ClassID:

120276

C23C16/50 - page 4 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Recent Application in this class:
#901
20190017167
2019-01-17

Compositions and methods using same for deposition of silicon-containing film

#902
20190002283
2019-01-03

Fabrication and application of nanofiber ribbons and sheets and twisted and non-twisted nanofiber yarns

#903
20180374697
2018-12-27

Methods and apparatuses for increasing reactor processing batch size

#904
20180372605
2018-12-27

Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber

#905
20180371615
2018-12-27

Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate

#906
20180371419
2018-12-27

Method of fabricating substrate for culturing stem cell

#907
20180370807
2018-12-27

Method of making aluminum-free neopentasilane

#908
20180369912
2018-12-27

Chemical vapor deposition during additive manufacturing

#909
20180368712
2018-12-27

Neural interface probe employing amorphous silicon carbide

#910
20180363140
2018-12-20

Vacuum-coating system for coating lenses

#911
20180363128
2018-12-20

Intermediate layer formed between base material and DLC layer and film-forming method thereof

#912
20180362393
2018-12-20

Method for producing a graphene film

#913
20180355483
2018-12-13

Organosilane precursors for ALD/CVD silicon-containing film applications and methods of using the same

#914
20180350598
2018-12-06

BORON FILM REMOVING METHOD, AND PATTERN FORMING METHOD AND APPARATUS USING BORON FILM

#915
20180350562
2018-12-06

Deposition radial and edge profile tunability through independent control of TEOS flow

#916
20180347045
2018-12-06

Remote plasma oxidation chamber

#917
20180347033
2018-12-06

Transfer-free method for producing graphene thin film

#918
20180342374
2018-11-29

Monopole antenna array source with gas supply or grid filter for semiconductor process equipment

#919
20180342373
2018-11-29

Monopole antenna array source for semiconductor process equipment

#920
20180342372
2018-11-29

Monopole antenna array source with phase shifted zones for semiconductor process equipment

#921
20180340258
2018-11-29

Chemical vapor deposition system including ground strap bar

#922
20180340257
2018-11-29

DIFFUSER FOR UNIFORMITY IMPROVEMENT IN DISPLAY PECVD APPLICATIONS

#923
20180334756
2018-11-22

Epitaxial growing device and method for making epitaxial structure using the same

#924
20180334746
2018-11-22

Wafer Edge Contact Hardware and Methods to Eliminate Deposition at Wafer Backside Edge and Notch

#925
20180334545
2018-11-22

Polymeric surface having reduced biomolecule adhesion to thermoplastic articles of such substrate

#926
20180330927
2018-11-15

Plasma source for rotating susceptor

#927
20180327905
2018-11-15

High registration particles-transferring system

#928
20180327902
2018-11-15

Device and method for vacuum coating

#929
20180323098
2018-11-08

Wafer positioning pedestal for semiconductor processing

#930
20180320268
2018-11-08

Laminated film

#931
20180315639
2018-11-01

Support ring with masked edge

#932
20180312975
2018-11-01

METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS ON INSULATOR SURFACES

#933
20180308876
2018-10-25

ACTIVE SWITCH ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL USING THE SAME

#934
20180308669
2018-10-25

Electrode assembly

#935
20180305812
2018-10-25

Method for depositing high deposition rate, thick tetraethyl orthosilicate film with low compressive stress, high film stability and low shrinkage

#936
20180301716
2018-10-18

Coating method of separator for fuel cell and separator for fuel cell

#937
20180301321
2018-10-18

Plasma-resistant member

#938
20180298488
2018-10-18

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

#939
20180298481
2018-10-18

Fully Dense, Fluid Tight and Low Friction Coating Systems for Dynamically Engaging Load Bearing Surfaces for High Pressure High Temperature Applications

#940
20180297853
2018-10-18

Ultra-high temperature precipitation process for manufacturing polysilicon

#941
20180297156
2018-10-18

Repaired Airfoil with Improved Coating System and Methods of Forming the Same

#942
20180294157
2018-10-11

Treatment approach to improve film roughness by improving nucleation/adhesion of silicon oxide

