanofiber yarns
#1138Advanced temperature control for wafer carrier in plasma processing chamber
#1139Methods of encapsulation
#1140METHOD TO DEPOSIT CONFORMAL AND LOW WET ETCH RATE ENCAPSULATION LAYER USING PECVD
#1141Linear compressor and method for manufacturing a linear compressor
#1142Selective cobalt deposition on copper surfaces
#1143Method for separating a carbon structure from a seed structure
#1144MANUFACTURING METHOD FOR LAMINATED BODY
#1145Method for PECVD overlay improvement
#1146Toroidal plasma channel with varying cross-section areas along the channel
#1147PLASMA APPARATUS
#1148Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime
#1149Film forming apparatus and film forming method
#1150Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing
#1151Coating device and coating method
#1152Film forming method and film forming apparatus
#1153Systems, Devices, and/or Methods for Managing Batteries
#1154Ultra-conformal carbon film deposition
#1155Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle
#1156PET containers with enhanced silicon dioxide barrier coating
#1157Formation of a layer on a semiconductor substrate
#1158PLASMA CVD APPARATUS
#1159Method for forming sealing film, and sealing film
#1160Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
#1161Apparatus and method for providing a uniform flow of gas
#1162Exhaust manifold in a CVD reactor
#1163System and method for temperature control in plasma processing system
#1164Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition
#1165Decorative article and timepiece
#1166Gas turbine in situ inflatable bladders for on-wing repair
#1167PLASMA PROCESSING APPARATUS
#1168Substrate support assembly with non-uniform gas flow clearance
#1169Laminated film and flexible electronic device
#1170PROCESS FOR MANUFACTURING A CUSTOMIZABLE MEDICAL DEVICE AND DEVICE OBTAINED BY SAID PROCESS
#1171Durable 3D geometry conformal anti-reflection coating
#1172Multi-zone pedestal for plasma processing
#1173Robust high performance low hydrogen silicon carbon nitride (SiCNH) dielectrics for nano electronic devices
#1174Robust high performance low hydrogen silicon carbon nitride (SiCNH) dielectrics for nano electronic devices
#1175Plasma stabilization method and deposition method using the same
#1176HEATED SUBSTRATE SUPPORT
#1177Diamond-like coating for piston ring surfaces, piston ring and processes for preparing the same
#1178Plasma suppression behind a showerhead through the use of increased pressure
#1179Components such as edge rings including chemical vapor deposition (CVD) diamond coating with high purity SP3 bonds for plasma processing systems
#1180SEMICONDUCTOR MANUFACTURING APPARATUS
#1181FILM DEPOSITION METHOD
#1182FLUORO POLYMER CONTACT LAYER TO CARBON NANOTUBE CHUCK
#1183PLASMA PROCESSING APPARATUS AND PRECOATING METHOD
#1184Electric discharge generator and power supply device of electric discharge generator
#1185Lid assembly for a processing system to facilitate sequential deposition techniques
#1186A PROCESS FOR PREPARATION OF A COMPOSITE LAYER OR A LAMINATE, AND PRODUCT OBTAINED THEREWITH
#1187Chemical control features in wafer process equipment
#1188PECVD COATED PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
#1189Substrate support with quadrants
#1190Systems and methods for internal surface conditioning in plasma processing equipment
#1191Oxide etch selectivity systems and methods
#1192Lamination transfer films for forming antireflective structures
#1193SUBSTRATE WITH AMORPHOUS, COVALENTLY-BONDED LAYER AND METHOD OF MAKING THE SAME
#1194Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy
#1195Water-barrier laminate
#1196Film deposition method
#1197Substrate processing apparatus
#1198Film deposition method
#1199Deposition apparatus
#1200Dual-feed tunable plasma source