G03F9/70 - CPC Classification Index

ClassID:

177250 ⎘

G03F9/70 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Sub-classes:

G03F9/7003 » {Alignment type or strategy, e.g. leveling, global alignment} 386
G03F9/7049 » {Technique, e.g. interferometric} 280
G03F9/7065 » {Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength} 153
G03F9/7069 » {Alignment mark illumination, e.g. darkfield, dual focus} 103
G03F9/7073 » {Alignment marks and their environment } 55
G03F9/7088 » {Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection} 798
G03F9/7092 » {Signal processing} 202
G03F9/7096 » {Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus} 125

Recent Application in this class:

20260005161

2026-01-01

LITHOGRAPHIC SEAM IMPLEMENTATION FOR ACTIVE INTERCONNECT ROUTING ACROSS MULTIPLE RETICLE FIELDS

20240210335

2024-06-27

APPARATUS FOR ANALYSING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD

20240061342

2024-02-22

Electron beam lithography with dynamic fin overlay correction

20230266678

2023-08-24

Lithographic apparatus

20230223377

2023-07-13

Wafer bonding device and wafer bonding method

20220013362

2022-01-13

Electron beam lithography with dynamic fin overlay correction

20210223703

2021-07-22

Lithographic apparatus

20210141303

2021-05-13

Overlay optimization

20200401054

2020-12-24

Measuring a process parameter for a manufacturing process involving lithography

#10

20200264523

2020-08-20

Movable body apparatus, moving method, exposure apparatus, exposure method, flat-panel display manufacturing method, and device manufacturing method

#11

20200159126

2020-05-21

Lithographic apparatus

#12

20200103757

2020-04-02

Exposure method, exposure apparatus, and device manufacturing method

#13

20200096879

2020-03-26

Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object

#14

20190384179

2019-12-19

Movable body apparatus, moving method, exposure apparatus, exposure method, flat-panel display manufacturing method, and device manufacturing method

#15

20190377266

2019-12-12

Lithographic apparatus

#16

20190377257

2019-12-12

Systems and methods for modifying mesa sidewalls

#17

20190235396

2019-08-01

Optical measurement device and method

#18

20190212658

2019-07-11

Position sensor, lithographic apparatus and method for manufacturing devices

#19

20190187567

2019-06-20

System and method for producing an optical mask for surface microtexturing, and surface microtexturing plant and method

#20

20190187566

2019-06-20

Lithographic apparatus

#21

20190107787

2019-04-11

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#22

20190107782

2019-04-11

Exposure apparatus, exposure method, and device manufacturing method

#23

20190064668

2019-02-28

Exposure method, exposure apparatus, and device manufacturing method

#24

20180373152

2018-12-27

Exposure method, exposure apparatus, and device manufacturing method

#25

20180348638

2018-12-06

Exposure method, exposure apparatus, and device manufacturing method

#26

20180275532

2018-09-27

Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object

#27

20180224758

2018-08-09

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#28

20180164692

2018-06-14

Exposure apparatus, exposure method, and device manufacturing method

#29

20180107126

2018-04-19

Overlay key, method of forming the same, and method of measuring overlay accuracy

#30

20180059555

2018-03-01

Lithographic apparatus, and device manufacturing method

#31

20180010906

2018-01-11

Optical measurement element for alignment in wafer-level testing and method for aligning an optical probe using the same