#943
20180291508
2018-10-11

Fabrication method for two-dimensional materials

#944
20180291499
2018-10-11

METHOD FOR MANUFACTURING COATED SUBSTRATES, COATED SUBSTRATES, USE THEREOF, AND SYSTEMS FOR MANUFACTURING COATED SUBSTRATES

#945
20180282946
2018-10-04

SHEET AND LAMINATE

#946
20180277431
2018-09-27

Feature fill with nucleation inhibition

#947
20180277405
2018-09-27

SUBSTRATE PROCESSING APPARATUS

#948
20180274076
2018-09-27

FULLY DENSE, FLUID TIGHT AND LOW FRICTION COATING SYSTEMS FOR DYNAMICALLY ENGAGING LOAD BEARING SURFACES FOR HIGH PRESSURE HIGH TEMPERATURE APPLICATIONS

#949
20180273269
2018-09-27

Packaging for high purity solvents

#950
20180269067
2018-09-20

Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)

#951
20180269066
2018-09-20

Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)

#952
20180269061
2018-09-20

Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors

#953
20180269057
2018-09-20

Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials

#954
20180266975
2018-09-20

BIOSENSOR USING DNA-BASED CONDUCTIVE NANOWIRE AND METHOD FOR MANUFACTURING THE SAME

#955
20180265973
2018-09-20

Plasma resistant coating of porous body by atomic layer deposition

#956
20180265972
2018-09-20

Plasma resistant coating of porous body by atomic layer deposition

#957
20180265731
2018-09-20

Polymer substrate with hardcoat layer, and manufacturing method for same

#958
20180261453
2018-09-13

Application of bottom purge to increase clean efficiency

#959
20180258536
2018-09-13

APPARATUS FOR PROCESSING A SURFACE OF SUBSTRATE AND METHOD OPERATING THE APPARATUS

#960
20180258535
2018-09-13

PECVD process

#961
20180247866
2018-08-30

Modulating the microstructure of metallic interconnect structures

#962
20180247797
2018-08-30

Reactors for plasma-assisted processes and associated methods

#963
20180245217
2018-08-30

High throughput vacuum deposition sources and system

#964
20180240664
2018-08-23

REMOTE PLASMA BASED DEPOSITION OF GRADED OR MULTI-LAYERED SILICON CARBIDE FILM

#965
20180240654
2018-08-23

Systems and methods for internal surface conditioning assessment in plasma processing equipment

#966
20180240648
2018-08-23

Multi-layer plasma resistant coating by atomic layer deposition

#967
20180238450
2018-08-23

Piston ring and method for manufacturing same

#968
20180237915
2018-08-23

Gas distribution apparatus for processing chambers

#969
20180233359
2018-08-16

Self-aligned nanodots for 3D NAND flash memory

#970
20180233348
2018-08-16

Method of manufacturing semiconductor device

#971
20180233327
2018-08-16

Apparatus with concentric pumping for multiple pressure regimes

#972
20180231689
2018-08-16

Item Having Optimized Adhesive Properties and Comprising a Silicon Organic Layer

#973
20180231587
2018-08-16

Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same

#974
20180230587
2018-08-16

Plasma erosion resistant thin film coating for high temperature application

#975
20180226306
2018-08-09

Method for PECVD overlay improvement

#976
20180226228
2018-08-09

Substrate processing apparatus

#977
20180224574
2018-08-09

Meta-optical device and method of manufacturing the same

#978
20180223433
2018-08-09

Radical gas generation system

#979
20180218943
2018-08-02

Techniques for filling a structure using selective surface modification

#980
20180218902
2018-08-02

Boron doped tungsten carbide for hardmask applications

#981
20180218847
2018-08-02

Structure for electric energy storage using carbon nanotubes

#982
20180216230
2018-08-02

METHOD FOR PECVD DEPOSITION OF A GRAPHENE-BASED LAYER ON A SUBSTRATE

#983
20180211863
2018-07-26

Apparatus and methods for wafer chucking on a susceptor for ALD

#984
20180211862
2018-07-26

Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing

#985
20180211821
2018-07-26

Wafer chuck and processing arrangement

#986
20180211820
2018-07-26

Method and apparatus for semiconductor processing chamber isolation for reduced particles and improved uniformity

