Patents-Review.com
ClassID:

177167 ⎘

G03F7/70325 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Systems for imaging mask onto workpiece Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lens

Sub-classes:
Recent Application in this class:
#1
20260153807
2026-06-04

METHOD FOR REDUCING THE RESOLUTION OF AN AERIAL IMAGE OF A PHOTOLITHOGRAPHY MASK WITHOUT REDUCING A SIGNAL-TO-NOISE RATIO AND CORRESPONDING OPTICAL SYSTEM

 #2
20260140456
2026-05-21

MIRROR SYSTEM, METHOD FOR OPERATING A MIRROR SYSTEM, PROJECTION LENS FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM, AND COMPUTER PROGRAM PRODUCT

 #3
20260110963
2026-04-23

PHOTORESIST COMPOSITION, PATTERN FORMING METHOD USING NEAR-FIELD SURFACE LAYER IMAGING, AND DEPOSITION DEVICE

 #4
20260023325
2026-01-22

DIGITAL LITHOGRAPHY APPARATUS WITH IMAGING DEVICE POSITIONED TO MITIGATE MOIRE EFFECT

 #5
20250390025
2025-12-25

OPTIMAL NEAR-FIELD GENERATION METHOD AND MASK MANUFACTURING METHOD COMPRISING THE SAME

 #6
20250389877
2025-12-25

EXPOSURE DEVICE, METHOD OF MANUFACTURING DIFFRACTIVE OPTICAL ELEMENT, OPTICAL SHEET, AND ALIGNMENT FILM

 #7
20250271773
2025-08-28

EXPOSURE APPARATUS, CONTROL METHOD THEREFOR, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, NON-TRANSITORY COMPUTER READABLE MEDIUM, AND ARTICLE MANUFACTURING METHOD

 #8
20250116939
2025-04-10

METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, MICROLITHOGRAPHIC MASK AND PROJECTION EXPOSURE APPARATUS

 #9
20250053095
2025-02-13

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF A PERIODIC PATTERN

 #10
20240393700
2024-11-28

INFORMATION PROCESSING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD

 #11
20240255319
2024-08-01

METHOD FOR DETERMINING A POSITION OF A MIRROR

 #12
20240248407
2024-07-25

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

 #13
20240210336
2024-06-27

PATTERNING DEVICE DEFECT DETECTION SYSTEMS AND METHODS

 #14
20240201583
2024-06-20

PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION FOR HETEROGENEOUS INTEGRATION

 #15
20240201486
2024-06-20

CONTROLLING ABERRATION IN AN OPTICAL SYSTEM, A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

 #16
20240061343
2024-02-22

HIGH-SPEED NANOPATTERNING METHOD AND APPARATUS OF TWO-COLOR SUPER-RESOLUTION PHOTOLITHOGRAPHY

 #17
20220197150
2022-06-23

Method and system for nanoscale data recording

 #18
20220128912
2022-04-28

Frequency broadening apparatus and method

 #19
20220121804
2022-04-21

Method for determining curvilinear patterns for patterning device

 #20
20220050382
2022-02-17

Laser processing method and laser processing system

 #21
20210173311
2021-06-10

System and method for industrial scale continuous holographic lithography

 #22
20210124273
2021-04-29

Method and system for nanoscale data recording

 #23
20210048753
2021-02-18

Method for determining curvilinear patterns for patterning device

 #24
20200379356
2020-12-03

Method and system for nanoscale data recording

 #25
20200310251
2020-10-01

Frequency broadening apparatus and method

 #26
20200264518
2020-08-20

Large area high resolution feature reduction lithography technique

 #27
20200209760
2020-07-02

Laser processing method and laser processing system

 #28
20200166850
2020-05-28

Method and system for nanoscale data recording

 #29
20200027744
2020-01-23

System and method for light field correction of colored surfaces in an image

 #30
20200011650
2020-01-09

METROLOGY TARGET

 #31
20190155167
2019-05-23

Method and system for nanoscale data recording

 #32
20190137769
2019-05-09

Electromagnetic radiation enhancement methods and systems

 #33
20190079401
2019-03-14

Target feeding system

 #34
20190064678
2019-02-28

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

 #35
20190018313
2019-01-17

Etch-assist features

 #36
20180329309
2018-11-15

System and method for industrial scale continuous holographic lithography

 #37
20180314167
2018-11-01

Lithography patterning with a gas phase resist

 #38
20180307216
2018-10-25

Method and apparatus for controlling an industrial process using product grouping

