Patents-Review.com
ClassID:

177043 ⎘

G03F7/11 - page 3 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Recent Application in this class:
#601
20200363718
2020-11-19

Kit, composition for forming underlayer film for imprinting, laminate, and production method using the same

 #602
20200361843
2020-11-19

Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin

 #603
20200356008
2020-11-12

Planographic printing plate precursor and method of producing planographic printing plate

 #604
20200356007
2020-11-12

Composition for forming organic film, patterning process, and polymer

 #605
20200356006
2020-11-12

Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability

 #606
20200354575
2020-11-12

Film-forming composition, silicon-containing film, and resist pattern-forming method

 #607
20200354501
2020-11-12

COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, FILM FOR LITHOGRAPHY, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CIRCUIT PATTERN

 #608
20200353741
2020-11-12

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE

 #609
20200348595
2020-11-05

COMPOSITION, FILM, AND PRODUCTION METHOD OF PATTERNED SUBSTRATE

 #610
20200348594
2020-11-05

Photoresist compositions and methods for fabricating semiconductor devices using the same

 #611
20200347244
2020-11-05

Conductive composition and production method therefor, and water-soluble polymer and production method therefor

 #612
20200346444
2020-11-05

Partition wall for formation of lipid bilayer membrane, and method for producing same

 #613
20200341390
2020-10-29

Processing apparatus and method thereof

 #614
20200341382
2020-10-29

Liquid chemical, method for producing liquid chemical, and method for analyzing test target solution

 #615
20200341377
2020-10-29

Composition for forming silicon-containing resist underlayer film and patterning process

 #616
20200340806
2020-10-29

Method for measuring distance of diffusion of curing catalyst

 #617
20200333710
2020-10-22

Underlayer material for photoresist

 #618
20200326624
2020-10-15

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD OF FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT

 #619
20200319561
2020-10-08

Protective film forming composition having a diol structure

 #620
20200319559
2020-10-08

LIQUID CHEMICAL AND METHOD FOR PRODUCING LIQUID CHEMICAL

 #621
20200319558
2020-10-08

Lithographic printing plate precursor

 #622
20200319550
2020-10-08

Sulfonium compound, chemically amplified resist composition, and patterning process

 #623
20200301280
2020-09-24

Method for forming semiconductor structure

 #624
20200301279
2020-09-24

Thin film circuit substrate and manufacturing method thereof

 #625
20200301278
2020-09-24

Stepped substrate-coating composition containing polyether resin having photocrosslinkable group

 #626
20200301276
2020-09-24

Cross-linkable fluorinated photopolymer

 #627
20200298452
2020-09-24

Method for manufacturing cured product pattern, method for manufacturing processed substrate, method for manufacturing circuit board, method for manufacturing electronic component, and method for manufacturing imprint mold

 #628
20200292941
2020-09-17

Conductive polymer composition, coated product and patterning process

 #629
20200285153
2020-09-10

Resist underlayer composition, and method of forming patterns using the composition

 #630
20200272053
2020-08-27

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, patterned substrate-producing method, and compound

 #631
20200272052
2020-08-27

Photopolymerizable resin composition, display device using same, and manufacturing method thereof

 #632
20200264511
2020-08-20

MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE

 #633
20200264509
2020-08-20

Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same

 #634
20200262231
2020-08-20

Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, plate-making method for lithographic printing plate, and lithographic printing method

 #635
20200249573
2020-08-06

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD

 #636
20200241419
2020-07-30

Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate

 #637
20200233307
2020-07-23

Film structure for electric field guided photoresist patterning process

 #638
20200233305
2020-07-23

Anti-reflective hardmask composition

 #639
20200233303
2020-07-23

Composition for forming silicon-containing resist underlayer film and patterning process

 #640
20200225585
2020-07-16

Crosslinkable compound-containing photocurable stepped substrate-coating composition

 #641
20200225584
2020-07-16

Alkaline developer soluable silicon-containing resist underlayer film-forming composition

 #642
20200225578
2020-07-16

Pre-patterned lithography templates

 #643
20200223216
2020-07-16

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE

 #644
20200218152
2020-07-09

Photosensitive polyimide compositions

 #645
20200209754
2020-07-02

Hardmask composition, hardmask layer and method of forming patterns

 #646
20200209753
2020-07-02

Resist underlying film forming composition

 #647
20200207902
2020-07-02

Polymer, hardmask composition, and method of forming patterns

 #648
20200201185
2020-06-25

Hardmask composition, hardmask layer and method of forming patterns

 #649
20200201184
2020-06-25

Resist underlayer film-forming composition

 #650
20200201183
2020-06-25

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING COMPOUND HAVING HYDANTOIN RING

 #651
20200201177
2020-06-25

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

 #652
20200199288
2020-06-25

Polymer for formation of resist underlayer film, composition for formation of resist underlayer film comprising same and method for manufacturing semiconductor element by using same

 #653
20200199093
2020-06-25

Composition, film, film-forming method and patterned substrate-producing method

 #654
20200192224
2020-06-18

RESIST UNDERLAYER FILM-FORMING COMPOSITION

 #655
20200189306
2020-06-18

Lithographic printing plate precursor and method of producing lithographic printing plate

 #656
20200183282
2020-06-11

Protective film-forming composition

 #657
20200174370
2020-06-04

Composition for forming resist underlayer film having improved flattening properties

 #658
20200166844
2020-05-28

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN

 #659
20200166839
2020-05-28

LITHOGRAPHIC PRINTING PLATE PRECURSOR, RESIN COMPOSITION FOR PRODUCING LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE

 #660
20200159121
2020-05-21

METAL-CONTAINING FILM-FORMING COMPOSITION, METAL-CONTAINING FILM AND PATTERN-FORMING METHOD

 #661
20200159120
2020-05-21

Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process

 #662
20200157060
2020-05-21

FILM FORMING MATERIAL, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, MATERIAL FOR OPTICAL COMPONENT FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, PERMANENT FILM FOR RESIST, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD

 #663
20200150533
2020-05-14

Photosensitive resin structure for printing plate, and method for producing same

 #664
20200148709
2020-05-14

Method for producing iodine-containing silicon compound

 #665
20200142313
2020-05-07

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask

 #666
20200142310
2020-05-07

Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device

 #667
20200142309
2020-05-07

Aromatic underlayer

 #668
20200133127
2020-04-30

Method of reducing undesired light influence in extreme ultraviolet exposure

 #669
20200133126
2020-04-30

Coating composition for forming resist underlayer film for EUV lithography process

 #670
20200131376
2020-04-30

Composition for forming film protecting against aqueous hydrogen peroxide solution

 #671
20200124966
2020-04-23

Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms

 #672
20200124965
2020-04-23

Resist underlayer film-forming composition comprising polymer having structural unit having urea linkage

 #673
20200117091
2020-04-16

PATTERN-FORMING METHOD, AND SILICON-CONTAINING FILM-FORMING COMPOSITION

 #674
20200110338
2020-04-09

Photosensitive material and method of lithography

 #675
20200105520
2020-04-02

Surface treatment of titanium containing hardmasks

 #676
20200103755
2020-04-02

Method for globally adjusting spacer critical dimension using photo-active self-assembled monolayer

 #677
20200101424
2020-04-02

METHOD FOR PERFORATING CARBON NANOMATERIAL, AND METHOD FOR PRODUCING FILTER MOLDED ARTICLE

 #678
20200098558
2020-03-26

Adhesion layer for multi-layer photoresist

 #679
20200083154
2020-03-12

Component Carrier With a Photoimageable Dielectric Layer and a Structured Conductive Layer Being Used as a Mask for Selectively Exposing the Photoimageable Dielectric Layer With Electromagnetic Radiation

 #680
20200073243
2020-03-05

Photosensitive middle layer

 #681
20200057377
2020-02-20

Lithography process and material for negative tone development

 #682
20200050109
2020-02-13

Priming material for organometallic resist

 #683
20200050108
2020-02-13

Self-priming resist for generic inorganic hardmasks

 #684
20200041906
2020-02-06

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CARBONYL STRUCTURE

 #685
20200041905
2020-02-06

RESIST UNDERLYING FILM-FORMING COMPOSITION CONTAINING AN AMIDE GROUP-CONTAINING POLYESTER

 #686
20200040209
2020-02-06

Composition for underlayer film formation, underlayer film for directed self-assembled film and forming method thereof, and directed self-assembly lithography process

 #687
20200033727
2020-01-30

Photoresist composition and photoresist film using the same

 #688
20200026191
2020-01-23

Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore

 #689
20200024384
2020-01-23

Polymer, organic layer composition and method of forming patterns

 #690
20200019062
2020-01-16

Compositions and processes for self-assembly of block copolymers

 #691
20200019061
2020-01-16

Cured film-forming composition

 #692
20200017678
2020-01-16

Hardmask composition, hardmask layer and method of forming patterns

 #693
20200004152
2020-01-02

Photoresist topcoat compositions and methods of processing photoresist compositions

 #694
20200004151
2020-01-02

Pattern formation method and material for manufacturing semiconductor devices

 #695
20190391492
2019-12-26

Radiatioin-curable mixture containing low-functionalised, partially saponified polyvinyl acetate

 #696
20190391481
2019-12-26

Extreme ultraviolet (EUV) mask stack processing

 #697
20190384177
2019-12-19

Blocking layer material composition and methods thereof in semiconductor manufacturing

 #698
20190384170
2019-12-19

Photoresist composition and method of forming photoresist pattern

 #699
20190371823
2019-12-05

Photosensitive element having substantially flat interface between electrode and photosensitive layer and manufacturing method thereof

 #700
20190367658
2019-12-05

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND PATTERN FORMATION METHOD

 #701
20190354018
2019-11-21

Resist underlayer film-forming composition containing amide solvent

 #702
20190354015
2019-11-21

COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

 #703
20190346765
2019-11-14

Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article

 #704
20190344597
2019-11-14

RELIEF PRINTING ORIGINAL PLATE FOR ROTARY LETTERPRESS PRINTING

 #705
20190339618
2019-11-07

Silicon-containing coating agent for pattern reversal

 #706
20190332013
2019-10-31

Coating and developing method and coating and developing apparatus

 #707
20190317406
2019-10-17

Substrate treating composition and method for fabricating a semiconductor device using the same

 #708
20190317405
2019-10-17

Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same

 #709
20190302619
2019-10-03

Nanoscale etching of light absorbing materials using light and an electron donor solvent

 #710
20190302616
2019-10-03

Resist underlayer film-forming composition containing naphthol aralkyl resin

 #711
20190300498
2019-10-03

Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

 #712
20190294047
2019-09-26

Hardmask composition and method of forming pattern using the hardmask composition

 #713
20190294046
2019-09-26

Resist underlayer film forming composition

 #714
20190294045
2019-09-26

Photosensitive resin composition, photosensitive resin laminate, and pattern forming process

 #715
20190292403
2019-09-26

Coating composition for pattern inversion

 #716
20190287792
2019-09-19

Method of manufacturing integrated circuit device

 #717
20190285985
2019-09-19

Polymer brushes for extreme ultraviolet photolithography

 #718
20190279871
2019-09-12

METHOD OF ENHANCING GENERATION EFFICIENCY OF PATTERNED OPTICAL COATING

 #719
20190278180
2019-09-12

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD

 #720
20190278171
2019-09-12

Method for forming a functionalised guide pattern for a graphoepitaxy method

 #721
20190271913
2019-09-05

Photoactive polymer brush materials and EUV patterning using the same

 #722
20190267234
2019-08-29

Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography

 #723
20190265593
2019-08-29

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ORGANIC GROUP HAVING DIHYDROXY GROUP

 #724
20190265590
2019-08-29

Underlayer material for photoresist

 #725
20190264076
2019-08-29

ADHESION LAYER-FORMING COMPOSITION AND METHOD FOR PRODUCING ARTICLE

 #726
20190259601
2019-08-22

Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography

 #727
20190258165
2019-08-22

CHEMICAL LIQUID, PATTERN FORMING METHOD, AND KIT

 #728
20190258154
2019-08-22

Relief image-forming method and assembly

 #729
20190255870
2019-08-22

Lithographic printing plate precursor, method of producing same, and printing method using same

 #730
20190250512
2019-08-15

Method for producing resist pattern coating composition with use of solvent replacement method

 #731
20190249000
2019-08-15

Resin composition and method of forming resist pattern

 #732
20190243247
2019-08-08

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound

 #733
20190243246
2019-08-08

Topcoat compositions containing fluorinated thermal acid generators

 #734
20190235386
2019-08-01

Pattern-forming method and composition

 #735
20190235385
2019-08-01

Photoresist topcoat compositions and methods of processing photoresist compositions

 #736
20190235380
2019-08-01

Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured film

 #737
20190227439
2019-07-25

Buffer layer to prevent etching by photoresist developer

 #738
20190227438
2019-07-25

Resist underlayer film-forming composition

 #739
20190227436
2019-07-25

Cross-linkable fluorinated photopolymer

 #740
20190227429
2019-07-25

Nanoimprint template, a method of making the same and applications thereof

 #741
20190225731
2019-07-25

Method for manufacturing semiconductor substrate having group-III nitride compound layer

 #742
20190225002
2019-07-25

Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, plate-making method for lithographic printing plate, and lithographic printing method

 #743
20190212652
2019-07-11

Positive type lithographic printing plate precursor, method of producing same, and method of preparing lithographic printing plate

 #744
20190212650
2019-07-11

Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate

 #745
20190212649
2019-07-11

Resist underlayer film forming composition containing triaryldiamine-containing novolac resin

 #746
20190206681
2019-07-04

Patterning material film stack comprising hard mask layer having high metal content interface to resist layer

 #747
20190206680
2019-07-04

Material composition and process for substrate modification

 #748
20190204743
2019-07-04

Photoresist compositions and methods

 #749
20190204742
2019-07-04

Pattern formation methods

 #750
20190204741
2019-07-04

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS

 #751
20190203065
2019-07-04

Photoresist topcoat compositions and methods of processing photoresist compositions

 #752
20190202955
2019-07-04

Monomers, polymers and lithographic compositions comprising same

 #753
20190198342
2019-06-27

Methods of forming micropatterns and substrate processing apparatus

 #754
20190196332
2019-06-27

Resist underlayer composition, and method of forming patterns using the composition

 #755
20190196066
2019-06-27

Antireflective film, method of producing antireflective film, and eyeglass type display

 #756
20190189429
2019-06-20

Surface treatment of titanium containing hardmasks

 #757
20190187560
2019-06-20

Composition for forming metal-containing film, method of producing composition for forming metal-containing film, semiconductor device, and method of producing semiconductor device

 #758
20190187556
2019-06-20

Plasma treatment method to enhance surface adhesion for lithography

 #759
20190185707
2019-06-20

Acetal-protected silanol group-containing polysiloxane composition

 #760
20190171105
2019-06-06

Photosensitive polyimide compositions

 #761
20190171104
2019-06-06

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin

 #762
20190171101
2019-06-06

Photocurable composition and method for producing semiconductor device

 #763
20190163064
2019-05-30

Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method

 #764
20190163063
2019-05-30

Composition for forming resist underlayer film

 #765
20190160858
2019-05-30

Multi-scale pre-assembled phases of matter

 #766
20190155156
2019-05-23

Method for forming semiconductor structure by patterning assist layer having polymer

 #767
20190146343
2019-05-16

SILICON-CONTAINING UNDERLAYERS

 #768
20190146342
2019-05-16

Photoresist composition and method of forming photoresist pattern

 #769
20190143730
2019-05-16

Lithographic printing precursor

 #770
20190137879
2019-05-09

Nitrogen heterocycle-containing monolayers on metal oxides for binding biopolymers

 #771
20190129307
2019-05-02

Resist underlayer composition, and method of forming patterns using the composition

 #772
20190105937
2019-04-11

Photosensitive resin constituent for flexographic printing plate and flexographic printing plate

 #773
20190101829
2019-04-04

PHOTORESIST PATTERNING ON SILICON NITRIDE

 #774
20190101826
2019-04-04

Photoresist composition for deep ultraviolet light patterning method and method of manufacturing semiconductor device

 #775
20190101820
2019-04-04

ASSEMBLY OF ELEMENTS FOR FLEXOGRAPHY

 #776
20190099995
2019-04-04

Silicone composition for printing plates, lithographic printing plate master, lithographic printing plate and method of producing printed matter

 #777
20190096665
2019-03-28

Method and system for supplying chemical liquid in semiconductor fabrication

 #778
20190094695
2019-03-28

Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound

 #779
20190092068
2019-03-28

ALUMINUM SUPPORT FOR PLANOGRAPHIC PRINTING PLATE AND PLANOGRAPHIC PRINTING PLATE PRECURSOR

 #780
20190086806
2019-03-21

Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive

 #781
20190085173
2019-03-21

Antireflective compositions with thermal acid generators

 #782
20190079407
2019-03-14

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #783
20190079406
2019-03-14

METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #784
20190079405
2019-03-14

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #785
20190079404
2019-03-14

METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #786
20190079403
2019-03-14

METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #787
20190079397
2019-03-14

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS

 #788
20190077901
2019-03-14

NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM

 #789
20190074186
2019-03-07

Method for manufacturing a mask

 #790
20190072856
2019-03-07

METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #791
20190072855
2019-03-07

METHOD FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #792
20190072854
2019-03-07

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC PRINTING PLATE

 #793
20190067000
2019-02-28

Pattern fidelity enhancement

 #794
20190064667
2019-02-28

Polymer brushes for extreme ultraviolet photolithography

 #795
20190049846
2019-02-14

Film formation method, dry film manufacturing method and liquid ejection head manufacturing method

 #796
20190049844
2019-02-14

Silicone structure-containing polymer, photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process

 #797
20190049843
2019-02-14

Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, laminate, and pattern forming process

 #798
20190041753
2019-02-07

Resist multilayer film-attached substrate and patterning process

 #799
20190041752
2019-02-07

Composition for forming organic film

 #800
20190041751
2019-02-07

Silicon-containing underlayers

 #801
20190041750
2019-02-07

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method

 #802
20190040207
2019-02-07

Silicon-containing coating agent for reversing planarization pattern

 #803
20190033716
2019-01-31

Sulfonium salt, polymer, resist composition, and patterning process

 #804
20190033715
2019-01-31

Resist composition and pattern forming process

 #805
20190027519
2019-01-24

Patterning for substrate fabrication

 #806
20190027369
2019-01-24

Composition for forming organic film, patterning process, and resin for forming organic film

 #807
20190025699
2019-01-24

FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD

 #808
20190022994
2019-01-24

Method for producing flexographic printing plates using UV-LED irradiation

 #809
20190019675
2019-01-17

Hardmask composition, method of preparing the same, and method of forming patterned layer by using the hardmask composition

 #810
20190016906
2019-01-17

Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition

 #811
20190016101
2019-01-17

Laminate, method for producing substrate with patterned plated layer, method for producing metal layer-containing laminate, touch panel sensor, and touch panel

 #812
20190013212
2019-01-10

Copper foil with carrier, production method for same, production method for coreless support with wiring layer, and production method for printed circuit board

 #813
20190011835
2019-01-10

PROTECTIVE FILM FORMING COMPOSITION, METHOD FOR PRODUCING PROTECTIVE FILM FORMING COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

 #814
20190011833
2019-01-10

PHOTOSENSITIVE TRANSFER MATERIAL, PATTERN FORMATION METHOD, AND ETCHING METHOD

 #815
20190011827
2019-01-10

Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method

 #816
20190010108
2019-01-10

Compound, resin, composition, resist pattern formation method, and circuit pattern formation method

 #817
20190004426
2019-01-03

Negative resist pattern-forming method, and composition for upper layer film formation

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2018-12-20

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2018-12-13

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN

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2018-12-13

Resist patterning method and resist material

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2018-12-13

Mitigating trailing edge voids in flexographic printing

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20180348636
2018-12-06

Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning

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20180348633
2018-12-06

Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate

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20180337058
2018-11-22

Method of semiconductor device fabrication having application of material with cross-linkable component

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2018-11-22

Film-forming composition containing silicone having crosslinking reactivity

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2018-11-15

Composition for forming fine resist pattern and pattern forming method using same

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2018-11-15

Flexographic printing plate with improved storage stability

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2018-11-08

OFFSET PRINTING PLATE, OFFSET PRINTING APPARATUS, AND OFFSET PRINTING METHOD

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2018-11-01

Film processing unit and substrate processing apparatus

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20180315596
2018-11-01

Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists

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20180314167
2018-11-01

Lithography patterning with a gas phase resist

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20180314155
2018-11-01

Pattern formation methods and photoresist pattern overcoat compositions

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20180314154
2018-11-01

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING LONG CHAIN ALKYL GROUP-CONTAINING NOVOLAC

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20180306953
2018-10-25

Coloring composition, method for producing coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device

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2018-10-11

METHOD FOR PRODUCING OPTICAL COMPONENT HAVING PROCESSED PATTERN FORMED THEREON

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2018-10-11

COMPOSITION FOR FORMING SILICON-CONTAINING FILM FOR EUV LITHOGRAPHY, SILICON-CONTAINING FILM FOR EUV LITHOGRAPHY, AND PATTERN-FORMING METHOD

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2018-10-11

Method for forming semiconductor structure using modified resist layer

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2018-10-04

Substrate processing apparatus, substrate processing method and recording medium

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20180284615
2018-10-04

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

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20180284614
2018-10-04

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

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2018-09-27

Under layer composition and method of manufacturing semiconductor device

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2018-09-27

Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film

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2018-09-06

Substrate processing apparatus, substrate processing method and storage medium

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2018-09-06

SILICON-CONTAINING UNDERLAYERS

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2018-08-30

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method

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2018-08-30

Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method

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2018-08-30

Method for manufacturing liquid ejection head and liquid ejection head

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2018-08-09

Resist underlayer composition, and method of forming patterns using the composition

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2018-08-02

Treatment liquid and pattern forming method

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20180217500
2018-08-02

Pattern forming method, semiconductor device, and manufacturing method thereof

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2018-08-02

Treatment liquid and pattern forming method

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2018-07-26

Photosensitive dry film and uses of the same

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2018-07-26

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

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2018-07-19

Image transfer using EUV lithographic structure and double patterning process

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20180203355
2018-07-19

Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning

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2018-07-19

Compound and method for producing same

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20180197731
2018-07-12

RESIST PATTERN COATING COMPOSITION INCLUDING VINYL GROUP- OR (METH) ACRYLOXY GROUP-CONTAINING POLYSILOXANE

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20180181003
2018-06-28

Pattern forming method, method for manufacturing electronic device, and laminate

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20180181002
2018-06-28

Method of pattern formation and method of producing polysilane resin precursor

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20180181001
2018-06-28

Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group

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20180180996
2018-06-28

Pattern forming method, method for manufacturing electronic device, and laminate

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2018-06-21

Material composition and process for substrate modification

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20180170088
2018-06-21

Digitally imageable flexo-printing plate with integrated barrier layer

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20180164686
2018-06-14

Method using silicon-containing underlayers

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2018-06-14

METHOD USING SILICON-CONTAINING UNDERLAYERS

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2018-06-14

Resist material and method for forming semiconductor structure using resist layer

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20180158674
2018-06-07

Aromatic resins for underlayers

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20180157175
2018-06-07

Aromatic resins for underlayers

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2018-05-31

Composition for coating resist pattern

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2018-05-24

Methods and apparatus for fabricating IC chips with tilted patterning

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2018-05-24

Chemically amplified positive resist film laminate and pattern forming process

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20180136563
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Stripping process

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2018-05-03

Photoresist topcoat compositions and methods of processing photoresist compositions

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2018-05-03

Topcoat compositions and pattern-forming methods

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Topcoat compositions containing fluorinated thermal acid generators

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2018-04-19

Laminate and pattern forming method

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20180107115
2018-04-19

Film material and pattern forming process

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20180102246
2018-04-12

Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced

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20180101098
2018-04-12

Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced

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2018-04-12

MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD

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20180101096
2018-04-12

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

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20180095368
2018-04-05

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

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20180095367
2018-04-05

Coating compositions for use with an overcoated photoresist

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2018-03-29

Coating and developing method and coating and developing apparatus

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20180086886
2018-03-29

Photocrosslinkable group-containing composition for coating stepped substrate

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2018-03-22

Manufacturing method for semiconductor device and semiconductor device

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20180081277
2018-03-22

Pattern forming method, resist pattern, method for manufacturing electronic device, and composition for forming upper layer film

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20180081274
2018-03-22

Cationically polymerizable resist underlayer film-forming composition

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20180081273
2018-03-22

Resin composition, method for forming pattern using the same, and method for synthesizing polymer

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20180074405
2018-03-15

TRANSFER-TYPE PHOTOSENSITIVE REFRACTIVE INDEX ADJUSTMENT FILM, METHOD FOR FORMING REFRACTIVE INDEX ADJUSTMENT PATTERN, AND ELECTRONIC COMPONENT

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20180065930
2018-03-08

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin

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20180059547
2018-03-01

Silicon-containing underlayers

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20180059546
2018-03-01

Silicon-containing underlayers

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20180059545
2018-03-01

Monomers, polymers and photoresist compositions

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20180052392
2018-02-22

MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, AND CIRCUIT PATTERN FORMING METHOD

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20180046081
2018-02-15

Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate

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20180044270
2018-02-15

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN

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20180040824
2018-02-08

Laminate and kit

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20180040474
2018-02-08

Metal-compound-removing solvent and method in lithography

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20180039179
2018-02-08

Pattern formation method and electronic device manufactured using same