Chemically amplified resist material, topcoat film material and pattern formation method using the same

Material and method for photolithography

Color filter and method for producing the same

Photosensitive planographic printing plate

Method of patterning a thin film

Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

POSITIVE WORKING LIGHT SENSITIVE PLANOGRAPHIC PRINTING PLATE MATERIAL

Positive resist compositions and patterning process

Method of making a lithographic printing plate

Lithographic printing plate precursor

Methods and structures for protecting one area while processing another area on a chip

Structure for pattern formation, method for pattern formation, and application thereof

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

Lithographic printing plate precursor and method of preparing lithographic printing plate

Circuit architecture on an organic base and related manufacturing method

Method of forming resist pattern and semiconductor device manufactured with the same

Barrier film material and pattern formation method using the same

Pattern formation method

Photoresist topcoat for a photolithographic process

Resin for hydrophobilizing resist surface, method for production thereof, and positive resist composition containing the resin

Immersion optical lithography system having protective optical coating

Enhancing photoresist performance using electric fields

Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same

Substrate processing method and substrate processing system

Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof

High etch resistant underlayer compositions for multilayer lithographic processes

Barrier film material and pattern formation method using the same

Self-topcoating photoresist for photolithography

Composite photoresist structure

Apparatus for applying a layer to a hydrophobic surface

Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition

Lithographic method

Pellicle film optimized for immersion lithography systems with NA>1

Immersion Lithography Technique And Product Using A Protection Layer Covering The Resist

Lithographic Printing Plate Material, Production Method of Lithographic Printing Plate Material and Printing Method

Tunable contact angle process for immersionlithography topcoats and photoresists

Top coat material and use thereof in lithography processes

Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

Hollow Cylindrical Printing Element

Topcoat compositions and methods of use thereof

Anti-reflective coating forming composition containing vinyl ether compound

Laser sensitive lithographic printing plate having specific photopolymer composition

Process for producing resist pattern and conductor pattern

Method for forming a fine pattern of a semiconductor device

Hardmask composition and associated methods

Laser sensitive lithographic printing plate having specific photopolymer composition

Film forming method, film forming apparatus and pattern forming method

Polymer, resist composition, and patterning process

Silylphenylene Polymer Composition For The Formation Of Interlayers And Process For The Formation Of Patterns By Using The Same

POLYMER LATEX OF HIGH ACRYLONITRILE CONTENT, FILM, PATTERN FORMING MATERIAL AND LITHOGRAPHIC PRINTING PLATE PRECURSOR USING THE SAME, AND METHOD FOR PRODUCTION OF POLYMER LATEX

POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

Pattern forming material, pattern forming apparatus and pattern forming process

PATTERN FORMING METHOD AND DEVICE PRODUCTION PROCESS USING THE METHOD

STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF

Polymer, resist protective coating material, and patterning process

Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition

Structure for pattern formation, method for pattern formation, and application thereof

Method of creating photolithographic structures with developer-trimmed hard mask

Contrast enhancing layers

Lithographic printing plate precursor and method for preparation of lithographic printing plate

STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF

Mask blank and mask

Photoresist composition and method of forming a resist pattern

Polyester compound and resist material using the same

PROCESS FOR PRODUCTION OF PATTERN-FORMING BODY

Plate member, substrate holding device, exposure apparatus and method, and device manufacturing method

PROCESS FOR PRODUCTION OF PATTERN-FORMING BODY

Structure for pattern formation, method for pattern formation, and application thereof

TOP COAT MATERIAL AND USE THEREOF IN LITHOGRAPHY PROCESSES

Copolymer and top coating composition

Pattern formation method

Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film

Immersion topcoat materials with improved performance

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

Method for using compositions containing fluorocarbinols in lithographic processes

Structure for pattern formation, method for pattern formation, and application thereof

Method for producing a lens

IMMERSION LITHOGRAPHY DEFECT REDUCTION WITH TOP COATER REMOVAL

Prevention of photoresist scumming

Resist top coat composition and patterning process

Immersion optical lithography system having protective optical coating

Underlayer coating forming composition for lithography containing cyclodextrin compound

Planographic printing plate precursor and pile of planographic printing plate precursors

Resist protective film composition and patterning process

Immersion Liquid for Liquid Immersion Lithography Process and Method for Forming Resist Pattern Using Such Immersion Liquid

Upper layer film forming composition for liquid immersion and method of forming photoresist pattern

METHOD AND PROCESS FOR IMMERSION EXPOSURE OF A SUBSTRATE

Thermal acid generator, resist undercoat material and patterning process

Mask structure for manufacture of trench type semiconductor device

Topcoat material and use thereof in immersion lithography processes

High contact angle topcoat material and use thereof in lithography process

Coating compositions for photolithography

Anti-reflective coating composition and production method for pattern using the same

Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom

Bilayer Laminated Film for Bump Formation and Method of Bump Formation

Treating carbon containing layers in patterning stacks

Method for preparation of lithographic printing plate and lithographic printing plate precursor

Holographic recording medium

Polymerizable negative planographic printing plate precursor, stack of planographic printing plate precursors, and method of producing polymerizable negative planographic printing plate precursor

Organosilane hardmask compositions and methods of producing semiconductor devices using the same

Method of forming resist pattern and method of manufacturing semiconductor device

Flexographic printing plate assembly

Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method

Compositions and processes for photolithography

Photosensitive recording material, planographic printing plate precursor, and stacks of the same

Method for manufacturing micro structure

Light sensitive planographic printing plate material and its manufacturing process

Exposure method and device manufacturing method

Top coat for lithography processes

Resist underlayer coating forming composition for mask blank, mask blank and mask

Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same

Photolithographic patterning of polymeric materials

Coating and developing method, coating and developing system and storage medium

Method for preparation of lithographic printing plate and lithographic printing plate precursor

Polymer, resist protective coating material, and patterning process

Coating compositions for use with an overcoated photoresist

Laser sensitive lithographic printing plate comprising specific acrylate monomer and initiator

Laser sensitive lithographic printing plate having specific photopolymer composition

Laminated resist used for immersion lithography

Lithographic printing plate material for CTP

Coating compositions for photoresists

Photolithographic systems and methods for producing sub-diffraction-limited features

Chalcogenide layer etching method

Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film

Method for fabricating printing plate with fine pattern using electric field

Hard mask composition for lithography process

Hard mask composition and method for manufacturing semiconductor device

Composition for hard mask and method for manufacturing semiconductor device

Hardmask compositions for resist underlayer films

Method for forming pattern and method for fabricating LCD device using the same

Pattern and wiring pattern and processes for producing them

METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE

Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same

Composition for forming nitride coating film for hard mask

Imprint lithography

Method for patterning low dielectric layer of semiconductor device

Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern

Topcoats for use in immersion lithography

Resist protective coating material and patterning process

RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD

Anti-reflective coatings using vinyl ether crosslinkers

Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method

Water castable-water strippable top coats for 193 nm immersion lithography

Method of forming etching mask

Barrier film material and pattern formation method using the same

Method for forming photoresist pattern

Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern

Method to prevent anti-assist feature and side lobe from printing out

Photosensitive film

Compositions and processes for photolithography

Process for producing top coat film used in lithography

Polymer, top coating layer, top coating composition and immersion lithography process using the same

Water-soluble material, chemically amplified resist and pattern formation method using the same

Planographic printing plate precursor

TARC material for immersion watermark reduction

Immersion optical lithography system having protective optical coating

Coating compositions

Method for manufacturing semiconductor device

Antireflective hard mask compositions

Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same

Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions

Shaping a phase change layer in a phase change memory cell

Resist pattern forming method and manufacturing method of semiconductor device

Lithographic printing plate precursor and lithographic printing process

Coating compositions for use with an overcoated photoresist

Compressible plate for flexographic printing, and process for obtaining

After deposition method of thinning film to reduce pinhole defects

Barrier coating compositions for photoresist and methods of forming photoresist patterns using the same

Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor

Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protec- ting film

Resist protective coating material and patterning process

Manufacturing method of a display device using a two-layered resist

Hydrophilic substrate for lithographic printing plate

Resist protective coating material and patterning process

Lithography process with an enhanced depth-on-focus

Topcoat compositions and methods of use thereof

Preparation of topcoat compositions and methods of use thereof

Substrate processing apparatus

Method of fabricating a semiconductor device

Pretreatment compositions

Resin for under-layer material, under-layer material, laminate and method for forming resist pattern

Processes and devices using polycyclic fluoroalkanes in vacuum and deep ultraviolet applications

Printing element with an integral printing surface

Negative photoresist composition

Pattern formation method

Immersion lithography contamination gettering layer

Topcoats for use in immersion lithography

Top coating composition for photoresist and method of forming photoresist pattern using the same

On-press developable imageable element comprising a tetraarylborate salt

Pattern forming method and method of manufacturing semiconductor device

METHOD FOR FORMING MATERIAL LAYER BETWEEN LIQUID AND PHOTORESIST LAYER

Composition for forming intermediate layer containing sylylphenylene-based polymer and pattern-forming method

Photosensitive structure for flexographic printing

Pretreatment compositions

Positive resist composition and resist laminate for low-acceleration electron beam and mehod of pattern formation

Prevention of photoresist scumming

Immersion lithography process, and structure used for the same and patterning process

Norbornene-type polymers, compositions thereof and lithographic processes using such compositions

Norbornene-type polymers, compositions thereof and lithographic process using such compositions

Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating

Top patterned hardmask and method for patterning

Method for thermally processing photosensitive printing sleeves

Lithographic printing plate precursor, method for preparation of lithographic printing plate precursor, and lithographic printing method

Intermediate semiconductor device structure including multiple photoresist layers

Photoresist topcoat for a photolithographic process

Fluorinated compound, fluoropolymer and process for its production

Immersion topcoat materials with improved performance

Nano-imprint lithography method involving substrate pressing

Pattern formation method

Pattern forming method and method of manufacturing semiconductor device

Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors

Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes

Pattern formation method

After deposition method of thinning film to reduce pinhole defects

Method of preventing pinhole defects through co-polymerization

Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method

Device manufacturing method, top coat material and substrate

Method of forming a photoresist pattern

Method for manufacturing high-transmittance optical filter for image display devices

Pattern forming method and method of manufacturing semiconductor device

Barrier film material and pattern formation method using the same

Lithographic printing plate precursor and method of producing printing plate

Manufacture of organically developable, photopolymerizable flexo-graphic elements on flexible metallic supports

Method for producing flexoprinting forms by means of laser engraving using photopolymer flexoprinting elements and photopolymerisable flexoprinting element

Top coating composition for photoresist and method of forming photoresist pattern using same

Apparatus and method to improve resist line roughness in semiconductor wafer processing

Compositions and processes for immersion lithography

Edge cure prevention process

Method for thermally processing photosensitive printing sleeves

Active hardmask for lithographic patterning

Edge cure prevention composition and process for using the same

Lithographic printing plate comprising a porous non-anodic layer

Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern

Photopolymer plate and method for imaging the surface of a photopolymer plate

Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base

Lithographic printing plate precursor

Removing apparatus, protective film forming apparatus, substrate processing system and removing method

Photolithography method to prevent photoresist pattern collapse

Controlling resist profiles through substrate modification

Highly reflective substrates for the digital processing of photopolymer printing plates

Photosensitive film

Alkali resistant polymeric interlayers for lithoplates

Planographic printing plate precursor

Planographic printing plate precursor and method of making planographic printing plate

Prevention of photoresist scumming

Alkali-soluble gap fill material forming composition for lithography

Protective film-forming composition for immersion exposure and pattern forming method using the same

Process for using protective layers in the fabrication of electronic devices

Composition for photoresist protective film, photoresist protective film and photoresist pattern formation process

Photoresist undercoat-forming material and patterning process

Protective film-forming composition for immersion exposure and pattern-forming method using the same

Method for manufacturing semiconductor device

Method for applying a layer to a hydrophobic surface

Method of forming pattern

Sacrificial film-forming composition, patterning process, sacrificial film and removal method

Lithographic semiconductor manufacturing using a multi-layered process

Protective film-forming composition for immersion exposure and pattern-forming method using the same

Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device

Top coat material and use thereof in lithography processes

Heat stable photocurable resin composition for dry film resist

Anti-reflective coatings using vinyl ether crosslinkers

Methods and structures for protecting one area while processing another area on a chip

Maskless lithography using UV absorbing nano particle

Lithographic printing plate precursor and lithographic printing method

Method for forming pattern

Patterning process and resist overcoat material

Device manufacturing method and apparatus with applied electric field

Process for preventing development defect and composition for use in the same

Method of producing a crosslinked coating in the manufacture of integrated circuits

High performance water-based primer

Film forming method, and substrate-processing apparatus

Method and system for treating a hard mask to improve etch characteristics

Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof

Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof

Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof

Patterned conductive coatings

Water-soluble material, chemically amplified resist and pattern formation method using the same

Method of increasing the shelf life of a photomask substrate

Barrier film material and pattern formation method using the same

Pattern forming method and manufacturing method of semiconductor device

Pattern formation

Chemically amplified resist and pattern formation method

Photosensitive material for immersion photolithography

Photosensitive material for immersion photolithography

Method and system for immersion lithography

Photosensitive element for use as flexographic printing plate

Plating using copolymer

Resist pattern forming method

Immersion lithography process and mask layer structure applied in the same

Optical information medium

Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device

Intermediate semiconductor device structure including multiple photoresist layers

Over-coating composition for photoresist and process for forming photoresist pattern using the same

Imaging element having protective overcoat layers

Process for production of pattern-forming body

Enhancing photoresist performance using electric fields

Wet developable hard mask in conjunction with thin photoresist for micro photolithography

Undercoating material for wiring, embedded material, and wiring formation method

Method for forming resist pattern and method for manufacturing semiconductor device