G03F7/021 - CPC Classification Index

ClassID:

176986 ⎘

G03F7/021 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Diazonium salts or compounds Macromolecular diazonium compounds; Macromolecular additives, e.g. binders

Sub-classes:

G03F7/0212 » {characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds} 16

Recent Application in this class:

20210173307

2021-06-10

HIGH-RESOLUTION FLEXOGRAPHIC PRINTING PLATE WITH IMPROVED BARRIER LAYER AND ADHESION MODULATING LAYER AND MEANS FOR ITS PRODUCTION

20180079864

2018-03-22

Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition

20170248846

2017-08-31

Compound, polymer, photosensitive resin composition, and color filter

20160334704

2016-11-17

Diazo-resin, photoresist composition and method of preparing same

20150212413

2015-07-30

Photosensitive resin composition for screen printing, photosensitive film, and screen plate

20130288178

2013-10-31

Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof

20060251987

2006-11-09

Negative photosensitive composition and negative photosensitive lithographic printing plate

20050196700

2005-09-08

Process of preparing planographic printing plate

20050079439

2005-04-14

Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid