176979 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials Azides
Sub-classes:POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME
#2Photocurable composition and method for producing semiconductor device
#3RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
#4Photosensitive, inorganic ligand-capped inorganic nanocrystals
#5CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZED STRUCTURES, AND MATERIALS AND METHODS FOR MAKING THE SAME
#6Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same
#7Photocurable composition and method for producing semiconductor device
#8Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
#9Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
#10Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
#11Method for direct photopatterning of molecules on surfaces
#12Photosensitive compound, photosensitive resin, and photosensitive composition
#13PHOTO-CATIONIC POLYMERIZABLE EPOXY RESIN COMPOSITION, LIQUID DISCHARGE HEAD, AND MANUFACTURING METHOD THEREOF
#14Manufacture of a polymer device
#15Method of fixing low-molecular compound to solid-phase support