Patents-Review.com
ClassID:

206324 ⎘

H01J2237/0262 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Details; Shields electrostatic

Recent Application in this class:
#1
20260094784
2026-04-02

FOIL LENS CORRECTORS, CHARGED PARTICLE MICROSCOPE SYSTEMS INCLUDING THE SAME, AND ASSOCIATED METHODS

 #2
20250349522
2025-11-13

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOSITION THEREON IN A LARGE PECVD CHAMBER

 #3
20250336646
2025-10-30

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #4
20250232941
2025-07-17

WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM

 #5
20250157783
2025-05-15

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

 #6
20250014855
2025-01-09

CHARGED PARTICLE APPARATUS AND METHOD

 #7
20240420921
2024-12-19

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

 #8
20240234105
2024-07-11

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOSITION THEREON IN A LARGE PECVD CHAMBER

 #9
20240136160
2024-04-25

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOSITION THEREON IN A LARGE PECVD CHAMBER

 #10
20240096597
2024-03-21

Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device

 #11
20240071711
2024-02-29

Apparatus using multiple beams of charged particles

 #12
20230386696
2023-11-30

Vacuum chamber arrangement for charged particle beam generator

 #13
20230360879
2023-11-09

Stage apparatus

 #14
20230207280
2023-06-29

SUBSTRATE TREATING APPARATUS

 #15
20230125679
2023-04-27

Member for semiconductor manufacturing apparatus and method for manufacturing the same

 #16
20230124558
2023-04-20

BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS

 #17
20220223366
2022-07-14

Apparatus using multiple beams of charged particles

 #18
20210383941
2021-12-09

Vacuum chamber arrangement for charged particle beam generator

 #19
20210375580
2021-12-02

Stage apparatus

 #20
20210351020
2021-11-11

Remote Capacitively Coupled Plasma Source with Improved Ion Blocker

 #21
20200402774
2020-12-24

Substrate processing apparatus and method of manufacturing semiconductor device

 #22
20200203114
2020-06-25

Apparatus using multiple beams of charged particles

 #23
20200194141
2020-06-18

Vacuum chamber arrangement for charged particle beam generator

 #24
20200035467
2020-01-30

Remote capacitively coupled plasma source with improved ion blocker

 #25
20190333743
2019-10-31

GAS SPRAYER FOR SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE

 #26
20190287755
2019-09-19

Ion milling apparatus and sample holder

 #27
20190272973
2019-09-05

Charged particle beam device

 #28
20190189395
2019-06-20

Aperture set for multi-beam

 #29
20190115246
2019-04-18

METHODS AND APPARATUS FOR SHIELDING SUBSTRATE SUPPORTS

 #30
20180374720
2018-12-27

GAS EXHAUST PLATE AND PLASMA PROCESSING APPARATUS

 #31
20180286633
2018-10-04

Ion milling system

 #32
20180261422
2018-09-13

Scanning electron microscope

 #33
20180218878
2018-08-02

Enhanced FIB-SEM systems for large-volume 3D imaging

 #34
20170250053
2017-08-31

High voltage shielding and cooling in a charged particle beam generator

 #35
20170221674
2017-08-03

Vacuum chamber arrangement for charged particle beam generator

 #36
20170018395
2017-01-19

Nano-patterned system and magnetic-field applying device thereof

 #37
20160240351
2016-08-18

PLASMA PRODUCING APPARATUS

 #38
20160133433
2016-05-12

Conductive interface system between vacuum chambers in a charged particle beam device

 #39
20150124229
2015-05-07

Charged particle lithography system and beam generator

 #40
20150123754
2015-05-07

Nano-patterned system and magnetic-field applying device thereof

 #41
20150060665
2015-03-05

System and method for controlling charge-up in an electron beam apparatus

 #42
20110266418
2011-11-03

Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof

 #43
20110261340
2011-10-27

Modulation device and charged particle multi-beamlet lithography system using the same

 #44
20110260040
2011-10-27

Charged particle multi-beamlet lithography system with modulation device

 #45
20080230713
2008-09-25

Ion source arc chamber seal

 #46
20080073531
2008-03-27

Charged particle beam system and a method for inspecting a sample

 #47
20080067410
2008-03-20

Charged particle generator and accelerator

 #48
20070187598
2007-08-16

Scanning electron microscope and apparatus for detecting defect

 #49
20070145269
2007-06-28

Electron anti-fogging baffle used as a detector