#987
20180209042
2018-07-26

Multi-layer plasma resistant coating by atomic layer deposition

#988
20180204717
2018-07-19

Method and device for the surface treatment of substrates

#989
20180202045
2018-07-19

Substrate treating apparatus and substrate treating method

#990
20180199432
2018-07-12

Selective deposition of thin film dielectrics using surface blocking chemistry

#991
20180198091
2018-07-12

Encapsulating film stacks for OLED applications with desired profile control

#992
20180187310
2018-07-05

Plasma treatment apparatus

#993
20180182627
2018-06-28

Method and apparatus for depositing a monolayer on a three dimensional structure

#994
20180182619
2018-06-28

Method of manufacturing semiconductor device

#995
20180182601
2018-06-28

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

#996
20180179643
2018-06-28

LAMINATED FILM AND METHOD FOR MANUFACTURING LAMINATED FILM

#997
20180174883
2018-06-21

Plasma distribution control

#998
20180174877
2018-06-21

Substrate processing apparatus and method of manufacturing semiconductor device

#999
20180174858
2018-06-21

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#1000
20180174803
2018-06-21

Plasma polymerization coating apparatus

#1001
20180174800
2018-06-21

Plasma device

#1002
20180172988
2018-06-21

Display device having integrated metamaterial lens

#1003
20180171473
2018-06-21

Conical wafer centering and holding device for semiconductor processing

#1004
20180171472
2018-06-21

Shower plate structure for exhausting deposition inhibiting gas

#1005
20180166306
2018-06-14

QUARTZ CRYSTAL MICROBALANCE UTILIZATION FOR FORELINE SOLIDS FORMATION QUANTIFICATION

#1006
20180164702
2018-06-14

Substrate processing apparatus

#1007
20180163305
2018-06-14

Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition

#1008
20180163298
2018-06-14

DEVICE FOR PRODUCING CONTINUOUS-GROWTH TYPE LARGE-AREA TRANSPARENT AND CONDUCTIVE GRAPHENE FILM

#1009
20180158716
2018-06-07

Pad raising mechanism in wafer positioning pedestal for semiconductor processing

#1010
20180158709
2018-06-07

Substrate treatment apparatus

#1011
20180158686
2018-06-07

Deposition Of Metal Films

#1012
20180158655
2018-06-07

Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source

#1013
20180155379
2018-06-07

Ruthenium precursors for ALD and CVD thin film deposition and uses thereof

#1014
20180151800
2018-05-31

CEM switching device

#1015
20180151350
2018-05-31

Reducing EUV-induced material property changes

#1016
20180148842
2018-05-31

Apparatus for plasma atomic layer deposition

#1017
20180148841
2018-05-31

SHOWER HEAD AND ROLL-TO-ROLL PLASMA-PROCESSING APPARATUS INCLUDING THE SAME

#1018
20180147808
2018-05-31

LAMINATED FILM

#1019
20180144932
2018-05-24

Deposition apparatus and method for manufacturing semiconductor device using the same

#1020
20180144906
2018-05-24

Methods for processing substrates using small plasma chambers

#1021
20180142355
2018-05-24

SYSTEM INTEGRATING ATOMIC LAYER DEPOSITION AND REACTIVE ION ETCHING

#1022
20180141102
2018-05-24

Coated metal mold and method for manufacturing same

#1023
20180138028
2018-05-17

Selective inhibition in atomic layer deposition of silicon-containing films

#1024
20180135182
2018-05-17

GRAPHITE BOAT TRANSMISSION MECHANISM USED IN PECVD DEVICE

#1025
20180135170
2018-05-17

FILM FORMING APPARATUS

#1026
20180131015
2018-05-10

Low Temperature Atmospheric Pressure Atomic Layer Deposition (ALD) of Graphene on Stainless Steel Substrates as BPP Coating

