176981 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Azides Macromolecular azides; Macromolecular additives, e.g. binders
Sub-classes:SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#2CLICK-CHEMISTRY COMPATIBLE STRUCTURES, CLICK-CHEMISTRY FUNCTIONALIZED STRUCTURES, AND MATERIALS AND METHODS FOR MAKING THE SAME
#3METHOD OF FORMING RESIST PATTERN
#4Thin film transistor substrate provided with protective film and method for producing same
#5PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR
#6PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR
#7Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
#8Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
#9Photosensitive compound, photosensitive resin, and photosensitive composition
#10SURFACE PATTERNING WITH FUNCTIONAL POLYMERS
#11Photoactivatable crosslinker compositions for surface modification
#12Information recording medium and method of manufacturing the same
#13Manufacture of a polymer device
#14Photosensitive resin, photosensitive composition and photo-crosslinked structure
#15Polymer composite