Patents-Review.com
ClassID:

177168 ⎘

G03F7/70333 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Systems for imaging mask onto workpiece; Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lens Focus drilling, e.g. FLEX

Recent Application in this class:
#1
20250264811
2025-08-21

EXPOSURE PROCESS DETERMINATION METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, ARTICLE MANUFACTURING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM

 #2
20250258438
2025-08-14

LASER PROCESSING SYSTEM, LASER PROCESSING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

 #3
20230075146
2023-03-09

Method and apparatus for dynamic lithographic exposure

 #4
20230010700
2023-01-12

METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED ONTO A SUBSTRATE

 #5
20220050382
2022-02-17

Laser processing method and laser processing system

 #6
20210349404
2021-11-11

METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTIMIZATION

 #7
20210255549
2021-08-19

Method and apparatus for dynamic lithographic exposure

 #8
20200241427
2020-07-30

Method and apparatus for dynamic lithographic exposure

 #9
20200209760
2020-07-02

Laser processing method and laser processing system

 #10
20200096877
2020-03-26

Projection exposure method and projection exposure apparatus for microlithography

 #11
20190204756
2019-07-04

Projection exposure method and projection exposure apparatus for microlithography

 #12
20190116673
2019-04-18

System for direct writing on an uneven surface of a workpiece that is covered with a radiation sensitive layer using exposures having different focal planes

 #13
20190094706
2019-03-28

Method and apparatus for dynamic lithographic exposure

 #14
20180299788
2018-10-18

Exposure apparatus, and device manufacturing method

 #15
20180039185
2018-02-08

Exposure apparatus and device manufacturing method

 #16
20170212423
2017-07-27

Method and apparatus for dynamic lithographic exposure

 #17
20170123326
2017-05-04

Exposure apparatus and device manufacturing method

 #18
20140293248
2014-10-02

Lithographic apparatus and device manufacturing method

 #19
20140206111
2014-07-24

Semiconductor device manufacturing method

 #20
20140053399
2014-02-27

Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs

 #21
20120200837
2012-08-09

Exposure apparatus, and device manufacturing method

 #22
20120044471
2012-02-23

Lithographic Apparatus and Method

 #23
20120008111
2012-01-12

Exposure apparatus, and device manufacturing method

 #24
20110211181
2011-09-01

Lithographic apparatus and device manufacturing method

 #25
20110200922
2011-08-18

Calculating a laser metric within a lithographic apparatus and method thereof

 #26
20110025997
2011-02-03

Exposure apparatus, and device manufacturing method

 #27
20110025996
2011-02-03

Exposure apparatus, and device manufacturing method

 #28
20100157266
2010-06-24

Projection exposure method and projection exposure apparatus for microlithography

 #29
20090284722
2009-11-19

Method for monitoring focus on an integrated wafer

 #30
20090190115
2009-07-30

Method for exposing a substrate and lithographic projection apparatus

 #31
20090190112
2009-07-30

Exposure apparatus, and device manufacturing method

 #32
20090170042
2009-07-02

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

 #33
20080170215
2008-07-17

Lithographic apparatus and device manufacturing method

 #34
20080165339
2008-07-10

Spatial energy distribution by slit filter for step-and-scan system on multiple focus exposure

 #35
20080143987
2008-06-19

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

 #36
20080085462
2008-04-10

Lithographic apparatus and device manufacturing method

 #37
20080002166
2008-01-03

Exposure apparatus, and device manufacturing method

 #38
20070296945
2007-12-27

Exposure apparatus and image plane detecting method

 #39
20070211234
2007-09-13

Exposure apparatus, and device manufacturing method

 #40
20070099100
2007-05-03

Method for exposing a substrate and lithographic projection apparatus

 #41
20070092840
2007-04-26

System and method for photolithography in semiconductor manufacturing

 #42
20070064214
2007-03-22

Exposure apparatus, and device manufacturing method

 #43
20060268248
2006-11-30

Lithographic projection apparatus and method of exposing a semiconductor wafer with a pattern from a mask

 #44
20060244937
2006-11-02

Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration

 #45
20060221317
2006-10-05

Immersion lithography method and device for illuminating a substrate

 #46
20060177778
2006-08-10

System and method for photolithography in semiconductor manufacturing

 #47
20060158631
2006-07-20

Method and apparatus for irradiating a microlithographic substrate

 #48
20060132740
2006-06-22

Exposure apparatus, and device manufacturing method

 #49
20060132739
2006-06-22

Exposure apparatus, and device manufacturing method

 #50
20060126697
2006-06-15

Very narrow band, two chamber, high rep-rate gas discharge laser system

 #51
20060114445
2006-06-01

Exposure apparatus, and device manufacturing method

 #52
20060110683
2006-05-25

Process of improved grayscale lithography

 #53
20060051979
2006-03-09

Apparatus and method of exposing a semiconductor device having a curved surface to light

 #54
20050271109
2005-12-08

Very narrow band, two chamber, high rep-rate gas discharge laser system

 #55
20050270508
2005-12-08

Multi-focus scanning with a tilted mask or wafer

 #56
20050174550
2005-08-11

Lithographic apparatus and device manufacturing method

 #57
20050100831
2005-05-12

Method for exposing a substrate and lithographic projection apparatus

 #58
20050068997
2005-03-31

Laser spectral engineering for lithographic process

 #59
20050041701
2005-02-24

Laser spectral engineering for lithographic process

 #60
20050041228
2005-02-24

Method and apparatus for irradiating a microlithographic substrate