Patents-Review.com
ClassID:

206338 ⎘

H01J2237/0437 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge; Beam blanking; Multi-aperture Semiconductor substrate

Recent Application in this class:
#1
20250379029
2025-12-11

MULTI-CHARGED PARTICLE BEAM WRITING METHOD

 #2
20250364208
2025-11-27

BACKGROUND WAVEFORM ACQUISITION METHOD, MARK POSITION DETECTION METHOD, ELECTRON BEAM WRITING METHOD, AND ELECTRON BEAM WRITING APPARATUS

 #3
20250359206
2025-11-20

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TRAPPING LAYER AND METHODS OF MANUFACTURING THE SAME

 #4
20250299918
2025-09-25

POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS, AND MARK POSITION MEASUREMENT METHOD

 #5
20250079120
2025-03-06

MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS

 #6
20240274659
2024-08-15

RFSOI SEMICONDUCTOR STRUCTURES INCLUDING A NITROGEN-DOPED CHARGE-TRAPPING LAYER AND METHODS OF MANUFACTURING THE SAME

 #7
20240071714
2024-02-29

BEAM DETECTOR, MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, AND BEAM DETECTOR ADJUSTMENT METHOD

 #8
20240013999
2024-01-11

MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS

 #9
20230402253
2023-12-14

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTICLE BEAM WRITING METHOD, INSPECTION METHOD FOR APERTURE ARRAY SUBSTRATE FOR MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM

 #10
20230360880
2023-11-09

Multi-Beam Pattern Definition Device

 #11
20230335366
2023-10-19

CHARGED PARTICLE BLOCKING ELEMENT, EXPOSURE APPARATUS COMPRISING SUCH AN ELEMENT, AND METHOD FOR USING SUCH AN EXPOSURE APPARATUS

 #12
20230314128
2023-10-05

Processing System and Charged Particle Beam Apparatus

 #13
20230260749
2023-08-17

OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM APPARATUS AND COMPUTER READABLE RECORDING MEDIUM

 #14
20230260748
2023-08-17

MULTI-ELECTRON BEAM WRITING APPARATUS AND MULTI-ELECTRON BEAM WRITING METHOD

 #15
20230187172
2023-06-15

MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD

 #16
20230055778
2023-02-23

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #17
20220392731
2022-12-08

Blanking aperture array unit

 #18
20220380896
2022-12-01

SEMICONDUCTOR PROCESS SURFACE MONITORING

 #19
20220320277
2022-10-06

RFSOI semiconductor structures including a nitrogen-doped charge-trapping layer and methods of manufacturing the same

 #20
20220270850
2022-08-25

Semiconductor device, multi-charged-particle beam writing apparatus, and multi-charged-particle beam exposure apparatus

 #21
20210384002
2021-12-09

Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus

 #22
20210376075
2021-12-02

RFSOI semiconductor structures including a nitrogen-doped charge-trapping layer and methods of manufacturing the same

 #23
20210358713
2021-11-18

Fill pattern to enhance ebeam process margin

 #24
20210335603
2021-10-28

Plasma block with integrated cooling

 #25
20210296082
2021-09-23

Plasma processing apparatus and operating method of plasma processing apparatus

 #26
20210287873
2021-09-16

Charged particle beam deflection device

 #27
20210249224
2021-08-12

ELECTRON BEAM APPARATUS, INSPECTION TOOL AND INSPECTION METHOD

 #28
20210013002
2021-01-14

Multi-beam writing method and multi-beam writing apparatus

 #29
20200321192
2020-10-08

Surface processing apparatus

 #30
20200273668
2020-08-27

Set of aperture substrates for multiple beams and multi charged particle beam apparatus

 #31
20200266033
2020-08-20

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #32
20200258716
2020-08-13

Multi-charged-particle beam writing apparatus and multi-charged-particle beam writing method

 #33
20200211812
2020-07-02

Multiple electron beams irradiation apparatus

 #34
20200194214
2020-06-18

Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus

 #35
20200091056
2020-03-19

Semiconductor device

 #36
20200043701
2020-02-06

Multiple charged particle beam writing apparatus and multiple charged particle beam writing method

 #37
20190198293
2019-06-27

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #38
20190189395
2019-06-20

Aperture set for multi-beam

 #39
20190164723
2019-05-30

Fill pattern to enhance e-beam process margin

 #40
20180358203
2018-12-13

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM ADJUSTING METHOD

 #41
20180166248
2018-06-14

Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line

 #42
20170352520
2017-12-07

Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus

 #43
20170345964
2017-11-30

Ion implant system having grid assembly

 #44
20170316914
2017-11-02

Stage mechanism

 #45
20170309440
2017-10-26

Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method

 #46
20170301506
2017-10-19

Multi charged particle beam exposure method, and multi charged particle beam blanking apparatus

