Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them

Reflector rack, fabrication method thereof, and narrow brand x-ray filter and system including same

Multilayer film reflector for soft X-rays and manufacturing method thereof

Broad-angle multilayer mirror design

EUV light source

Glass ceramic having a low thermal expansion

Optical reflector element, its method of fabrication, and an optical instrument implementing such elements

Compliant, nanoscale free-standing multilayer films

Elastomer spatial light modulators for extreme ultraviolet lithography

Projection objective and method for its manufacture

Planarization of substrate pits and scratches

Method to locally protect extreme ultraviolet multilayer blanks used for lithography

Reflection mirror apparatus, exposure apparatus and device manufacturing method

Multilayer reflective extreme ultraviolet lithography mask blanks

Speckle-based imaging diffuser and method for controllably fabricating same

Highly reflective crystalline mosaic neutron monochromator

Compound x-ray lens having multiple aligned zone plates