206365 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources Construction
Sub-classes:ION SOURCE AND OPERATING METHOD THEREOF
#2ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY
#3COMPACT 2D SCANNER MAGNET WITH TRAPEZOIDAL COILS
#4ION GENERATION DEVICE AND ION IMPLANTER
#5Structure for Particle Acceleration And Charged Particle Beam Apparatus
#6Repeller assembly for mounting into an arc chamber of an ion implanter and arc chamber containing the repeller assembly
#7Charged Particle Gun and Charged Particle Beam System
#8Charged particle source module
#9Variable thickness ion source extraction plate
#10Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#11Apparatus of plural charged-particle beams
#12Thermally isolated captive features for ion implantation systems
#13Thermally isolated captive features for ion implantation systems
#14Method and apparatus for forming substrate surfaces with exposed crystal lattice using accelerated neutral atom beam
#15Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#16Side inject designs for improved radical concentrations
#17Apparatus of plural charged-particle beams
#18Ion source with tailored extraction shape
#19Ion implantation processes and apparatus using gallium
#20Charged particle source module
#21Electron source and electron beam device using the same
#22Semiconductor manufacturing device with embedded fluid conduits
#23Side inject designs for improved radical concentrations
#24Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#25Charged-particle beam apparatus, charged-particle beam writing apparatus, and charged-particle beam controlling method
#26Apparatus of plural charged-particle beams
#27Field ionization source, ion beam apparatus, and beam irradiation method
#28Lanthanated tungsten ion source and beamline components
#29Ion generator
#30Method for ultra-shallow etching using neutral beam processing based on gas cluster ion beam technology
#31Electron source architecture for a scanning electron microscopy system
#32Electron microscope electron gun for facilitating position adjustment and electron microscope including same
#33Collision ionization source
#34Electron beam emitters with ruthenium coating
#35Hollow cathode ion source
#36Method of adjusting the primary side of an X-ray diffractometer
#37Apparatus of plural charged-particle beams
#38Ribbon beam ion source of arbitrary length
#39Apparatus of plural charged-particle beams
#40Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun
#41Semiconductor manufacturing device with embedded fluid conduits
#42Inspection device
#43SiC coating in an ion implanter
#44Apparatus for GHz rate high duty cycle pulsing and manipulation of low and medium energy DC electron beams
#45Assemblies for ion and electron sources and methods of use
#46Plasma ion source and charged particle beam apparatus
#47Uniformity control using adjustable internal antennas
#48Control of ion angular distribution of ion beams with hidden deflection electrode
#49Electron gun supporting member and electron gun apparatus
#50Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#51GCIB nozzle assembly
#52Plasma-based material modification using a plasma source with magnetic confinement
#53Cathode arrangement, electron gun, and lithography system comprising such electron gun
#54Cathode arrangement, electron gun, and lithography system comprising such electron gun
#55Cold stripper for high energy ion implanter with tandem accelerator
#56Device for producing an electron beam
#57High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped
#58SiC coating in an ion implanter
#59Methods of ion source fabrication
#60Ion beam device
#61Pre-aligned nozzle/skimmer
#62Excited gas injection for ion implant control
#63APPARATUS FOR GENERATING ELECTRON BEAMS, AND METHOD FOR MANUFACTURING SAME
#64Method of Anion Production from Atoms and Molecules
#65Encapsulation of electrodes in solid media
#66Ion sources, systems and methods
#67Inspection device
#68Ion sources and methods for generating an ion beam with controllable ion current density distribution
#69CLOSED DRIFT ION SOURCE WITH SYMMETRIC MAGNETIC FIELD
#70Charged particle source from a photoionized cold atom beam
#71Gas delivery system with voltage gradient for an ion microscope
#72GAS FIELD IONIZATION ION SOURCE APPARATUS AND SCANNING CHARGED PARTICLE MICROSCOPE EQUIPPED WITH SAME
#73Liquid metal ion gun
#74ION BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
#75Filament for electron source
#76Ion microscope
#77PLUME STEERING
#78Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
#79Hall-current ion source with improved ion beam energy distribution
#80Ion source
#81Ion source apparatus
#82GAS ION SOURCE WITH HIGH MECHANICAL STABILITY
#83Charged particle source with integrated energy filter
#84Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