#1027
20180130696
2018-05-10

Wafer positioning pedestal for semiconductor processing

#1028
20180130681
2018-05-10

PROCESSING SYSTEM

#1029
20180130674
2018-05-10

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

#1030
20180130642
2018-05-10

Methods and systems to modulate film stress

#1031
20180127879
2018-05-10

PLASMA TREATMENT WITH NON-POLYMERIZING COMPOUNDS THAT LEADS TO REDUCED DILUTE BIOMOLECULE ADHESION TO THERMOPLASTIC ARTICLES

#1032
20180127878
2018-05-10

COATING DEVICE OF COMPONENT FOR SEMICONDUCTOR MANUFACTURING APPARATUS AND COATING METHOD THEREOF

#1033
20180127876
2018-05-10

Method and system for in situ formation of gas-phase compounds

#1034
20180122647
2018-05-03

Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity

#1035
20180122633
2018-05-03

Carrier plate for use in plasma processing systems

#1036
20180122632
2018-05-03

Use of silyl bridged alkyl compounds for dense OSG films

#1037
20180122631
2018-05-03

Precursors and flowable CVD methods for making low-k films to fill surface features

#1038
20180119282
2018-05-03

High Hardness Soft Film Structure

#1039
20180119278
2018-05-03

PECVD BOAT

#1040
20180117255
2018-05-03

Controlling the uniformity of PECVD deposition

#1041
20180114722
2018-04-26

Deposition apparatus including UV annealing unit and method for fabricating non-volatile memory device by using the deposition apparatus

#1042
20180114679
2018-04-26

Technique to prevent aluminum fluoride build up on the heater

#1043
20180112306
2018-04-26

Fuel cell separator and coating method of seperator for fuel cell separator

#1044
20180108518
2018-04-19

Film forming apparatus, cleaning method for film forming apparatus and recording medium

#1045
20180108455
2018-04-19

PARALLEL PAIR CABLE

#1046
20180105937
2018-04-19

Charge transfer roller for use in an additive deposition system and process

#1047
20180105935
2018-04-19

LOADING WORKPIECES IN A COATING SYSTEM

#1048
20180105541
2018-04-19

Carbon bridged aminosilane compounds for high growth rate silicon-containing films

#1049
20180102274
2018-04-12

Support ring with masked edge

#1050
20180102247
2018-04-12

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#1051
20180102245
2018-04-12

Method for depositing ALD films using halide-based precursors

#1052
20180102236
2018-04-12

Cobalt etch back

#1053
20180100236
2018-04-12

COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF

#1054
20180096865
2018-04-05

Oxygen compatible plasma source

#1055
20180096842
2018-04-05

Remote plasma based deposition of graded or multi-layered silicon carbide film

#1056
20180096821
2018-04-05

Dual-channel showerhead with improved profile

#1057
20180096819
2018-04-05

Dual-channel showerhead with improved profile

#1058
20180094358
2018-04-05

Method of Preparing Corrosion Resistant Coatings

#1059
20180094349
2018-04-05

Film forming apparatus

#1060
20180090319
2018-03-29

HARD MASK AND MANUFACTURING METHOD THEREOF

#1061
20180090310
2018-03-29

Method of manufacturing semiconductor device

#1062
20180087467
2018-03-29

Film forming apparatus

#1063
20180087155
2018-03-29

Sputtering showerhead

#1064
20180087150
2018-03-29

Method of forming a silicon nitride film using Si—N containing precursors

#1065
20180082855
2018-03-22

Plasma processing method

#1066
20180082827
2018-03-22

Methods and apparatus for processing chamber cleaning end point detection

#1067
20180076100
2018-03-15

Systems and methods for detection of plasma instability by electrical measurement

#1068
20180076063
2018-03-15

Substrate processing apparatus

#1069
20180076049
2018-03-15

MASK ETCH FOR PATTERNING

#1070
20180076032
2018-03-15

Thick tungsten hardmask films deposition on high compressive/tensile bow wafers

#1071
20180076025
2018-03-15

Pentachlorodisilane

#1072
20180076008
2018-03-15

DISCHARGE ELECTRODE

#1073
20180073144
2018-03-15

Control system for plasma chamber having controllable valve and method of using the same

#1074
20180073143
2018-03-15

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#1075
20180073137
2018-03-15

Systems and methods for reducing effluent build-up in a pumping exhaust system

#1076
20180066364
2018-03-08

PECVD process

#1077
20180066361
2018-03-08

THIN FILM MANUFACTURING DEVICE AND THIN FILM MANUFACTURING METHOD

#1078
20180066359
2018-03-08

METHOD OF DEPOSITING THIN FILM

#1079
20180066140
2018-03-08

2,2,4,4-tetrasilylpentasilane and its compositions, methods and uses

#1080
20180061659
2018-03-01

Silicon-based deposition for semiconductor processing

#1081
20180061636
2018-03-01

Precursors and flowable CVD methods for making low-K films to fill surface features

#1082
20180059289
2018-03-01

APPARATUS FOR PLASMA PROCESSING ON OPTICAL SURFACES AND METHODS OF MANUFACTURING AND USE THEREOF

#1083
20180057941
2018-03-01

Method for manufacturing diamond-like carbon film

#1084
20180057939
2018-03-01

MANUFACTURING METHOD OF TRANSPARENT ELECTRODE

#1085
20180051375
2018-02-22

Substrate processing apparatus

#1086
20180047645
2018-02-15

Suppressing interfacial reactions by varying the wafer temperature throughout deposition

#1087
20180047557
2018-02-15

Polycrystalline ceramic substrate and method of manufacture

#1088
20180047541
2018-02-15

Film forming apparatus and gas injection member used therefor

#1089
20180044791
2018-02-15

MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE COATING WITH INTERMITTENT RESTORATION PLASMA

#1090
20180044247
2018-02-15

Rare-earth oxide based chamber material

#1091
20180044246
2018-02-15

Rare-earth oxide based chamber material

#1092
20180036935
2018-02-08

Method for manufacturing packaging comprising a container printed on directly and treated by plasma

#1093
20180036775
2018-02-08

Aluminum fluoride mitigation by plasma treatment

#1094
20180033679
2018-02-01

Method and apparatus for filling a gap

#1095
20180033644
2018-02-01

Film forming method and method of manufacturing thin film transistor

#1096
20180033616
2018-02-01

Method and apparatus for filling a gap

#1097
20180033606
2018-02-01

Method and apparatus for filling a gap

#1098
20180030595
2018-02-01

Fixture comprising magnetic means for holding rotary symmetric workpieces

#1099
20180025892
2018-01-25

Hollow cathode plasma source

#1100
20180023185
2018-01-25

Plasma Process and Reactor for the Thermochemical Treatment of the Surface of Metallic Pieces

#1101
20180023016
2018-01-25

Amorphous hydrocarbon based film, and sliding member and sliding system with said film

#1102
20180022642
2018-01-25

INDEX MATCHING LAYER IN OPTICAL APPLICATIONS

#1103
20180019101
2018-01-18

Metal component and manufacturing method thereof and process chamber having the metal component

#1104
20180016629
2018-01-18

DNA sequencing with stacked nanopores

#1105
20180015500
2018-01-18

Method of manufacturing polymer-free everolimus-eluting coronary stent fabricated by electrospinning technique

#1106
20180010245
2018-01-11

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING LITHIUM-BASED FILM BY USING THE SAME

