177043 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Composition for forming silicon-containing resist underlayer film and patterning process
#302EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
#303Photocurable composition and method for producing semiconductor device
#304A SPIN COATING COMPOSITION COMPRISING A CARBON MATERIAL, A METAL ORGANIC COMPOUND, AND SOLVENT, AND A MANUFACTURING METHOD OF A METAL OXIDE FILM ABOVE A SUBSTRATE
#305SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
#306Film structure for electric field guided photoresist patterning process
#307METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#308RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPPING AGENT
#309PHOTORESIST UNDERLAYER COMPOSITION
#310Resist underlayer film-forming composition having diol structure
#311PHOTORESIST UNDERLAYER COMPOSITION
#312Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating
#313Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate
#314METHOD OF PROCESSING PHOTORESIST LAYER, AND PHOTORESIST LAYER
#315COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT
#316FILM-FORMING COMPOSITION
#317COMPOSITION FOR FORMING RESIST UNDERLYING FILM
#318MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
#319ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
#320MATERIAL FOR FORMING FILLING FILM FOR INHIBITING SEMICONDUCTOR SUBSTRATE PATTERN COLLAPSE, AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE
#321STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERMETIC OVERLAYER
#322FILM-FORMING COMPOSITION
#323FILM-FORMING COMPOSITION
#324INORGANIC SOLID OBJECT PATTERN MANUFACTURING METHOD AND INORGANIC SOLID OBJECT PATTERN
#325COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
#326CONDUCTIVE COMPOSITION AND PRODUCTION METHOD THEREFOR, AND WATER-SOLUBLE POLYMER AND PRODUCTION METHOD THEREFOR
#327RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT
#328Pellicle for extreme ultraviolet lithography based on yttrium carbide
#329HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
#330CHEMICAL-RESISTANT PROTECTIVE FILM
#331Lithography measurement machine and operating method thereof
#332COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
#333PHOTORESIST UNDERLAYER COMPOSITION
#334RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#335METHOD OF STRIPPING PHOTORESIST
#336HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
#337EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
#338HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
#339COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD
#340METHOD AND PRECURSORS FOR PRODUCING OXOSTANNATE RICH FILMS
#341SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
#342METHOD OF FORMING A PHOTORESIST ABSORBER LAYER AND STRUCTURE INCLUDING SAME
#343Multi-Reactive Photosensitive Nanocomposite Film and Bioelectric Stimulation System Using Independent Multi-States
#344PHOTOSENSITIVE COMPOSITION, CURED FILM, PHOTOSENSITIVE TRANSFER MATERIAL AND METHOD OF PRODUCING THE SAME, FILM, TOUCH PANEL, METHOD OF SUPPRESSING DETERIORATION, AND LAMINATE AND METHOD OF PRODUCING THE SAME
#345SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT SYSTEM
#346Method for exposing photopolymerization layer comprising photopolymer
#347Method of manufacturing semiconductor devices
#348EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION
#349RESIST UNDERLYING FILM-FORMING COMPOSITION FOR NANOIMPRINTING
#350MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM
#351Coated underlayer for overcoated photoresist
#352RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE
#353Ablation layer, photosensitive resin structure, method for producing relief printing plate using said photosensitive resin structure
#354COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD OF FORMING RESIST PATTERN
#355COMPOSITION, COMPOSITION PRECURSOR SOLUTION, PRODUCTION METHOD FOR COMPOSITION, SUBSTRATE WITH MULTILAYER FILM, AND PRODUCTION METHOD FOR PATTERNED SUBSTRATE
#356LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
#357COMPOSITION FOR REMOVING EDGE BEADS FROM METAL CONTAINING RESISTS, AND METHOD OF FORMING PATTERNS INCLUDING STEP OF REMOVING EDGE BEADS USING THE COMPOSITION
#358BLOCK COPOLYMER SELF-ALIGNMENT ON ISOLATED CHEMICAL STRIPES
#359METHOD FOR FORMING PHOTORESIST PATTERNS
#360COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
#361RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#362RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#363METHOD FOR FORMING PHOTORESIST PATTERNS
#364METHODS OF PREPARING REGIOREGULAR CONJUGATED POLYMERS
#365Resist underlayer film-forming composition containing indolocarbazole novolak resin
#366CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE FILM
#367COMPOSITIONS FOR REDUCING RESIST CONSUMPTION OF EXTREME ULTRAVIOLET METALLIC TYPE RESIST
#368SEMICONDUCTOR DEVICE AND IMPRINT METHOD
#369SILICON-CONTAINING COMPOSITION AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE
#370Composition containing a dicyanostyryl group, for forming a resist underlayer film capable of being wet etched
#371COMPOSITION FOR PHOTORESIST UNDERLAYER
#372Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods
#373Underlayer of multilayer structure and methods of use thereof
#374Metal oxide resist patterning with electrical field guided post-exposure bake
#375Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same
#376FLOW CELLS AND METHODS FOR MAKING THE SAME
#377Method of reducing undesired light influence in extreme ultraviolet exposure
#378Silicon-containing resist underlayer film-forming composition including organic group having ammonium group
#379RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING HETEROCYCLIC COMPOUND
#380METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#381MICRO AND NANO STRUCTURING OF A DIAMOND SUBSTRATE
#382METHOD OF FORMING AN ADHESION LAYER ON A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING SAME
#383Radiation-sensitive resin composition and method for forming resist pattern
#384RESIST UNDERLAYER FILM-FORMING COMPOSITION
#385HARDMASK COMPOSITION, HARDMASK LAYER, AND PATTERN FORMING METHOD
#386RESIST UNDERLAYER FILM-FORMING COMPOSITION
#387PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL
#388PHOTOSENSITIVE TRANSFER MATERIAL AND METHOD OF PRODUCING THE SAME, METHOD OF PRODUCING PATTERNED METAL CONDUCTIVE MATERIAL, FILM, TOUCH PANEL, METHOD OF SUPPRESSING DETERIORATION, AND LAMINATE
#389COMPOSITION CONTAINING A HETEROCYCLIC COMPOUND HAVING A DICYANOSTYRYL GROUP, FOR FORMING A RESIST UNDERLAYER FILM CAPABLE OF BEING WET ETCHED
#390METHOD OF MANUFACTURING CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, PATTERN FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, CHEMICAL FLUID FOR MANUFACTURING ELECTRONIC MATERIAL, CONTAINER, AND QUALITY INSPECTION METHOD
#391HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
#392Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
#393Pillar template for making micropore membranes and methods of fabrication thereof
#394RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN
#395Solvent compatible nozzle plate
#396Method of manufacturing a semiconductor device
#397POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
#398Resist underlayer film-forming composition
#399Insulating layer for multilayer printed circuit board, multilayer printed circuit board comprising same, and method for producing same
#400COMPOSITION FOR COATING SUBSTRATE WITH LEVEL DIFFERENCE, SAID COMPOSITION CONTAINING COMPOUND HAVING CURABLE FUNCTIONAL GROUP
#401MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM
#402PATTERN FORMATION METHOD AND MATERIAL FOR MANUFACTURING SEMICONDUCTOR DEVICES
#403Photoresist compositions and methods for fabricating semiconductor devices using the same
#404PHOTOSENSITIVE POLYMER AND RESIST COMPOSITION HAVING THE SAME
#405NANOWELL ARRAY DEVICE FOR HIGH THROUGHPUT SAMPLE ANALYSIS
#406COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE
#407RESIST UNDERLAYER FILM-FORMING COMPOSITION
#408METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND DEVICES
#409Freeze-less methods for self-aligned double patterning
#410Method for manufacturing cured film and use of the same
#411COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND
#412Lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method
#413PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS
#414MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
#415MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER
#416COMPOSITION, FILM, METHOD OF FORMING FILM, METHOD OF FORMING PATTERN, METHOD OF FORMING ORGANIC-UNDERLAYER-FILM REVERSE PATTERN, AND METHOD OF PRODUCING COMPOSITION
#417COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD OF PRODUCING PATTERNED SUBSTRATE, AND COMPOUND
#418ADHESION PROMOTING PHOTORESIST UNDERLAYER COMPOSITION
#419PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
#420PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
#421Hardmask composition and method of forming patterns
#422Underlayer material for photoresist
#423FILM-FORMING COMPOSITION
#424Component Carrier With a Photoimageable Dielectric Layer and a Structured Conductive Layer Being Used as a Mask for Selectively Exposing the Photoimageable Dielectric Layer With Electromagnetic Radiation
#425Highly thick spin-on-carbon hard mask composition and patterning method using same
#426PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTILAYER PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING MULTILAYER PRINTED WIRING BOARD
#427Resist underlayer film material, patterning process, and method for forming resist underlayer film
#428LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
#429ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
#430RESIST UNDERLAYER FILM-FORMING COMPOSITION
#431PHOTO-PATTERNABLE CROSS-BRED ORGANIC SEMICONDUCTOR POLYMERS FOR ORGANIC THIN-FILM TRANSISTORS
#432FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, METHOD FOR FORMING PATTERN, AND PURIFICATION METHOD
#433ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
#434METHOD FOR PRODUCING POLYMER
#435Method for coating chips
#436COMPOSITION, SILICON-CONTAINING FILM, METHOD OF FORMING SILICON-CONTAINING FILM, AND METHOD OF TREATING SEMICONDUCTOR SUBSTRATE
#437Resist underlayer film-forming composition
#438CHEMICAL SOLUTION-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING POLYMERIZATION PRODUCT HAVING DIOL STRUCTURE AT TERMINAL THEREOF
#439COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN
#440INFRARED RADIATION SENSITIVE POSITIVE-WORKING IMAGEABLE ELEMENT AND METHOD FOR FORMING IMAGE USING SAME
#441On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method
#442MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM
#443Water-developable photosensitive resin printing original plate
#444FILM FORMING COMPOSITION
#445FILM STRUCTURE FOR ELECTRIC FIELD ASSISTED BAKE PROCESS
#446Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device
#447LAMINATE, COMPOSITION, AND, LAMINATE FORMING KIT
#448FLEXOGRAPHIC PRINTING RAW PLATE AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE
#449Gray-tone lithography for precise control of grating etch depth
#450FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM, METHOD OF FORMING FILM, METHOD OF FORMING RESIST PATTERN, METHOD OF FORMING ORGANIC-UNDERLAYER-FILM REVERSE PATTERN, METHOD OF PRODUCING FILM-FORMING COMPOSITION, AND METHOD OF FORMING METAL-CONTAINING FILM PATTERN
#451Composition for resist underlayer, and pattern forming method using same
#452Laminate, composition, and laminate forming kit
#453Photosensitive dry film, and printed wiring board with photosensitive dry film
#454UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
#455Coating composition for photoresist underlayer
#456Controlling semiconductor film thickness
#457COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND PURIFICATION METHOD
#458SUBSTRATE TREATING COMPOSITION AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME
#459MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, AND LAMINATE
#460Diffractive backlight fabrication method
#461PERMANENT BONDING AND PATTERNING MATERIAL
#462Flexographic printing raw plate and manufacturing method of flexographic printing plate
#463Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
#464NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
#465Method of fabricating diffractive backlight
#466Protective film-forming composition having acetal structure and amide structure
#467FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
#468FLEXOGRAPHIC PRINTING PLATE PRECURSOR, IMAGING ASSEMBLY AND USE
#469Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound
#470Method for producing a lithography coating film forming-composition
#471RESIST UNDERLAYER SURFACE MODIFICATION
#472Selective deposition of carbon on photoresist layer for lithography applications
#473Method for pitch split patterning using sidewall image transfer
#474Nanoscale Etching of Light Absorbing Materials using Light and an Electron Donor Solvent
#475FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
#476Chemical-resistant protective film-forming composition containing polymerization product of arylene compound having glycidyl group
#477Silicon-containing underlayers
#478Resist underlayer film material, patterning process, and method for forming resist underlayer film
#479Method for producing coating film-forming composition for lithography
#480Resist underlayer film-forming composition and method for forming resist pattern using the same
#481Method to form narrow slot contacts
#482Lithography process and material for negative tone development
#483Resin composition and method of forming resist pattern
#484HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT
#485Directed self-assembly structures and techniques
#486Chemical compositions and methods of patterning microelectronic device structures
#487Underlayer composition and method of manufacturing a semiconductor device
#488High-resolution shadow masks
#489Planographic printing plate precursor, method of preparing planographic printing plate, and planographic printing method
#490PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN
#491Multiple patterning with organometallic photopatternable layers with intermediate freeze steps
#492Coating compositions and methods of forming electronic devices
#493Coating compositions and methods of forming electronic devices
#494Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process
#495Polymers, underlayer coating compositions comprising the same, and patterning methods
#496COMPOSITION, METHOD OF PRODUCING SUBSTRATE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING REVERSE PATTERN
#497Substrate treatment method and substrate treatment system
#498Backplane unit and its manufacturing method and display device
#499RESIST UNDERLAYER FILM-FORMING COMPOSITION
#500Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
#501Method of manufacturing a semiconductor device
#502Photosensitive resin composition, pattern forming method, cured film, laminate, and device
#503UNDERLAYER FILM FORMING COMPOSITION
#504COMPOSITION, RESIST UNDERLAYER FILM, AND RESIST PATTERN-FORMING METHOD
#505Material for forming organic film, method for forming organic film, patterning process, and compound
#506Photosensitive element, resin composition for forming barrier layer, method for forming resist pattern, and method for manufacturing printed wiring board
#507Cleaning composition, cleaning method, and method for manufacturing semiconductor
#508Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer
#509PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
#510RESIST UNDERLAYER FILM-FORMING COMPOSITION
#511RESIST UNDERLYING FILM-FORMING COMPOSITION COMPRISING A REACTION PRODUCT WITH A GLYCIDYL ESTER COMPOUND
#512Polyethylene film and dry film resist
#513Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern
#514Hard-mask forming composition, method for manufacturing electronic component, and resin
#515Lithographic printing plate precursor
#516AROMATIC UNDERLAYER
#517Resist underlayer composition, and method of forming patterns using the composition
#518Silicon-based nanowire, preparation method thereof, and thin film transistor
#519Film processing method
#520Pattern formation methods and photoresist pattern overcoat compositions
#521Resist underlayer composition, and method of forming patterns using the composition
#522Ablation layer, photosensitive resin structure, method for producing relief printing plate using said photosensitive resin structure
#523Method of removing photoresist, laminate, method of forming metallic pattern, polyimide resin and stripper
#524Method for making lithographic printing plates
#525Method for manufacturing semiconductor device
#526Treatment liquid and pattern forming method
#527Coating composition for photoresist underlayer
#528METHOD OF FORMING PHOTORESIST PATTERN
#529UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#530Resist composition and patterning process
#531Coloring composition, method for producing coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device
#532Material for forming organic film, method for forming organic film, patterning process, and compound
#533TRANSFER FILM, MANUFACTURING METHOD OF CURED FILM, MANUFACTURING METHOD OF LAMINATE, AND MANUFACTURING METHOD OF TOUCH PANEL
#534Semiconductor element intermediate, composition for forming metal-containing film, method of producing semiconductor element intermediate, and method of producing semiconductor element
#535WATER-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING AND PHOTOSENSITIVE RESIN ORIGINAL PLATE FOR FLEXOGRAPHIC PRINTING OBTAINED THEREFROM
#536Lithographic printing plate precursor
#537LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND CAPACITIVE INPUT DEVICE
#538Material for forming organic film, method for forming organic film, patterning process, and compound
#539Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same
#540Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group
#541Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer
#542COMPOUND, SYNTHESIS METHOD OF THE COMPOUND, HARDMASK COMPOSITION, AND METHOD OF FORMING PATTERNS
#543FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
#544Material for forming organic film, patterning process, and polymer
#545Composition, pattern-forming method, and compound-producing method
#546UNDERLAYER FILM-FORMING COMPOSITION, PATTERN-FORMING METHOD, AND COPOLYMER FOR FORMING UNDERLAYER FILM USED FOR PATTERN FORMATION
#547Planographic printing plate precursor, planographic printing plate precursor laminate, plate-making method for planographic printing plate, and planographic printing method
#548Resist composition and patterning process
#549Photoresist developer and method of developing photoresist
#550HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT
#551Low-noise biomolecular sensors
#552Resist underlayer film-forming composition including cyclic carbonyl compound
#553PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
#554Pattern fidelity enhancement
#555RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUBLE BOND
#556COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
#557SPIN-ON METAL OXIDE MATERIALS OF HIGH ETCH RESISTANCE USEFUL IN IMAGE REVERSAL TECHNIQUE AND RELATED SEMICONDUCTOR MANUFACTURING PROCESSES
#558HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
#559Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
#560Coating composition for use with an overcoated photoresist
#561Adhesion layer for multi-layer photoresist
#562Film forming composition containing fluorine-containing surfactant
#563Photoresist composition, method for preparing the same, and patterning method
#564Composition for forming silicon-containing resist underlayer film and patterning process
#565Method of patterning a substrate using a sidewall spacer etch mask
#566Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same
#567COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
#568COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
#569Resist underlayer film forming composition having a disulfide structure
#570Water-developable photosensitive resin composition for flexographic printing and photosensitive resin original plate for flexographic printing obtained therefrom
#571LITHOGRAPHIC PRINTING PLATE PRECURSORS AND METHOD OF USE
#572Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask
#573COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
#574COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
#575Bottom antireflective coating materials
#576COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM
#577Patterning process of a semiconductor structure with enhanced adhesion
#578PERMANENT BONDING AND PATTERNING MATERIAL
#579Composition for forming silicon-containing resist underlayer film and patterning process
#580Stepped substrate coating composition containing compound having curable functional group
#581Random copolymer for forming neutral layer, laminate for forming pattern including the same, and method for forming pattern using the same
#582COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION AND PATTERN FORMATION METHOD
#583SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS PROTECTED PHENOLIC GROUP AND NITRIC ACID
#584Composition for forming organic film, patterning process, and polymer
#585STABILIZED INTERFACES OF INORGANIC RADIATION PATTERNING COMPOSITIONS ON SUBSTRATES
#586COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME
#587Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
#588Protective film forming composition having an acetal structure
#589Method for producing substrate
#590UNDERLAYER FILM-FORMING COMPOSITION, PATTERN-FORMING METHOD, COPOLYMER, AND MONOMER FOR UNDERLAYER FILM-FORMING COMPOSITION
#591Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating
#592PATTERN-FORMING MATERIAL, PATTERN-FORMING METHOD, AND MONOMER FOR PATTERN-FORMING MATERIAL
#593Substrate hydrophilizing agent
#594Photoresist and method of formation and use
#595Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added
#596Composition for forming organic film, patterning process, and polymer
#597RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED CROSSLINKABLE COMPOUND
#598Photoresist pattern trimming compositions and pattern formation methods
#599Resist underlayer film forming composition using a fluorene compound
#600Treatment liquid and treatment method