Patents-Review.com
ClassID:

177018 ⎘

G03F7/0395 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties

Sub-classes:
Recent Application in this class:
#1
20260093178
2026-04-02

POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION

 #2
20260079398
2026-03-19

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

 #3
20260079394
2026-03-19

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND AND ACID DIFFUSION CONTROL AGENT

 #4
20260056465
2026-02-26

COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND

 #5
20260044077
2026-02-12

SULFONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS

 #6
20250383603
2025-12-18

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

 #7
20250341776
2025-11-06

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

 #8
20250333553
2025-10-30

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION

 #9
20250314964
2025-10-09

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS

 #10
20250237950
2025-07-24

RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER

 #11
20250224675
2025-07-10

RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND

 #12
20250199401
2025-06-19

RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY DEVICE

 #13
20250180988
2025-06-05

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

 #14
20250164883
2025-05-22

RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

 #15
20250147421
2025-05-08

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

 #16
20250130497
2025-04-24

METHOD FOR IMPROVING HARDNESS OF BAKED PRODUCT

 #17
20250053090
2025-02-13

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

 #18
20250053089
2025-02-13

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

 #19
20250053088
2025-02-13

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM HAVING SACCHARIN SKELETON

 #20
20250021002
2025-01-16

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF

 #21
20250013150
2025-01-09

RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTO-DEGRADABLE BASE

 #22
20240345482
2024-10-17

MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND

 #23
20240192595
2024-06-13

POLYMER COMPOSITIONS HAVING PHOTOACID GENERATORS AND PHOTORESISTS

 #24
20240184204
2024-06-06

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BASIC ORGANIC GROUP

 #25
20240118615
2024-04-11

RESIST COMPOSITION AND PATTERN FORMING PROCESS

 #26
20240103369
2024-03-28

RESIST UNDERLAYER FILM FORMATION COMPOSITION

 #27
20240094635
2024-03-21

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

 #28
20230305400
2023-09-28

Bismaleimide Compound, Composition Containing Same, Polybenzoxazole, And Semiconductor Device

 #29
20230296982
2023-09-21

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION

 #30
20230259028
2023-08-17

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS

 #31
20230244144
2023-08-03

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

 #32
20230236508
2023-07-27

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT

 #33
20230185192
2023-06-15

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

 #34
20230123180
2023-04-20

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

 #35
20230096077
2023-03-30

PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME

 #36
20220342307
2022-10-27

Radiation-sensitive resin composition and method for forming resist pattern

 #37
20210364921
2021-11-25

Positive resist composition and patterning process

 #38
20210048746
2021-02-18

Resist composition and patterning process

 #39
20200363722
2020-11-19

Positive tone photosensitive compositions containing amic acid as latent base catalyst

 #40
20200133124
2020-04-30

Extreme ultraviolet photoresist and method

 #41
20200071268
2020-03-05

Sulfonium compound, positive resist composition, and resist pattern forming process

 #42
20200012193
2020-01-09

Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method

 #43
20200012192
2020-01-09

Photosensitive resin composition

 #44
20200004143
2020-01-02

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

 #45
20190369492
2019-12-05

Photoimageable polyolefin compositions containing photobase generators

 #46
20190361350
2019-11-28

Onium salt, chemically amplified positive resist composition, and resist pattern forming process

 #47
20190339617
2019-11-07

Permanent dielectric compositions containing photoacid generator and base

 #48
20190094690
2019-03-28

Resist composition and patterning process

 #49
20190056659
2019-02-21

METHOD FOR MANUFACTURING MEMS DEVICES USING MULTIPLE PHOTOACID GENERATORS IN A COMPOSITE PHOTOIMAGEABLE DRY FILM

 #50
20190040171
2019-02-07

Photoresist polymers, methods of forming patterns and methods of manufacturing semiconductor devices

 #51
20190010119
2019-01-10

Resist composition and resist patterning process

 #52
20180329299
2018-11-15

Fluorine free photopatternable phenol functional group containing polymer compositions

