G03F7/11 - page 6 - CPC Classification Index

#1501

20120258400

2012-10-11

TARC material for immersion watermark reduction

#1502

20120249995

2012-10-04

RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD

#1503

20120238095

2012-09-20

Patterning process and composition for forming silicon-containing film usable therefor

#1504

20120237874

2012-09-20

Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition

#1505

20120225386

2012-09-06

Chemically amplified resist composition and patterning process

#1506

20120225384

2012-09-06

Compositions and processes for photolithography

#1507

20120219912

2012-08-30

Resist composition and method for producing resist pattern

#1508

20120219911

2012-08-30

Lithographic printing plate precursor and plate making method thereof

#1509

20120219909

2012-08-30

Resist composition and method for producing resist pattern

#1510

20120219908

2012-08-30

Resist composition and method for producing resist pattern

#1511

20120219906

2012-08-30

Resist composition and method for producing resist pattern

#1512

20120219905

2012-08-30

Resist composition and method for producing resist pattern

#1513

20120219904

2012-08-30

Resist composition and method for producing resist pattern

#1514

20120219902

2012-08-30

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS

#1515

20120219899

2012-08-30

Resist composition and method for producing resist pattern

#1516

20120219898

2012-08-30

Resist composition and method for producing resist pattern

#1517

20120219771

2012-08-30

Photolithographic patterning of polymeric materials

#1518

20120214100

2012-08-23

RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME

#1519

20120213984

2012-08-23

Flexographic printing forme precursor for laser engraving

#1520

20120202158

2012-08-09

Patterning process

#1521

20120202155

2012-08-09

Underlayer coating composition and processes thereof

#1522

20120202152

2012-08-09

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF

#1523

20120199027

2012-08-09

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF

#1524

20120183903

2012-07-19

Patterning process and resist composition

#1525

20120181251

2012-07-19

Pattern forming method and resist underlayer film-forming composition

#1526

20120171626

2012-07-05

Compositions comprising base-reactive component and processes for photolithography

#1527

20120171617

2012-07-05

Polymers, photoresist compositions and methods of forming photolithographic patterns

#1528

20120171613

2012-07-05

UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

#1529

20120171612

2012-07-05

Radiation-sensitive resin composition, resist pattern formation method, and polymer

#1530

20120171611

2012-07-05

Aromatic hydrocarbon resin and composition for forming underlayer film for lithography

#1531

20120164577

2012-06-28

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

#1532

20120164390

2012-06-28

Processes to pattern small features for advanced patterning needs

#1533

20120156617

2012-06-21

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

#1534

20120156613

2012-06-21

Anti-reflective coatings using vinyl ether crosslinkers

#1535

20120153487

2012-06-21

SUBSTRATE FOR ELECTRON-BEAM DRAWING

#1536

20120148945

2012-06-14

Resist composition and patterning process

#1537

20120142193

2012-06-07

Resist underlayer film composition and patterning process using the same

#1538

20120137908

2012-06-07

Device and method for removing overcoat of on-press developable lithographic plate

#1539

20120135350

2012-05-31

Positive resist composition and patterning process

#1540

20120135348

2012-05-31

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD

#1541

20120133077

2012-05-31

Resin mold for imprinting and method for producing the same

#1542

20120129353

2012-05-24

Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film

#1543

20120129098

2012-05-24

Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus

#1544

20120129097

2012-05-24

Photopolymer Printing Plates with In Situ Non-Directional Floor Formed During Extrusion

#1545

20120128891

2012-05-24

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT

#1546

20120122036

2012-05-17

Pattern forming method

#1547

20120119202

2012-05-17

Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture

#1548

20120115089

2012-05-10

Process for forming a hydrophilic coating and hydrophilic coating, and process for forming an ink jet recording head and ink jet recording head

#1549

20120115083

2012-05-10

Biodegradable Film for Flexographic Printing Plate Manufacture and Method of Using the Same

#1550

20120107747

2012-05-03

Method of lithography

#1551

20120101205

2012-04-26

Copolymer and top coating composition

#1552

20120088194

2012-04-12

Method of forming patterns

#1553

20120088188

2012-04-12

Underlayer composition and method of imaging underlayer composition

#1554

20120082945

2012-04-05

Method for using a topcoat composition

#1555

20120077126

2012-03-29

Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method

#1556

20120077122

2012-03-29

Pattern forming method, chemical amplification resist composition and resist film

