177018 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
#302Exposure system and pattern formation method
#303Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography
#304Photoresist composition and method of forming same
#305Photosensitive composition and pattern-forming method using the photosensitive composition
#306Polymer, resist composition and patterning process
#307Dissolution inhibitors in photoresist compositions for microlithography
#308Photoresists, fluoropolymers and processes for 157 nm microlithography
#309Nitrogen-containing organic compound, chemically amplified resist composition and patterning process
#310Photosensitive composition, compound used in the same, and patterning method using the same
#311Polymer, resist composition, and patterning process
#312Positive resist composition for immersion exposure and pattern-forming method using the same
#313Fluorinated polymers, photoresists and processes for microlithography
#314Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
#315Protecting groups in polymers, photoresists and processes for microlithography
#316Resist composition for immersion exposure and pattern formation method using the same
#317Polymer compound, resist material and pattern formation method
#318Method of forming fine pattern
#319Polymer, resist composition, and patterning process
#320Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives
#321Polymer and photoresist compositions
#322Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
#323Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
#324Norbornene-type monomers and polymers containing pendent lactone or sultone groups
#325Polymer and chemically amplified resist composition containing the same
#326Norbornene-type monomers and polymers containing pendent lactone or sultone groups
#327Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
#328Polymers and photoresist compositions comprising same
#329Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask
#330Photoresist composition for deep UV and process thereof
#331Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
#332Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
#333Bases and surfactants and their use in photoresist compositions for microlithography
#334Photosensitive composition and pattern forming method using the same
#335Resist compositions and patterning process
#336Positive resist composition and pattern forming method using the same
#337Positive resist composition and pattern formation method using the same
#338Positive resist composition and pattern-forming method using the same
#339Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes)
#340Compound, fluorine-containing polymerizable cyclic olefin compound
#341Process for preparing fluorine-containing polymer and method of forming fine pattern using same
#342Positive resist composition and pattern formation method using the same
#343Resist resin
#344Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same
#345MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS
#346Bridged carbocyclic compounds and methods of making and using same
#347Resist composition
#348Resist resin
#349Process for producing a semiconductor device
#350Pattern forming process
#351Positive resist composition
#352Photoresist polymers and photoresist compositions comprising the same
#353Photoresist polymer and photoresist composition containing the same
#354Fluorinated copolymers for microlithography
#355Underlayer compositions for multilayer lithographic processes
#356Photosensitive polymer and chemically amplified photoresist composition containing the same
#357Resist material and method for pattern formation
#358Positive photosensitive composition and method of forming resist pattern
#359Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition
#360Sulfonate and a resist composition
#361Compound, polymer, resist composition, and patterning process
#362Resist composition comprising photosensitive polymer having lactone in its backbone
#363Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process