Patents-Review.com
ClassID:

177269 ⎘

G03F9/7073 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography Alignment marks and their environment

Sub-classes:
Recent Application in this class:
#1
20250284215
2025-09-11

SYSTEMS AND METHODS FOR OPTIMIZING METROLOGY MARKS

 #2
20240310738
2024-09-19

METHOD OF DETERMINING A CORRECTION FOR AT LEAST ONE CONTROL PARAMETER IN A SEMICONDUCTOR MANUFACTURING PROCESS

 #3
20240152064
2024-05-09

PHOTOLITHOGRAPHY METHOD AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME

 #4
20240094624
2024-03-21

PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUS

 #5
20240004321
2024-01-04

ALIGNMENT SYSTEM AND METHOD FOR ALIGNING AN OBJECT HAVING AN ALIGNMENT MARK

 #6
20230197627
2023-06-22

ELECTRONIC DEVICES COMPRISING OVERLAY MARKS

 #7
20220317582
2022-10-06

WAFER EDGE EXPOSURE METHOD, WAFER EDGE EXPOSURE DEVICE AND MASK

 #8
20220291599
2022-09-15

Alignment mark evaluation method and alignment mark evaluation system

 #9
20220155696
2022-05-19

OVERLAY MEASUREMENT STRUCTURES AND METHOD OF OVERLAY ERRORS

 #10
20220051951
2022-02-17

Method for producing overlay results with absolute reference for semiconductor manufacturing

 #11
20220050393
2022-02-17

Method of pattern alignment for field stitching

 #12
20220050388
2022-02-17

Coaxial see-through alignment imaging system

 #13
20220050386
2022-02-17

COAXIAL SEE-THROUGH INSPECTION SYSTEM

 #14
20220050385
2022-02-17

Tunable wavelength see-through layer stack

 #15
20220050384
2022-02-17

Method for producing overlay results with absolute reference for semiconductor manufacturing

 #16
20210255553
2021-08-19

Metrology method, patterning device, apparatus and computer program

 #17
20210103226
2021-04-08

Position detection apparatus, position detection method, lithography apparatus, and method of manufacturing article

 #18
20210041792
2021-02-11

Lithographic overlay correction and lithographic process

 #19
20200326640
2020-10-15

Lithographic cluster, lithographic apparatus, and device manufacturing method

 #20
20200319547
2020-10-08

Imprint apparatus

 #21
20200272061
2020-08-27

Lithographic method

 #22
20200159134
2020-05-21

Information determining apparatus and method

 #23
20200152498
2020-05-14

Apparatus and method for aligning integrated circuit layers using multiple grating materials

 #24
20200110342
2020-04-09

Metrology method, patterning device, apparatus and computer program

 #25
20200081356
2020-03-12

Lithographic method

 #26
20190369504
2019-12-05

Lithographic overlay correction and lithographic process

 #27
20190204759
2019-07-04

Alignment system wafer stack beam analyzer

 #28
20190146330
2019-05-16

Method for forming an aligned mask

 #29
20190094721
2019-03-28

Lithographic method

 #30
20190094687
2019-03-28

Shaping apparatus and article manufacturing method

 #31
20190067204
2019-02-28

Alignment mark and measurement method thereof

 #32
20190064679
2019-02-28

Pattern forming apparatus, deciding method, storage medium, information processing apparatus, and article manufacturing method

 #33
20190049849
2019-02-14

Wafer table chuck having a particle recess

 #34
20190033708
2019-01-31

Real-time correction of template deformation in nanoimprint lithography

 #35
20180373162
2018-12-27

Methods of controlling a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus

 #36
20180364564
2018-12-20

On-axis illumination and alignment for charge control during charged particle beam inspection

 #37
20180196363
2018-07-12

Lithographic apparatus and device manufacturing method

 #38
20180149986
2018-05-31

Lithographic apparatus, object positioning system and device manufacturing method

 #39
20180130797
2018-05-10

Multi-layer semiconductor device structure

 #40
20180039192
2018-02-08

Mask transmission device and transmission method

 #41
20170330782
2017-11-16

Method for in-die overlay control using FEOL dummy fill layer

 #42
20170329241
2017-11-16

Alignment method and alignment system thereof

 #43
20170239850
2017-08-24

Transfer method and apparatus and computer program product

 #44
20170151694
2017-06-01

Imprint apparatus and method for producing article

 #45
20170108783
2017-04-20

Alignment modeling and a lithographic apparatus and exposure method using the same

 #46
20170062320
2017-03-02

Universal BGA substrate

 #47
20170012189
2017-01-12

Light emitting device and method for manufacturing light emitting device

 #48
20160349633
2016-12-01

Calibration apparatus and an adjustment method for a lithography apparatus

 #49
20160056152
2016-02-25

Multi-layer semiconductor device structure

 #50
20150171294
2015-06-18

Light emitting device and method for manufacturing light emitting device

 #51
20150091090
2015-04-02

Multi-layer semiconductor device structure

 #52
20150021803
2015-01-22

Imprint method for an imprint apparatus which transfers a pattern onto a substrate by using a mold

 #53
20140175594
2014-06-26

Active pad patterns for gate alignment marks

 #54
20140065380
2014-03-06

Overlay mark and method of forming the same

 #55
20130277756
2013-10-24

Method of manufacturing a semiconductor device including alignment mark

 #56
20130020721
2013-01-24

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

 #57
20130015462
2013-01-17

Transistors with dual layer passivation

 #58
20110075123
2011-03-31

Method for detecting work alignment mark and exposure apparatus using the same

 #59
20070241419
2007-10-18

Transistor and method with dual layer passivation

 #60
16192591
2020-03-24

Self aligning systems and methods for lithography systems