#32

20170330782

2017-11-16

Method for in-die overlay control using FEOL dummy fill layer

#33

20170329241

2017-11-16

Alignment method and alignment system thereof

#34

20170285493

2017-10-05

Projection exposure method and projection exposure apparatus

#35

20170261856

2017-09-14

Exposure method, exposure apparatus, and device manufacturing method

#36

20170239850

2017-08-24

Transfer method and apparatus and computer program product

#37

20170219935

2017-08-03

Exposure device and out-of-focus and tilt error compensation method

#38

20170168403

2017-06-15

Environmental control of systems for photolithography process

#39

20170076906

2017-03-16

Ebeam staggered beam aperture array

#40

20170003604

2017-01-05

Exposure method, exposure apparatus, and device manufacturing method

#41

20170003601

2017-01-05

Exposure method, exposure apparatus, and device manufacturing method

#42

20160327872

2016-11-10

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#43

20160291484

2016-10-06

Exposure apparatus, exposure method, and device manufacturing method

#44

20160252753

2016-09-01

Alignment system

#45

20160211185

2016-07-21

Method of aligning substrate-scale mask with substrate

#46

20160161866

2016-06-09

Exposure apparatus, exposure method, and device manufacturing method

#47

20160139510

2016-05-19

Lithography apparatus, and method of manufacturing article

#48

20150309423

2015-10-29

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#49

20150293464

2015-10-15

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#50

20150286149

2015-10-08

Exposure apparatus and method for manufacturing article

#51

20150220006

2015-08-06

Method and apparatus for maintaining depth of focus

#52

20150153661

2015-06-04

Substrate table system, lithographic apparatus and substrate table swapping method

#53

20150116686

2015-04-30

Edge-dominant alignment method in exposure scanner system

#54

20140354971

2014-12-04

Exposure method, exposure apparatus, and device manufacturing method

#55

20140354966

2014-12-04

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#56

20140253893

2014-09-11

Cylindrical reticle system, exposure apparatus and exposure method

#57

20140168627

2014-06-19

Method of operating a lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product

#58

20140168622

2014-06-19

Microlens array and scanning exposure device using same

#59

20140141535

2014-05-22

Method for aligning substrate and mask and method for preparing semiconductor device

#60

20140055768

2014-02-27

Position detector, lithography apparatus, and device manufacturing method

#61

20130329209

2013-12-12

Mask, exposure apparatus and device manufacturing method

#62

20130314708

2013-11-28

Method and apparatus for maintaining depth of focus

#63

20130301027

2013-11-14

Exposure method, exposure apparatus, and device manufacturing method

#64

20130100427

2013-04-25

Metrology method and apparatus, and device manufacturing method

#65

20120127453

2012-05-24

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#66

20120081682

2012-04-05

Maskless exposure apparatus and method to determine exposure start position and orientation in maskless lithography

#67

20120038899

2012-02-16

EXPOSURE APPARATUS AND ALIGNMENT ERROR COMPENSATION METHOD USING THE SAME

#68

20120033193

2012-02-09

Inspection apparatus and method for measuring a property of a substrate

#69

20110304839

2011-12-15

Position sensor and lithographic apparatus

#70

20110267593

2011-11-03

Method and apparatus for maintaining depth of focus

#71

20110205518

2011-08-25

Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus

#72

20110053062

2011-03-03

Exposure method, exposure apparatus, and device manufacturing method

#73

20110053061

2011-03-03

Exposure apparatus, exposure method, and device manufacturing method

#74

20100290022

2010-11-18

Enhancing alignment in lithographic apparatus device manufacture

#75

20100201965

2010-08-12

Method and system for improved overlay correction

#76

20100128239

2010-05-27

Exposure method and exposure apparatus

#77

20090231569

2009-09-17

EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE

#78

20090170014

2009-07-02

Mask, exposure apparatus and device manufacturing method

#79

20080094593

2008-04-24

Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method

#80

20070109515

2007-05-17

Exposure apparatus and an exposure method

#81

20070011112

2007-01-11

Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method

#82

20060176459

2006-08-10

Off-axis levelling in lithographic projection apparatus

#83

20050157281

2005-07-21

Off-axis levelling in lithographic projection apparatus

#84

20050088638

2005-04-28

Off-axis leveling in lithographic projection apparatus

#85

20050051742

2005-03-10

Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus

#86

16417085

2020-08-04

Measurement library optimization in semiconductor metrology

#87

15184782

2019-07-09

Measurement library optimization in semiconductor metrology

#88

13332293

2014-07-08

Method and system for aligning substrates for direct laser coupling in an energy assisted magnetic recording head