#85Small form factor plasma source for high density wide ribbon ion beam generation
#86Ion source with independent power supplies
#87Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
#88ELECTRON BEAM GENERATOR HAVING ADJUSTABLE BEAM WIDTH
#89Charged particle beam apparatus using an electrostatic lens gun
#90Cathode ion source
#91Ion beam device
#92Carbon nanotube electron gun
#93Charged particle extraction device and method of design there for
#94Assemblies for ion and electron sources and methods of use
#95INDIRECT HEATED CATHODE OF ION IMPLANTER
#96Method and apparatus for producing hyperthermal beams
#97Ion implantation apparatus and a method
#98Ion implantation apparatus
#99Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control
#100PRE-ALIGNED NOZZLE/SKIMMER
#101Electron source
#102Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles
#103Multiple nozzle gas cluster ion beam system
#104Apparatus for producing a charged particle beam
#105Directional gas injection for an ion source cathode assembly
#106Techniques for providing a multimode ion source
#107Cathode having electron production and focusing grooves, ion source and related method
#108Excited gas injection for ion implant control
#109Dual mode gas field ion source
#110Charged particle extraction device and method of design there for
#111Increasing current in charged particle sources and systems
#112PLASMA GENERATING APPARATUS AND FILM FORMING APPARATUS USING PLASMA GENERATING APPARATUS
#113Methods for implanting B22Hx and its ionized lower mass byproducts
#114Ion source for generating negatively charged ions
#115Ion source cleaning method and apparatus
#116Techniques for providing a multimode ion source
#117Gas delivery system for an ion source
#118Charged particle source with integrated energy filter
#119Ultra high precision measurement tool
#120Multi mode ion source
#121Ion source with adjustable aperture
#122PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, AND DEPOSITION METHOD
#123CAPILLARITRON ION BEAM SPUTTERING SYSTEM AND THIN FILM PRODUCTION METHOD
#124Electron beam generating apparatus
#125Dual mode gas field ion source
#126ION SOURCE GAS REACTOR
#127RF electron source for ionizing gas clusters
#128Techniques for providing a multimode ion source
#129Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method
#130PLASMA TREATMENT APPARATUS
#131Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
#132Method and device for adjusting a beam property in a gas cluster ion beam system
#133Ion source, ion implantation apparatus, and ion implantation method
#134Gas ion source with high mechanical stability
#135Cathode having electron production and focusing grooves, ion source and related method
#136Arrangement and method for compensating emitter tip vibrations
#137Focused ion beam apparatus
#138Carbon nanotube electron gun
#139Ion source arc chamber seal
#140Ion beam apparatus having plasma sheath controller
#141Methods of operating an electromagnet of an ion source
#142Generation, acceleration, focusing and collection of a high-brightness, space-charge-dominated circular charged-particle beam
#143Semiconductor apparatus using ion beam
#144Ion source with upstream inner magnetic pole piece
#145Multivalent ion generating source and charged particle beam apparatus using such ion generating source
#146Methods and apparatuses for directing an ion beam source
#147Ion source
#148Charged particle beam device with a gas field ion source and a gas supply system
#149Electron beam apparatus and an aberration correction optical apparatus
#150High brightness—multiple beamlets source for patterned X-ray production
#151Ion source including magnet and magnet yoke assembly
#152Electron gun assembly
#153Electron beam generator for multiple columns
#154Electron gun and electron beam apparatus field of invention
#155Ion sources and methods for generating an ion beam with a controllable ion current density distribution
#156Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
#157Apparatus and method for controlling ion beam
#158Ion source and polishing system using the same
#159Charged particle beam extraction and formation apparatus
#160Irradiation system ion beam and method to enhance accuracy of irradiation
#161Irradiation system with ion beam
#162Method to increase low-energy beam current in irradiation system with ion beam
#163Ion source section for ion implantation equipment
#164Sample dimension measuring method and scanning electron microscope
#165Gas flow restricting cathode system for ion implanter and related method
#166Ion source with electrode kept at potential(s) other than ground by zener diode(s), thyristor(s) and/or the like
#167Kinematic ion implanter electrode mounting
#168Ion source head structure of semiconductor ion implanter
#169Cam actuated filament clamp