#1557

20120076991

2012-03-29

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

#1558

20120070994

2012-03-22

Resist underlayer film forming composition containing silicon having sulfide bond

#1559

20120070779

2012-03-22

Lithographic printing plate precursor

#1560

20120052685

2012-03-01

Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process

#1561

20120052446

2012-03-01

High resolution, solvent resistant, thin elastomeric printing plates

#1562

20120052442

2012-03-01

Lithographic printing plate precursor and plate making method thereof

#1563

20120052437

2012-03-01

High resolution, solvent resistant, thin elastomeric printing plates

#1564

20120045900

2012-02-23

Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative

#1565

20120045720

2012-02-23

Developers and method of coloring lithographic printing members

#1566

20120040294

2012-02-16

Top coating composition

#1567

20120040291

2012-02-16

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY

#1568

20120028198

2012-02-02

Upper layer-forming composition and photoresist patterning method

#1569

20120028196

2012-02-02

METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD

#1570

20120028189

2012-02-02

Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound

#1571

20120021359

2012-01-26

Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method

#1572

20120021355

2012-01-26

Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method

#1573

20120009524

2012-01-12

Material and method for photolithography

#1574

20120003589

2012-01-05

Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition

#1575

20120003588

2012-01-05

Method of improving print performance in flexographic printing plates

#1576

20110311781

2011-12-22

Method of patterning photosensitive material on a substrate containing a latent acid generator

#1577

20110305995

2011-12-15

Resin film forming method

#1578

20110305979

2011-12-15

RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS

#1579

20110294069

2011-12-01

Photoresist compositions and methods of forming photolithographic patterns

#1580

20110293900

2011-12-01

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

#1581

20110287369

2011-11-24

Resist underlayer film forming composition containing silicon having anion group

#1582

20110281085

2011-11-17

POLYMER THIN FILM, PATTERNED MEDIA, PRODUCTION METHODS THEREOF, AND SURFACE MODIFYING AGENTS

#1583

20110275018

2011-11-10

Circuit architecture on an organic base and related manufacturing method

#1584

20110269078

2011-11-03

Substrate treatment to reduce pattern roughness

#1585

20110269076

2011-11-03

Surface modifying material, method of forming resist pattern, and method of forming pattern

#1586

20110262871

2011-10-27

TARC material for immersion watermark reduction

#1587

20110262862

2011-10-27

Near-infrared absorptive layer-forming composition and multilayer film

#1588

20110262859

2011-10-27

Upper layer-forming composition and resist patterning method

#1589

20110245395

2011-10-06

Top coat composition

#1590

20110244400

2011-10-06

Norbornene-type polymers, compositions thereof and lithographic process using such compositions

#1591

20110236831

2011-09-29

Acetal compound, polymer, resist composition, and patterning process

#1592

20110223536

2011-09-15

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME

#1593

20110223535

2011-09-15

Photoresist comprising nitrogen-containing compound

#1594

20110221077

2011-09-15

Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the same

#1595

20110217656

2011-09-08

Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate

#1596

20110207331

2011-08-25

Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin

#1597

20110207052

2011-08-25

Sulfonamide-containing photoresist compositions and methods of use

#1598

20110207051

2011-08-25

Sulfonamide-containing topcoat and photoresist additive compositions and methods of use

#1599

20110189446

2011-08-04

Process and system for fabrication of patterns on a surface

#1600

20110177462

2011-07-21

Patterning process

#1601

20110177459

2011-07-21

Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process

#1602

20110177455

2011-07-21

Polymer, resist composition, and patterning process

#1603

20110151197

2011-06-23

Photolithographic Patterning of Polymeric Materials

#1604

20110143281

2011-06-16

Coating compositions for photoresists

#1605

20110135891

2011-06-09

Film type photodegradable transfer material

#1606

20110134411

2011-06-09

LITHOGRAPHIC PRINTING PLATE PRECURSOR, LITHOGRAPHIC PRINTING METHOD AND PACKAGED BODY OF LITHOGRAPHIC PRINTING PLATE PRECURSORS

#1607

20110129781

2011-06-02

Methods of forming a pattern using photoresist compositions

#1608

20110123937

2011-05-26

Compositions and processes for immersion lithography

#1609

20110123933

2011-05-26

POLYMER, COMPOSITION FOR PROTECTIVE LAYER, AND PATTERNING METHOD USING THE SAME

#1610

20110123925

2011-05-26

POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME

#1611

20110118494

2011-05-19

Surface treatment agent and surface treatment method

#1612

20110117501

2011-05-19

Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same

#1613

20110111604

2011-05-12

PLASMA SURFACE TREATMENT TO PREVENT PATTERN COLLAPSE IN IMMERSION LITHOGRAPHY

#1614

20110111345

2011-05-12

Silicon containing coating compositions and methods of use

#1615

20110097672

2011-04-28

Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer

#1616

20110097670

2011-04-28

Patterning process and chemical amplified photoresist composition

#1617

20110091814

2011-04-21

PROCESS FOR MAKING LITHOGRAPHIC PRINTING PLATE

#1618

20110081615

2011-04-07

Material for forming resist sensitization film and production method of semiconductor device

#1619

20110076843

2011-03-31

Lithography patterning method

#1620

20110076625

2011-03-31

Method of forming patterns

#1621

20110076619

2011-03-31

Method for modifying first film and composition for forming acid transfer resin film used therefor

#1622

20110070680

2011-03-24

Pattern forming method and manufacturing method of semiconductor device

#1623

20110070542

2011-03-24

Photoresist and patterning process

#1624

20110065878

2011-03-17

Norbornene-type polymers, compositions thereof and lithographic processes using such compositions

#1625

20110065053

2011-03-17

MATERIAL FOR FORMING PROTECTIVE FILM AND METHOD FOR FORMING PHOTORESIST PATTERN

#1626

20110054212

2011-03-03

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING PROCESS

#1627

20110053097

2011-03-03

PROTECTIVE FILM-FORMING MATERIAL AND METHOD OF PHOTORESIST PATTERNING WITH IT

#1628

20110045404

2011-02-24

Composition for forming resist underlayer film for lithography and production method of semiconductor device

#1629

20110042771

2011-02-24

Near-infrared absorbing film compositions

#1630

20110040056

2011-02-17

PROCESS FOR PRODUCTION OF POLYMER

#1631

20110039214

2011-02-17

Pattern Forming Method and Method of Manufacturing Semiconductor Device

#1632

20110033801

2011-02-10

Coating compositions for use with an overcoated photoresist

#1633

20110027722

2011-02-03

Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same

#1634

20110027702

2011-02-03

Hardcoat composition

#1635

20110020755

2011-01-27

Method of forming patterns

#1636

20110011291

2011-01-20

METHOD FOR MAKING LITHOGRAPHIC PRINTING ORIGINAL PLATE

#1637

20110008733

2011-01-13

Phototools having a protective layer

#1638

20110003257

2011-01-06

Processes for photolithography

#1639

20100330505

2010-12-30

Resist underlayer film forming composition containing silicone having cyclic amino group

#1640

20100324330

2010-12-23

Process for Preventing Development Defect and Composition for Use in the Same

#1641

20100310830

2010-12-09

Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article

#1642

20100304290

2010-12-02

Compositions and processes for photolithography

#1643

20100297564

2010-11-25

POLYMERIZABLE FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER AND METHOD OF FORMING RESIST PATTERN

#1644

20100297557

2010-11-25

Coating compositions suitable for use with an overcoated photoresist

#1645

20100297556

2010-11-25

Coating compositions suitable for use with an overcoated photoresist

#1646

20100297539

2010-11-25

Antireflective hard mask compositions

#1647

20100291487

2010-11-18

Silicon-containing resist underlayer film forming composition having urea group

#1648

20100291483

2010-11-18

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE

#1649

20100291475

2010-11-18

Silicone Coating Compositions

#1650

20100285407

2010-11-11

Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same

#1651

20100279235

2010-11-04

COMPOSITION FOR FORMATION OF TOP ANTI-REFLECTIVE FILM, AND PATTERN FORMATION METHOD USING THE COMPOSITION

#1652

20100279234

2010-11-04

Double patterning method using metallic compound mask layer

#1653

20100279078

2010-11-04

Structure and method for creating surface texture of compliant coatings on piezo ink jet imaging drums