#1107
20180005801
2018-01-04

Apparatus and method for deposition and etch in gap fill

#1108
20180004318
2018-01-04

FLEXIBLE SENSOR

#1109
20180002831
2018-01-04

Growth method of graphene

#1110
20170372928
2017-12-28

SUBSTRATE PROCESSING SYSTEM AND TEMPERATURE CONTROL METHOD

#1111
20170369999
2017-12-28

Display apparatus and method of manufacturing the same

#1112
20170365755
2017-12-21

Methods of filling a flowable material in a gap of an assembly module

#1113
20170365462
2017-12-21

Remote plasma based deposition of oxygen doped silicon carbide films

#1114
20170365448
2017-12-21

Coil filament for plasma enhanced chemical vapor deposition source

#1115
20170365447
2017-12-21

PLASMA GENERATOR APPARATUS

#1116
20170362713
2017-12-21

Showerhead curtain gas method and system for film profile modulation

#1117
20170362712
2017-12-21

Substrate temperature monitoring

#1118
20170362711
2017-12-21

Low-friction coating production method and sliding method

#1119
20170358445
2017-12-14

METHODS FOR PLASMA DEPOSITING POLYMERS COMPRISING CYCLIC SILOXANES AND RELATED COMPOSITIONS AND ARTICLES

#1120
20170350010
2017-12-07

RESIN CONTAINER AND RESIN-CONTAINER COATING APPARATUS

#1121
20170350006
2017-12-07

Method for Preparing Transparent Sheet Materials

#1122
20170348459
2017-12-07

Si—O—N—P related fabrication methods, surface treatments and uses thereof

#1123
20170342559
2017-11-30

Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor

#1124
20170338109
2017-11-23

Compositions and methods using same for deposition of silicon-containing films

#1125
20170338106
2017-11-23

Substrate processing method and substrate processing apparatus

#1126
20170338085
2017-11-23

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

#1127
20170338083
2017-11-23

Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces

#1128
20170335460
2017-11-23

Diffusion resistant electrostatic clamp

#1129
20170335459
2017-11-23

NON-SHADOW FRAME PLASMA PROCESSING CHAMBER

#1130
20170335453
2017-11-23

Film deposition apparatus

#1131
20170335449
2017-11-23

Compositions and methods using same for deposition of silicon-containing film

#1132
20170330796
2017-11-16

Filling a cavity in a substrate using sputtering and deposition

#1133
20170330747
2017-11-16

COMPOSITE SUBSTRATE MANUFACTURING METHOD AND COMPOSITE SUBSTRATE

#1134
20170330744
2017-11-16

Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication

#1135
20170330733
2017-11-16

Substrate processing device and substrate processing method

#1136
20170330728
2017-11-16

Adjustable side gas plenum for edge rate control in a downstream reactor

#1137
20170327377
2017-11-16

Fabrication and application of nanofiber ribbons and sheets and twisted and non-twisted nanofiber yarns

#1138
20170323813
2017-11-09

Advanced temperature control for wafer carrier in plasma processing chamber

#1139
20170323803
2017-11-09

Methods of encapsulation

#1140
20170323785
2017-11-09

METHOD TO DEPOSIT CONFORMAL AND LOW WET ETCH RATE ENCAPSULATION LAYER USING PECVD

#1141
20170321673
2017-11-09

Linear compressor and method for manufacturing a linear compressor

#1142
20170321320
2017-11-09

Selective cobalt deposition on copper surfaces

#1143
20170314122
2017-11-02

Method for separating a carbon structure from a seed structure

#1144
20170313046
2017-11-02

MANUFACTURING METHOD FOR LAMINATED BODY

#1145
20170309525
2017-10-26

Method for PECVD overlay improvement

#1146
20170309456
2017-10-26

Toroidal plasma channel with varying cross-section areas along the channel

#1147
20170309455
2017-10-26

PLASMA APPARATUS

#1148
20170306493
2017-10-26

Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime

#1149
20170306492
2017-10-26

Film forming apparatus and film forming method

#1150
20170306490
2017-10-26

Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing

#1151
20170306489
2017-10-26

Coating device and coating method

#1152
20170306483
2017-10-26

Film forming method and film forming apparatus

#1153
20170301901
2017-10-19

Systems, Devices, and/or Methods for Managing Batteries

#1154
20170301537
2017-10-19

Ultra-conformal carbon film deposition

#1155
20170297066
2017-10-19

Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle

#1156
20170297057
2017-10-19

PET containers with enhanced silicon dioxide barrier coating

#1157
20170294306
2017-10-12

Formation of a layer on a semiconductor substrate

#1158
20170283952
2017-10-05

PLASMA CVD APPARATUS

#1159
20170283951
2017-10-05

Method for forming sealing film, and sealing film

#1160
20170283950
2017-10-05

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

#1161
20170283947
2017-10-05

Apparatus and method for providing a uniform flow of gas

#1162
20170283946
2017-10-05

Exhaust manifold in a CVD reactor

#1163
20170278761
2017-09-28

System and method for temperature control in plasma processing system

#1164
20170278681
2017-09-28

Carrier ring wall for reduction of back-diffusion of reactive species and suppression of local parasitic plasma ignition

#1165
20170277127
2017-09-28

Decorative article and timepiece

#1166
20170276024
2017-09-28

Gas turbine in situ inflatable bladders for on-wing repair

#1167
20170275761
2017-09-28

PLASMA PROCESSING APPARATUS

#1168
20170275759
2017-09-28

Substrate support assembly with non-uniform gas flow clearance

#1169
20170275752
2017-09-28

Laminated film and flexible electronic device

#1170
20170274123
2017-09-28

PROCESS FOR MANUFACTURING A CUSTOMIZABLE MEDICAL DEVICE AND DEVICE OBTAINED BY SAID PROCESS

#1171
20170271130
2017-09-21

Durable 3D geometry conformal anti-reflection coating

#1172
20170263484
2017-09-14

Multi-zone pedestal for plasma processing

#1173
20170263451
2017-09-14

Robust high performance low hydrogen silicon carbon nitride (SiCNH) dielectrics for nano electronic devices

#1174
20170263449
2017-09-14

Robust high performance low hydrogen silicon carbon nitride (SiCNH) dielectrics for nano electronic devices

#1175
20170263442
2017-09-14

Plasma stabilization method and deposition method using the same

#1176
20170263422
2017-09-14

HEATED SUBSTRATE SUPPORT

#1177
20170261103
2017-09-14

Diamond-like coating for piston ring surfaces, piston ring and processes for preparing the same

#1178
20170260627
2017-09-14

Plasma suppression behind a showerhead through the use of increased pressure

#1179
20170253974
2017-09-07

Components such as edge rings including chemical vapor deposition (CVD) diamond coating with high purity SP3 bonds for plasma processing systems

#1180
20170253973
2017-09-07

SEMICONDUCTOR MANUFACTURING APPARATUS

#1181
20170253964
2017-09-07

FILM DEPOSITION METHOD

#1182
20170250103
2017-08-31

FLUORO POLYMER CONTACT LAYER TO CARBON NANOTUBE CHUCK

#1183
20170250058
2017-08-31

PLASMA PROCESSING APPARATUS AND PRECOATING METHOD

#1184
20170241021
2017-08-24

Electric discharge generator and power supply device of electric discharge generator

#1185
20170241020
2017-08-24

Lid assembly for a processing system to facilitate sequential deposition techniques

#1186
20170239686
2017-08-24

A PROCESS FOR PREPARATION OF A COMPOSITE LAYER OR A LAMINATE, AND PRODUCT OBTAINED THEREWITH

#1187
20170236691
2017-08-17

Chemical control features in wafer process equipment

#1188
20170232198
2017-08-17

PECVD COATED PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS

#1189
20170231033
2017-08-10

Substrate support with quadrants

#1190
20170229293
2017-08-10

Systems and methods for internal surface conditioning in plasma processing equipment

#1191
20170229287
2017-08-10

Oxide etch selectivity systems and methods

#1192
20170227682
2017-08-10

Lamination transfer films for forming antireflective structures

#1193
20170226640
2017-08-10

SUBSTRATE WITH AMORPHOUS, COVALENTLY-BONDED LAYER AND METHOD OF MAKING THE SAME

#1194
20170226635
2017-08-10

Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy

#1195
20170226625
2017-08-10

Water-barrier laminate

#1196
20170218516
2017-08-03

Film deposition method

#1197
20170218514
2017-08-03

Substrate processing apparatus

#1198
20170218510
2017-08-03

Film deposition method

#1199
20170218508
2017-08-03

Deposition apparatus

#1200
20170213702
2017-07-27

Dual-feed tunable plasma source