 #53
20180284609
2018-10-04

Photosensitive compositions, color filter and microlens derived therefrom

 #54
20180246405
2018-08-30

Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin

 #55
20180203349
2018-07-19

Photoimageable polyolefin compositions containing photobase generators

 #56
20180196178
2018-07-12

Resin film, coloring photosensitive composition, resin film production method, color filter, light shielding film, solid-state imaging element, and image display device

 #57
20180101094
2018-04-12

Resist composition and patterning process

 #58
20180088463
2018-03-29

Resist composition and patterning process

 #59
20180039177
2018-02-08

Positive resist composition, resist pattern forming process, and photomask blank

 #60
20180030189
2018-02-01

Nadic anhydride polymers and photosensitive compositions derived therefrom

 #61
20180017865
2018-01-18

Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method

 #62
20170369697
2017-12-28

Resist composition and method for forming resist pattern

 #63
20170369616
2017-12-28

Resist composition and patterning process

 #64
20170255098
2017-09-07

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #65
20170242338
2017-08-24

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

 #66
20170153546
2017-06-01

Permanent dielectric compositions containing photoacid generator and base

 #67
20170108775
2017-04-20

Resist composition and patterning process

 #68
20170097566
2017-04-06

Fluorine free photopatternable phenol functional group containing polymer compositions

 #69
20170038684
2017-02-09

Chemically amplified positive resist composition and pattern forming process

 #70
20170029547
2017-02-02

Resist composition and patterning process using the same

 #71
20160370702
2016-12-22

Polymer, chemically amplified positive resist composition and patterning process

 #72
20160370701
2016-12-22

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #73
20160349612
2016-12-01

Sulfonium salt, chemically amplified resist composition, and patterning process

 #74
20160347897
2016-12-01

Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

 #75
20160319060
2016-11-03

Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof

 #76
20160246175
2016-08-25

Chemically amplified positive resist composition and pattern forming process

 #77
20160238934
2016-08-18

Photoresist additive for outgassing reduction and out-of-band radiation absorption

 #78
20160238932
2016-08-18

Photoimageable polyolefin compositions containing photobase generators

 #79
20160187780
2016-06-30

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #80
20160187775
2016-06-30

Photoimageable compositions containing thermal base generators

 #81
20160147146
2016-05-26

Resist composition and method for producing resist pattern

 #82
20160124303
2016-05-05

Resist composition

 #83
20160109800
2016-04-21

Photoresist compositions and methods of forming photolithographic patterns

 #84
20160085149
2016-03-24

Resist composition and patterning process

 #85
20160033863
2016-02-04

Photoresist composition to reduce photoresist pattern collapse

 #86
20150362836
2015-12-17

Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device

 #87
20150355544
2015-12-10

Chemically amplified resist composition and pattern forming process

 #88
20150286138
2015-10-08

Photoresist having improved extreme-ultraviolet lithography imaging performance

 #89
20150253664
2015-09-10

Chemically-amplified positive resist composition and resist patterning process using the same

 #90
20150205205
2015-07-23

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #91
20150198879
2015-07-16

Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same

 #92
20150168838
2015-06-18

Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

 #93
20150160551
2015-06-11

Positive-tone, chemically amplified, aqueous-developable, permanent dielectric

 #94
20150132701
2015-05-14

Photoresist system and method

 #95
20150072291
2015-03-12

Self-assembled structures, method of manufacture thereof and articles comprising the same

 #96
20150021289
2015-01-22

Photoresist composition, coated substrate, and method of forming electronic device

 #97
20140361415
2014-12-11

Photoresists and methods for use thereof

 #98
20140349233
2014-11-27

Water soluble norbornene-type polymers and photoimageable compositions thereof

 #99
20140287359
2014-09-25

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

 #100
20140255843
2014-09-11

Patterning process and resist composition

 #101
20140242518
2014-08-28

Patterning process and resist composition

 #102
20140199636
2014-07-17

Sub-diffraction-limited patterning and imaging via multi-step photoswitching

 #103
20140162188
2014-06-12

Positive resist composition, monomer, polymer, and patterning process

 #104
20140141372
2014-05-22

Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition

 #105
20140134541
2014-05-15

Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

 #106
20140045122
2014-02-13

Positive resist composition and patterning process

 #107
20130344438
2013-12-26

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

 #108
20130337378
2013-12-19

Sulfonium salt, polymer, resist composition, and patterning process

 #109
20130323646
2013-12-05

Resist composition and patterning process

 #110
20130312628
2013-11-28

Lithographic printing plate precursor

 #111
20130288180
2013-10-31

Monomer, polymer, positive resist composition and patterning process

 #112
20130244176
2013-09-19

Resist composition and method of forming resist pattern

 #113
20130189622
2013-07-25

BLOCK COPOLYMER OF POLYMIDE AND POLYAMIC ACID, METHOD FOR PRODUCING THE BLOCK COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE BLOCK COPOLYMER AND PROTECTIVE FILM FORMED USING THE BLOCK COPOLYMER

 #114
20130189621
2013-07-25

Radiation-sensitive resin composition, polymer and compound

 #115
20130181199
2013-07-18

Thermo-oxidatively stable, side chain polyether functionalized polynorbornenes for microelectronic and optoelectronic devices and assemblies thereof

 #116
20130177852
2013-07-11

Hydrophilic photoacid generator and resist composition comprising same

 #117
20130157194
2013-06-20

Patterning process, resist composition, polymer, and polymerizable ester compound

 #118
20130108960
2013-05-02

Patterning process and resist composition

 #119
20130071788
2013-03-21

Patterning process and resist composition

 #120
20130065182
2013-03-14

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

 #121
20130035503
2013-02-07

Sulfonium compound, photoacid generator, and resist composition

 #122
20120328987
2012-12-27

Patterning process and resist composition

 #123
20120321855
2012-12-20

Pattern forming method and resist composition

 #124
20120308930
2012-12-06

Patterning process and resist composition

 #125
20120308927
2012-12-06

Polymers, photoresist compositions and methods of forming photolithographic patterns

 #126
20120288797
2012-11-15

Photoresist compositions and methods of use in high index immersion lithography

 #127
20120270159
2012-10-25

Patterning process

 #128
20120244472
2012-09-27

Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same

 #129
20120219897
2012-08-30

Photoresist having improved extreme-ultraviolet lithography imaging performance

 #130
20120203030
2012-08-09

Photoacid generator, method for producing the same, and resist composition comprising the same

 #131
20120203024
2012-08-09

Photoacid generator, method for producing the same, and resist composition comprising the same

 #132
20120172606
2012-07-05

Sulfonium compound, photo-acid generator, and method for manufacturing the same

 #133
20120165499
2012-06-28

Polymer, method for producing the same, and resist composition containing the same

 #134
20120156595
2012-06-21

COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY

 #135
20120148957
2012-06-14

Pattern forming method, chemical amplification resist composition and resist film

 #136
20120148945
2012-06-14

Resist composition and patterning process

 #137
20120129101
2012-05-24

Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom

 #138
20120076996
2012-03-29

RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH

 #139
20120015293
2012-01-19

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #140
20110294070
2011-12-01

Monomer, polymer, chemically amplified positive resist composition, and patterning process

 #141
20110294069
2011-12-01

Photoresist compositions and methods of forming photolithographic patterns

 #142
20110269070
2011-11-03

Photoacid generators and photoresists comprising same

 #143
20110254140
2011-10-20

Photoresists and methods for use thereof

 #144
20110223536
2011-09-15

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

 #145
20110200941
2011-08-18

Chemically amplified positive resist composition for EB or EUV lithography and patterning process

 #146
20110200919
2011-08-18

Chemically amplified positive resist composition and pattern forming process

 #147
20110177455
2011-07-21

Polymer, resist composition, and patterning process

 #148
20110104610
2011-05-05

Positive photosensitive composition and pattern forming method using the same

 #149
20110098500
2011-04-28

Polymerizable fluorine-containing compound

 #150
20110076625
2011-03-31

Method of forming patterns

 #151
20110076622
2011-03-31

Positive resist composition for immersion exposure and pattern-forming method using the same

 #152
20110065878
2011-03-17

Norbornene-type polymers, compositions thereof and lithographic processes using such compositions

 #153
20110039204
2011-02-17

Ester compounds and their preparation, polymers, resist compositions and patterning process

 #154
20110003251
2011-01-06

Positive resist composition and pattern forming process

 #155
20100331508
2010-12-30

(Meth)acrylate derivative, intermediate thereof, and polymer compound

 #156
20100310991
2010-12-09

Positive resist composition for immersion exposure and pattern-forming method using the same

 #157
20100304300
2010-12-02

Photosensitive composition and pattern-forming method using the photosensitive composition

 #158
20100261117
2010-10-14

Positive photosensitive composition and method of forming resist pattern

 #159
20100248136
2010-09-30

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

 #160
20100239985
2010-09-23

Method for using compositions containing fluorocarbinols in lithographic processes

 #161
20100239978
2010-09-23

Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition

 #162
20100196823
2010-08-05

Positive resist composition for immersion exposure and method of forming resist pattern

 #163
20100183988
2010-07-22

Exposure system and pattern formation method

 #164
20100167207
2010-07-01

Chemically amplified positive resist composition and resist patterning process

 #165
20100143843
2010-06-10

Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition

 #166
20100136482
2010-06-03

Resist composition and patterning process

 #167
20100129738
2010-05-27

Positive resist composition and patterning process

 #168
20100081079
2010-04-01

Polymer for resist and resist composition manufactured using the same

 #169
20100069520
2010-03-18

Block copolymer of polyimide and polyamic acid, method for producing the block copolymer, photosensitive resin composition comprising the block copolymer and protective film formed using the block copolymer

 #170
20100062374
2010-03-11

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

 #171
20100062373
2010-03-11

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

 #172
20100062366
2010-03-11

Positive resist composition and patterning process

 #173
20100062365
2010-03-11

Chemically amplified positive resist composition

 #174
20100055608
2010-03-04

Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process

 #175
20100021847
2010-01-28

Oxime compound and resist composition containing the same

 #176
20100009286
2010-01-14

Chemically-amplified positive resist composition and patterning process thereof

 #177
20090325103
2009-12-31

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same

 #178
20090280434
2009-11-12

Resist composition and patterning process

 #179
20090274975
2009-11-05

POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH

 #180
20090269695
2009-10-29

Chemically amplified positive resist composition

 #181
20090263742
2009-10-22

Chemically amplified positive resist composition

 #182
20090258498
2009-10-15

Method for manufacturing a semiconductor device

 #183
20090246694
2009-10-01

Photoacid generator, resist composition, and patterning process

 #184
20090246686
2009-10-01

Polymer, polymer preparation method, resist composition and patterning process

 #185
20090239176
2009-09-24

Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin

 #186
20090221845
2009-09-03

FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT

 #187
20090215976
2009-08-27

Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films

 #188
20090215974
2009-08-27

Ring-opening metathesis polymer, hydrogenated product thereof, method for preparing the same, and use thereof

 #189
20090191709
2009-07-30

Method for manufacturing a semiconductor device

 #190
20090186307
2009-07-23

Hydrogenated ring-opening metathesis polymer, resist composition and patterning process

 #191
20090181323
2009-07-16

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #192
20090181322
2009-07-16

Photoresist compositions and methods of use in high index immersion lithography

 #193
20090181321
2009-07-16

Photoresist compositions and methods of use in high index immersion lithography

 #194
20090136867
2009-05-28

Si-polymers and photoresists comprising same

 #195
20090117490
2009-05-07

Positive resist composition for immersion lithography and method for forming resist pattern

 #196
20090111053
2009-04-30

Positive resist composition and pattern forming method using the same

 #197
20090098485
2009-04-16

Positive resist composition and pattern forming method using the same

 #198
20090081588
2009-03-26

Resist composition and patterning process

 #199
20090075207
2009-03-19

Norbornene polymer for photoresist and photoresist composition comprising the same

 #200
20090075202
2009-03-19

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

 #201
20080318171
2008-12-25

Method of forming patterns

 #202
20080318159
2008-12-25

Positive photosensitive composition

 #203
20080311507
2008-12-18

Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same

 #204
20080292989
2008-11-27

POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

 #205
20080269506
2008-10-30

Chemical amplification type resist composition

 #206
20080241736
2008-10-02

Resist composition and patterning process

 #207
20080233517
2008-09-25

Negative resists based on acid-catalyzed elimination of polar molecules

 #208
20080124651
2008-05-29

Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers

 #209
20080085473
2008-04-10

Copolymer for use in chemical amplification resists

 #210
20080085470
2008-04-10

Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method

 #211
20080085468
2008-04-10

Resist composition and pattern forming method using the same

 #212
20080081293
2008-04-03

Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

 #213
20080081290
2008-04-03

Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition

 #214
20080081287
2008-04-03

Chemically amplified resist material and pattern formation method using the same

 #215
20080070157
2008-03-20

Cyclodextrin derivative, photoresist composition including the cyclodextrin derivative and method of forming a pattern using the photoresist composition

 #216
20080070155
2008-03-20

INCLUSION COMPLEX, PHOTORESIST COMPOSITION HAVING THE INCLUSION COMPLEX AND METHOD OF FORMING A PATTERN USING THE PHOTORESIST COMPOSITION

 #217
20080063975
2008-03-13

Polymer, positive resist composition and method for forming resist pattern

 #218
20080050674
2008-02-28

Polyester compound and resist material using the same

 #219
20080026317
2008-01-31

Method for using compositions containing fluorocarbinols in lithographic processes

 #220
20080008965
2008-01-10

Ester compounds and their preparation, polymers, resist compositions and patterning process

 #221
20080008962
2008-01-10

Polymerizable ester compounds, polymers, resist compositions and patterning process

 #222
20080008960
2008-01-10

Positive resist compositions and patterning process

 #223
20070259274
2007-11-08

Negative resists based on acid-catalyzed elimination of polar molecules

 #224
20070231741
2007-10-04

Resist composition and patterning process

 #225
20070231738
2007-10-04

Resist composition and patterning process using the same

 #226
20070212645
2007-09-13

Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition

 #227
20070207413
2007-09-06

Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers

 #228
20070207409
2007-09-06

Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

 #229
20070207403
2007-09-06

Branching self-assembling photoresist with decomposable backbone

 #230
20070196766
2007-08-23

Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

 #231
20070190447
2007-08-16

Photoresist composition and method of forming resist pattern

 #232
20070179309
2007-08-02

Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process

 #233
20070172762
2007-07-26

Photoresist composition for deep ultraviolet lithography

 #234
20070172760
2007-07-26

Photosensitive polymer and photoresist composition having the same

 #235
20070172757
2007-07-26

Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method

 #236
20070160929
2007-07-12

Lactone-containing compound, polymer, resist composition, and patterning process

 #237
20070154844
2007-07-05

Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film

 #238
20070154841
2007-07-05

Photoresist composition for deep ultraviolet lithography

 #239
20070148595
2007-06-28

Positive resist composition and pattern forming method using the same

 #240
20070148592
2007-06-28

Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

 #241
20070148585
2007-06-28

Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer

 #242
20070148581
2007-06-28

Photoresist composition and method of forming resist pattern

 #243
20070141513
2007-06-21

Positive photosensitive composition

 #244
20070134589
2007-06-14

Positive resist composition and pattern forming method using the same

 #245
20070134588
2007-06-14

Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

 #246
20070129576
2007-06-07

Process for preparing fluorine-containing norbornene derivative

 #247
20070123674
2007-05-31

Chemical amplification type resist composition

 #248
20070111138
2007-05-17

Photoactive compounds

 #249
20070105045
2007-05-10

Positive resist composition and pattern formation method using the positive resist composition

 #250
20070105042
2007-05-10

Resist composition and patterning process

 #251
20070100159
2007-05-03

Salt suitable for an acid generator and a chemically amplified resist composition containing the same

 #252
20070092834
2007-04-26

Photoimageable, thermosettable fluorinated resists

 #253
20070088131
2007-04-19

Sulfonate and resist composition

 #254
20070082289
2007-04-12

Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition

 #255
20070077519
2007-04-05

Pattern forming method and resist composition used therefor

 #256
20070065753
2007-03-22

Positive resist composition for immersion exposure and pattern forming method using the same

 #257
20070065752
2007-03-22

Positive resist composition and pattern forming method using the same

 #258
20070059639
2007-03-15

Positive resist composition and pattern-forming method using the same

 #259
20070042290
2007-02-22

Positive resist composition for immersion exposure and pattern-forming method using the same

 #260
20070026339
2007-02-01

Negative resists based on a acid-catalyzed elimination of polar molecules

 #261
20060292490
2006-12-28

Positive photosensitive composition and pattern forming method using the same

 #262
20060292489
2006-12-28

Photoresist monomer polymer thereof and photoresist composition including the same

 #263
20060275695
2006-12-07

Polymer for immersion lithography and photoresist composition

 #264
20060273070
2006-12-07

Photoresist polymer, and photoresist composition

 #265
20060251991
2006-11-09

Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer

 #266
20060235174
2006-10-19

Norbornene-type polymers, compositions thereof and lithographic processes using such compositions

 #267
20060234164
2006-10-19

Norbornene-type polymers, compositions thereof and lithographic process using such compositions

 #268
20060234160
2006-10-19

Novel ester compounds, polymers, resist compositions and patterning process

 #269
20060210922
2006-09-21

Positive resist composition and pattern forming method using the resist composition

 #270
20060210919
2006-09-21

Photosensitive composition and pattern-forming method using the same

 #271
20060210913
2006-09-21

Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist composition

 #272
20060204893
2006-09-14

Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer

 #273
20060199915
2006-09-07

Modified cycloolefin copolymer, process for producing the same, and use of the polymer

 #274
20060194148
2006-08-31

Positive resist composition and pattern forming method using the same

 #275
20060188806
2006-08-24

Norbornene polymer for photoresist and photoresist composition comprising the same

 #276
20060167284
2006-07-27

Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography

 #277
20060166130
2006-07-27

Photoresist composition and resist pattern formation method by the use thereof

 #278
20060166129
2006-07-27

Fluorinated polymers useful as photoresists, and processes for microlithography

 #279
20060160023
2006-07-20

Photo acid generator, chemical amplification resist material

 #280
20060160019
2006-07-20

Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition

 #281
20060154171
2006-07-13

Photoresist composition and method of forming resist pattern

 #282
20060154170
2006-07-13

Resist composition for liquid immersion exposure process and method of forming resist pattern therewith

 #283
20060135663
2006-06-22

Fluorinated copolymer process for its production and resist composition containing it

 #284
20060122348
2006-06-08

Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

 #285
20060110677
2006-05-25

Photoresist composition for deep UV and process thereof

 #286
20060093960
2006-05-04

Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process

 #287
20060073408
2006-04-06

Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition

 #288
20060068320
2006-03-30

Resist composition and method of pattern formation with the same

 #289
20060057490
2006-03-16

Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same

 #290
20060051702
2006-03-09

Resist material and pattern formation method

 #291
20060040203
2006-02-23

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

 #292
20060035165
2006-02-16

Positive resist composition and method of forming a resist pattern using the same

 #293
20060025540
2006-02-02

Polymeric compositions and uses therefor

 #294
20060024610
2006-02-02

Photoresist compositions

 #295
20060022297
2006-02-02

Photoresist polymer and photoresist composition containing the same

 #296
20060019192
2006-01-26

Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same

 #297
20060008736
2006-01-12

Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same

 #298
20060008734
2006-01-12

Photosensitive dielectric resin compositions, films formed therefrom and semiconductor and display devices encompassing such films

 #299
20060008731
2006-01-12

Novel photoresist monomers and polymers

 #300
20060008730
2006-01-12

Monomers for photoresists bearing acid-labile groups of reduced optical density