MEDICAL SYSTEMS, ANTI-SCATTER GRIDS AND METHODS OF MANUFACTURING ANTI-SCATTER GRIDS

X-RAY IRRADIATION APPARATUS, INCLUDING A SPECTRALLY SHAPING X-RAY OPTIC AND A SPECTRAL FILTER APERTURE DEVICE, FOR X-RAY IMAGING

SIGNAL MANIPULATION ELEMENTS INTEGRATED WITH WINDOW PLATE FOR OPTICAL FEEDTHROUGH TO VACUUM

OPTICS-INTEGRATED CONFINEMENT APPARATUS INCLUDING POLARIZATION CONTROLLING OPTICAL ELEMENTS

SOLID TARGET IRRADIATOR SYSTEM FOR RADIOISOTOPES PRODUCTION

Device and Method for Generating Optical Tweezers

System and method for bending crystal wafers for use in high resolution analyzers

COLLIMATOR AND METHODS OF FORMING SAME

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM

METHOD FOR PRODUCING REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE, AND REFLECTIVE OPTICAL ELEMENTS FOR THE EUV WAVELENGTH RANGE

STEPPING STRATEGY FOR DEFECT COMPENSATION IN DAX IMAGING

Focusing grating devices with large aspect ratio

Interferometer for x-ray phase contrast imaging

X-ray scattering apparatus

X-ray scattering apparatus

Stable top-bridge manufacturing for DAX gratings

Light field X-ray optics

STABILIZED GRATING STRUCTURES

Method of printing and implementing refractive X-ray optical components

Reflector and method of manufacturing a reflector

Nanopatterned electron beams for temporal coherence and deterministic phase control of x-ray free-electron lasers

Electron diffraction intensity from single crystal silicon in a photoinjector

Structured grating component, imaging system and manufacturing method

Off-axis capillary x-ray optics

APPARATUS AND METHOD FOR TREATING RADIOACTIVE EMISSION

Metal X-ray grid, X-ray imaging device, and production method for metal X-ray grid

Stress patterning systems and methods for manufacturing free-form deformations in thin substrates

EUV mask blanks and methods of manufacture

Hard X-ray photoelectron spectroscopy system

Device and method for phase stepping in phase contrast image acquisition

Constructions of x-ray lenses for converging x-rays

Metal X-ray grid, X-ray imaging device, and production method for metal X-ray grid

Method and apparatus for determining a radiation beam intensity profile

System and method for x-ray fluorescence with filtering

Detector arrangement for an X-ray phase contrast system and method for X-ray contrast imaging

Reflective optical element for EUV lithography

Super-high aspect ratio diffractive optics fabricated by batch-processing

Irradiator apparatus and system and method for irradiating a sample using x-rays

EUV Collector

Optical systems, metrology apparatus and associated method

OPTICAL ELEMENT AND OPTICAL ASSEMBLY COMPRISING SAME

Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle

Methods for aligning a spectrometer

Radiation-phase-contrast imaging device

Optical element for deflecting x-rays

Reflective optical element and optical system for EUV lithography having proportions of substances which differ across a surface

Method for manufacturing a membrane assembly

X-ray phase imaging apparatus

Extreme ultraviolet mirrors and masks with improved reflectivity

Grating and radiation imaging device

Multi-cathode EUV and soft x-ray source

Mirror, more particularly for a microlithographic projection exposure apparatus

Methods for manufacturing doubly bent X-ray focusing device, doubly bent X-ray focusing device assembly, doubly bent X-ray spectroscopic device and doubly bent X-ray spectroscopic device assembly

Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus

Batch-processing method for super-high aspect ratio diffractive optics

LASER IRRADIATION DEVICE

APPARATUS INCLUDING A BENT INTERFERENCE GRATING AND METHOD FOR BENDING AN INTERFERENCE GRATING FOR INTERFEROMETRIC X-RAY IMAGING

Charged particle beam device, optical device, irradiation method, diffraction grating system, and diffraction grating

X-ray diffractometer with multilayer reflection-type monochromator

Method for scanning a sample by means of X-ray optics and an apparatus for scanning a sample

X-ray diffractive grating and X-ray Talbot interferometer

Faceted EUV optical element

EUV-mirror, optical system with EUV-mirror and associated operating method

X-ray interferometer

Mirror, in particular for a microlithographic projection exposure apparatus

EUV mirror and optical system comprising EUV mirror

Radiological image capturing apparatus and radiological image capturing system

X-ray imaging system and image processing device

TALBOT INTERFEROMETER, TALBOT INTERFERENCE SYSTEM, AND FRINGE SCANNING METHOD

Structure, method for manufacturing the same, and talbot interferometer

Radiation source-collector and method for manufacture

Extreme ultraviolet reflective element with amorphous layers and method of manufacturing thereof

High aspect ratio dense pattern-programmable nanostructures utilizing metal assisted chemical etching

COMPUTATION APPARATUS, PROGRAM, AND X-RAY IMAGING SYSTEM

Systems and methods for x-ray phase contrast imaging using arrays of x-ray focusing elements

X-ray shield grating and X-ray talbot interferometer including X-ray shield grating

Method and apparatus for generating radiation

Interferometric dynamic-grating imaging method, diffraction grating and imaging apparatus

Photo-masks for lithography

Phase contrast X-ray tomography device

X-ray diffraction imaging system with integrated supermirror

X-ray imaging system and image processing method

POLYCAPILLARY LENS

X-RAY SHIELD GRADING AND METHOD FOR FABRICATING THE SAME

Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus

Lithographic apparatus

Structural body and X-ray talbot interferometer including the structural body

Reflective optical element

Method for examining an object using an X-ray recording system for phase contrast imaging with stochastic phase scanning

Illumination optical unit

Method for manufacturing microstructure

APPARATUS AND METHOD FOR X-RAY PHASE CONTRAST IMAGING

Radiological image capturing apparatus and radiological image capturing system

Method of producing a Fresnel Zone Plate for applications in high energy radiation

EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method

Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor

Method for manufacturing compound refractive lens for focusing X-rays in two dimensions

Arrangement of a mirror

EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method

Reflective optical element and optical system for EUV lithography

Collector

Structure, method for manufacturing the same, and image pickup apparatus including the structure

Stacked zone plates for pitch frequency multiplication

OPTICAL GRATING INCLUDING A SMOOTHING LAYER

Method for X-ray phase contrast and dark-field imaging using an arrangement of gratings in planar geometry

Lithographic apparatus, spectral purity filter and device manufacturing method

Zone compensated multilayer laue lens and apparatus and method of fabricating the same

Device for adjusting curvature of mirror while avoiding movement of central point of mirror, and mirror adjustment system comprising same

Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

Differential phase-contrast imaging with increased dynamic range

Method for manufacturing X-ray/γ-ray focusing optical system using atomic layer deposition

Hybrid X-ray optic apparatus and methods

Radiological image capturing apparatus and radiological image capturing system

Silicon focusing mirror system

X-ray apparatus and X-ray measuring method

X-RAY INTERFEROMETER

Optical arrangement for EUV lithography and method for configuring such an optical arrangement

Corrosion-resistant multilayer structures with improved reflectivity

Optical device for analyzing a specimen by the scattering of an X-ray beam and associated collimation device and collimator

X-ray waveguide

High Aspect Ratio Grid for Phase Contrast X-ray Imaging and Method of Making the Same

Multilayer total internal reflection optic devices and methods of making and using the same

EUV collector

APPARATUS FOR ALIGNMENT OF MULTILAYER FILM MIRRORS FOR MONOCHROMATIC X-RAY GENERATOR AND X-RAY IMAGE DETECTING METHOD USING THE SAME

Reflective surface shape controllable mirror device, and method for manufacturing reflective surface shape controllable mirror

Projection objective having mirror elements with reflective coatings

Reflective optical element and method for production of such an optical element

Grid for radiation imaging and method for producing the same

Surface correction on coated mirrors

Semiconductor exposure device using extreme ultra violet radiation

REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRAPHY APPARATUS

MULTILAYER MIRROR, LITHOGRAPIC APPARATUS, AND METHODS FOR MANUFACTURING A MULTILAYER MIRROR AND A PRODUCT

MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE

Technique for etching monolayer and multilayer materials

Method for assembling a mirror plate stack

Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method

Illumination optical unit for microlithography

GRID FOR USE IN RADIATION IMAGING, METHOD FOR PRODUCING THE SAME, AND RADIATION IMAGING SYSTEM

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER

Component of an EUV or UV lithography apparatus and method for producing it

Zone plate

Adjustable electromagnetic energy collimator

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

Source-collector module with GIC mirror and xenon ice EUV LPP target system

Source-collector module with GIC mirror and xenon liquid EUV LPP target system

EUV collector with cooling device

X-ray optical systems with adjustable convergence and focal spot size

Method and system for thermally conditioning an optical element

X-ray waveguide

X-ray waveguide

X-ray radiator to generate quasi-monochromatic x-ray radiation, and radiography x-ray acquisition system employing same

MIRROR AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM

X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program

Ultraviolet reflector with coolant gas holes and method

Reflective optical element and method for production of such an optical element

Extreme ultraviolet light generation system

OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT

High flux photon beams using optic devices

EUV light source components and methods for producing, using and refurbishing same

Multi-beam X-ray system

X-ray shield grating, manufacturing method therefor, and X-ray imaging apparatus

Cooled spider and method for grazing-incidence collectors

Analysis method, radiation imaging apparatus using analysis method, and analysis program for executing analysis method

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Cooling systems and methods for grazing incidence EUV lightography collectors

Extreme UV radiation reflecting element comprising a sputter-resistant material

MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

Radiation Collector

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS

EUV projection lens and optic system having the same

Slit mechanism apparatus and X-ray computed tomography apparatus

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

Nano-structured nuclear radiation shielding

X-ray detector for phase contrast imaging

Optical component for EUVL and smoothing method thereof

Grazing incidence collector for laser produced plasma sources

Optimizing total internal reflection multilayer optics through material selection

X-ray imaging apparatus, X-ray imaging method, and X-ray imaging program

Wavelength-dispersive X-ray spectrometer

Zone-optimized mirrors and optical systems using same

Grating with a large aspect ratio, in particular to be used as an X-ray optical grating in a CT system, produced by a lithography method

SPECTRAL FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL FILTER, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY

Electron-beam-assisted EEM method

Curvature distribution crystal lens and X-ray reflectometer

Projection objective having mirror elements with reflective coatings

X-ray condensing method and its device using phase restoration method

METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS, OPTICAL ELEMENT PRODUCED ACCORDING TO THE METHOD, COLLECTOR, AND LIGHTING SYSTEM

Reflective-type mask blank for EUV lithography

Projection objective and method for its manufacture

SPECTRAL PURITY FILTER FOR MULTI-LAYER MIRROR, LITHOGRAPHIC APPARATUS INCLUDING SUCH MULTI-LAYER MIRROR, METHOD FOR ENLARGING THE RATIO OF DESIRED RADIATION AND UNDESIRED RADIATION, AND DEVICE MANUFACTURING METHOD

Method for the protection of extreme ultraviolet lithography optics

Radiological image capturing apparatus and radiological image capturing system

Ultraviolet reflector with coolant gas holes and method

Optical component for EUVL and smoothing method thereof

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

Procedure of Manufacturing a Neutron-Guiding Flat Surface

Radiation phase image radiographing apparatus

Ultra-high density diffraction grating

Radiation sources and methods of generating radiation

Coated mirrors and their fabrication

High-resolution, active-optic X-ray fluorescence analyzer

High-resolution X-ray optic and method for constructing an X-ray optic

High intensity x-ray beam system

Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate

Lithographic apparatus

Semiconductor exposure device using extreme ultra violet radiation

Approach and device for focusing x-rays

Mammography X-ray homogenizing optic

MULTILAYER FILM REFLECTOR

Highly aligned x-ray optic and source assembly for precision x-ray analysis applications

Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method

EUV light source components and methods for producing, using and refurbishing same

OPTICAL ELEMENT FOR X-RAY

Multi-energy imaging system and method using optic devices

EXPOSURE MIRROR AND EXPOSURE APPARATUS HAVING SAME

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME

Use of a focusing vortex lens as the objective in spiral phase contrast microscopy

Sputtering target used for production of reflective mask blank for EUV lithography

EXTREME ULTRAVIOLET (EUV) MASK PROTECTION AGAINST INSPECTION LASER DAMAGE

X-ray imaging system and methods of using and forming an array of optic devices therein

Fresnel zone plate and x-ray microscope using the fresnel zone plate

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE

Thermally stable multilayer mirror for the EUV spectral range

X-ray lens assembly and X-ray device incorporating said assembly

Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

X-Ray or neutron monochromator

Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror

Device for improving the resolution capability of an x-ray optical apparatus

Methods to manufacture contaminant-gettering materials in the surface of EUV optics

METHOD FOR DEPOSITING REFLECTIVE MULTILAYER FILM OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND METHOD FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method

System, method and apparatus for RF directed energy

Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method

Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element

Substrate and method of fabricating the same

Method of making and structure of multilayer laue lens for focusing hard x-rays

Polishing method for extreme ultraviolet optical elements and elements produced using the method

Extreme UV radiation focusing mirror and extreme UV radiation source device

Method for fabricating neutron supermirror using neutron monochromator structures

Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus

High-Precision Optical Surface Prepared by Sagging from a Masterpiece

Thermally stable multilayer mirror for the EUV spectral region

Reflective optical illumination collector

Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors

EUV light source

Collector configured of mirror shells

Multilayer mirror, evaluation method, exposure apparatus, device manufacturing method

X-RAY REFLECTOR EXHIBITING TAPER, METHOD OF MAKING SAME, NARROW BAND X-RAY FILTERS INCLUDING SAME, DEVICES INCLUDING SUCH FILTERS, MULTISPECTRAL X-RAY PRODUCTION VIA UNISPECTRAL FILTER, AND MULTISPECTRAL X-RAY PRODUCTION VIA MULTISPECTRAL FILTER

Method of providing a shaped body made of glass or glass ceramics

X-ray generating method and x-ray generating apparatus

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME

Reflective-type mask blank for EUV lithography

Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank

EUV light source

EUV light source

Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate

Mask blank and photomask having antireflective properties

EUV light source

Low loss hollow core optical waveguide

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask

Polarized neutron guide

Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomask

Curved X-ray reflector

Discharge produced plasma EUV light source

EUV light source collector erosion mitigation

Reflective mask blank, reflective mask, and method for manufacturing semiconductor device

Photomask and method thereof

Reflective-type mask blank for EUV lithography and method for producing the same

Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

Sputtering target, method of manufacturing a multilayer reflective film coated substrate, method of manufacturing a reflective mask blank, and method of manufacturing a reflective mask

Method for repairing mask-blank defects using repair-zone compensation

Methods to manufacture contaminant-gettering materials in the surface of EUV optics

Illumination system particularly for microlithography

Methods of forming capping layers on reflective materials

Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby

Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby

Photomasks and methods of manufacturing the same

Lithographic apparatus, device manufacturing method, and optical component

Forming a capping layer for a EUV mask and structures formed thereby

Systems and methods for cleaning a chamber window of an EUV light source

Collector having unused region for illumination systems using a wavelength ≦193 nm

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

Thermal casting of polymers in centrifuge for producing X-ray optics

Production method of radiation image conversion panel

Multilayer film reflector and X-ray exposure system

Deformable system comprising a parallelepiped-shaped part and an actuator

Defect repair device and defect repair method

X-ray reflector exhibiting taper, method of making same, narrow band x-ray filters including same, devices including such filters, multispectral x-ray production via unispectral filter, and multispectral x-ray production via multispectral filter

Reflection mask, use of the reflection mask and method for fabricating the reflection mask

Interference multilayer capping design for multilayer reflective mask blanks

Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method

Light scattering EUVL mask

Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system

Extreme ultraviolet radiation imaging