121280 ⎘
Single-crystal growth by condensing evaporated or sublimed materials; Epitaxial-layer growth by condensing ionised vapours
HOMOEPITAXIAL THIN FILM, MANUFACTURING METHOD AND MANUFACTURING APPARATUS THEREOF
#2P-TYPE SPINEL STRUCTURES AS A P-N HETEROEPITAXIAL INTERFACE TO B-GA2O3
#3HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMBER AND FOR SEMICONDUCTOR MANUFACTURING
#4ALUMINUM NITRIDE SINGLE CRYSTALS HAVING LARGE CRYSTAL AUGMENTATION PARAMETERS
#5MULTILAYER BODY
#6PIEZOELECTRIC FILM, METHOD OF PRODUCING PIEZOELECTRIC FILM, PIEZOELECTRIC ELEMENT, AND PIEZOELECTRIC DEVICE
#7MULTILAYER BODY
#8Deposition Of Piezoelectric Films
#9LARGE-AREA SINGLE-CRYSTAL SILVER THIN-FILM STRUCTURE USING SINGLE-CRYSTAL COPPER THIN-FILM BUFFER LAYER AND MANUFACTURING METHOD THEREFOR
#10Ion conductive material including halide material, electrolyte including the same, and methods of forming the same
#11Method for manufacturing sputtering target, method for forming oxide film, and transistor
#12Ion conductive material including complex metal halide, electrolyte including the same, and methods of forming the same
#13Tunable templating layers for perpendicularly magnetized Heusler films
#14Method for manufacturing sputtering target, method for forming oxide film, and transistor
#15Ion conductive material, electrolyte including ion conductive material, and methods of forming
#16Epi-growth apparatus of separate chamber type
#17Apparatus for growing single crystal metal-oxide EPI wafer
#18Single crystal epitaxial layer having a rhombohedral lattice
#19Aluminum nitride single crystals having large crystal augmentation parameters
#20DIAMETER EXPANSION OF ALUMINUM NITRIDE CRYSTALS DURING GROWTH BY PHYSICAL VAPOR TRANSPORT
#21METHODS FOR IMPROVING LOADING RATIO OF HYDROGEN GAS
#22Method for manufacturing sputtering target, method for forming oxide film, and transistor
#23FERROELECTRIC CRYSTAL FILM, ELECTRONIC COMPONENT, MANUFACTURING METHOD OF FERROELECTRIC CRYSTAL FILM, AND MANUFACTURING APPARATUS THEREFOR
#24TRANSLATING LAYER FOR COMBINING FCC AND HCP LATTICE STRUCTURES
#25METHOD FOR PREPARING COPPER THIN FILM BY USING SINGLE CRYSTAL COPPER TARGET
#26Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms
#27SURFACE-COATED CUTTING TOOL HAVING EXCELLENT CHIP RESISTANCE
#28Electrode having nano mesh multi-layer structure, using single crystal copper, and manufacturing method therefor
#29Method for manufacturing sputtering target, method for forming oxide film, and transistor
#30Single crystal rhombohedral epitaxy of SiGe on sapphire at 450° C.-500° C. substrate temperatures
#31Method for manufacturing crystal film
#32Rhombohedron epitaxial growth with molten target sputtering
#33Film formation method, vacuum processing apparatus, method of manufacturing semiconductor light emitting element, semiconductor light emitting element, method of manufacturing semiconductor electronic element, semiconductor electronic element, and illuminating apparatus
#34OFF-AXIS SPUTTERING DEPOSITION FOR GROWTH OF SINGLE CRYSTALLINE FILMS OF A BROAD RANGE OF COMPLEX MATERIALS
#35Epitaxy base, semiconductor light emitting device and manufacturing methods thereof
#36METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM
#37Process for making lead zirconate titanate (PZT) layers and/or platinum electrodes and products thereof
#38Self-aligned tunable metamaterials
#39METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXIDE FILM, AND TRANSISTOR
#40Radiation detector, scintillator panel, and method for manufacturing the same
#41Use of freestanding nitride veneers in semiconductor devices
#42METHOD OF PRODUCING FREE-STANDING NET-SHAPE SAPPHIRE
#43PERPENDICULAR MAGNETIC RECORDING MEDIUM, METHOD OF MANUFACTURING THE SAME, AND MAGNETIC RECORDING/REPRODUCTION APPARATUS
#44Substrate structures and methods
#45Epitaxial film forming method, sputtering apparatus, manufacturing method of semiconductor light-emitting element, semiconductor light-emitting element, and illumination device
#46SELF-ALIGNED TUNABLE METAMATERIALS
#47Preparation Method of Manufacturing Thermoelectric Nanowires Having Core/Shell Structure
#48Vapour deposition process for the preparation of a phosphate compound
#49METHOD FOR DEPOSITING CRYSTALLINE TITANIA NANOPARTICLES AND FILMS
#50Vapour deposition process for the preparation of a chemical compound
#51Multilayer substrate structure and method of manufacturing the same
#52LATTICE MATCHING LAYER FOR USE IN A MULTILAYER SUBSTRATE STRUCTURE
#53Ferroelectric crystal film, electronic component, manufacturing method of ferroelectric crystal film, and manufacturing apparatus therefor
#54System and process for high-density, low-energy plasma enhanced vapor phase epitaxy
#55Non-polar plane of wurtzite structure material
#56USE OF FREESTANDING NITRIDE VENEERS IN SEMICONDUCTOR DEVICES
#57PULSED LASER DEPOSITION OF HIGH QUALITY PHOTOLUMINESCENT GaN FILMS
#58Method for depositing crystalline titania nanoparticles and films
#59GaN CRYSTAL SHEET
#60Pulsed laser deposition of high quality photoluminescent GaN films
#61Method for depositing crystalline titania nanoparticles and films
#62System and process for high-density, low-energy plasma enhanced vapor phase epitaxy