206321 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Details Moving components not otherwise provided for
Sub-classes:MOBILE RADIATION DETECTOR SYSTEM FOR ION IMPLANTERS
#2MID-RING EROSION COMPENSATION IN SUBSTRATE PROCESSING SYSTEMS
#3PLASMA PROCESSING APPARATUS
#4METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
#5APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
#6SUBSTRATE PROCESSING APPARATUS
#7SUBSTRATE PROCESSING APPARATUS AND A METHOD OF PROCESSING A SUBSTRATE USING THE SAME
#8MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED ALIGNMENT AND METHOD FOR ALIGNING THE MULTI-BEAM PARTICLE MICROSCOPE, AND COMPUTER PROGRAM PRODUCT
#9Apparatus and Methods for Plasma Processing
#10SUBSTRATE POSITION MONITORING DEVICES
#11CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
#12Apparatus of plural charged-particle beams
#13PLASMA PROCESSING APPARATUS
#14METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
#15Vacuum chamber arrangement for charged particle beam generator
#16HIGH PRECISION EDGE RING CENTERING FOR SUBSTRATE PROCESSING SYSTEMS
#17HYBRID CHAMBER
#18SUBSTRATE PROCESSING APPARATUS
#19ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING
#20Apparatus of plural charged-particle beams
#21Semiconductor wafer
#22SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS USING THE SAME
#23Plasma generating device and process executing apparatus including the same
#24GAS SUPPLY DEVICE, SYSTEM HAVING A GAS SUPPLY DEVICE, AND PARTICLE BEAM APPARATUS HAVING A GAS DELIVERY DEVICE OR THE SYSTEM
#25DEPOSITION METHOD AND DEPOSITION APPARATUS
#26PLASMA PROCESSING APPARATUS
#27Electron gun, electron gun component, electron beam applicator, and alignment method
#28MID-RING EROSION COMPENSATION IN SUBSTRATE PROCESSING SYSTEMS
#29Storage Cassette for Replaceable Parts for Plasma Processing Apparatus
#30SUBSTRATE PROCESSING APPARATUS
#31IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING APPARATUS
#32Ion milling device
#33Bottom electrode assembly, plasma processing apparatus, and method of replacing focus ring
#34Vacuum chamber arrangement for charged particle beam generator
#35Collision avoidance for particle beam instruments
#36Method and device for implanting ions in wafers
#37Apparatus of plural charged-particle beams
#38PLASMA PROCESSING APPARATUS
#39Multi charged particle beam writing apparatus
#40Closure mechanism vacuum chamber isolation device and sub-system
#41OPTICAL SYSTEM ADJUSTMENT METHOD OF IMAGE ACQUISITION APPARATUS
#42Vacuum chamber arrangement for charged particle beam generator
#43Collision avoidance for particle beam instruments
#44Apparatus of plural charged-particle beams
#45Method for driving member and processing apparatus
#46Charged particle beam apparatus
#47Method and device for implanting ions in wafers
#48Aperture array alignment method and multi charged particle beam writing apparatus
#49Retractable detector
#50Optical system adjustment method of image acquisition apparatus
#51SUBSTRATE TREATING APPARATUS
#52Multi charged particle beam drawing apparatus and multi charged particle beam drawing method
#53Object preparation device and particle beam device having an object preparation device and method for operating the particle beam device
#54Scanning electron microscope
#55Electron source architecture for a scanning electron microscopy system
#56Enhanced FIB-SEM systems for large-volume 3D imaging
#57Image capture assembly and method for electron back scatter diffraction
#58Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
#59Charged particle beam apparatus
#60Electron microscope and image acquisition method
#61Retractable detector
#62Stage mechanism
#63High throughput TEM preparation processes and hardware for backside thinning of cross-sectional view lamella
#64Vacuum chamber arrangement for charged particle beam generator
#65Charged particle beam apparatus
#66Apparatus of plural charged-particle beams
#67Plasma generating device comprising a rotating body
#68Aligning a featureless thin film in a TEM
#69Lower dose rate ion implantation using a wider ion beam
#70Enclosure for a target processing machine
#71High-energy ion implanter, beam collimator, and beam collimation method
#72Multi-electrode electron optics
#73Arc chamber with multiple cathodes for an ion source
#74Adjustable cathodoluminescence detection system and microscope employing such a system
#75Substrate processing apparatus
#76Beam monitoring device, method, and system
#77Apparatus and techniques for energetic neutral beam processing
#78SYSTEM AND METHOD FOR SAMPLE ANALYSIS BY THREE DIMENSIONAL CATHODOLUMINESCENCE
#79High-throughput ion implanter
#80Cathodoluminescence detector including inner and outer tubes sealed from a vacuum chamber of an associated particle beam system
#81Beam monitoring device, method, and system
#82Adjustable cathodoluminescence detection system and microscope employing such a system
#83Particle beam microscope
#84Particle Beam Microscope
#85Charging-free electron beam cure of dielectric material
#86Electro-optical element for multiple beam alignment
#87X-RAY ANALYSER
#88Charged particle beam analyzer and analysis method
#89Ion sources, systems and methods
#90Semiconductor structure made using improved multiple ion implantation process
#91Semiconductor structure made using improved multiple ion implantation process
#92Environmental cell for charged particle beam system
#93ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
#94PLUME STEERING
#95SYSTEM AND METHOD FOR REMOVING ORGANIC RESIDUE FROM A CHARGED PARTICLE BEAM SYSTEM
#96SPUTTER TARGET FEED SYSTEM
#97Charged particle beam device
#98Movable detector for charged particle beam inspection or review
#99Cleaning of an extraction aperture of an ion source
#100Cleaning of an extraction aperture of an ion source
#101Techniques for processing a substrate using a mask
#102Mobile type electron accelerator
#103Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus
#104Self-aligning floating ion-optics components
#105External cathode ion source
#106Masking apparatus for an ion implanter
#107SUBSTRATE PLASMA-PROCESSING APPARATUS
#108Substrate processing apparatus
#109Ion beam angle calibration and emittance measurement system for ribbon beams
#110Ion deposition apparatus having rotatable carousel for supporting a plurality of targets
#111APPARATUS
#112Method and apparatus for controlling beam current uniformity in an ion implanter
#113Ion source cleaning method and apparatus
#114Charged particle beam apparatus and method adjusting axis of aperture
#115Charged particle beam device
#116Charging-free electron beam cure of dielectric material
#117Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method
#118TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY
#119SCANNING ELECTRON MICROSCOPE
#120Charged particle beam equipment
#121External cathode ion source
#122Charged Particle Beam Apparatus
#123System and method for two-dimensional beam scan across a workpiece of an ion implanter
#124Techniques for reducing contamination during ion implantation
#125Mask position detection
#126Beam tuning with automatic magnet pole rotation for ion implanters
#127Vacuum device where power supply mechanism is mounted and power supply method
#128Particle-optical projection system
#129Ion-implanting apparatus, ion-implanting method, and device manufactured thereby
#130Method and apparatus for ion beam profiling
#131High resolution atom probe
#132Particle-optical projection system
#133Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device
#134Stationary actively-cooled shadow ring for heat dissipation in plasma chamber