 #39
20180299788
2018-10-18

Exposure apparatus, and device manufacturing method

 #40
20180173107
2018-06-21

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE

 #41
20180173106
2018-06-21

Nanoscale pattern exposure system

 #42
20180059550
2018-03-01

HEAT ACTUATED AND PROJECTED LITHOGRAPHY SYSTEMS AND METHODS

 #43
20180039185
2018-02-08

Exposure apparatus and device manufacturing method

 #44
20170336716
2017-11-23

EUV lithography system for dense line patterning

 #45
20170336715
2017-11-23

Euv lithography system for dense line patterning

 #46
20170256418
2017-09-07

Lithography patterning with a gas phase resist

 #47
20170244024
2017-08-24

Spin torque MRAM fabrication using negative tone lithography and ion beam etching

 #48
20170227842
2017-08-10

Mask plate

 #49
20170176866
2017-06-22

Apparatus and method for imparting direction-selective light attenuation

 #50
20170139330
2017-05-18

Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformity

 #51
20170123326
2017-05-04

Exposure apparatus and device manufacturing method

 #52
20170062707
2017-03-02

Spin torque MRAM fabrication using negative tone lithography and ion beam etching

 #53
20160377987
2016-12-29

System for creating nanoscale patterns

 #54
20160377983
2016-12-29

Extreme ultraviolet lithography process

 #55
20160327874
2016-11-10

Exposure apparatus and device fabrication method

 #56
20160259253
2016-09-08

Super-resolution imaging photolithography

 #57
20160258810
2016-09-08

Method and apparatus for inspection and metrology

 #58
20160246181
2016-08-25

Exposure method, exposure apparatus, and method for producing device

 #59
20160238949
2016-08-18

Exposure method, exposure apparatus, and method for producing device

 #60
20160238947
2016-08-18

Pattern formation method and exposure apparatus

 #61
20160202617
2016-07-14

Exposure apparatus and device manufacturing method

 #62
20160116846
2016-04-28

Super-resolution exposure system

 #63
20160109813
2016-04-21

Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer

 #64
20160109811
2016-04-21

Sub-diffraction-limited patterning and imaging

 #65
20150362841
2015-12-17

Method and apparatus for exposing a structure on a substrate

 #66
20150348793
2015-12-03

Plasmonic nano-lithography based on attenuated total reflection

 #67
20150286148
2015-10-08

Heat actuated and projected lithography systems and methods

 #68
20150277222
2015-10-01

Lithographic substrate and a device

 #69
20150246478
2015-09-03

Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method

 #70
20150234292
2015-08-20

Exposure apparatus and device fabrication method

 #71
20150205137
2015-07-23

Electromagnetic radiation enhancement methods and systems

 #72
20150198897
2015-07-16

Exposure apparatus and device manufacturing method

 #73
20150198895
2015-07-16

Method for writing nanoscale patterns

 #74
20150177568
2015-06-25

Photo-alignment exposure device and photo-alignment exposure method

 #75
20150055113
2015-02-26

Pattern formation method, mask for exposure, and exposure apparatus

 #76
20150042972
2015-02-12

Amplification method for photoresist exposure in semiconductor chip manufacturing

 #77
20150042971
2015-02-12

Method and system for nanopatterning

 #78
20140293252
2014-10-02

Exposure apparatus, and device manufacturing method

 #79
20140268092
2014-09-18

Extreme ultraviolet lithography process and mask

 #80
20140268091
2014-09-18

Extreme ultraviolet lithography process and mask

 #81
20140218713
2014-08-07

Extreme ultraviolet lithography process

 #82
20140211177
2014-07-31

Exposure apparatus and device manufacturing method

 #83
20140211176
2014-07-31

Exposure apparatus and device manufacturing method

 #84
20140211175
2014-07-31

ENHANCING RESOLUTION IN LITHOGRAPHIC PROCESSES USING HIGH REFRACTIVE INDEX FLUIDS

 #85
20140198307
2014-07-17

Interferometer system, lithography apparatus, and article manufacturing method

 #86
20140078479
2014-03-20

Image optimization using pupil filters in projecting printing systems with fixed or restricted illumination angular distribution

 #87
20130344445
2013-12-26

Apparatus and method for printing a periodic pattern with a large depth of focus

 #88
20130250259
2013-09-26

Exposure method, exposure apparatus, and method for producing device

 #89
20130250258
2013-09-26

Exposure method, exposure apparatus, and method for producing device

 #90
20130250257
2013-09-26

Exposure apparatus, and device manufacturing method

 #91
20130208251
2013-08-15

Large area nanopatterning method and apparatus

 #92
20130155383
2013-06-20

Exposure apparatus and exposure method

 #93
20130141705
2013-06-06

Exposure apparatus and exposure method

 #94
20130065185
2013-03-14

Scanning Lithography using point source imaging arrays

 #95
20130044299
2013-02-21

Projection-type photolithography system using composite photon sieve

 #96
20120312774
2012-12-13

Illuminating waveguide fabrication method

 #97
20120282554
2012-11-08

LARGE AREA NANOPATTERNING METHOD AND APPARATUS

 #98
20120257183
2012-10-11

Nanolithography system

 #99
20120228804
2012-09-13

Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method

 #100
20120224159
2012-09-06

METHOD AND APPARATUS FOR PATTERNING A DISK

 #101
20120200837
2012-08-09

Exposure apparatus, and device manufacturing method

 #102
20120162629
2012-06-28

Large area nanopatterning method and apparatus

 #103
20120092634
2012-04-19

Method and apparatus for printing periodic patterns

 #104
20120070985
2012-03-22

EXPOSURE METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #105
20120009525
2012-01-12

Method and apparatus for printing a periodic pattern with a large depth of focus

 #106
20120008111
2012-01-12

Exposure apparatus, and device manufacturing method

 #107
20110318695
2011-12-29

Arbitrary pattern direct nanostructure fabrication methods and system

 #108
20110310374
2011-12-22

Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions

 #109
20110305994
2011-12-15

NANO PLASMONIC PARALLEL LITHOGRAPHY

 #110
20110300473
2011-12-08

METHOD FOR NANOPATTERNING USING NANOMASKS AND LIGHT EXPOSURE

 #111
20110273687
2011-11-10

Lithographic apparatus and device manufacturing method

 #112
20110207056
2011-08-25

Contact or proximity printing using a magnified mask image

 #113
20110199598
2011-08-18

Lithographic fabrication of general periodic structures

 #114
20110025997
2011-02-03

Exposure apparatus, and device manufacturing method

 #115
20110025996
2011-02-03

Exposure apparatus, and device manufacturing method

 #116
20100270264
2010-10-28

Near field exposure mask, method of forming resist pattern using the mask, and method of producing device

 #117
20100123885
2010-05-20

Large area nanopatterning method and apparatus

 #118
20100075259
2010-03-25

Illuminating waveguide fabrication method

 #119
20100073657
2010-03-25

Nanolithography system

 #120
20100033701
2010-02-11

Superlens and lithography systems and methods using same

 #121
20100020298
2010-01-28

Lithography apparatus with an optical fiber module

 #122
20090311631
2009-12-17

Near-field exposure apparatus and near-field exposure method

 #123
20090297989
2009-12-03

Method and device for patterning a disk

 #124
20090286053
2009-11-19

Lithographic method

 #125
20090253079
2009-10-08

FORMING REVERSE ILLUMINATION PATTERNS

 #126
20090208881
2009-08-20

IMMERSION ULTRAVIOLET PHOTOLITHOGRAPHY PROCESS

 #127
20090208850
2009-08-20

Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method

 #128
20090207398
2009-08-20

Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member

 #129
20090203216
2009-08-13

PHOTOLITHOGRAPHIC SYSTEMS AND METHODS FOR PRODUCING SUB-DIFFRACTION-LIMITED FEATURES

 #130
20090190112
2009-07-30

Exposure apparatus, and device manufacturing method

 #131
20090180090
2009-07-16

Exposure apparatus and device fabrication method

 #132
20090059385
2009-03-05

Projection objective having a high aperture and a planar end surface

 #133
20090009745
2009-01-08

Exposure method, exposure apparatus, and method for producing device

 #134
20080305412
2008-12-11

NEAR-FIELD EXPOSURE MASK AND NEAR-FIELD EXPOSURE METHOD

 #135
20080297757
2008-12-04

Light-modulating nano/micro scale aperture array device having immersion layer and high speed nano scale pattern recording system using the same

 #136
20080297746
2008-12-04

Exposure method, exposure apparatus, and method for producing device

 #137
20080273187
2008-11-06

Lens structure, optical system having the same, and lithography method using the optical system

 #138
20080248432
2008-10-09

Near-field exposure method

 #139
20080199817
2008-08-21

Resist pattern forming method including uniform intensity near field exposure

 #140
20080186579
2008-08-07

System and a method for generating periodic and/or quasi-periodic pattern on a sample

 #141
20080121616
2008-05-29

Spatial-frequency tripling and quadrupling processes for lithographic application

 #142
20080074633
2008-03-27

NEAR-FIELD EXPOSURE METHOD AND APPARATUS, NEAR-FIELD EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD

 #143
20080002166
2008-01-03

Exposure apparatus, and device manufacturing method

 #144
20070279604
2007-12-06

Lithography systems and processes

 #145
20070263188
2007-11-15

Exposure apparatus and device fabrication method

 #146
20070248917
2007-10-25

Method of manufacturing a device using a near-field photomask and near-field light

 #147
20070211234
2007-09-13

Exposure apparatus, and device manufacturing method

 #148
20070159617
2007-07-12

Photolithographic systems and methods for producing sub-diffraction-limited features

 #149
20070148558
2007-06-28

Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto

 #150
20070146680
2007-06-28

Exposure apparatus, exposure method, and exposure mask

 #151
20070138376
2007-06-21

Nanoscale optical microscope

 #152
20070125969
2007-06-07

Nanolithography system

 #153
20070121089
2007-05-31

Exposure method, exposure apparatus, and method for producing device

 #154
20070105240
2007-05-10

Apparatus and methods for nanolithography using nanoscale optics

 #155
20070082279
2007-04-12

Near-field exposure method and device manufacturing method using the same

 #156
20070081136
2007-04-12

Exposure apparatus and device fabrication method

 #157
20070065734
2007-03-22

Exposure method, exposure mask, and exposure apparatus

 #158
20070064214
2007-03-22

Exposure apparatus, and device manufacturing method

 #159
20070058153
2007-03-15

Image improvement by using reflective mirrors between object and projection lens

 #160
20070019173
2007-01-25

Photolithography arrangement

 #161
20070002300
2007-01-04

Lithographic apparatus and device manufacturing method

 #162
20060263722
2006-11-23

Photoresist, photolithography method using the same, and method for producing photoresist

 #163
20060256311
2006-11-16

Lithographic apparatus and device manufacturing method

 #164
20060166112
2006-07-27

Method for making a pattern using near-field light exposure through a photomask

 #165
20060160036
2006-07-20

Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method

 #166
20060133222
2006-06-22

LITHOGRAPHY METHOD

 #167
20060132740
2006-06-22

Exposure apparatus, and device manufacturing method

 #168
20060132739
2006-06-22

Exposure apparatus, and device manufacturing method

 #169
20060124834
2006-06-15

Near-field light generating method and near-field optical head using a light blocking metal film having a fine opening whose size is not more than a wavelength of irradiated light, and near-field optical microscope having the optical head

 #170
20060114445
2006-06-01

Exposure apparatus, and device manufacturing method

 #171
20060110693
2006-05-25

Exposure method and apparatus, exposure mask, and device manufacturing method

 #172
20060098177
2006-05-11

Exposure method, exposure apparatus, and method for producing device

 #173
20060078637
2006-04-13

Solid immersion lens lithography

 #174
20060029867
2006-02-09

Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same

 #175
20060012885
2006-01-19

Projection objective having a high aperture and a planar end surface

 #176
20060003236
2006-01-05

Photomask and near-field exposure method

 #177
20060003233
2006-01-05

Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method

 #178
20050266321
2005-12-01

Mask for proximity field optical exposure, exposure apparatus and method therefor

 #179
20050233262
2005-10-20

Lithography mask and optical lithography method using surface plasmon

 #180
20050227153
2005-10-13

Mask for proximity field optical exposure, exposure apparatus and method therefor

 #181
20050151949
2005-07-14

Process and apparatus for applying apodization to maskless optical direct write lithography processes

 #182
20050147922
2005-07-07

Method for exposing a photosensitive resist layer with near-field light

 #183
20050057752
2005-03-17

Method of detecting attracting force between substrates, and near-field exposure method and apparatus

 #184
20050053859
2005-03-10

Photoresist, photolithography method using the same, and method for producing photoresist

 #185
20050030506
2005-02-10

Projection exposure method and projection exposure system

 #186
20050007567
2005-01-13

Contact or proximity printing using a magnified mask image