#1654

20100266958

2010-10-21

RESIST MATERIAL AND METHOD FOR FORMING PATTERN USING THE SAME

#1655

20100266953

2010-10-21

COPOLYMER AND TOP COATING COMPOSITION

#1656

20100266951

2010-10-21

Resist underlayer film forming composition and method for forming resist pattern

#1657

20100260983

2010-10-14

Photosensitive resin composition and circuit formation substrate using the same

#1658

20100255427

2010-10-07

CONFORMAL PHOTO-SENSITIVE LAYER AND PROCESS

#1659

20100255416

2010-10-07

Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern

#1660

20100248138

2010-09-30

LITHOGRAPHIC PRINTING PLATE PRECURSOR

#1661

20100239985

2010-09-23

Method for using compositions containing fluorocarbinols in lithographic processes

#1662

20100233617

2010-09-16

Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition

#1663

20100233445

2010-09-16

Negative-working imageable elements with overcoat

#1664

20100227126

2010-09-09

Positive-type photosensitive resin composition, method for producing patterns, and electronic parts

#1665

20100221658

2010-09-02

Lithographic printing plate precursor and method of preparing lithographic printing plate

#1666

20100209851

2010-08-19

Method of making a lithographic printing plate

#1667

20100203456

2010-08-12

METHOD OF FORMING RESIST PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#1668

20100196807

2010-08-05

Prevention of photoresist scumming

#1669

20100183980

2010-07-22

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

#1670

20100183977

2010-07-22

Compositions and processes for photolithography

#1671

20100183976

2010-07-22

Compositions and processes for photolithography

#1672

20100178618

2010-07-15

Patterning process

#1673

20100178617

2010-07-15

Patterning process

#1674

20100168337

2010-07-01

Graded topcoat materials for immersion lithography

#1675

20100167212

2010-07-01

RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

#1676

20100167203

2010-07-01

Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same

#1677

20100151395

2010-06-17

Protective film-removing solvent and method of photoresist patterning with it

#1678

20100151387

2010-06-17

High resolution, solvent resistant, thin elastomeric printing plates

#1679

20100151384

2010-06-17

Composition for resist underlayer film and process for producing same

#1680

20100147334

2010-06-17

Coated-type silicon-containing film stripping process

#1681

20100143849

2010-06-10

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#1682

20100136486

2010-06-03

Resist protective coating composition and patterning process

#1683

20100124720

2010-05-20

MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME

#1684

20100112823

2010-05-06

Method of forming a resist pattern

#1685

20100112482

2010-05-06

Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process

#1686

20100112478

2010-05-06

WATER-DEVELOPABLE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL

#1687

20100112311

2010-05-06

STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF

#1688

20100099036

2010-04-22

Pattern forming method and method of manufacturing semiconductor device

#1689

20100092892

2010-04-15

PHOTOPOLYMERIZED RESIN LAMINATE AND METHOD FOR MANUFACTURING BOARD HAVING BLACK MATRIX PATTERN

#1690

20100087352

2010-04-08

Process for creating shape-designed particles in a fluid

#1691

20100086879

2010-04-08

Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film

#1692

20100086872

2010-04-08

Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process

#1693

20100086870

2010-04-08

Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process

#1694

20100081097

2010-04-01

SUBSTRATE PROCESSING APPARATUS

#1695

20100081082

2010-04-01

Pattern-forming method

#1696

20100081081

2010-04-01

Resist underlayer film forming composition for electron beam lithography

#1697

20100069569

2010-03-18

Polyimide precursor, polyimide, and coating solution for under layer film for image formation

#1698

20100062380

2010-03-11

Double patterning process

#1699

20100062375

2010-03-11

METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE

#1700

20100048848

2010-02-25

Process for producing polymer for semiconductor lithography

#1701

20100040974

2010-02-18

Upper layer film forming composition and method of forming photoresist pattern

#1702

20100040973

2010-02-18

Composition for formation of resist protection film, and method for formation of resist pattern using the same

#1703

20100035181

2010-02-11

Resist underlayer film forming composition

#1704

20100028809

2010-02-04

Double patterning for lithography to increase feature spatial density

#1705

20100022730

2010-01-28

POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION

#1706

20100022090

2010-01-28

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAINING AROMATIC FUSED RING-CONTAINING RESIN

#1707

20100022089

2010-01-28

Method for manufacturing semiconductor device using quadruple-layer laminate

#1708

20100021852

2010-01-28

Composition for formation of upper layer film, and method for formation of photoresist pattern

#1709

20100018639

2010-01-28

METHOD OF FORMING MICROPATTERN, METHOD OF MANUFACTURING OPTICAL RECORDING MEDIUM MASTER COPY, OPTICAL RECORDING MEDIUM MASTER COPY, OPTICAL RECORDING MEDIUM STAMPER, AND OPTICAL RECORDING MEDIUM

#1710

20100009288

2010-01-14

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same

#1711

20100009285

2010-01-14

Flexographic printing forme precursor for laser engraving

#1712

20100009130

2010-01-14

On-press developable imageable elements

#1713

20100003615

2010-01-07

Upper layer-forming composition and photoresist patterning method

#1714

20090317747

2009-12-24

ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS

#1715

20090317740

2009-12-24

Composition containing hydroxylated condensation resin for forming resist underlayer film

#1716

20090311635

2009-12-17

Double exposure patterning with carbonaceous hardmask

#1717

20090311622

2009-12-17

Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film

#1718

20090305146

2009-12-10

Optical recording medium and method for manufacturing the same

#1719

20090297982

2009-12-03

Photosensitive element, method for formation of resist pattern, and method for production of print circuit board

#1720

20090297784

2009-12-03

Photosensitive hardmask for microlithography

#1721

20090291561

2009-11-26

Method of forming pattern

#1722

20090286182

2009-11-19

Resist protective coating composition and patterning process

#1723

20090286165

2009-11-19

HOLOGRAM LAMINATE, HOLOGRAM COPY METHOD, AND HOLOGRAM PRODUCING METHOD

#1724

20090280438

2009-11-12

Method of forming pattern

#1725

20090280434

2009-11-12

Resist composition and patterning process

#1726

20090280431

2009-11-12

MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME

#1727

20090274979

2009-11-05

Device and method for removing overcoat of on-press developable lithographic plate

#1728

20090253082

2009-10-08

Method for forming resist pattern

#1729

20090253076

2009-10-08

Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative

#1730

20090246701

2009-10-01

METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE

#1731

20090246697

2009-10-01

Method of processing overcoated lithographic printing plate

#1732

20090246693

2009-10-01

NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME

#1733

20090246692

2009-10-01

Lithographic printing plate precursor

#1734

20090246690

2009-10-01

Lithographic printing plate precursor

#1735

20090233243

2009-09-17

Structure for pattern formation, method for pattern formation, and application thereof

#1736

20090233224

2009-09-17

Compositions and processes for photolithography

#1737

20090227111

2009-09-10

BARRIER FILM MATERIAL AND PATTERN FORMATION METHOD USING THE SAME

#1738

20090226850

2009-09-10

Process for producing resist pattern and conductor pattern

#1739

20090226845

2009-09-10

Printing element with an integrated printing surface

#1740

20090220896

2009-09-03

PATTERN FORMING METHOD

#1741

20090208886

2009-08-20

Double patterning process

#1742

20090208874

2009-08-20

Method of processing on-press developable lithographic printing plate having overcoat

#1743

20090208867

2009-08-20

Resist composition, resist protective coating composition, and patterning process

#1744

20090203216

2009-08-13

PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION-LIMITED FEATURES

#1745

20090201485

2009-08-13

Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus

#1746

20090197205

2009-08-06

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD

#1747

20090197200

2009-08-06

Resist top coat composition and patterning process

#1748

20090197199

2009-08-06

Material for forming resist protective film and method for forming resist pattern using same

#1749

20090197086

2009-08-06

ELIMINATION OF PHOTORESIST MATERIAL COLLAPSE AND POISONING IN 45-NM FEATURE SIZE USING DRY OR IMMERSION LITHOGRAPHY

#1750

20090181173

2009-07-16

LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING METHOD

#1751

20090169920

2009-07-02

METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE

#1752

20090162782

2009-06-25

Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating

#1753

20090142715

2009-06-04

LAMINATED RESIST USED FOR IMMERSION LITHOGRAPHY

#1754

20090142714

2009-06-04

Method for using a topcoat composition

#1755

20090136878

2009-05-28

Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same

#1756

20090136871

2009-05-28

Topcoat composition

#1757

20090136869

2009-05-28

Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method

#1758

20090130603

2009-05-21

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#1759

20090130594

2009-05-21

Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating

#1760

20090123878

2009-05-14

PATTERNING METHOD

#1761

20090114108

2009-05-07

Lithographic printing plate precursor and lithographic printing method

#1762

20090111054

2009-04-30

Negative resist composition and method of forming resist pattern

#1763

20090104560

2009-04-23

BARRIER FILM MATERIAL AND PATTERN FORMATION METHOD

#1764

20090104541

2009-04-23

PLASMA SURFACE TREATMENT TO PREVENT PATTERN COLLAPSE IN IMMERSION LITHOGRAPHY

#1765

20090098486

2009-04-16

Composition for forming lower layer film and pattern forming method

#1766

20090092930

2009-04-09

Pattern formation method

#1767

20090087780

2009-04-02

Negative-working photosensitive material and negative-working planographic printing plate precursor

#1768

20090081595

2009-03-26

Patterning process

#1769

20090081375

2009-03-26

Photocurable coating composition, and overprint and process for producing same

#1770

20090075061

2009-03-19

Device manufacturing method, top coat material and substrate

#1771

20090068584

2009-03-12

Positive photosensitive resin composition, cured layer , protecting layer, insulating layer and semiconductor device and display therewith

#1772

20090061360

2009-03-05

MATERIAL FOR RESIST PROTECTIVE FILM FOR IMMERSION LITHOGRAPHY

#1773

20090061329

2009-03-05

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND HARD MASK

#1774

20090053648

2009-02-26

LIGHT SENSITIVE PLANOGRAPHIC PRINTING PLATE MATERIAL

#1775

20090053647

2009-02-26

Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative

#1776

20090053646

2009-02-26

MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST PATTERN THEREWITH

#1777

20090050020

2009-02-26

Composition for resist underlayer film and process for producing same

#1778

20090048409

2009-02-19

ACRYLIC COPOLYMER

#1779

20090047584

2009-02-19

Mask blank and mask

#1780

20090042147

2009-02-12

Method of forming patterns

#1781

20090035590

2009-02-05

Non-covalently crosslinkable materials for photolithography processes

#1782

20090022961

2009-01-22

INTERLAYER FOR LITHOGRAPHIC PLATES

#1783

20090011377

2009-01-08

Photoresist topcoat for a photolithographic process

#1784

20090011369

2009-01-08

Lithographic method and device manufactured thereby

#1785

20090011365

2009-01-08

Resist composition and patterning process

#1786

20090011361

2009-01-08

Amine-arresting additives for materials used in photolithographic processes

#1787

20090011344

2009-01-08

METHOD OF MANUFACTURING COLOR FILTER

#1788

20080318171

2008-12-25

Method of forming patterns

#1789

20080318158

2008-12-25

Underlayer coating forming composition for lithography containing polysilane compound

#1790

20080318153

2008-12-25

PHOTOSENSITIVE LAYER STACK

#1791

20080311530

2008-12-18

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

#1792

20080311527

2008-12-18

Method of forming protection layer on photoresist pattern and method of forming fine pattern using the same

#1793

20080311523

2008-12-18

Material for formation of resist protection film and method of forming resist pattern therewith

#1794

20080311506

2008-12-18

Graded topcoat materials for immersion lithography

#1795

20080305432

2008-12-11

Positive resist composition and pattern-forming method

#1796

20080305431

2008-12-11

PRETREATMENT COMPOSITIONS

#1797

20080299503

2008-12-04

Material for forming resist protection films and method for resist pattern formation with the same

#1798

20080293248

2008-11-27

METHOD OF FORMING AMORPHOUS CARBON FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

#1799

20080292996

2008-11-27

Method for producing a high resolution resist pattern on a semiconductor wafer

#1800

20080286692

2008-11-20

Photosensitve Laminate