G03F7/016 - CPC Classification Index

ClassID:

176983 ⎘

G03F7/016 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials Diazonium salts or compounds

Sub-classes:

G03F7/0163 » {Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes} 7
G03F7/0166 » {characterised by the non-macromolecular additives} 10
G03F7/021 » Macromolecular diazonium compounds; Macromolecular additives, e.g. binders 9

Recent Application in this class:

20250115691

METHOD OF FORMING PATTERNS

20230406970

METHOD OF FORMING PATTERNS

20200096868

HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE AND MEANS FOR PRODUCING SAME

20200081343

Photosensitive resin composition, organic EL element barrier rib, and organic EL element

20190391495

METHOD OF MAKING A LITHOGRAPHIC PRINTING PLATE PRECURSOR CONTAINING A DIAZONIUM COMPOUND

20170184966

Photoresist polymers and photoresist compositions

20150129280

Structure including molecular monolayer and graphene electrode, flexible electronic device, and method of producing the same

20080311513

Photosensitive metal nanoparticle and method of forming conductive pattern using the same

20060194251

Method of fixing low-molecular compound to solid-phase support

20060075965

Method of and apparatus for dispensing photoresist in manufacturing semiconductor devices or the like

20050079439

Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid