Patents-Review.com
ClassID:

206337 ⎘

H01J2237/0435 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge; Beam blanking Multi-aperture

Sub-classes:
Recent Application in this class:
#1
20260081106
2026-03-19

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS

 #2
20260010079
2026-01-08

APERTURE CORRECTION AMOUNT CALCULATION METHOD FOR APERTURE ARRAY SUBSTRATE, APERTURE ARRAY SUBSTRATE, BLANKING APERTURE ARRAY SUBSTRATE, MULTIPLE CHARGED-PARTICLE BEAM WRITING APPARATUS, AND MULTIPLE CHARGED-PARTICLE BEAM WRITING METHOD

 #3
20250391633
2025-12-25

ION EXTRACTION OPTICS WITH DYNAMIC EXTRACTION ANGLE CONTROL

 #4
20250336640
2025-10-30

ILLUMINATION LENS ADJUSTMENT METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM

 #5
20250323017
2025-10-16

MULTIPLE CHARGED-PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED-PARTICLE BEAM WRITING APPARATUS

 #6
20250323016
2025-10-16

MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM

 #7
20250323010
2025-10-16

MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND ADJUSTING METHOD THEREOF

 #8
20250299964
2025-09-25

PATTERN SHAPING OF METAL RESIST LAYER USING REACTIVE ANGLED BEAM PROCESSING

 #9
20250273424
2025-08-28

USE OF MULTIPLE ELECTRON BEAMS FOR HIGH THROUGHPUT INSPECTION

 #10
20250232942
2025-07-17

ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM

 #11
20250210302
2025-06-26

METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM MICROSCOPE, CORPUSCULAR MULTI-BEAM MICROSCOPE FOR VOLTAGE CONTRAST IMAGING AND SEMICONDUCTOR STRUCTURES FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM MICROSCOPE

 #12
20250157783
2025-05-15

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

 #13
20250132124
2025-04-24

MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH MIRROR FOR FIELD CURVATURE CORRECTION

 #14
20250095951
2025-03-20

ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS

 #15
20250095948
2025-03-20

ELECTRONIC COMPONENT AND CHARGED PARTICLE BEAM IRRADIATION APPARATUS

 #16
20250037960
2025-01-30

BLANKING APERTURE ARRAY SYSTEM, CHARGED PARTICLE BEAM WRITING APPARATUS, AND METHOD FOR INSPECTING BLANKING APERTURE ARRAY SYSTEM

 #17
20240429022
2024-12-26

MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD

 #18
20240395493
2024-11-28

BLANKING APERTURE ARRAY MECHANISM AND WRITING APPARATUS

 #19
20240304415
2024-09-12

Method for Determining Focal Properties in a Target Beam Field of a Multi-Beam Charged-Particle Processing Apparatus

 #20
20240304413
2024-09-12

Optimizing Image Distortion in a Multi Beam Charged Particle Processing Apparatus

 #21
20240297010
2024-09-05

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

 #22
20240282550
2024-08-22

BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING APPARATUS

 #23
20240203687
2024-06-20

MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM CURRENT CONTROL

 #24
20240128051
2024-04-18

MULTI-BEAM CHARGED PARTICLE BEAM SYSTEM WITH ANISOTROPIC FILTERING FOR IMPROVED IMAGE CONTRAST

 #25
20240128048
2024-04-18

METHOD FOR OPERATING A MULTI-BEAM PARTICLE MICROSCOPE WITH FAST CLOSED-LOOP BEAM CURRENT CONTROL, COMPUTER PROGRAM PRODUCT AND MULTI-BEAM PARTICLE MICROSCOPE

 #26
20240071711
2024-02-29

Apparatus using multiple beams of charged particles

 #27
20240029999
2024-01-25

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #28
20240017301
2024-01-18

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

 #29
20230154720
2023-05-18

METHOD FOR ESTIMATING CATHODE LIFETIME OF ELECTRON GUN, AND ELECTRON BEAM WRITING APPARATUS

 #30
20230111566
2023-04-13

CONTROL METHOD OF WRITING APPARATUS AND WRITING APPARATUS

 #31
20230086984
2023-03-23

BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM

 #32
20230081240
2023-03-16

Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing method

 #33
20230019113
2023-01-19

Multi-modal operations for multi-beam inspection system

 #34
20230005711
2023-01-05

Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatus

 #35
20220399181
2022-12-15

Multi charged particle beam writing apparatus

 #36
20220319807
2022-10-06

Charged particle beam writing apparatus and charged particle beam writing method

 #37
20220277927
2022-09-01

PARTICLE BEAM SYSTEM INCLUDING A MULTI-BEAM DEFLECTION DEVICE AND A BEAM STOP, METHOD FOR OPERATING THE PARTICLE BEAM SYSTEM AND ASSOCIATED COMPUTER PROGRAM PRODUCT

 #38
20220254600
2022-08-11

METHOD FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM MICROSCOPE, CORPUSCULAR MULTI-BEAM MICROSCOPE FOR VOLTAGE CONTRAST IMAGING AND SEMICONDUCTOR STRUCTURES FOR VOLTAGE CONTRAST IMAGING WITH A CORPUSCULAR MULTI-BEAM MICROSCOPE

 #39
20220223366
2022-07-14

Apparatus using multiple beams of charged particles

 #40
20220189734
2022-06-16

Electron beam irradiation apparatus and electron beam irradiation method

 #41
20220172919
2022-06-02

Drawing apparatus and deflector

 #42
20220157553
2022-05-19

Method for controlling operation of electron emission source, electron beam writing method, and electron beam writing apparatus

 #43
20220108867
2022-04-07

Digital detector, apparatus of charged-particle beam such as electron microscope comprising the same, and method thereof

 #44
20220102113
2022-03-31

Multiple-charged particle-beam irradiation apparatus and multiple-charged particle-beam irradiation method

 #45
20220068591
2022-03-03

Charged particle beam adjustment method, charged particle beam drawing method, and charged particle beam irradiation apparatus

 #46
20220059310
2022-02-24

Multiple electron beam writing apparatus and multiple electron beam writing method

 #47
20210358713
2021-11-18

Fill pattern to enhance ebeam process margin

 #48
20210257185
2021-08-19

Multi-charged particle beam writing apparatus and multi-charged particle beam writing method

 #49
20210237129
2021-08-05

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

 #50
20210074510
2021-03-11

Multi charged particle beam evaluation method and multi charged particle beam writing device

 #51
20200381212
2020-12-03

MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS OF OPERATING THE SAME

 #52
20200343073
2020-10-29

Multi charged particle beam writing apparatus

 #53
20200312619
2020-10-01

Aperture array with integrated current measurement

 #54
20200251306
2020-08-06

Exposure apparatus and exposure method, lithography method, and device manufacturing method

 #55
20200230665
2020-07-23

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

 #56
20200203121
2020-06-25

OPTICAL SYSTEM ADJUSTMENT METHOD OF IMAGE ACQUISITION APPARATUS

 #57
20200203114
2020-06-25

Apparatus using multiple beams of charged particles

 #58
20200176219
2020-06-04

Systems and methods for charged particle beam modulation

 #59
20200051782
2020-02-13

Writing data generation method, computer-readable recording medium on which program is recorded, and multi-charged particle beam writing apparatus

 #60
20200027689
2020-01-23

Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets

 #61
20190378676
2019-12-12

Deflector for multiple electron beams and multiple beam image acquiring apparatus

 #62
20190311882
2019-10-10

Studying dynamic specimens in a transmission charged particle microscope

 #63
20190304749
2019-10-03

Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

 #64
20190279842
2019-09-12

Apparatus of plural charged-particle beams

 #65
20190214218
2019-07-11

Aperture array alignment method and multi charged particle beam writing apparatus

 #66
20190198294
2019-06-27

Multiple charged particle beam writing method and apparatus using beams for straddling regions

 #67
20190198290
2019-06-27

Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

 #68
20190189395
2019-06-20

Aperture set for multi-beam

 #69
20190172678
2019-06-06

Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate

 #70
20190164723
2019-05-30

Fill pattern to enhance e-beam process margin

 #71
20190155160
2019-05-23

Ebeam universal cutter

 #72
20190122856
2019-04-25

Multi-charged-particle beam writing apparatus

 #73
20190121236
2019-04-25

Cross scan proximity correction with ebeam universal cutter

 #74
20190074161
2019-03-07

Exposure apparatus and exposure method, lithography method, and device manufacturing method

 #75
20190051494
2019-02-14

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #76
20190051487
2019-02-14

Optical system adjustment method of image acquisition apparatus

 #77
20190013175
2019-01-10

Aperture size modulation to enhance ebeam patterning resolution

 #78
20180350552
2018-12-06

Multi charged particle beam drawing apparatus and multi charged particle beam drawing method

 #79
20180323034
2018-11-08

Reduced Coulomb interactions in a multi-beam column

 #80
20180261421
2018-09-13

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #81
20180247788
2018-08-30

Multi charged particle beam writing apparatus and adjusting method for multi charged particle beam writing apparatus

 #82
20180236505
2018-08-23

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

 #83
20180166248
2018-06-14

Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line

 #84
20180144905
2018-05-24

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #85
20180143526
2018-05-24

Ebeam three beam aperture array

 #86
20180138013
2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #87
20180138012
2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #88
20180130634
2018-05-10

Electron microscope and image acquisition method

 #89
20180108514
2018-04-19

Multi-column electron beam lithography including field emitters on a silicon substrate with boron layer

 #90
20180040454
2018-02-08

Particle beam system and method for operating a particle optical unit

 #91
20170358425
2017-12-14

Multi charged-particle beam writing apparatus and adjustment method for the same

 #92
20170352520
2017-12-07

Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus

 #93
20170345612
2017-11-30

Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus

 #94
20170287674
2017-10-05

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #95
20170271118
2017-09-21

Multi charged particle beam blanking apparatus, multi charged particle beam blanking method, and multi charged particle beam writing apparatus

 #96
20170271117
2017-09-21

Corner rounding correction for electron beam (Ebeam) direct write system

 #97
20170269481
2017-09-21

Cross scan proximity correction with ebeam universal cutter

 #98
20170243713
2017-08-24

Studying dynamic specimen behavior in a charged-particle microscope

 #99
20170229280
2017-08-10

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #100
20170207056
2017-07-20

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #101
20170178862
2017-06-22

Multiple charged particle beam apparatus

 #102
20170169993
2017-06-15

Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image

 #103
20170098524
2017-04-06

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #104
20170084421
2017-03-23

Backscattered electrons (BSE) imaging using multi-beam tools

 #105
20170077029
2017-03-16

Unidirectional metal on layer with ebeam

 #106
20170076905
2017-03-16

Ebeam three beam aperture array

 #107
20170069509
2017-03-09

DATA COMPRESSION FOR EBEAM THROUGHPUT

 #108
20170025241
2017-01-26

Apparatus of plural charged-particle beams

 #109
20160322199
2016-11-03

Apparatus for charged particle lithography system

 #110
20160314934
2016-10-27

Exposure apparatus and exposure method

 #111
20160284505
2016-09-29

Apparatus of plural charged-particle beams

 #112
20160240344
2016-08-18

Charged particle inspection method and charged particle system

 #113
20160211111
2016-07-21

Rotation angle measuring method of multi-charged particle beam image, rotation angle adjustment method of multi-charged particle beam image, and multi-charged particle beam writing apparatus

 #114
20160172151
2016-06-16

Apparatus and methods for aberration correction in electron beam based system

 #115
20160161849
2016-06-09

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #116
20160141142
2016-05-19

Blanking system for multi charged particle beams, and multi charged particle beam writing apparatus

 #117
20160111251
2016-04-21

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #118
20160111246
2016-04-21

Blanking device for multi charged particle beams, and multi charged particle beam writing apparatus

 #119
20160099129
2016-04-07

Blanking aperture array and charged particle beam writing apparatus

 #120
20160071696
2016-03-10

Beam grid layout

 #121
20160061876
2016-03-03

Inspection method for blanking device for blanking multi charged particle beams

 #122
20160042908
2016-02-11

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #123
20160013012
2016-01-14

Charged Particle Beam System

 #124
20150357157
2015-12-10

Particle beam system and method for operating a particle optical unit

 #125
20150311035
2015-10-29

LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE

 #126
20150311031
2015-10-29

Multi-Beam Tool for Cutting Patterns

 #127
20150311030
2015-10-29

Multi-beam tool for cutting patterns

 #128
20150248993
2015-09-03

Compensation of defective beamlets in a charged-particle multi-beam exposure tool

 #129
20150243480
2015-08-27

Charged particle beam exposure apparatus and method of manufacturing semiconductor device

 #130
20150200074
2015-07-16

Charged particle beam exposure apparatus

 #131
20150190994
2015-07-09

Method for forming an optical fiber array

 #132
20150090896
2015-04-02

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

 #133
20150069260
2015-03-12

CHARGED-PARTICLE MULTI-BEAM APPARATUS HAVING CORRECTION PLATE

 #134
20150041672
2015-02-12

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

 #135
20150021493
2015-01-22

Pattern definition device having multiple blanking arrays

 #136
20150008331
2015-01-08

Charged particle inspection method and charged particle system

 #137
20140158902
2014-06-12

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #138
20140124684
2014-05-08

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #139
20140106279
2014-04-17

Drawing apparatus, and method of manufacturing article

 #140
20140061497
2014-03-06

Charged particle lithography system with intermediate chamber

 #141
20140014852
2014-01-16

Projection lens arrangement

 #142
20130252145
2013-09-26

Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers

 #143
20130112891
2013-05-09

Charged particle optical system and scribing apparatus

 #144
20130082187
2013-04-04

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #145
20130063708
2013-03-14

Drawing apparatus, and method of manufacturing article

 #146
20130043413
2013-02-21

Arrangement of optical fibers, and a method of forming such arrangement

 #147
20130026386
2013-01-31

ELECTROLYTIC PLATING METHOD AND ELECTROSTATIC DEFLECTING DEVICE

 #148
20130011796
2013-01-10

Drawing apparatus and method of manufacturing article

 #149
20120328988
2012-12-27

Drawing apparatus, method of manufacturing article, and processing apparatus

 #150
20120305798
2012-12-06

Charged particle multi-beam apparatus including a manipulator device for manipulation of one or more charged particle beams

 #151
20120293780
2012-11-22

Charged particle lithography system with intermediate chamber

 #152
20120288799
2012-11-15

In situ cleaning device for lithographic apparatus

 #153
20120241606
2012-09-27

Multiple-beam system for high-speed electron-beam inspection

 #154
20120219914
2012-08-30

DRAWING APPARATUS, DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE

 #155
20120183905
2012-07-19

CHARGED-PARTICLE BEAM DRAWING APPARATUS AND ARTICLE MANUFACTURING METHOD

 #156
20120126459
2012-05-24

Drawing apparatus, method of manufacturing article, method of manufacturing deflecting apparatus, and method of manufacturing drawing apparatus

 #157
20120104252
2012-05-03

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #158
20120061583
2012-03-15

Projection lens arrangement

 #159
20120043457
2012-02-23

OPTICAL SWITCHING IN A LITHOGRAPHY SYSTEM

 #160
20110266418
2011-11-03

Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof

 #161
20110261340
2011-10-27

Modulation device and charged particle multi-beamlet lithography system using the same

 #162
20110260040
2011-10-27

Charged particle multi-beamlet lithography system with modulation device

 #163
20110079730
2011-04-07

Imaging system

 #164
20110068276
2011-03-24

Multiple beam charged particle optical system

 #165
20100181479
2010-07-22

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #166
20100148087
2010-06-17

Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns

 #167
20100133433
2010-06-03

Electron beam apparatus

 #168
20100045958
2010-02-25

Lithography system

 #169
20100018858
2010-01-28

Frequency adjusting apparatus

 #170
20090261267
2009-10-22

PROJECTION LENS ARRANGEMENT

 #171
20090256075
2009-10-15

Charged Particle Inspection Method and Charged Particle System

 #172
20090212240
2009-08-27

Charged particle beam exposure system

 #173
20090212229
2009-08-27

Projection lens arrangement

 #174
20090200495
2009-08-13

Particle-beam exposure apparatus with overall-modulation of a patterned beam

 #175
20090140160
2009-06-04

Charged particle beam exposure system and beam manipulating arrangement

 #176
20090114837
2009-05-07

Dynamic pattern generator with cup-shaped structure

 #177
20090114818
2009-05-07

Charged particle-optical systems, methods and components

 #178
20090039262
2009-02-12

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

 #179
20080158537
2008-07-03

OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM

 #180
20080158536
2008-07-03

OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM

 #181
20080149846
2008-06-26

Particle-beam apparatus with improved wien-type filter

 #182
20080099693
2008-05-01

Charged-particle exposure apparatus

 #183
20080067437
2008-03-20

Charged beam processing apparatus

 #184
20080067383
2008-03-20

Electron-beam size measuring apparatus and size measuring method with electron beams

 #185
20080061247
2008-03-13

Lithography system

 #186
20080054184
2008-03-06

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #187
20080049888
2008-02-28

High brightness—multiple beamlets source for patterned X-ray production

 #188
20080042060
2008-02-21

Inspection system by charged particle beam and method of manufacturing devices using the system

 #189
20070187625
2007-08-16

Optical switching in a lithography system

 #190
20070114450
2007-05-24

MASK-MAKING MEMBER AND ITS PRODUCTION METHOD, MASK AND ITS MAKING METHOD, EXPOSURE PROCESS, AND FABRICATION METHOD OF SEMICONDUCTOR DEVICE

 #191
20070057186
2007-03-15

Inspection system by charged particle beam and method of manufacturing devices using the system

 #192
20070018101
2007-01-25

Electron beam apparatus and method of manufacturing semiconductor device using the apparatus

 #193
20060289804
2006-12-28

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #194
20060192145
2006-08-31

Charged particle beam apparatus and method for operating the same

 #195
20060017019
2006-01-26

Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method

 #196
20060006349
2006-01-12

Optical switching in lithography system

 #197
20050253093
2005-11-17

Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation

 #198
20050211921
2005-09-29

Electron beam exposure system

 #199
20050174553
2005-08-11

Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device

 #200
20050161621
2005-07-28

Charged particle beamlet exposure system

 #201
20050104014
2005-05-19

Ion printer

 #202
20050062950
2005-03-24

Modulator circuitry

 #203
20050006603
2005-01-13

Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method