 #47
20170243714
2017-08-24

Diagnosis method, charged particle beam lithography apparatus, and recording medium

 #48
20170133199
2017-05-11

Systems including a beam projection device providing variable exposure duration resolution

 #49
20170076906
2017-03-16

Ebeam staggered beam aperture array

 #50
20160314930
2016-10-27

Device, manufacturing method, and exposure apparatus

 #51
20160181465
2016-06-23

Ion implant system having grid assembly

 #52
20160155610
2016-06-02

Multiple charged particle beam lithography apparatus and multiple charged particle beam pattern writing method

 #53
20160141142
2016-05-19

Blanking system for multi charged particle beams, and multi charged particle beam writing apparatus

 #54
20150155138
2015-06-04

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

 #55
20150155130
2015-06-04

DRAWING APPARATUS, DRAWING METHOD, AND METHOD FOR MANUFACTURING ARTICLE

 #56
20150136994
2015-05-21

Modulation device and power supply arrangement

 #57
20150072461
2015-03-12

Ion implant system having grid assembly

 #58
20150052776
2015-02-26

Drying apparatus for use in a lithography system

 #59
20130078577
2013-03-28

CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION METHOD, DRAWING DATA GENERATION PROGRAM STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD

 #60
20130032729
2013-02-07

Charged particle detection system and multi-beamlet inspection system

 #61
20120312975
2012-12-13

ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD

 #62
20120292524
2012-11-22

Charged particle lithography system with aperture array cooling

 #63
20120292491
2012-11-22

Charged particle beam modulator

 #64
20120273691
2012-11-01

Electro-optical element for multiple beam alignment

 #65
20120273658
2012-11-01

Modulation device and charged particle multi-beamlet lithography system using the same

 #66
20120145931
2012-06-14

Lithography system, modulation device and method of manufacturing a fiber fixation substrate

 #67
20120145916
2012-06-14

Projection lens arrangement

 #68
20120129325
2012-05-24

Method for ion implant using grid assembly

 #69
20120125259
2012-05-24

Ion implant system having grid assembly

 #70
20120115306
2012-05-10

DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD

 #71
20120091358
2012-04-19

Projection lens arrangement

 #72
20120091318
2012-04-19

Beamlet blanker arrangement

 #73
20120043457
2012-02-23

OPTICAL SWITCHING IN A LITHOGRAPHY SYSTEM

 #74
20120015303
2012-01-19

Drawing apparatus and method of manufacturing article

 #75
20110266418
2011-11-03

Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof

 #76
20110261340
2011-10-27

Modulation device and charged particle multi-beamlet lithography system using the same

 #77
20110260040
2011-10-27

Charged particle multi-beamlet lithography system with modulation device

 #78
20110204253
2011-08-25

Pattern definition device with multiple multibeam array

 #79
20100323508
2010-12-23

Plasma grid implant system for use in solar cell fabrications

 #80
20100288938
2010-11-18

Multi-beam deflector array means with bonded electrodes

 #81
20100276606
2010-11-04

Charged particle optical system comprising an electrostatic deflector

 #82
20100248166
2010-09-30

Deflector array, exposure apparatus, and device manufacturing method

 #83
20100224777
2010-09-09

Layered scanning charged particle microscope with differential pumping aperture

 #84
20100187434
2010-07-29

Method for producing a multi-beam deflector array device having electrodes

 #85
20100045958
2010-02-25

Lithography system

 #86
20090026389
2009-01-29

Multi-beam source

 #87
20080283767
2008-11-20

Pattern definition device having distinct counter-electrode array plate

 #88
20080203317
2008-08-28

Multi-beam deflector array device for maskless particle-beam processing

 #89
20080158537
2008-07-03

OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM

 #90
20080158536
2008-07-03

OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM

 #91
20080128638
2008-06-05

Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate

 #92
20080061247
2008-03-13

Lithography system

 #93
20080017807
2008-01-24

Deflector array, exposure apparatus, and device manufacturing method

 #94
20070187625
2007-08-16

Optical switching in a lithography system

 #95
20060006349
2006-01-12

Optical switching in lithography system

 #96
20050263713
2005-12-01

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus

 #97
20050035300
2005-02-17

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus