Patents-Review.com
ClassID:

177260 ⎘

G03F9/7038 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography; Alignment type or strategy, e.g. leveling, global alignment Alignment for proximity or contact printer

Recent Application in this class:
#1
20200026192
2020-01-23

Proximity exposure method

 #2
20200004158
2020-01-02

Information processing apparatus, storage medium, lithography apparatus, lithography system, and article manufacturing method

 #3
20190285403
2019-09-19

Position detection apparatus, position detection method, imprint apparatus, and method of manufacturing article

 #4
20190164770
2019-05-30

Template, imprint apparatus, imprint method and imprint apparatus management method

 #5
20190146364
2019-05-16

Dual-layer alignment device and method

 #6
20180370091
2018-12-27

Imprint apparatus, method of manufacturing article, information processing apparatus, method of supporting map editing, and storage medium

 #7
20180095371
2018-04-05

Overlay alignment detection apparatus for display device and exposure process system

 #8
20170329217
2017-11-16

Position detector, position detection method, imprint apparatus, and product manufacturing method

 #9
20170285495
2017-10-05

Pattern forming method and method of manufacturing article

 #10
20160377995
2016-12-29

Device and method for positioning a photolithography mask by a contactless optical method

 #11
20160158978
2016-06-09

Imprint apparatus

 #12
20150377614
2015-12-31

Position detection apparatus, position detection method, imprint apparatus, and method of manufacturing article

 #13
20150235880
2015-08-20

Detection apparatus, imprint apparatus, and method of manufacturing products

 #14
20150192515
2015-07-09

Imprint apparatus, imprint method and method of manufacturing an article

 #15
20150122175
2015-05-07

Mark position detector, imprint apparatus, and article manufacturing method

 #16
20150062553
2015-03-05

Detection apparatus, lithography apparatus and method of manufacturing article

 #17
20150014892
2015-01-15

Imprint apparatus and method of manufacturing article

 #18
20150013559
2015-01-15

Imprint method, imprint apparatus, and article manufacturing method

 #19
20140346694
2014-11-27

Position detection apparatus, imprint apparatus, and position detection method

 #20
20140184791
2014-07-03

Optical image capturing module, alignment method, and observation method

 #21
20130240480
2013-09-19

Method for manufacturing mold

 #22
20130193602
2013-08-01

Imprint apparatus including alignment and overlay measurement

 #23
20130155382
2013-06-20

Work stage of exposing apparatus, exposing method and method of manufacturing a structure

 #24
20130128253
2013-05-23

Exposure apparatus using microlens array and optical member

 #25
20130100459
2013-04-25

Detector, imprint apparatus, and article manufacturing method

 #26
20130078821
2013-03-28

IMPRINT METHOD, IMPRINT APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

 #27
20130057839
2013-03-07

Lithography system and manufacturing method of commodities

 #28
20120328725
2012-12-27

Position detection apparatus, imprint apparatus, and position detection method

 #29
20120262719
2012-10-18

Plasmon tomography

 #30
20120147343
2012-06-14

Alignment method, alignment apparatus, and exposure apparatus

 #31
20110219635
2011-09-15

Method of aligning a first article relative to a second article

 #32
20110141489
2011-06-16

Mark position detector, imprint apparatus, and article manufacturing method

 #33
20110063627
2011-03-17

Plasmon tomography

 #34
20110027542
2011-02-03

EXPOSURE APPARATUS AND EXPOSURE METHOD

 #35
20100103402
2010-04-29

WORK STAGE OF EXPOSING APPARATUS, EXPOSING METHOD AND METHOD OF MANUFACTURING A STRUCTURE

 #36
20090311631
2009-12-17

Near-field exposure apparatus and near-field exposure method

 #37
20090244511
2009-10-01

Electroactive polymers for lithography

 #38
20090242806
2009-10-01

Electroactive polymers for lithography

 #39
20090130573
2009-05-21

Multilayer active mask lithography

 #40
20090117475
2009-05-07

Multilayer active mask lithography

 #41
20090068765
2009-03-12

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #42
20090051920
2009-02-26

Plasmon tomography

 #43
20080283308
2008-11-20

Device For Determining the Relative Position Between Two Essentially Flat Elements

 #44
20080090312
2008-04-17

LITHOGRAPHY ALIGNMENT SYSTEM AND METHOD USING nDSE-BASED FEEDBACK CONTROL

 #45
20080090160
2008-04-17

Alignment for contact lithography

 #46
20080089470
2008-04-17

Alignment for contact lithography

 #47
20080055607
2008-03-06

Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marks

 #48
20080028360
2008-01-31

Methods and systems for performing lithography, methods for aligning objects relative to one another, and nanoimprinting molds having non-marking alignment features

 #49
20080020303
2008-01-24

Alignment for contact lithography

 #50
20070248892
2007-10-25

Apparatus for aligning a first article relative to a second article

 #51
20070242271
2007-10-18

Infrared interferometric-spatial-phase imaging using backside wafer marks

 #52
20070234786
2007-10-11

Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography

 #53
20070212488
2007-09-13

Pattern transfer method and pattern transfer apparatus

 #54
20070200276
2007-08-30

Method for rapid printing of near-field and imprint lithographic features

 #55
20070190639
2007-08-16

Plasmon tomography

 #56
20070190638
2007-08-16

Plasmon tomography

 #57
20070127037
2007-06-07

Position sensor, method for detecting horizontal and vertical position, alignment apparatus including position sensor, and method for horizontal and vertical alignment

 #58
20070115471
2007-05-24

WAFER, EXPOSURE MASK, METHOD OF DETECTING MARK AND METHOD OF EXPOSURE

 #59
20070076843
2007-04-05

Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus

 #60
20070058323
2007-03-15

Electroactive polymers for lithography

 #61
20070035731
2007-02-15

Direct alignment in mask aligners

 #62
20060264016
2006-11-23

Active mask lithography

 #63
20060264015
2006-11-23

Electroactive polymers for lithography

 #64
20060193432
2006-08-31

Method for adjusting gap between two objects and exposure method using the same, gap adjusting apparatus, and exposure apparatus

 #65
20060158630
2006-07-20

Exposure apparatus, device manufacturing method, stage apparatus, and alignment method

 #66
20060152703
2006-07-13

Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same

 #67
20060146329
2006-07-06

Device for aligning substrate with mask and method using the same

 #68
20060110070
2006-05-25

Multiple layer alignment sensing

 #69
20060029867
2006-02-09

Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same

 #70
20060007440
2006-01-12

Method and apparatus for detecting relative positional deviation between two objects

 #71
20050105093
2005-05-19

Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method